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1. 发明授权

US5789867A Apparatus and method for igniting plasma in a process module 失效
公开(公告)号：US5789867A
公开(公告)日：1998-08-04
申请号：US595753
申请日：1996-02-02
申请人： Han Westendorp , Hans Meiling , John William Vanderpot , Donald Berrian
发明人： Han Westendorp , Hans Meiling , John William Vanderpot , Donald Berrian
IPC分类号： H05H1/46 , C23C14/34 , C23C16/48 , C23C16/50 , C23C16/505 , C23C16/509 , C23C16/517 , C23F4/00 , H01J37/32 , H01J7/24
CPC分类号： H01J37/32082 , C23C16/50 , C23C16/5096 , C23C16/517 , H01J37/32009 , H01J37/32165
摘要： The invention provides apparatus and methods for improving systems that expose samples to reactive plasmas, and more particularly for igniting plasma within a process module. The systems are of the type which have an electrode pair and a radiofrequency generator connected to one electrode. Gas is injected between the electrodes where it is ionized and transformed into a plasma. The invention includes (i) ignition means for ionizing gas, e.g., silane, between electrodes which are separated by a small gap of less than approximately one centimeter; and (ii) a radiofrequency energy generator that preferably operates at high frequencies, e.g., 60 MHz, to transform molecules into plasma. Several embodiments of ignition means are taught by the invention, including: an electron source, an ultraviolet source, a second radiofrequency energy generator, and radioactive sources, among others. A process module constructed according to the invention, using high frequency energy and small electrode separations, has a high rate of deposition and a high production yield.

2. 发明授权

US5565036A Apparatus and method for igniting plasma in a process module 失效
标题翻译：在过程模块中点燃等离子体的装置和方法
公开(公告)号：US5565036A
公开(公告)日：1996-10-15
申请号：US183529
申请日：1994-01-19
申请人： Han Westendorp , Hans Meiling , John W. Vanderpot , Donald Berrian
发明人： Han Westendorp , Hans Meiling , John W. Vanderpot , Donald Berrian
IPC分类号： H05H1/46 , C23C14/34 , C23C16/48 , C23C16/50 , C23C16/505 , C23C16/509 , C23C16/517 , C23F4/00 , H01J37/32 , C23C16/00
CPC分类号： H01J37/32082 , C23C16/50 , C23C16/5096 , C23C16/517 , H01J37/32009 , H01J37/32165
摘要： The invention provides apparatus and methods for improving systems that expose samples to reactive plasmas, and more particularly for igniting plasma within a process module. The systems are of the type which have an electrode pair and a radiofrequency generator connected to one electrode. Gas is injected between the electrodes where it is ionized and transformed into a plasma. The invention includes (i) ignition means for ionizing gas, e.g., silane, between electrodes which are separated by a small gap of less than approximately one centimeter; and (ii) a radiofrequency energy generator that preferably operates at high frequencies, e.g., 60 MHz, to transform molecules into plasma. Several embodiments of ignition means are taught by the invention, including: an electron source, an ultraviolet source, a second radiofrequency energy generator, and radioactive sources, among others. A process module constructed according to the invention, using high frequency energy and small electrode separations, has a high rate of deposition and a high production yield.
摘要翻译：本发明提供了用于改进将样品暴露于反应性等离子体的系统的装置和方法，更具体地说，用于在过程模块内点燃等离子体。这些系统是具有连接到一个电极的电极对和射频发生器的类型。在电极之间注入气体，将其电离并转化成等离子体。本发明包括（i）用于将电极之间的气体（例如硅烷）电离的点火装置，其间隔开小于大约一厘米的小间隙; 和（ii）优选以高频（例如60MHz）操作以将分子转化成等离子体的射频能量发生器。本发明教导了点火装置的几个实施例，包括：电子源，紫外线源，第二射频能量发生器和放射源。根据本发明构造的使用高频能量和小电极分离的处理模块具有高的沉积速率和高的产量。

3. 发明授权

US07522263B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US07522263B2
公开(公告)日：2009-04-21
申请号：US11317243
申请日：2005-12-27
申请人： Hubert Adriaan Van Mierlo , Gert-Jan Heerens , Hans Meiling , Antonius Gerardus Theodorus Maria Bastein , Jacques Cor Johan Van der Donck , Hedser Van Brug
发明人： Hubert Adriaan Van Mierlo , Gert-Jan Heerens , Hans Meiling , Antonius Gerardus Theodorus Maria Bastein , Jacques Cor Johan Van der Donck , Hedser Van Brug
IPC分类号： G03B53/42 , G03B27/52 , G03B27/54 , G03F9/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G01N21/94 , G01N21/956 , G01N2021/8822 , G01N2021/95676 , G03F1/82 , G03F1/84 , G03F7/7085 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet radiation beam, a substrate table constructed to hold a substrate, a projection system provided with reflective optics configured to project the patterned extreme ultraviolet radiation beam onto a target portion of the substrate, a vacuum chamber constructed to create a vacuum environment, and a detection unit arranged within the vacuum chamber to detect contamination on the patterning device.
摘要翻译：公开了一种光刻设备。该装置包括被配置为调节极紫外线辐射束的照明系统，配置成在其横截面中赋予极紫外辐射束图案以形成图案化的极紫外辐射束的图案形成装置，基板，设置有反射光学器件的投影系统，其被配置为将图案化的极紫外辐射束投影到基板的目标部分上，构造成产生真空环境的真空室和布置在真空室内的检测单元，图案形成装置。

4. 发明授权

US07115886B2 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权
公开(公告)号：US07115886B2
公开(公告)日：2006-10-03
申请号：US10973250
申请日：2004-10-27
申请人： Willem Van Schaik , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
发明人： Willem Van Schaik , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70883 , G03F7/70933
摘要： In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.

