专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09960006B2 Charged-particle-beam device 有权
公开(公告)号：US09960006B2
公开(公告)日：2018-05-01
申请号：US15310438
申请日：2015-04-28
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Noritsugu Takahashi , Yasunari Sohda , Wataru Mori , Yuko Sasaki , Hajime Kawano
IPC分类号： G01N23/22 , G01N23/225 , G21K7/00 , H01J37/28 , H01J37/05 , H01J37/147 , H01J37/153 , H01J37/21 , H01J37/244 , H01J37/26 , H01J37/12
CPC分类号： H01J37/05 , H01J37/12 , H01J37/147 , H01J37/153 , H01J37/21 , H01J37/244 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/2448
摘要： A charged-particle-beam device used for measuring the dimensions, etc., of fine circuit patterns in a semiconductor manufacturing process, wherein corrections are made in the defocusing and astigmatism generated during changes in the operating conditions of a Wien filter acting as a deflector of secondary signals such as secondary electrons, and the display dimensions of obtained images are kept constant. In the charged-particle-beam device, the Wien filter (23) is arranged between a detector and a lens (11) arranged on the test-sample side among two stages of lenses for converging a charged-particle beam, and a computing device (93) is provided for the interlocked control of the Wien filter (23) and a lens (12) arranged on the charged-particle-source side among the two stages of lenses.

2. 发明授权

US10818470B2 Charged particle beam device 有权
公开(公告)号：US10818470B2
公开(公告)日：2020-10-27
申请号：US16491819
申请日：2017-03-06
申请人： Hitachi High-Technologies Corporation
发明人： Kazuki Ikeda , Wen Li , Takuma Nishimoto , Hiroyuki Takahashi , Wataru Mori , Makoto Suzuki , Hajime Kawano
IPC分类号： H01J37/147 , H01J37/22 , H01J37/28
摘要： A charged particle beam device includes a deflection unit that deflects a charged particle beam released from a charged particle source to irradiate a sample, a reflection plate that reflects secondary electrons generated from the sample, and a control unit that controls the deflection unit based on an image generated by detecting the secondary electrons reflected from the reflection plate. The deflection unit includes an electromagnetic deflection unit that electromagnetically scans with the charged particle beam by a magnetic field and an electrostatic deflection unit that electrostatically scans with the charged particle beam by an electric field. The control unit controls the electromagnetic deflection unit and the electrostatic deflection unit, superimposes an electromagnetic deflection vector generated by the electromagnetic scanning and an electrostatic deflection vector generated by the electrostatic scanning, and controls at least a trajectory of the charged particle beam.

3. 发明授权

US10991542B2 Charged particle beam device 有权
公开(公告)号：US10991542B2
公开(公告)日：2021-04-27
申请号：US16477986
申请日：2017-01-27
申请人： Hitachi High-Technologies Corporation
发明人： Ryota Watanabe , Yuko Sasaki , Kazunari Asao , Makoto Suzuki , Wataru Mori , Minoru Yamazaki
IPC分类号： H01J37/22 , H01J37/244 , H01J37/10 , H01J37/28
摘要： The purpose of the present invention is to provide a charged particle beam device which adjusts brightness and contrast or adjusts focus and the like appropriately in a short time even if there are few detected signals. Proposed as an aspect for achieving this purpose is a charged particle beam device provided with: a detector for detecting charged particles obtained on the basis of irradiation of a specimen with a charged particle beam emitted from a charged particle source; and a control unit for processing a signal obtained on the basis of the output of the detector, wherein the control unit performs statistical processing on gray level values in a predetermined region of an image generated on the basis of the output of the detector, and executes signal processing for correcting a difference between a statistical value obtained by the statistical processing and reference data relating to the gray level values of the image.

4. 发明申请

US20150034824A1 SCANNING ELECTRON MICROSCOPE 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20150034824A1
公开(公告)日：2015-02-05
申请号：US14379733
申请日：2013-02-15
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Wataru Mori , Hiroyuki Ito , Yuko Sasaki , Hiromi Inada
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/05 , H01J37/09 , H01J37/244 , H01J2237/2801 , H01J2237/2806
摘要： The purpose of the present invention is to provide a scanning electron microscope that achieves an increase in both resolution and pattern recognition capability. In order to achieve the purpose, the present invention proposes a scanning electron microscope provided with a monochromator that makes an electron beam monochromatic, the monochromator including a magnetic field generator that deflects the electron beam, and an energy selection aperture that passes a part of the electron beam deflected by the magnetic field generator. An aperture that passes some of electrons emitted from the sample and a detector that detects the electrons that have passed through the aperture are disposed on a trajectory to which the electrons emitted from the sample are deflected by a magnetic field generated by the magnetic field generator.
摘要翻译：本发明的目的是提供一种扫描电子显微镜，其实现分辨率和图案识别能力的增加。为了实现该目的，本发明提出了一种具有单色仪的扫描电子显微镜，其使电子束单色，单色器包括使电子束偏转的磁场发生器，以及通过一部分能量选择孔由磁场发生器偏转的电子束。通过从样品发射的一些电子的孔和检测已经通过孔的电子的检测器设置在由样品发射的电子被磁场发生器产生的磁场偏转的轨迹上。

