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1. 发明授权

US07125467B2 Slider processing system utilizing polyvinyl alcohol release layer 失效
标题翻译：滑块加工系统采用聚乙烯醇脱模层
公开(公告)号：US07125467B2
公开(公告)日：2006-10-24
申请号：US10611528
申请日：2003-06-30
申请人： Phillip Joe Brock , Michael William Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Wesley L. Hillman , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Richard I. Palmisano , Jila Tabib , Mark C. Thurber , Willi Volksen
发明人： Phillip Joe Brock , Michael William Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Wesley L. Hillman , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Richard I. Palmisano , Jila Tabib , Mark C. Thurber , Willi Volksen
IPC分类号： B32B37/00 , G11B5/127
CPC分类号： C09D5/20 , Y10T29/49032 , Y10T29/49041
摘要： A process for fabricating sliders where the sliders are held in place during processing by a solid matrix material is described. A thin coating of a release-layer material is applied on the sliders before encapsulation in the matrix material. The release-layer material is polyvinyl alcohol and more preferably high molecular weight polyvinyl alcohol which is highly hydrolyzed. Use of the release-layer of the invention maintains the process resistance while providing the advantage of allowing easier removal of the matrix material after it is no longer needed. The release-layer can be applied to encapsulant materials including epoxies, acrylates, polyimides, silsesquioxanes and others. After the selected fabrication process such as the formation of air-bearing features an appropriate solvent is applied to soften the polyvinyl alcohol film and allow clean debonding of the sliders.
摘要翻译：描述了一种用于制造滑块的方法，其中滑块在由固体基质材料处理期间保持就位。剥离层材料的薄涂层在封装在基质材料中之前施加在滑块上。剥离层材料是聚乙烯醇，更优选高度水解的高分子量聚乙烯醇。本发明的释放层的使用保持了工艺阻力，同时提供了在不再需要基质材料之后容易去除基质材料的优点。释放层可以应用于包括环氧树脂，丙烯酸酯，聚酰亚胺，倍半硅氧烷等的包封材料。在选择的制造方法如形成空气轴承特征之后，施加适当的溶剂以软化聚乙烯醇膜并允许滑块的清洁脱粘。

2. 发明授权

US5545307A Process for patterned electroplating 失效
标题翻译：图案化电镀工艺
公开(公告)号：US5545307A
公开(公告)日：1996-08-13
申请号：US417621
申请日：1995-04-06
申请人： Saad K. Doss , Dennis R. McKean , Alfred F. Renaldo , Robert J. Wilson
发明人： Saad K. Doss , Dennis R. McKean , Alfred F. Renaldo , Robert J. Wilson
IPC分类号： C25D5/02
CPC分类号： C25D5/024
摘要： A process for patterned electroplating involves the steps of: (i) coating a substrate with a layer of amninoalkylpyridine which acts as an adhesion promoter; (ii) coating the adhesion layer with a radiation sensitive polymeric resist; (iii) imagewise exposing the film to radiation; (iv) developing the image to patternwise expose the substrate; (v) electroplating metal onto the exposed portions of the substrate; and (vi) removing the remaining polymeric film from the substrate.
摘要翻译：用于图案化电镀的方法包括以下步骤：（i）用作为粘合促进剂的氨基烷基吡啶层涂覆底物; （ii）用辐射敏感聚合物抗蚀剂涂覆粘附层; （iii）将膜成像曝光于辐射; （iv）显影所述图像以图案地曝光所述基底; （v）将金属电镀到衬底的暴露部分上; 和（vi）从基底上除去剩余的聚合物膜。

3. 发明授权

US4522911A Deep ultra-violet lithographic resists with diazohomotetramic acid compounds 失效
标题翻译：深紫外光刻抗蚀剂与重氮三甲酸化合物
公开(公告)号：US4522911A
公开(公告)日：1985-06-11
申请号：US508642
申请日：1983-06-28
申请人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
发明人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
IPC分类号： G03F7/20 , C07D213/77 , G03C1/72 , G03C5/08 , G03F7/008 , G03F7/016 , G03F7/022 , G03F7/039 , H01L21/027 , G03C1/54 , C07C113/00 , G03C1/60
CPC分类号： C07D213/77 , G03F7/0163
摘要： A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
摘要翻译：一种与深紫外线辐射一起使用的平版印刷抗蚀剂，包括酸性树脂和重氮磺酰三乙酸敏化剂。

