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1. 发明申请

US20070023870A1 Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures 失效
标题翻译：低K层间电介质材料和低K层间介电层和结构的形成方法
公开(公告)号：US20070023870A1
公开(公告)日：2007-02-01
申请号：US11190644
申请日：2005-07-27
申请人： Geraud Dubois , James Hedrick , Ho-Cheol Kim , Victor Lee , Teddie Magbitang , Robert Miller , Muthumanickam Sankarapandian , Linda Sundberg , Willi Volksen
发明人： Geraud Dubois , James Hedrick , Ho-Cheol Kim , Victor Lee , Teddie Magbitang , Robert Miller , Muthumanickam Sankarapandian , Linda Sundberg , Willi Volksen
IPC分类号： H01L23/58 , H01L21/4763
CPC分类号： C08L101/12 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/31695 , H01L21/76807 , H01L21/7682 , H01L2221/1047
摘要： A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.
摘要翻译：使用该组合物制造的物质组成和结构。所述组合物包含：树脂; 分散在树脂中的聚合物纳米颗粒，每个聚合纳米颗粒包含多臂芯聚合物和连接到多臂芯聚合物的悬置聚合物，与树脂不混溶的多臂芯聚合物和可混溶的侧链聚合物与树脂; 和溶剂，所述溶剂在第一温度下挥发，所述树脂在第二温度下可交联，所述聚合物纳米颗粒在第三温度下可分解，所述第三温度高于所述第二温度，所述第二温度高于所述第一温度，其中在从第二温度到第三温度的层之间加热组合物的层的厚度收缩小于约3.5％。

2. 发明授权

US07989026B2 Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films 有权
标题翻译：使用含环氧基的脂环族丙烯酸聚合物作为嵌段共聚物薄膜的取向控制层的方法
公开(公告)号：US07989026B2
公开(公告)日：2011-08-02
申请号：US12013444
申请日：2008-01-12
申请人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
IPC分类号： B05D5/00
CPC分类号： B05D5/00 , B05D7/14 , B05D7/52 , C08L53/00 , C09D125/14 , C09D153/00
摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
摘要翻译：本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。在另外的实施方案中，公开了双层和三层成像方案。

3. 发明申请

US20090182093A1 Method of Controlling Orientation of Domains in Block Copolymer Films 失效
公开(公告)号：US20090182093A1
公开(公告)日：2009-07-16
申请号：US12013138
申请日：2008-01-11
申请人： Joy Cheng , Ho-Cheol Kim , Daniel P. Sanders , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Daniel P. Sanders , Linda Sundberg
IPC分类号： C08L53/00
CPC分类号： C08L63/00 , B05D5/02 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C08F283/10 , C08L53/00 , C09D125/14 , G03F7/0002 , G03F7/038 , Y10S264/901 , Y10S428/91 , Y10T428/24942
摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

4. 发明授权

US08491965B2 Method of controlling orientation of domains in block copolymer films 有权
公开(公告)号：US08491965B2
公开(公告)日：2013-07-23
申请号：US12060516
申请日：2008-04-01
申请人： Joy Cheng , Ho-Cheol Kim , Daniel P. Sanders , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Daniel P. Sanders , Linda Sundberg
IPC分类号： B05D5/00 , B05D5/12
CPC分类号： C08L63/00 , B05D5/02 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C08F283/10 , C08L53/00 , C09D125/14 , G03F7/0002 , G03F7/038 , Y10S264/901 , Y10S428/91 , Y10T428/24942
摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

5. 发明授权

US07763319B2 Method of controlling orientation of domains in block copolymer films 失效
标题翻译：控制嵌段共聚物膜中取向的方法
公开(公告)号：US07763319B2
公开(公告)日：2010-07-27
申请号：US12013138
申请日：2008-01-11
申请人： Joy Cheng , Ho-Cheol Kim , Daniel P. Sanders , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Daniel P. Sanders , Linda Sundberg
IPC分类号： B05D5/00 , B05D5/12
CPC分类号： C08L63/00 , B05D5/02 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C08F283/10 , C08L53/00 , C09D125/14 , G03F7/0002 , G03F7/038 , Y10S264/901 , Y10S428/91 , Y10T428/24942
摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.
摘要翻译：公开了一种定向微相分离的结构域的方法，包括施加包含取向控制组分的组合物和包含具有至少两个微相分离结构域的嵌段共聚物的嵌段共聚物组合组分，其中取向控制组分与嵌段共聚物组合物组分; 以及从所述组合物在所述基材的表面上形成组成上垂直分离的膜。取向控制成分和嵌段共聚物在成膜时分离，在基板表面形成组成垂直分离的膜，其中取向控制成分相邻于与基板表面相邻的组成偏析膜的表面富集，并且嵌段共聚物组件在空气 - 表面界面处富集。

6. 发明申请

US20090179001A1 METHOD OF USE OF EPOXY-CONTAINING CYCLOALIPHATIC ACRYLIC POLYMERS AS ORIENTATION CONTROL LAYERS FOR BLOCK COPOLYMER THIN FILMS 有权
标题翻译：使用环氧基丙烯酸聚合物作为块状共聚物薄膜的方向控制层的方法
公开(公告)号：US20090179001A1
公开(公告)日：2009-07-16
申请号：US12013444
申请日：2008-01-12
申请人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
IPC分类号： B32B37/14 , B32B38/10
CPC分类号： B05D5/00 , B05D7/14 , B05D7/52 , C08L53/00 , C09D125/14 , C09D153/00
摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
摘要翻译：本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。在另外的实施方案中，公开了双层和三层成像方案。

