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1. 发明授权

US06940587B2 Lithographic apparatus and a measurement system 有权
标题翻译：光刻设备和测量系统
公开(公告)号：US06940587B2
公开(公告)日：2005-09-06
申请号：US10670801
申请日：2003-09-26
申请人： Hans Van Der Laan , Johannes Jacobus Matheus Baselmans , Antonius Johannes Josephus Van Dijsseldonk , Martinus Hendrikus Antonius Leenders , Johannes Hubertus Josephina Moors
发明人： Hans Van Der Laan , Johannes Jacobus Matheus Baselmans , Antonius Johannes Josephus Van Dijsseldonk , Martinus Hendrikus Antonius Leenders , Johannes Hubertus Josephina Moors
IPC分类号： G01M11/02 , G03F7/20 , H01L21/027 , G03B27/52 , G03B27/54 , G03B27/68
CPC分类号： G03F7/706
摘要： A measurement system configured to measure wave front aberrations of a projection system, as well as a lithographic apparatus including such a measurement system, is provided wherein the measurement system includes a diffractive element and structure configured to increase the pupil filling of the radiation in the pupil of the projection system, both movable into the projection beam between a radiation system and the projection system, and a sensor module configured to sense radiation that has traversed the projection system to measure wave front aberrations of the projection system.
摘要翻译：提供了一种被配置为测量投影系统的波前像差的测量系统以及包括这种测量系统的光刻设备，其中测量系统包括衍射元件和结构，其被配置为增加瞳孔中的瞳孔填充所述投影系统可移动到辐射系统和投影系统之间的投影光束中;以及传感器模块，被配置为感测已经穿过投影系统的辐射以测量投影系统的波前像差。

2. 发明授权

US07148952B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07148952B2
公开(公告)日：2006-12-12
申请号：US10976314
申请日：2004-10-29
申请人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
发明人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
IPC分类号： G03B27/42
CPC分类号： G03F7/70075
摘要： The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
摘要翻译：本发明提供了一种包括用于提供投影射线束的照明系统的光刻设备。照明系统包括至少一个可移动光学元件（7），使得投影射线束（4）能够围绕中心位置移动。这确保了投影束（4）中的强度分布中的不均匀性将被涂抹，这反过来提供了由诸如晶片或其它基底的系统照射的表面的曝光的改进的均匀性。光学元件（7）可以包括电动机可移动镜，棱镜，滤镜，透镜，旋转三棱镜，漫射器，衍射光学阵列，光学积分器等。本发明还提供了一种使用根据本发明的光刻设备的器件制造方法，其中所述光学元件被移动，以便为所述投影射束提供最佳均匀性。

3. 发明授权

US06650399B2 Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations 有权
标题翻译：平版印刷设备，光栅模块，传感器模块，测量波前像差的方法
公开(公告)号：US06650399B2
公开(公告)日：2003-11-18
申请号：US10073119
申请日：2002-02-12
申请人： Johannes Jacobus Matheus Baselmans , Marco Hugo Petrus Moers , Hans Van Der Laan , Robert Wilhelm Willekers , Wilhelmus Petrus De Boeij , Marcus Adrianus Van De Kerkhof
发明人： Johannes Jacobus Matheus Baselmans , Marco Hugo Petrus Moers , Hans Van Der Laan , Robert Wilhelm Willekers , Wilhelmus Petrus De Boeij , Marcus Adrianus Van De Kerkhof
IPC分类号： G03B2742
CPC分类号： G01M11/0264 , G01M11/0285 , G03F7/706
摘要： A lithographic projection apparatus including an illumination system; a support structure for holding a mask; a substrate table for holding a substrate; a projection system for projecting a pattern onto a target portion of the substrate; and an interferometric measurement system for measuring wave front aberrations of the projection system, characterized in that the interferometric measurement system including: a grating, featuring a grating pattern in a grating plane, said grating being movable into and out of the projection beam, such that the grating plane is substantially coincident with said object plane; a pinhole, featuring a pinhole pattern in a pinhole plane and arranged in a pinhole plate, said pinhole being movable into and out of the projection beam, such that the pinhole plane is substantially coincident with a plane downstream of the projection system and optically conjugate to said object plane, and a detector with a detector surface substantially coincident with a detection plane, said detection plane located downstream of the pinhole at a location where a spatial distribution of the electric field amplitude of the projection beam is substantially a Fourier transformation of a spatial distribution of the electric field amplitude of the projection beam in the pinhole plane.
摘要翻译：一种光刻投影装置，包括照明系统; 用于保持面罩的支撑结构; 用于保持衬底的衬底台; 投影系统，用于将图案投影到所述基板的目标部分上; 以及用于测量所述投影系统的波前像差的干涉测量系统，其特征在于，所述干涉测量系统包括：光栅，其特征在于光栅平面中的光栅图案，所述光栅可移入和移出所述投影光束，使得光栅平面基本上与所述物平面重合; 针孔，其具有针孔平面中的针孔图案并且布置在针孔板中，所述针孔可移动进入和离开投影梁，使得针孔平面基本上与投影系统的下游平面重合，并且与光学共轭所述物体平面和检测器表面基本上与检测平面重合的检测器，所述检测平面位于所述针孔的下游，所述位置处投影光束的电场振幅的空间分布基本上是空间的傅立叶变换投影光束在针孔平面中的电场振幅分布。

