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    • 3. 发明授权
    • Waveguide laser system
    • 波导激光系统
    • US4930138A
    • 1990-05-29
    • US399030
    • 1989-08-24
    • Hans Opower
    • Hans Opower
    • H01S3/03H01S3/07H01S3/08
    • H01S3/0315H01S3/076H01S3/08081
    • In order to improve an electrically excited, diffusion-cooled laser system comprising two wall surfaces slightly spaced from one another and forming an optical waveguide, the width of the wall surfaces being a multiple of the space between them and the surfaces enclosing between them a flow-free discharge chamber, and also comprising an optically unstable resonator having a resonator beam path travelling through at least part of the discharge chamber and extending lengthwise of a resonator axis as well as having an expansion transverse to the resonator axis extending as far as at least one laser beam exiting from the resonator, this transverse expansion extending transversely to a longitudinal direction of said waveguide and approximately parallel to said wall surfaces, such that the waveguide can be constructed with as large a surface area as possible without losing the beam quality of the beam exiting the waveguide, it is suggested that the resonator be followed by a laser amplifier, the amplifier beam path thereof travelling through an additional part of said discharge chamber.
    • 为了改进电激发的扩散冷却激光系统,其包括彼此稍微间隔开并形成光波导的两个壁表面,壁表面的宽度是它们之间的空间和包围它们之间的表面的倍数 并且还包括光学不稳定的谐振器,其具有穿过至少部分放电室并且沿着谐振器轴线的纵向延伸的谐振器光束路径,并且具有横向于至少延伸的谐振器轴线的扩展 一个从谐振器出射的激光束,该横向膨胀横向于所述波导的纵向方向延伸并且大致平行于所述壁表面,使得波导可以被构造成具有尽可能大的表面积,而不会损失波导质量 光束离开波导,建议谐振器后面是激光放大器, 其放大器光束路径穿过所述放电室的附加部分。
    • 4. 发明授权
    • Gas laser
    • 气体激光
    • US4611329A
    • 1986-09-09
    • US654383
    • 1984-09-25
    • Volker ErnstHans Opower
    • Volker ErnstHans Opower
    • H01S3/03H01S3/038H01S3/041H01S3/097
    • H01S3/03H01S3/038H01S3/041
    • Gas laser of circular cross section perpendicular to the direction of beam propagation, having an optical resonator. The laser has, for continuous or modulated continuous beam operation, a tube as the inner electrode (2), which is connected to a high-frequency voltage source. The outer electrode (4) likewise comprises a tube which is disposed coaxially with the inner electrode (2). Between the two electrodes (2, 4) is the annular excitation chamber (3). The tube wall serving as outer electrode (4) is provided with slot-like cavities (1) which are open toward the excitation chamber (3) and serve for the cooling of the gas therein.
    • 具有垂直于光束传播方向的圆形截面的气体激光器,具有光学谐振器。 对于连续或调制的连续光束操作,激光器具有连接到高频电压源的作为内部电极(2)的管。 外电极(4)同样包括与内电极(2)同轴设置的管。 在两个电极(2,4)之间是环形激励室(3)。 用作外部电极(4)的管壁设置有朝向激发室(3)开口并用于冷却其中的气体的槽状空腔(1)。
    • 5. 发明授权
    • Processing system
    • 处理系统
    • US08811665B2
    • 2014-08-19
    • US13332467
    • 2011-12-21
    • Hans OpowerKlaus Juenger
    • Hans OpowerKlaus Juenger
    • G06K9/00G03F7/20G03F9/00
    • G03F7/70791G03F9/00
    • A processing system for plate-like objects is provided, with an exposure device and an object carrier with an object carrier surface for receiving the object. The exposure device and the carrier are movable relative to one another, such that the exact position of the object relative to the carrier is determinable. An edge detection device is provided which comprises at least one edge illumination unit having an illumination area, within which an object edge located in the respective object edge area has light directed onto it from the side of the carrier. At least one edge image detection unit is provided on a side of the object located opposite the carrier, the edge image detection unit imaging an edge section of the object edges located in the illumination area as an edge image, such that the respective edge image is detectable in its exact position relative to the carrier.