7. 发明申请

US20090181171A1 Method of Controlling Orientation of Domains in Block Copolymer Films 有权
标题翻译：控制嵌段共聚物膜中畴的取向的方法
公开(公告)号：US20090181171A1
公开(公告)日：2009-07-16
申请号：US12060516
申请日：2008-04-01
申请人： Joy Cheng , Ho-Cheol Kim , Daniel P. Sanders , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Daniel P. Sanders , Linda Sundberg
IPC分类号： B44C1/22 , C08F283/10 , B05D5/00
CPC分类号： C08L63/00 , B05D5/02 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C08F283/10 , C08L53/00 , C09D125/14 , G03F7/0002 , G03F7/038 , Y10S264/901 , Y10S428/91 , Y10T428/24942
摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.
摘要翻译：公开了一种定向微相分离的结构域的方法，包括施加包含取向控制组分的组合物和包含具有至少两个微相分离结构域的嵌段共聚物的嵌段共聚物组合组分，其中取向控制组分与嵌段共聚物组合物组分; 以及从所述组合物在所述基材的表面上形成组成上垂直分离的膜。取向控制成分和嵌段共聚物在成膜时分离，在基板表面形成组成垂直分离的膜，其中取向控制成分相邻于与基板表面相邻的组成偏析膜的表面富集，并且嵌段共聚物组件在空气 - 表面界面处富集。

8. 发明授权

US07521090B1 Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films 有权
标题翻译：使用含环氧基的脂环族丙烯酸聚合物作为嵌段共聚物薄膜的取向控制层的方法
公开(公告)号：US07521090B1
公开(公告)日：2009-04-21
申请号：US12060500
申请日：2008-04-01
申请人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
发明人： Joy Cheng , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda Sundberg
IPC分类号： B05D5/00
CPC分类号： B05D5/00 , B05D7/14 , B05D7/52 , C08L53/00 , C09D125/14 , C09D153/00
摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.
摘要翻译：本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。在另外的实施方案中，公开了双层和三层成像方案。

9. 发明申请

US20070117040A1 Water castable-water strippable top coats for 193 nm immersion lithography 审中-公开
标题翻译：可浇注水可剥离的顶涂层，用于193 nm浸没光刻
公开(公告)号：US20070117040A1
公开(公告)日：2007-05-24
申请号：US11284358
申请日：2005-11-21
申请人： Phillip Brock , Jennifer Cha , Dario Gil , Carl Larson , Linda Sundberg , Gregory Wallraff
发明人： Phillip Brock , Jennifer Cha , Dario Gil , Carl Larson , Linda Sundberg , Gregory Wallraff
IPC分类号： G03C1/00
CPC分类号： G03F7/2041 , C09D129/04 , C09D131/04 , G03F7/11 , C08L2666/04
摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises a polymer which is sparingly soluble or insoluble in water at a temperature of about 25° C. or below but soluble in water at a temperature of about 60° C. or above. The polymer contains poly vinyl alcohol monomer unit and a poly vinyl acetate or poly vinyl ether monomer unit having the following polymer structure: wherein R is an aliphatic or alicyclic radical; m and n are independently integers, and are the same or different; and p is zero or 1. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is particularly useful in immersion lithography techniques using water as the imaging medium. The topcoat material of the present invention are also useful for immersion lithography employing organic liquid as immersion medium.
摘要翻译：公开了一种用于施加在光致抗蚀剂材料上的面漆材料。面漆材料包括在约25℃或更低的温度下微溶或不溶于水的聚合物，但在约60℃或更高的温度下可溶于水。聚合物含有聚乙烯醇单体单元和具有以下聚合物结构的聚乙酸乙烯酯或聚乙烯醚单体单元：其中R是脂族或脂环族基团; m和n独立地是整数，并且相同或不同; 并且p为零或1.面漆材料可用于光刻工艺，其中将顶涂层材料施加在光致抗蚀剂层上。面漆材料在使用水作为成像介质的浸没式光刻技术中特别有用。本发明的面漆材料也可用于使用有机液体作为浸渍介质的浸渍光刻。

10. 发明申请

US20060292485A1 Topcoat compositions and methods of use thereof 有权
标题翻译：面漆组合物及其使用方法
公开(公告)号：US20060292485A1
公开(公告)日：2006-12-28
申请号：US11159946
申请日：2005-06-23
申请人： Hiroshi Ito , Linda Sundberg
发明人： Hiroshi Ito , Linda Sundberg
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041
摘要： A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene, 2,2,3,3,4,4,5,5-octafluoropentyl-1,1,2,2-tetrafluoroethyl ether (OFP-TFEE), and a mixture consisting of a hydrophobic alkane and an alcohol is provided. Also provided is method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.
摘要翻译：一种面漆组合物，其包含含氟聚合物和选自α，α，α-三氟甲苯，2,2,3,3,4,4,5,5-八氟戊基-1,1，提供了2,2-四氟乙基醚（OFP-TFEE）和由疏水性烷烃和醇组成的混合物。还提供了在光致抗蚀剂上形成图像的方法，其包括在衬底上形成光致抗蚀剂; 将面漆组合物，包含至少一种含氟聚合物和浇铸溶剂的面漆组合物涂覆到光致抗蚀剂上; 除去顶涂层组合物的浇铸溶剂，导致在光致抗蚀剂上形成顶涂层材料; 将光致抗蚀剂暴露于辐射，辐射改变暴露于辐射的光致抗蚀剂区域的化学组成，在光致抗蚀剂中形成暴露和未曝光的区域; 并去除i）面漆材料和ii）光致抗蚀剂的曝光区域或光致抗蚀剂的未曝光区域。

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