4. 发明授权

US07851138B2 Patterning a surface comprising silicon and carbon 有权
标题翻译：图案化包括硅和碳的表面
公开(公告)号：US07851138B2
公开(公告)日：2010-12-14
申请号：US11880157
申请日：2007-07-19
申请人： Cherngye Hwang , Dennis R. McKean , Gary J. Suzuki
发明人： Cherngye Hwang , Dennis R. McKean , Gary J. Suzuki
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11 , G03F7/26 , G03F7/40
CPC分类号： G03F7/0751 , G11B5/3163 , G11B5/3169 , G11B5/6082
摘要： Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is coated with 3-(trimethoxysilyl)propyl methacrylate, and a photoresist is applied the 3-(trimethoxysilyl)propyl methacrylate coated surface. The photoresist is imaged and the surface is etched. The photoresist is then removed.
摘要翻译：在此描述包括至少一个具有耦合到衬底的硅的特征的表面。在一个实施例中，描述了一种用于图案化表面的方法，该表面包括至少一个具有硅的特征和至少一个具有与基底结合的碳的特征。表面用甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂覆，并且使用光致抗蚀剂涂覆甲基丙烯酸3-（三甲氧基甲硅烷基）丙酯涂布表面。光致抗蚀剂成像，表面被蚀刻。然后除去光致抗蚀剂。

5. 发明申请

US20100147797A1 SYSTEM AND METHOD FOR PATTERNING A MASTER DISK FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS 审中-公开
标题翻译：用于绘制图形磁记录盘的主磁盘的系统和方法
公开(公告)号：US20100147797A1
公开(公告)日：2010-06-17
申请号：US12711987
申请日：2010-02-24
申请人： Thomas R. Albrecht , Dennis R. McKean , Gurinder Pal Singh , Henry Hung Yang
发明人： Thomas R. Albrecht , Dennis R. McKean , Gurinder Pal Singh , Henry Hung Yang
IPC分类号： C23F1/02
CPC分类号： G11B5/855
摘要： A system and method for patterning a master disk or “stamper” to be used for nanoimprinting magnetic recording disks uses an air-bearing slider that supports an aperture structure within the optical near-field of a resist layer on a rotating master disk substrate. Laser pulses directed to the input side of the aperture are output to the resist layer. The aperture structure includes a metal film reflective to the laser radiation with the aperture formed in it. The aperture has a size less than the wavelength of the incident laser radiation and is maintained by the air-bearing slider near the resist layer to within the radiation wavelength. The timing of the laser pulses is controlled to form a pattern of exposed regions in the resist layer, with this pattern ultimately resulting in the desired pattern of data islands and nondata islands in the magnetic recording disks when they are nanoimprinted by the master disk.
摘要翻译：用于图形化用于纳米压印磁记录盘的母盘或“压模”的系统和方法使用支撑旋转母盘衬底上的抗蚀剂层的光学近场内的孔结构的空气轴承滑块。指向孔径输入侧的激光脉冲输出到抗蚀剂层。孔结构包括反射激光辐射的金属膜，其中形成有孔。孔径的尺寸小于入射激光辐射的波长，并且由抗蚀剂层附近的空气轴承滑块维持在辐射波长内。控制激光脉冲的定时以形成抗蚀剂层中的暴露区域的图案，当这些图案被母盘纳米压印时，该图案最终导致磁记录盘中的数据岛和非数据岛的期望图案。

6. 发明授权

US5342727A Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition 失效
标题翻译： 4-羟基苯乙烯和烷基取代的-4-羟基苯乙烯的共聚物与光敏剂混合以形成光敏组合物
公开(公告)号：US5342727A
公开(公告)日：1994-08-30
申请号：US812878
申请日：1991-12-20
申请人： Richard Vicari , Douglas J. Gordon , William D. Hinsberg , Dennis R. McKean , Carlton G. Willson , Ralph Dammel
发明人： Richard Vicari , Douglas J. Gordon , William D. Hinsberg , Dennis R. McKean , Carlton G. Willson , Ralph Dammel
IPC分类号： C08F8/10 , C08F212/14 , G03F7/004 , G03F7/023 , G03F7/021 , G03F7/09
CPC分类号： G03F7/0233 , C08F212/14 , C08F8/12 , G03F7/0045
摘要： A copolymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C.sub.1 to C.sub.4 alkyl and wherein at least one of B and D is C.sub.1 to C.sub.4 alkyl; and wherein said copolymer has a molecular weight of from about 800 to about 100,000; and wherein the mol ratio of monomer (a) to monomer (b) ranges from about 3:1 to about 1:3.
摘要翻译：（a）未取代的4-羟基苯乙烯单体和（b）式（IMAGE）的取代的4-羟基苯乙烯单体的共聚物，其中A，B，C和D独立地为H或C 1至C 4烷基，并且其中至少一个的B和D是C 1〜C 4烷基; 并且其中所述共聚物的分子量为约800至约100,000; 并且其中单体（a）与单体（b）的摩尔比为约3:1至约1:3。

