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1. 发明申请

US20090081563A1 Integrated Circuits and Methods of Design and Manufacture Thereof 有权
标题翻译：集成电路及其设计和制造方法
公开(公告)号：US20090081563A1
公开(公告)日：2009-03-26
申请号：US12126741
申请日：2008-05-23
申请人： Helen Wang , Scott D. Halle , Henning Haffner , Haoren Zhuang , Klaus Herold , Matthew E. Colburn , Allen H. Gabor , Zachary Baum , Scott M. Mansfield , Jason E. Meiring
发明人： Helen Wang , Scott D. Halle , Henning Haffner , Haoren Zhuang , Klaus Herold , Matthew E. Colburn , Allen H. Gabor , Zachary Baum , Scott M. Mansfield , Jason E. Meiring
IPC分类号： G03F1/14 , G03F7/26
CPC分类号： H01L21/32139 , G03F1/36 , G03F1/70 , H01L21/0274 , H01L21/28123 , H01L21/823437 , Y10S438/942
摘要： Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes depositing a gate material over a semiconductor substrate, and depositing a first resist layer over the gate material. A first mask is used to pattern the first resist layer to form first and second resist features. The first resist features include pattern for gate lines of the semiconductor device and the second resist features include printing assist features. A second mask is used to form a resist template; the second mask removes the second resist features.
摘要翻译：公开了集成电路及其制造和设计方法。例如，制造方法包括在半导体衬底上沉积栅极材料，并且在栅极材料上沉积第一抗蚀剂层。使用第一掩模来图案化第一抗蚀剂层以形成第一和第二抗蚀剂特征。第一抗蚀剂特征包括半导体器件的栅极线的图案，第二抗蚀剂特征包括印刷辅助特征。使用第二掩模形成抗蚀剂模板; 第二掩模移除第二抗蚀剂特征。

2. 发明授权

US08039203B2 Integrated circuits and methods of design and manufacture thereof 有权
标题翻译：集成电路及其设计和制造方法
公开(公告)号：US08039203B2
公开(公告)日：2011-10-18
申请号：US12126741
申请日：2008-05-23
申请人： Helen Wang , Scott D. Halle , Henning Haffner , Haoren Zhuang , Klaus Herold , Matthew E. Colburn , Allen H. Gabor , Zachary Baum , Scott M. Mansfield , Jason E. Meiring
发明人： Helen Wang , Scott D. Halle , Henning Haffner , Haoren Zhuang , Klaus Herold , Matthew E. Colburn , Allen H. Gabor , Zachary Baum , Scott M. Mansfield , Jason E. Meiring
IPC分类号： H01L21/027
CPC分类号： H01L21/32139 , G03F1/36 , G03F1/70 , H01L21/0274 , H01L21/28123 , H01L21/823437 , Y10S438/942
摘要： Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes depositing a gate material over a semiconductor substrate, and depositing a first resist layer over the gate material. A first mask is used to pattern the first resist layer to form first and second resist features. The first resist features include pattern for gate lines of the semiconductor device and the second resist features include printing assist features. A second mask is used to form a resist template; the second mask removes the second resist features.
摘要翻译：公开了集成电路及其制造和设计方法。例如，制造方法包括在半导体衬底上沉积栅极材料，并且在栅极材料上沉积第一抗蚀剂层。使用第一掩模来图案化第一抗蚀剂层以形成第一和第二抗蚀剂特征。第一抗蚀剂特征包括半导体器件的栅极线的图案，第二抗蚀剂特征包括印刷辅助特征。使用第二掩模形成抗蚀剂模板; 第二掩模移除第二抗蚀剂特征。

3. 发明申请

US20100175040A1 METHODOLOGY OF PLACING PRINTING ASSIST FEATURE FOR RANDOM MASK LAYOUT 有权
标题翻译：打印辅助功能的随机面膜布局方法
公开(公告)号：US20100175040A1
公开(公告)日：2010-07-08
申请号：US12350251
申请日：2009-01-08
申请人： Jason E. Meiring , Henning Haffner
发明人： Jason E. Meiring , Henning Haffner
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Embodiments of the present invention provide a method of placing printing assist features in a mask layout. The method includes providing a design layout having one or more designed features; generating a set of parameters, the set of parameters being associated with one or more printing assist features (PrAFs); adding the one or more PrAFs of the set of parameters to the design layout to produce a modified design layout; performing simulation of the one or more PrAFs and the one or more designed features on the modified design layout; verifying whether the one or more PrAFs are removable based on results of the simulation; and creating a set of PrAF placement rules based on the set of parameters, if the one or more PrAFs are verified as removable. The set of PrAF placement rules may be used in creating a final set of PrAF features to be used for creating the mask layout.
摘要翻译：本发明的实施例提供了一种将打印辅助特征放置在掩模布局中的方法。该方法包括提供具有一个或多个设计特征的设计布局; 产生一组参数，该组参数与一个或多个打印辅助特征（PrAF）相关联; 将该组参数中的一个或多个PrAF添加到设计布局以产生修改的设计布局; 在修改的设计布局上执行一个或多个PrAF的模拟和一个或多个设计的特征; 基于模拟结果验证一个或多个PrAF是否可移除; 以及如果一个或多个PrAF被验证为可移除的，则基于该参数集创建一组PrAF放置规则。 PrAF放置规则的集合可以用于创建用于创建掩模布局的最后一组PrAF特征。

