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    • 7. 发明授权
    • Monolithically integrated planar semiconductor arrangement
    • 单片集成平面半导体布置
    • US4695867A
    • 1987-09-22
    • US775044
    • 1985-08-21
    • Peter FlohrsHartmut Michel
    • Peter FlohrsHartmut Michel
    • H01L29/73H01L21/331H01L21/8222H01L23/528H01L27/082H01L29/06H01L29/40H01L27/02
    • H01L29/402H01L23/528H01L27/0825H01L2924/0002
    • A semiconductor arrangement is suggested which is provided with a capacity transistor and a drive transistor in form of a Dralington-circuit. Thereby, the two transistors are monolithically integrated with a planar technique in a common substrate (8), which forms the two collector zones of the two transistors (T1,T2). A passivation layer (14) covers the main face of substrate (8) covering this main surface with the exception of contact windows. A cover electrode (13) is disposed above the passivation layer in the area between the collector zone and the base zone (4) of the capacity transistor (T2), whereby this passivation layer is connected with a resistor strip (2) at a distance from the base zone (4) for adjusting its potential. An additional guard strip (3) is diffused into the main surface between the resistor strip (2) and the base zone (4). In order to prevent a voltage rupture in the area of the resistor strip (2), the passivation layer is designed thinner at the area adjacent the base zone (4) than in the remaining area beneath the cover electrode (13).
    • PCT No.PCT / DE85 / 00118 Sec。 371日期1985年8月21日 102(e)1985年8月21日PCT PCT公布1985年4月16日PCT公布。 出版物WO85 / 05497 日期为1985年12月5日。提出了一种半导体装置,其具有容量晶体管和Dralington电路形式的驱动晶体管。 由此,两个晶体管在共同的衬底(8)中与平面技术单片集成,形成两个晶体管(T1,T2)的两个集电极区。 除了接触窗外,钝化层(14)覆盖覆盖该主表面的基板(8)的主面。 覆盖电极(13)设置在容纳晶体管(T2)的集电区域和基极区域(4)之间的区域中的钝化层上方,由此该钝化层与电阻条(2)在一定距离处连接 从基区(4)调整其电位。 附加的保护条(3)扩散到电阻条(2)和基区(4)之间的主表面。 为了防止电阻条(2)的区域中的电压破裂,钝化层在与基极区(4)相邻的区域比在覆盖电极(13)下方的剩余区域更薄。
    • 8. 发明授权
    • Monolithically integrated semiconductor arrangement with a cover
electrode
    • 具有覆盖电极的单片集成半导体布置
    • US5479046A
    • 1995-12-26
    • US263951
    • 1994-06-22
    • Peter FlohrsChristian Pluntke
    • Peter FlohrsChristian Pluntke
    • H01L29/06H01L29/40H01L29/78H01L29/772
    • H01L29/402H01L29/0615H01L29/7813
    • The invention relates to a monolithically integrated semiconductor arrangement, where from the first main surface a first zone (p) and a second zone (n.sup.+) are diffused into a substrate (2), which is weakly doped (substrate region n.sup.-) under a first main surface (3) and is more strongly doped (substrate region n.sup.+) under a second main surface (4). An insulating passivation layer is attached to the first main surface (3), on top of which a metallic cover electrode (D) is located, which covers adjacent substrate regions (n.sup.-) and the edge areas of the first zone (p) and the second zone (n.sup.+). In accordance with the invention, at least one additional zone (.nu.) of the same type of conductivity as the associated zone (n.sup.+), but with weaker doping, is diffused in for increasing the break-through voltage, and is connected to the zone (n.sup.+), does not contact the other zone (p) and prevents the zone (n.sup.+) from directly bordering the substrate (n.sup.-) underneath the cover electrode (D).
    • 本发明涉及一种单片集成半导体装置,其中从第一主表面将第一区(p)和第二区(n +)扩散到基底(2)内,该衬底(2)是弱掺杂(衬底区n- 第一主表面(3)并且在第二主表面(4)下更强掺杂(衬底区域n +)。 绝缘钝化层附着到第一主表面(3)上,其上面设有覆盖相邻衬底区域(n-)和第一区域(p)的边缘区域的金属覆盖电极(D)和 第二区(n +)。 根据本发明,与相关区(n +)具有相同类型导电性但具有较弱掺杂的至少一个附加区(nu)被扩散用于增加突破电压,并连接到区 (n +)不接触另一区域(p),并且防止区域(n +)直接与覆盖电极(D)下方的衬底(n-)接壤。
    • 9. 发明授权
    • Semiconductor power component and a method of producing same
    • 半导体功率元件及其制造方法
    • US06949439B2
    • 2005-09-27
    • US10450222
    • 2002-03-26
    • Peter FlohrsRobert PlikatWolfgang Feiler
    • Peter FlohrsRobert PlikatWolfgang Feiler
    • H01L21/331H01L29/739H01L21/8224
    • H01L29/66333H01L29/7395
    • A semiconductor power component and a method for producing a semiconductor power component, in particular a vertical NPT-IGBT for ignition applications with a breakdown voltage of less than approx. 1000 V. The semiconductor power component includes a wafer substrate of a first conductive type including a rear-side emitter region of a second conductive type and a front-side drift region of the first conductive type; a rear-side anode contact which is connected to the emitter region and extends partially to the front-side surface; a front-side MOS control structure; and a front-side cathode contact which is connected to a front-side source region and a body region of the front-side MOS control structure. The thickness of the drift region is much larger than the width of the space charge region at a defined breakdown voltage; and the thickness of the rear-side emitter region is greater than 5 μm.
    • 半导体功率部件和半导体功率部件的制造方法,特别是用于点火应用的垂直NPT-IGBT,击穿电压小于约。 半导体功率部件包括第一导电类型的晶片衬底,其包括第二导电类型的后侧发射极区域和第一导电类型的前侧漂移区域; 背面阳极接触件,其连接到发射极区域并部分地延伸到前侧表面; 前端MOS控制结构; 以及连接到前侧MOS控制结构的前侧源极区域和主体区域的前侧阴极接触件。 在限定的击穿电压下,漂移区的厚度远大于空间电荷区的宽度; 后侧发射极区域的厚度大于5μm。