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1. 发明授权

US06757110B2 Catadioptric lithography system and method with reticle stage orthogonal to wafer stage 失效
标题翻译：光折射光刻系统和方法与标线片正交于晶片台
公开(公告)号：US06757110B2
公开(公告)日：2004-06-29
申请号：US10156005
申请日：2002-05-29
申请人： Harry Sewell , Jorge Ivaldi , John Shamaly
发明人： Harry Sewell , Jorge Ivaldi , John Shamaly
IPC分类号： G02B900
CPC分类号： G03F7/70225
摘要： The present invention relates to a lithography apparatus using catadioptric exposure optics that projects high quality images without image flip. The lithography apparatus includes a reticle stage, a wafer stage, and a catadioptric exposure optics located between the reticle stage and the wafer stage. The catadioptric exposure optics projects an image from the reticle stage onto the wafer stage. The projected image has the same image orientation as the image from the reticle stage. In other words, the catadioptric exposure optics does not perform image flip. The reticle stage lies on a first plane and the wafer stage lies on a second plane, where the first plane is orthogonal to the second plane. In another embodiment of the present invention, the catadioptric exposure optics projects an even number of reflections. The projected image is of high precision and lacks aberrations such as perspective warping and obscured areas. The invention can be combined with a dual wafer stage and with a dual isolation system.
摘要翻译：本发明涉及一种使用反射折射曝光光学器件的光刻设备，该光学设备投影高质量的图像而无需图像翻转。光刻设备包括刻线台，晶片台和位于标线片台和晶片台之间的反射折射曝光光学元件。反射折射曝光光学镜将投影图像从标线片阶段投影到晶片台上。投影图像具有与来自标线片舞台的图像相同的图像取向。换句话说，反射折射曝光光学元件不执行图像翻转。标线台位于第一平面上，晶片台位于第二平面上，其中第一平面与第二平面正交。在本发明的另一个实施例中，反射折射曝光光学器件投射偶数次的反射。投影图像精度高，缺乏透视扭曲和遮蔽区域等畸变。本发明可以与双晶片台和双隔离系统组合。

2. 发明授权

US06977716B2 Catadioptric lithography system and method with reticle stage orthogonal to wafer stage 失效
标题翻译：光折射光刻系统和方法与标线片正交于晶片台
公开(公告)号：US06977716B2
公开(公告)日：2005-12-20
申请号：US10833227
申请日：2004-04-28
申请人： Harry Sewell , Jorge Ivaldi , John Shamaly
发明人： Harry Sewell , Jorge Ivaldi , John Shamaly
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G02B9/00 , G02B27/58
CPC分类号： G03F7/70225
摘要： The present invention relates to a lithography apparatus and method using catadioptric exposure optics that projects high quality images without image flip. The apparatus includes means for illuminating a reticle stage to produce a patterned image. The apparatus also includes means for receiving the patterned image at each of a plurality of wafer stages. Each of the wafer stages has an associated data collection station. The apparatus also includes means for positioning the reticle stage substantially orthogonal to each of the plurality of wafer stages as well as means for directing the patterned image through a catadioptric exposure optics element between the reticle stage and each wafer stage to cause an even number of reflections of the patterned image and to project the patterned image onto each wafer stage in a congruent manner. The invention can also be combined with a dual isolation system.
摘要翻译：本发明涉及一种使用反射折射曝光光学元件的光刻设备和方法，该光学装置和方法能够投射高质量的图像而无需图像翻转。该装置包括用于照亮标线片台以产生图案化图像的装置。该装置还包括用于在多个晶片级中的每一个处接收图案化图像的装置。每个晶片台具有相关的数据采集台。该装置还包括用于将标线片台基本上正交于多个晶片台中的每一个定位的装置以及用于引导图案化图像通过分划板台和每个晶片台之间的反射折射曝光光学元件的装置，以产生偶数次的反射并且以均匀的方式将图案化图像投影到每个晶片台上。本发明还可以与双隔离系统组合。

3. 发明授权

US06847434B2 Method and apparatus for a pellicle frame with porous filtering inserts 失效
标题翻译：具有多孔过滤插入物的防护薄膜框架的方法和装置
公开(公告)号：US06847434B2
公开(公告)日：2005-01-25
申请号：US10314419
申请日：2002-12-09
申请人： Joseph Laganza , Jorge Ivaldi , Florence Luo
发明人： Joseph Laganza , Jorge Ivaldi , Florence Luo
IPC分类号： G03F1/14 , G03F7/20 , G03B27/62 , G03B27/42 , G03B27/52 , G03F9/00
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983
摘要： A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
摘要翻译：一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。掩模版和防护薄膜之间的框架保持被清除的光学间隙。框架限定第一和第二相对表面。第一相对表面限定第一开口，并且被配置为与防护薄膜组合。第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。框架的至少一个边缘具有穿过其中的开口。多孔烧结材料通过框架的边缘填充每个开口。

4. 发明申请

US20060078407A1 System and method for reticle protection and transport 失效
标题翻译：用于掩模保护和运输的系统和方法
公开(公告)号：US20060078407A1
公开(公告)日：2006-04-13
申请号：US11282474
申请日：2005-11-21
申请人： Santiago del Puerto , Michael DeMarco , Glenn Friedman , Jorge Ivaldi , James McClay
发明人： Santiago del Puerto , Michael DeMarco , Glenn Friedman , Jorge Ivaldi , James McClay
IPC分类号： H01L21/677
CPC分类号： G03F7/70741 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/66 , G03F7/70808 , H01L21/67005 , H01L21/67751 , H01L21/67772 , H01L21/67778 , Y10S414/14
摘要： A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.
摘要翻译：一种用于在光刻工具中将基板从大气压转换成真空的衬底保护和输送系统和方法。该系统包括支撑衬底的一个或多个可移除衬底输送盒。盒可以包括基部和顶部，并且可以包括密封。每个盒具有至少一个排气口和至少一个过滤器。该系统还包括具有底座和盖子的盒子。盒子保持一个或多个盒式衬底布置。还提供了一种具有用于保持盒 - 盒 - 衬底布置的搁架的存放架。此外，提供具有负载锁的入口模块，用于将盒式基板装置从大气压转换成真空。出入口模块可以包括用于运送盒式基板装置的梭和/或电梯。在过渡期间，过滤器和排气口限制负载锁中的颗粒进入盒 - 衬底布置并到达衬底的表面。

