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    • 8. 发明授权
    • Method of forming polymer features by directed self-assembly of block copolymers
    • 通过嵌段共聚物的定向自组装形成聚合物特征的方法
    • US08226838B2
    • 2012-07-24
    • US12061693
    • 2008-04-03
    • Joy ChengWilliam D. HinsbergHo-Cheol KimCharles T. RettnerDaniel P. Sanders
    • Joy ChengWilliam D. HinsbergHo-Cheol KimCharles T. RettnerDaniel P. Sanders
    • C03C15/00
    • G03F7/0002B82Y10/00B82Y40/00
    • Disclosed are methods of forming polymer structures comprising: applying a solution of a block copolymer assembly comprising at least one block copolymer to a neutral substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and have a first spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains of the block copolymer that form by lateral segregation of the blocks in accordance with the underlying chemical pattern, wherein at least one domain of the block copolymer assembly has an affinity for the pinning regions, wherein a structure extending across the chemical pattern is produced, the structure having a uniform second spatial frequency given by the number of repeating sets of domains along the given direction that is at least twice that of the first spatial frequency.
    • 公开了形成聚合物结构的方法,包括:将包含至少一种嵌段共聚物的嵌段共聚物组合物溶液施加到其上具有化学图案的中性衬底上,所述化学图案包括化学上不同的交替的钉扎和中性区域,并且具有第一 空间频率由衬底上沿着给定方向的成套组钉扎和中性区域的数量给出; 以及通过根据下面的化学图案横向分离块而形成嵌段共聚物的结构域,其中嵌段共聚物组合物的至少一个结构域对于钉扎区域具有亲和力,其中横跨化学图案延伸的结构是 所述结构具有由给定方向上的至少是第一空间频率的两倍的畴的重复集合的数量给出的统一的第二空间频率。
    • 9. 发明申请
    • METHOD OF FORMING POLYMER FEATURES BY DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS
    • 通过方向自组装块状共聚物形成聚合物特征的方法
    • US20090179002A1
    • 2009-07-16
    • US12061693
    • 2008-04-03
    • Joy ChengWilliam D. HinsbergHo-Cheol KimCharles T. RettnerDaniel P. Sanders
    • Joy ChengWilliam D. HinsbergHo-Cheol KimCharles T. RettnerDaniel P. Sanders
    • B05D5/00C23F1/00
    • G03F7/0002B82Y10/00B82Y40/00
    • Disclosed are methods of forming polymer structures comprising: applying a solution of a block copolymer assembly comprising at least one block copolymer to a neutral substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and have a first spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains of the block copolymer that form by lateral segregation of the blocks in accordance with the underlying chemical pattern, wherein at least one domain of the block copolymer assembly has an affinity for the pinning regions, wherein a structure extending across the chemical pattern is produced, the structure having a uniform second spatial frequency given by the number of repeating sets of domains along the given direction that is at least twice that of the first spatial frequency.
    • 公开了形成聚合物结构的方法,包括:将包含至少一种嵌段共聚物的嵌段共聚物组合物溶液施加到其上具有化学图案的中性衬底上,所述化学图案包括化学上不同的交替的钉扎和中性区域,并且具有第一 空间频率由衬底上沿着给定方向的成套组钉扎和中性区域的数量给出; 以及通过根据下面的化学图案横向分离块而形成嵌段共聚物的结构域,其中嵌段共聚物组合物的至少一个结构域对于钉扎区域具有亲和力,其中横跨化学图案延伸的结构是 所述结构具有由给定方向上的至少是第一空间频率的两倍的畴的重复集合的数量给出的统一的第二空间频率。
    • 10. 发明授权
    • Method of forming polymer features by directed self-assembly of block copolymers
    • 通过嵌段共聚物的定向自组装形成聚合物特征的方法
    • US07521094B1
    • 2009-04-21
    • US12013957
    • 2008-01-14
    • Joy ChengWilliam D. HinsbergHo-Cheol KimCharles T. RettnerDaniel P. Sanders
    • Joy ChengWilliam D. HinsbergHo-Cheol KimCharles T. RettnerDaniel P. Sanders
    • B05D3/00
    • G03F7/0002B82Y10/00B82Y40/00
    • Disclosed herein is a method of forming polymer structures comprising applying a solution of a diblock copolymer assembly comprising at least one diblock copolymer that forms lamellae, to a neutral surface of a substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and which have a chemical pattern spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains comprising blocks of the diblock copolymer. The domains form by lateral segregation of the blocks. At least one domain has an affinity for the pinning regions and forms on the pinning region, the domains so formed on the pinning region are aligned with the underlying chemical pattern, and domains that do not form on the pinning region form adjacent to and are aligned with the domains formed on the pinning regions. In this way, a structure comprising repeating sets of domains is formed on the chemical pattern with a spatial frequency given by the number of repeating sets of domains in the given direction, that is at least twice that of the chemical pattern spatial frequency. Methods of forming the chemical patterns, and pattern transfer methods using patterned domains, are also disclosed.
    • 本文公开了形成聚合物结构的方法,包括将包含至少一种形成薄片的二嵌段共聚物的二嵌段共聚物组合物的溶液施加到其上具有化学图案的基材的中性表面上,所述化学图案包括交替的钉扎和中性区域 其在化学上是不同的,并且具有由沿着衬底上的给定方向的成套组的钉扎和中性区域的数量给出的化学图案空间频率; 以及形成包含二嵌段共聚物嵌段的畴。 这些区域由块的横向偏析形成。 至少一个结构域对钉扎区域的钉扎区域和形成具有亲和性,因此形成在钉扎区域上的区域与下面的化学图案对准,并且不在钉扎区域上形成的区域形成为邻近并对齐 其中所述域形成在钉扎区域上。 以这种方式,在化学图案上形成包括重复的畴集合的结构,其空间频率由给定方向上的重复域集合的数量给出,即至少是化学图案空间频率的两倍。 还公开了形成化学图案的方法和使用图案域的图案转印方法。