5. 发明授权

US11152186B2 Charged particle beam device 有权
公开(公告)号：US11152186B2
公开(公告)日：2021-10-19
申请号：US16354670
申请日：2019-03-15
申请人： Hitachi High-Technologies Corporation
发明人： Wataru Yamane , Minoru Yamazaki , Yuko Sasaki , Wataru Mori , Takashi Doi
IPC分类号： H01J37/147 , H01J37/244 , H01J37/22 , H01J37/10 , H01J37/28
摘要： An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.

6. 发明授权

US10796880B2 Charged particle beam device and charged particle beam device noise source determination method 有权
公开(公告)号：US10796880B2
公开(公告)日：2020-10-06
申请号：US16473957
申请日：2016-12-27
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Takuma Nishimoto , Wen Li , Hiroyuki Takahashi , Wataru Mori , Hajime Kawano
IPC分类号： H01J37/22
摘要： Provided is a charged particle beam device to enable determination of a noise source of a charged particle beam device that can cause a noise frequency component superimposed on a measurement image. The charged particle beam device includes a unit that extracts information regarding a noise source. The unit that extracts information regarding a noise source includes: a control signal monitoring unit that observes a control signal of a control unit which controls an electron optical system of the charged particle beam device and outputs the observed signal; a first frequency conversion processing unit that executes frequency conversion processing on the signal output from the control signal monitoring unit; a second frequency conversion processing unit that executes frequency conversion processing on an image signal output from a detector of the electron optical system; and a frequency analysis and comparison processing unit that receives an output signal of the first frequency conversion processing unit and an image signal of the second frequency conversion processing unit, and associates a peak frequency of a superimposed noise of the image signal with a noise source of the control unit which generates a noise having a peak frequency corresponding to the peak frequency of the superimposed noise within the image signal.

7. 发明授权

US10707047B2 Measuring device and measuring method 有权
公开(公告)号：US10707047B2
公开(公告)日：2020-07-07
申请号：US16325662
申请日：2016-08-31
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Noritsugu Takahashi , Makoto Sakakibara , Wataru Mori , Hajime Kawano , Yuko Sasaki
IPC分类号： H01J37/20 , H01J37/12 , H01J37/21 , H01J37/244 , H01J37/10 , H01J37/141
摘要： A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.

8. 发明授权

US09305745B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US09305745B2
公开(公告)日：2016-04-05
申请号：US14379733
申请日：2013-02-15
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Wataru Mori , Hiroyuki Ito , Yuko Sasaki , Hiromi Inada
IPC分类号： H01J37/00 , H01J37/28 , H01J37/05 , H01J37/244 , H01J37/09
CPC分类号： H01J37/28 , H01J37/05 , H01J37/09 , H01J37/244 , H01J2237/2801 , H01J2237/2806
摘要： The purpose of the present invention is to provide a scanning electron microscope that achieves an increase in both resolution and pattern recognition capability. In order to achieve the purpose, the present invention proposes a scanning electron microscope provided with a monochromator that makes an electron beam monochromatic, the monochromator including a magnetic field generator that deflects the electron beam, and an energy selection aperture that passes a part of the electron beam deflected by the magnetic field generator. An aperture that passes some of electrons emitted from the sample and a detector that detects the electrons that have passed through the aperture are disposed on a trajectory to which the electrons emitted from the sample are deflected by a magnetic field generated by the magnetic field generator.
摘要翻译：本发明的目的是提供一种扫描电子显微镜，其实现分辨率和图案识别能力的增加。为了实现该目的，本发明提出了一种具有单色仪的扫描电子显微镜，其使电子束单色，单色器包括使电子束偏转的磁场发生器，以及通过一部分能量选择孔由磁场发生器偏转的电子束。通过从样品发射的一些电子的孔和检测已经通过孔的电子的检测器设置在由样品发射的电子被磁场发生器产生的磁场偏转的轨迹上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式