7. 发明授权

US4397937A Positive resist compositions 失效
标题翻译：正抗蚀剂组合物
公开(公告)号：US4397937A
公开(公告)日：1983-08-09
申请号：US347658
申请日：1982-02-10
申请人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Robert J. Twieg , Carlton G. Willson
发明人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Robert J. Twieg , Carlton G. Willson
IPC分类号： G03C1/72 , C08L61/00 , C08L61/04 , G03F7/022 , H01L21/027 , G03C1/54 , G03C1/60
CPC分类号： G03F7/022
摘要： Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.
摘要翻译：正型抗蚀剂由可溶性酚醛树脂和作为1-氧代-2-二氮萘磺酸的二酯和作为几何和非对映异构体的混合物的不对称伯或仲脂族二醇的敏化剂形成。

8. 发明申请

US20080273270A1 Forming a planarized surface for at least one bar of sliders 有权
标题翻译：形成用于至少一个滑块的平坦化表面
公开(公告)号：US20080273270A1
公开(公告)日：2008-11-06
申请号：US11800127
申请日：2007-05-03
申请人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
发明人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
IPC分类号： G11B5/60 , G11B5/147 , B29C65/00
CPC分类号： G11B5/4853 , G11B5/102 , G11B5/3163 , G11B5/3173 , Y10T29/49027 , Y10T29/49039 , Y10T29/49041 , Y10T29/49055 , Y10T29/53165 , Y10T156/10
摘要： A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.
摘要翻译：公开了一种用于形成至少一个用于硬盘驱动器的滑块的平面化表面的方法。通常，将至少一个滑杆放置在粘合剂层上。然后在至少一个滑杆上方设置单个热塑性层。然后将单个热塑性层加热到软化温度，使得单个热塑性层将在至少一个滑块之间流动。然后将单个热塑性层冷却以在所述粘合剂层处形成所述单一热塑性层和所述至少一个滑块条的平坦化表面。

9. 发明授权

US07396636B2 Segmented resist islands for photolithography on single sliders 失效
标题翻译：在单个滑块上用于光刻的分段抗蚀岛
公开(公告)号：US07396636B2
公开(公告)日：2008-07-08
申请号：US10928038
申请日：2004-08-27
申请人： Cherngye Hwang , Kim Y. Lee , Dennis R. McKean , Gary Suzuki
发明人： Cherngye Hwang , Kim Y. Lee , Dennis R. McKean , Gary Suzuki
IPC分类号： G03F7/00
CPC分类号： G11B5/6005 , G11B5/3163 , G11B5/3173
摘要： A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.
摘要翻译：公开了一种用于在单个滑块上创建用于光刻的分割的抗蚀岛的方法。该方法包括将多个单个滑块的温度升高到低于适当的软烘烤温度的温度。单个滑块位于分隔器中，分隔器的单个滑块和壁具有沉积在其上的抗蚀剂层。然后进行粗光刻以从分隔器的壁的上部的部分去除抗蚀剂; 然后将单个滑块，抗蚀剂和分隔器的温度倾斜到适当的软烘烤温度。

10. 发明授权

US07209324B2 Sliders bonded by a debondable encapsulant containing styrene and butadiene polymers 失效
标题翻译：滑块由含有苯乙烯和丁二烯聚合物的可剥离密封剂粘合
公开(公告)号：US07209324B2
公开(公告)日：2007-04-24
申请号：US10611673
申请日：2003-06-30
申请人： Phillip J. Brock , Michael W. Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Richard I. Palmisano , Willi Volksen
发明人： Phillip J. Brock , Michael W. Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Richard I. Palmisano , Willi Volksen
IPC分类号： G11B5/60
CPC分类号： G11B5/6005
摘要： The invention relates generally to the bonding of one or more sliders in styrene and butadiene polymers. More particularly, the invention relates to planarized slider assemblies formed by using debondable solid encapsulants comprised of styrene and butadiene polymers. The invention also relates to methods that use such encapsulants in conjunction with resists to produce magnetic head sliders having patterned air-bearing surfaces.
摘要翻译：本发明一般涉及一种或多种滑块在苯乙烯和丁二烯聚合物中的结合。更具体地，本发明涉及通过使用由苯乙烯和丁二烯聚合物组成的可分离固体密封剂形成的平面化滑块组件。本发明还涉及将这种密封剂与抗蚀剂结合使用以产生具有图案化空气轴承表面的磁头滑块的方法。

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