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    • 2. 发明授权
    • Process for manufacturing a wiring substrate
    • 制造布线基板的工艺
    • US07202156B2
    • 2007-04-10
    • US10989515
    • 2004-11-17
    • Hajime SaikiAtsuhiko SugimotoMikiya Sakurai
    • Hajime SaikiAtsuhiko SugimotoMikiya Sakurai
    • H01L21/4763
    • H05K3/4661H05K3/108H05K3/181H05K3/4602H05K2201/0209
    • A process for manufacturing a wiring substrate, comprising: a step of forming an insulating resin layer containing an inorganic filler over a wiring layer formed on at least one surface of an insulating substrate; a step of forming a thin copper film layer by roughening a surface of the insulating resin layer and plating the same electrolessly with copper; a step of forming an insulating film over the thin copper film layer; a step of forming plated resists profiling a pattern by exposing and developing the insulating film with the pattern; and a step of forming wiring pattern layers by an electrolytic copper plating on a surface of the insulating resin layer having the plated resists formed thereon, wherein at least one of the plated resists has a width of less than 20 μm, and the plated resists include adjoining plated resists in which a clearance between said adjoining plated resists has a width of less than 20 μm.
    • 一种布线基板的制造方法,包括:在绝缘基板的至少一个面上形成的布线层上形成含有无机填料的绝缘树脂层的工序; 通过使绝缘树脂层的表面粗糙化并用铜电化而使其形成薄铜膜层的步骤; 在所述薄铜膜层上形成绝缘膜的步骤; 通过用图案曝光和显影绝缘膜来形成电镀抗蚀剂的步骤; 以及在其上形成有电镀抗蚀剂的绝缘树脂层的表面上通过电解铜电镀形成布线图案层的步骤,其中至少一个电镀抗蚀剂具有小于20μm的宽度,并且电镀抗蚀剂包括 邻接的电镀抗蚀剂,其中所述相邻的电镀抗蚀剂之间的间隙具有小于20μm的宽度。
    • 6. 发明申请
    • Process for manufacturing a wiring substrate
    • 制造布线基板的工艺
    • US20050106854A1
    • 2005-05-19
    • US10989515
    • 2004-11-17
    • Hajime SaikiAtsuhiko SugimotoMikiya Sakurai
    • Hajime SaikiAtsuhiko SugimotoMikiya Sakurai
    • H05K3/18H05K3/10H05K3/46H05K1/11H01L21/4763H01R12/04
    • H05K3/4661H05K3/108H05K3/181H05K3/4602H05K2201/0209
    • A process for manufacturing a wiring substrate, comprising: a step of forming an insulating resin layer containing an inorganic filler over a wiring layer formed on at least one surface of an insulating substrate; a step of forming a thin copper film layer by roughening a surface of the insulating resin layer and plating the same electrolessly with copper; a step of forming an insulating film over the thin copper film layer; a step of forming plated resists profiling a pattern by exposing and developing the insulating film with the pattern; and a step of forming wiring pattern layers by an electrolytic copper plating on a surface of the insulating resin layer having the plated resists formed thereon, wherein at least one of the plated resists has a width of less than 20 μm, and -the plated resists include adjoining plated resists in which a clearance between said adjoining plated resists has a width of less than 20 μm.
    • 一种布线基板的制造方法,包括:在绝缘基板的至少一个面上形成的布线层上形成含有无机填料的绝缘树脂层的工序; 通过使绝缘树脂层的表面粗糙化并用铜电化而使其形成薄铜膜层的步骤; 在所述薄铜膜层上形成绝缘膜的步骤; 通过利用图案曝光和显影绝缘膜来形成电镀抗蚀剂成型图案的步骤; 以及在其上形成有电镀抗蚀剂的绝缘树脂层的表面上通过电解铜电镀形成布线图案层的步骤,其中至少一个电镀抗蚀剂具有小于20μm的宽度,并且电镀抗蚀剂 包括邻接的电镀抗蚀剂,其中所述邻接的电镀抗蚀剂之间的间隙具有小于20μm的宽度。