4. 发明申请

US20090276736A1 Test Pattern Based Process Model Calibration 有权
标题翻译：基于测试模式的过程模型校准
公开(公告)号：US20090276736A1
公开(公告)日：2009-11-05
申请号：US12113374
申请日：2008-05-01
申请人： Scott M. Mansfield , Geng Han , Jason E. Meiring , Dario Gil
发明人： Scott M. Mansfield , Geng Han , Jason E. Meiring , Dario Gil
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/68
摘要： Embodiments of the present invention provide a method for performing lumped-process model calibration. The method includes creating a plurality of sub-process models for a set of sub-processes; creating a lumped-process-model incorporating said set of sub-processes; calculating a first set of output patterns from a set of test patterns by using said plurality of sub-process models; calculating a second set of output patterns from said set of test patterns by using said lumped-process-model; and adjusting process parameters used in said lumped-process-model to calculate said second set of output patterns to match said first set of output patterns. A computer system for performing the lumped-process model calibration is also provided.
摘要翻译：本发明的实施例提供了一种执行集中过程模型校准的方法。该方法包括为一组子过程创建多个子过程模型; 创建结合所述一组子过程的集总过程模型; 通过使用所述多个子过程模型从一组测试模式计算第一组输出模式; 通过使用所述集中过程模型从所述一组测试模式计算第二组输出模式; 以及调整在所述集总过程模型中使用的过程参数以计算所述第二组输出模式以匹配所述第一组输出模式。还提供了用于执行集总过程模型校准的计算机系统。

5. 发明授权

US07901945B2 Image and part recognition technology 有权
标题翻译：图像和零件识别技术
公开(公告)号：US07901945B2
公开(公告)日：2011-03-08
申请号：US12174245
申请日：2008-07-16
申请人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
发明人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
IPC分类号： G01N21/00
CPC分类号： G06K7/1456 , G06K7/14 , G06K19/06037 , G06K19/06196
摘要： A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.
摘要翻译：用于识别图像的系统和方法可以包括使用对准标记。识别的图像可以是来自阵列，字符，数字，形状和/或不规则形状的图案。图案可以由诸如识别标记和/或传感器阵列的阵列中的元件形成。更具体地，该系统和方法涉及通过考虑图像的取向来区分图像。对准标记的尺寸和/或位置可以提供关于图像的取向的信息。有关图像方向的信息可能会减少错误的识别。图像识别的系统和方法可以与识别标记，生物传感器，微流体阵列和/或光学字符识别系统一起使用。

6. 发明授权

US07651850B2 Image and part recognition technology 失效
标题翻译：图像和零件识别技术
公开(公告)号：US07651850B2
公开(公告)日：2010-01-26
申请号：US10847635
申请日：2004-05-17
申请人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
发明人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
IPC分类号： C12M1/36
CPC分类号： G06K7/1456 , G06K7/14 , G06K19/06037 , G06K19/06196
摘要： A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.
摘要翻译：用于识别图像的系统和方法可以包括使用对准标记。识别的图像可以是来自阵列，字符，数字，形状和/或不规则形状的图案。图案可以由诸如识别标记和/或传感器阵列的阵列中的元件形成。更具体地，该系统和方法涉及通过考虑图像的取向来区分图像。对准标记的尺寸和/或位置可以提供关于图像的取向的信息。有关图像方向的信息可能会减少错误的识别。图像识别的系统和方法可以与识别标记，生物传感器，微流体阵列和/或光学字符识别系统一起使用。