5. 发明申请

US20050151955A1 Method and apparatus for a reticle with purged pellicle-to-reticle gap 审中-公开
标题翻译：具有被清除的防护薄膜到标线间隙的掩模版的方法和装置
公开(公告)号：US20050151955A1
公开(公告)日：2005-07-14
申请号：US11034053
申请日：2005-01-13
申请人： Joseph Laganza , Jorge Ivaldi , Florence Luo
发明人： Joseph Laganza , Jorge Ivaldi , Florence Luo
IPC分类号： G03F1/14 , G03F7/20 , G03B27/62
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983
摘要： A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
摘要翻译：一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。掩模版和防护薄膜之间的框架保持被清除的光学间隙。框架限定第一和第二相对表面。第一相对表面限定第一开口，并且被配置为与防护薄膜组合。第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。框架的至少一个边缘具有穿过其中的开口。多孔烧结材料通过框架的边缘填充每个开口。

6. 发明授权

US07339653B2 System for a pellicle frame with heightened bonding surfaces 失效
标题翻译：防护薄膜组件系统，具有更高的粘结面
公开(公告)号：US07339653B2
公开(公告)日：2008-03-04
申请号：US11671647
申请日：2007-02-06
申请人： Joseph Laganza , Jorge Ivaldi
发明人： Joseph Laganza , Jorge Ivaldi
IPC分类号： G03B27/62 , G03B27/32 , G03B27/58
CPC分类号： G03F7/70983 , G03F1/64
摘要： A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
摘要翻译：描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。框架限定第一和第二相对表面。第一相对表面限定第一开口，第二相对表面限定第二开口。多个间隔构件在围绕第一开口的第一相对表面上间隔开。间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

7. 发明申请

US20070127000A1 Method and System for a Pellicle Frame with Heightened Bonding Surfaces 失效
标题翻译：具有更高粘合面的防护薄膜框架的方法和系统
公开(公告)号：US20070127000A1
公开(公告)日：2007-06-07
申请号：US11671647
申请日：2007-02-06
申请人： Joseph Laganza , Jorge Ivaldi
发明人： Joseph Laganza , Jorge Ivaldi
IPC分类号： G03B27/52
CPC分类号： G03F7/70983 , G03F1/64
摘要： A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
摘要翻译：描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。框架限定第一和第二相对表面。第一相对表面限定第一开口，第二相对表面限定第二开口。多个间隔构件在围绕第一开口的第一相对表面上间隔开。间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

8. 发明申请

US20050088637A1 Method and system for a pellicle frame with heightened bonding surfaces (as amended) 失效
标题翻译：具有更高粘合面的防护薄膜框架的方法和系统（经修改）
公开(公告)号：US20050088637A1
公开(公告)日：2005-04-28
申请号：US10986077
申请日：2004-11-12
申请人： Joseph Laganza , Jorge Ivaldi
发明人： Joseph Laganza , Jorge Ivaldi
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70983 , G03F1/64
摘要： A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
摘要翻译：描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。框架限定第一和第二相对表面。第一相对表面限定第一开口，第二相对表面限定第二开口。多个间隔构件在围绕第一开口的第一相对表面上间隔开。间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

9. 发明授权

US06822731B1 Method and apparatus for a pellicle frame with heightened bonding surfaces 失效
标题翻译：防护薄膜组件框架的方法和装置，具有更高的粘合面
公开(公告)号：US06822731B1
公开(公告)日：2004-11-23
申请号：US10464840
申请日：2003-06-18
申请人： Joseph Laganza , Jorge Ivaldi
发明人： Joseph Laganza , Jorge Ivaldi
IPC分类号： G03B2762
CPC分类号： G03F7/70983 , G03F1/64
摘要： A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
摘要翻译：描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。框架限定第一和第二相对表面。第一相对表面限定第一开口，第二相对表面限定第二开口。多个间隔构件在围绕第一开口的第一相对表面上间隔开。间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

10. 发明授权

US07173689B2 Method and system for a pellicle frame with heightened bonding surfaces 失效
标题翻译：防护薄膜组件框架的方法和系统具有更高的粘结面
公开(公告)号：US07173689B2
公开(公告)日：2007-02-06
申请号：US10986077
申请日：2004-11-12
申请人： Joseph Laganza , Jorge Ivaldi
发明人： Joseph Laganza , Jorge Ivaldi
IPC分类号： G03B27/32 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70983 , G03F1/64
摘要： A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.
摘要翻译：描述了一种用于在光刻系统中保持光学结构之间的光学间隙的方法和装置。框架限定第一和第二相对表面。第一相对表面限定第一开口，第二相对表面限定第二开口。多个间隔构件在围绕第一开口的第一相对表面上间隔开。间隔构件具有被配置为与第一光学结构的表面配合的基本上共平面。粘合剂密封第一相对表面和第一光学结构之间的第一开口周围的空间。因此，框架包围第一光学结构和第二光学结构之间的光学间隙。

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