    • 提供了一种用于板状物体的处理系统,其具有曝光装置和具有用于接收物体的物体载体表面的物体载体。 曝光装置和载体可相对于彼此移动,使得物体相对于载体的精确位置是可确定的。 提供一种边缘检测装置,其包括具有照明区域的至少一个边缘照明单元,在该边缘照明单元中位于相应物体边缘区域中的物体边缘具有从载体的侧面引导到其上的光。 至少一个边缘图像检测单元设置在与载体相对的一侧的物体侧,边缘图像检测单元将位于照明区域中的物体边缘的边缘部分成像为边缘图像,使得各个边缘图像是 在其相对于载体的确切位置可检测。
    • 6. 发明授权
    • Lithography exposure device having a plurality of radiation sources
    • 具有多个辐射源的平版印刷曝光装置
    • US07652750B2
    • 2010-01-26
    • US11392970
    • 2006-03-28
    • Hans OpowerStefan Scharl
    • Hans OpowerStefan Scharl
    • G03B27/52
    • G03F7/7005G03F7/70383G03F7/704
    • A lithography exposure device is provided which includes a mounting device for the layer sensitive to light, an exposure unit with several laser radiation sources, an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device, and a control for controlling intensity and position of exposure spots so that exposed structures which are as precisely structured as possible can be produced. A laser radiation field propagating in the direction of the light-sensitive layer generates each of the exposure spots from respective focal points and has a power density which leads in the conversion area in the light-sensitive layer to formation of a channel penetrating the light-sensitive layer with an index of refraction increased in relation to its surroundings by the Kerr effect and which guides the laser radiation field in a spatially limited manner.
    • 提供了一种光刻曝光装置,其包括用于对光敏感的层的安装装置,具有若干激光辐射源的曝光单元,与激光辐射源相关联的光学聚焦装置,用于在光学聚焦之间产生相对运动的移动单元 装置和安装装置,以及用于控制曝光点的强度和位置的控制,使得可以产生尽可能精确构造的暴露结构。 在感光层的方向上传播的激光辐射场从各个焦点产生每个曝光点,并且具有在感光层的转换区域中引起的功率密度,从而形成穿透光敏层的通道, 具有折射率的敏感层相对于其周围环境通过克尔效应增加,并以空间有限的方式引导激光辐射场。
    • 7. 发明申请
    • Exposure system
    • 曝光系统
    • US20060244943A1
    • 2006-11-02
    • US11406049
    • 2006-04-17
    • Hans OpowerStefan Scharl
    • Hans OpowerStefan Scharl
    • G03B27/58
    • G03F7/70391G03F7/704G03F7/70858
    • In an exposure system for substrate members which bear a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier bearing the substrate member and an exposure device, wherein the substrate member and the exposure device can be moved relative to one another such that the photosensitive coating can be exposed as a result of this relative movement, it is suggested for an exposure of the photosensitive coating which is as precise as possible that the exposure device have an optics slide which can be moved in the second direction and on which an optical imaging device for the exposure of the substrate member is arranged, and that the exposure device have a light source unit which is arranged on the machine frame separately from the optics slide and has a plurality of light sources, the radiation of which can be coupled into the optical imaging device.
    • 在用于在基片表面上承载感光涂层的基片部件的曝光系统中,包括机架,承载基片部件的基片载体和曝光装置,其中基片部件和曝光装置可相对于彼此移动, 由于这种相对运动,感光涂层可能被曝光,所以建议使感光涂层的曝光尽可能精确,使得曝光装置具有可沿第二方向移动的光学滑块,并且其上 布置用于曝光基板构件的光学成像装置,并且曝光装置具有与光学滑块分开布置在机架上的光源单元,并且具有多个光源,其辐射可以是 耦合到光学成像装置中。
    • 8. 发明申请
    • Method and device for producing exposed structures
    • 用于生产暴露结构的方法和装置
    • US20050282087A1
    • 2005-12-22
    • US11071074
    • 2005-03-02
    • Hans OpowerStefan ScharlDirk Leinenbach
    • Hans OpowerStefan ScharlDirk Leinenbach
    • G03F7/20G03C5/00
    • G03F7/70525G03F7/704G03F7/70425
    • In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carried out, can be read out while sets of data of an additional macroline are being stored.