7. 发明申请

US20090017271A1 Densely packed sensor arrays 有权
标题翻译：密集的传感器阵列
公开(公告)号：US20090017271A1
公开(公告)日：2009-01-15
申请号：US11981282
申请日：2007-10-31
申请人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
发明人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
IPC分类号： B32B3/10 , B05D5/00
CPC分类号： G06K7/14 , G06K7/1456 , G06K19/06037 , Y10T428/24802
摘要： A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.
摘要翻译：用于识别图像的系统和方法可以包括使用对准标记。识别的图像可以是来自阵列，字符，数字，形状和/或不规则形状的图案。图案可以由诸如识别标记和/或传感器阵列的阵列中的元件形成。更具体地，该系统和方法涉及通过考虑图像的取向来区分图像。对准标记的尺寸和/或位置可以提供关于图像的取向的信息。有关图像方向的信息可能会减少错误的识别。图像识别的系统和方法可以与识别标记，生物传感器，微流体阵列和/或光学字符识别系统一起使用。

8. 发明授权

US09317922B2 Image and part recognition technology 有权
标题翻译：图像和零件识别技术
公开(公告)号：US09317922B2
公开(公告)日：2016-04-19
申请号：US13017731
申请日：2011-01-31
申请人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
发明人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
IPC分类号： G06T7/00 , G06K19/06 , G06K7/14
CPC分类号： G06T7/0044 , G06K7/1439 , G06K7/1456 , G06K19/06196 , G06T7/74 , G06T2207/30204 , G06T2207/30208
摘要： A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.
摘要翻译：用于识别图像的系统和方法可以包括使用对准标记。识别的图像可以是来自阵列，字符，数字，形状和/或不规则形状的图案。图案可以由诸如识别标记和/或传感器阵列的阵列中的元件形成。更具体地，该系统和方法涉及通过考虑图像的取向来区分图像。对准标记的尺寸和/或位置可以提供关于图像的取向的信息。有关图像方向的信息可能会减少错误的识别。图像识别的系统和方法可以与识别标记，生物传感器，微流体阵列和/或光学字符识别系统一起使用。

9. 发明申请

US20120194671A1 Image And Part Recognition Technology 有权
标题翻译：图像和零件识别技术
公开(公告)号：US20120194671A1
公开(公告)日：2012-08-02
申请号：US13017731
申请日：2011-01-31
申请人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
发明人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
IPC分类号： H04N7/18
CPC分类号： G06T7/0044 , G06K7/1439 , G06K7/1456 , G06K19/06196 , G06T7/74 , G06T2207/30204 , G06T2207/30208
摘要： A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.
摘要翻译：用于识别图像的系统和方法可以包括使用对准标记。识别的图像可以是来自阵列，字符，数字，形状和/或不规则形状的图案。图案可以由诸如识别标记和/或传感器阵列的阵列中的元件形成。更具体地，该系统和方法涉及通过考虑图像的取向来区分图像。对准标记的尺寸和/或位置可以提供关于图像的取向的信息。有关图像方向的信息可能会减少错误的识别。图像识别的系统和方法可以与识别标记，生物传感器，微流体阵列和/或光学字符识别系统一起使用。

10. 发明授权

US08017174B2 Densely packed sensor arrays 有权
标题翻译：密集的传感器阵列
公开(公告)号：US08017174B2
公开(公告)日：2011-09-13
申请号：US11981282
申请日：2007-10-31
申请人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
发明人： Jason E. Meiring , Timothy B. Michaelson , C. Grant Willson
IPC分类号： B05D3/00
CPC分类号： G06K7/14 , G06K7/1456 , G06K19/06037 , Y10T428/24802
摘要： A system and method for recognition of images may include the use of alignment markers. The image recognized may be a pattern from an array, a character, a number, a shape, and/or irregular shapes. The pattern may be formed by elements in an array such as an identification marking and/or a sensor array. More particularly, the system and method relate to discriminating between images by accounting for the orientation of the image. The size and/or location of alignment markers may provide information about the orientation of an image. Information about the orientation of an image may reduce false recognitions. The system and method of image recognition may be used with identification markings, biosensors, micro-fluidic arrays, and/or optical character recognition systems.
摘要翻译：用于识别图像的系统和方法可以包括使用对准标记。识别的图像可以是来自阵列，字符，数字，形状和/或不规则形状的图案。图案可以由诸如识别标记和/或传感器阵列的阵列中的元件形成。更具体地，该系统和方法涉及通过考虑图像的取向来区分图像。对准标记的尺寸和/或位置可以提供关于图像的取向的信息。有关图像方向的信息可能会减少错误的识别。图像识别的系统和方法可以与识别标记，生物传感器，微流体阵列和/或光学字符识别系统一起使用。

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