5. 发明申请

US20050112508A1 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷设备，装置制造方法和由此制造的装置
公开(公告)号：US20050112508A1
公开(公告)日：2005-05-26
申请号：US10973250
申请日：2004-10-27
申请人： Willem Van Schaik , Bastiaan Mertens , Hans Meiling , Norbertus Koster
发明人： Willem Van Schaik , Bastiaan Mertens , Hans Meiling , Norbertus Koster
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70925 , G03F7/70883 , G03F7/70933
摘要： In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
摘要翻译：用于光刻投影装置的光学部件的原位清洁可以通过在分子氧的存在下用包含波长小于250nm的UV或EUV辐射在含有光学部件的装置内照射空间来进行。通常，除了通常的清洗气体组合物之外，空间将被除去含有少量分子氧的无臭吹扫气体吹扫。该技术也可以通过将低分子氧引入该空间而在真空空间中使用。

6. 发明申请

US20050146703A1 Device manufacturing method, device manufactured thereby and a mask for use in the method 有权
标题翻译：装置制造方法，由此制造的装置和用于该方法的掩模
公开(公告)号：US20050146703A1
公开(公告)日：2005-07-07
申请号：US11023359
申请日：2004-12-29
申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
发明人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
IPC分类号： G03F1/16 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/70258 , G03F7/70283 , G03F7/703
摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of raditaion as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
摘要翻译：根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构，以将辐射束的至少一部分反射为在其横截面中具有图案的图案化的辐射束。该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。

7. 发明授权

US06879374B2 Device manufacturing method, device manufactured thereby and a mask for use in the method 有权
标题翻译：装置制造方法，由此制造的装置和用于该方法的掩模
公开(公告)号：US06879374B2
公开(公告)日：2005-04-12
申请号：US10173559
申请日：2002-06-18
申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
发明人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
IPC分类号： G03F1/16 , G03F7/20 , H01L21/027 , G03B27/68 , G03B27/42 , G03C5/00 , G03F9/00
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/70258 , G03F7/70283 , G03F7/703
摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
摘要翻译：根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构以将辐射束的至少一部分反射为在其横截面中具有图案的图案化辐射束。该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。

8. 发明授权

US06724460B2 Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects 失效
标题翻译：平版印刷设备，设备制造方法，由此制造的设备，清洁单元和清洁被污染物体的方法
公开(公告)号：US06724460B2
公开(公告)日：2004-04-20
申请号：US09988830
申请日：2001-11-19
申请人： Willem Van Schaik , Antonie Ellert Duisterwinkel , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
发明人： Willem Van Schaik , Antonie Ellert Duisterwinkel , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
IPC分类号： G03B2752
CPC分类号： G03F7/70925
摘要： In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
摘要翻译：用于光刻投影装置的光学部件的原位清洁可以通过在分子氧的存在下用包含波长小于250nm的UV或EUV辐射在含有光学部件的装置内照射空间来进行。通常，除了通常的清洗气体组合物之外，空间将被除去含有少量分子氧的无臭吹扫气体吹扫。该技术也可以通过将低分子氧引入该空间而在真空空间中使用。

9. 发明授权

US06686230B2 Semiconducting devices and method of making thereof 失效
标题翻译：半导体器件及其制造方法
公开(公告)号：US06686230B2
公开(公告)日：2004-02-03
申请号：US09331528
申请日：1999-08-05
申请人： Hans Meiling , Rudolf Emmanuel Isidor Schropp
发明人： Hans Meiling , Rudolf Emmanuel Isidor Schropp
IPC分类号： H01L2184
CPC分类号： H01L29/66765 , C23C16/24 , C23C16/44 , C23C16/50 , H01L21/02381 , H01L21/0242 , H01L21/0245 , H01L21/02532 , H01L21/0262 , Y10S438/908 , Y10S438/91
摘要： A process for providing a semiconducting device including the steps of depositing a semiconducting layer onto a substrate by means of heating a gas to a predetermined dissociation temperature so that the gas dissociates into fractions, whereby those fractions subsequently condense on the substrate to build up a semiconducting layer.
摘要翻译：一种用于提供半导体器件的方法，包括以下步骤：通过将气体加热至预定的解离温度将半导体层沉积到衬底上，使得气体解离成部分，由此这些部分随后在衬底上冷凝以形成半导体层。

10. 发明授权

US07492443B2 Device manufacturing method, device manufactured thereby and a mask for use in the method 有权
标题翻译：装置制造方法，由此制造的装置和用于该方法的掩模
公开(公告)号：US07492443B2
公开(公告)日：2009-02-17
申请号：US11023359
申请日：2004-12-29
申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
发明人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
IPC分类号： G03B27/68 , G03B27/42 , G03F9/00 , G03C5/00
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/70258 , G03F7/70283 , G03F7/703
摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
摘要翻译：根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构以将辐射束的至少一部分反射为在其横截面中具有图案的图案化辐射束。该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。

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