4. 发明授权

US08681309B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08681309B2
公开(公告)日：2014-03-25
申请号：US12639321
申请日：2009-12-16
申请人： Johannes Jacobus Matheus Baselmans , Johannes Christiaan Maria Jasper
发明人： Johannes Jacobus Matheus Baselmans , Johannes Christiaan Maria Jasper
IPC分类号： G03B27/52 , G03B27/58 , G03F7/20
CPC分类号： G03F7/705 , G03F7/70591 , G03F7/706 , G03F7/70891
摘要： In a lithographic method, a characteristic of a projection system is measured before and after periods of heating (exposures) and cooling to provide data to calibrate a model of lens heating. The model has a part modeling the effect of cooling and a part modeling the effect of heating on the characteristic.
摘要翻译：在光刻方法中，在加热（曝光）和冷却之前和之后测量投影系统的特性，以提供用于校准透镜加热模型的数据。该模型具有对冷却效果进行建模的部分，以及对加热对特性影响的部分建模。

5. 发明申请

US20140071420A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20140071420A1
公开(公告)日：2014-03-13
申请号：US13903885
申请日：2013-05-28
申请人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
发明人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
摘要翻译：公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。还公开了CaF2的双组分最终光学元件。

6. 发明授权

US08472006B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US08472006B2
公开(公告)日：2013-06-25
申请号：US12463242
申请日：2009-05-08
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
IPC分类号： G03B27/54 , G03B27/58
CPC分类号： G03F7/70341 , G03F7/7095
摘要： The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.

7. 发明申请

US20120194790A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20120194790A1
公开(公告)日：2012-08-02
申请号：US13446687
申请日：2012-04-13
申请人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
IPC分类号： G03B21/53 , G03B27/52
CPC分类号： G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要： An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
摘要翻译：浸没式光刻设备包括液体供应系统，其被配置为将液体供应到辐射束通过的空间，该液体具有可由调谐器调谐的光学特性。该空间可以位于投影系统和基板之间。调谐器布置成调节液体的一个或多个特性，例如作为空间和/或时间的函数的形状，组成，折射率和/或吸收率，以便改变光刻设备的成像性能。

8. 发明申请

US20110273683A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110273683A1
公开(公告)日：2011-11-10
申请号：US13188026
申请日：2011-07-21
申请人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendman , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendman , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译：在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。可以使用致动器来改变衬底表面上方的液体供应系统的高度。控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

9. 发明申请

US20110211181A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110211181A1
公开(公告)日：2011-09-01
申请号：US13102620
申请日：2011-05-06
申请人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Adrianus Fransiscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
发明人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Adrianus Fransiscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译：在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。

10. 发明授权

US07859647B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07859647B2
公开(公告)日：2010-12-28
申请号：US12020947
申请日：2008-01-28
申请人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
发明人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译：系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。可单独控制的元件可以改变辐射束的远心性。将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。或者，独立可控元件可以改变辐射束的光轴。

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