    • 为了改进通过曝光单元在多个部件上产生暴露结构的方法,使基板部件和曝光单元相对于彼此移动,其中在至少一些部件上产生相同的结构, 以这样的方式,其尽可能有效地进行操作,建议通过在分别设置在多个大环内酯内的组分的区域中暴露基质成分来产生每个相同的结构,每一个大环内酯包含 在彼此相邻的多个线中,在沿着曝光路径的单次通过期间,由该曝光路径覆盖的所有部件将曝光单元暴露在多个麦克风的同一宏线的区域中, 曝光单元具有多个光源和具有控制存储器的控制,其中已经存储有用于宏线的数据组在whic的区域中 h曝光正在执行,可以在存储附加宏线的数据集的同时读出。
    • 9. 发明授权
    • Apparatus for imaging exit spots of a laser array
    • 用于成像激光阵列出射点的装置
    • US5818546A
    • 1998-10-06
    • US512056
    • 1995-08-07
    • Hans OpowerUwe BeckerUwe Brauch
    • Hans OpowerUwe BeckerUwe Brauch
    • G02B26/10G09F9/00H01L33/00H04N5/225H04N9/31G02F1/00H04N3/08
    • H04N9/3129
    • In order to improve an apparatus for generating an image in an image plane that is visible, in particular, for a human eye, comprising a radiation source which generates an image via an optical projection means by building up at least one row of image spots during an image build-up cycle by illuminating individual, adjacently located image spots and periodically repeating the image build-up cycle, so that it is possible to generate images as simply and, therefore, also as inexpensively as possible, it is suggested that a row of light sources comprising a plurality of semiconductor emitters be provided for the illumination of the image spots of the row of image spots, that the optical projection means associate each exit spot for the radiation of each semiconductor emitter with at least one of the image spots and that the optical projection means simultaneously image the exit spots of all the semiconductor emitters of the row of light sources onto the image spots associated therewith.
    • 为了改善用于在图像平面中产生图像的装置,特别是人眼可见的装置,其包括通过光学投影装置通过在至少一行图像点处建立至少一行图像点而产生图像的辐射源 通过照亮单独的相邻位置的图像斑点并周期性地重复图像建立周期,从而可以简单地生成图像,并且因此也可以尽可能廉价地生成图像,从而建立一行 提供包括多个半导体发射器的光源用于照射该行像点的图像点,光学投影装置将每个半导体发射器的辐射的每个出射点与图像斑点和 光学投影装置同时将该行光源的所有半导体发射器的出射点成像到与其相关联的图像点上。
    • 10. 发明授权
    • Waveguide configuration
    • 波导配置
    • US4961201A
    • 1990-10-02
    • US399029
    • 1989-08-24
    • Hans Opower
    • Hans Opower
    • H01S3/03H01S3/06H01S3/08H01S3/0975
    • H01S3/06H01S3/0315H01S3/08081H01S3/0975
    • In order to improve a waveguide configuration for high-frequency-excited, diffusion-cooled gas laser system comprising a waveguide carrier with a cavity closed like a ring in an azimuthal direction in relation to a longitudinal axis and extending in the direction of said longitudinal axis, and a waveguide for guidance of a laser beam along an optical axis, the waveguide being arranged in the cavity and formed by waveguide wall surfaces disposed at a constant spacing from one another, the width of the waveguide wall surfaces transversely to the lengthwise extent of the waveguide in the direction of the optical axis being a multiple of their spacing from one another, and the waveguide wall surfaces enclosing a discharge space between them, such that with a waveguide geometry which is as expedient as possible, i.e., not too large a width, it is still easy to handle and can be operated in a single mode, it is proposed that the waveguide be arranged in the cavity such that its lengthwise extent includes an angle of.ltoreq.30 degrees with the azimuthal direction.
    • 为了改善用于高频激发的扩散冷却气体激光系统的波导配置,该系统包括波导载体,该波导载体相对于纵向轴线在方位角方向上闭合为环状,并且在纵轴方向上延伸 以及用于沿着光轴引导激光束的波导,所述波导被布置在所述空腔中并且由彼此以恒定间隔布置的波导壁面形成,所述波导壁表面的宽度横向于纵向方向 波导在光轴方向上是它们彼此间隔的倍数,并且波导壁表面在它们之间包围放电空间,使得具有尽可能方便的波导几何形状,即不太大的 宽度,它仍然易于处理并且可以在单一模式下操作,因此建议将波导布置在空腔中,使得其纵向ex 帐篷包括与方位角方向<30度的角度。