专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06613230B2 Method for simultaneous removal of arsenic and fluoride from aqueous solutions 失效
标题翻译：从水溶液中同时去除砷和氟化物的方法
公开(公告)号：US06613230B2
公开(公告)日：2003-09-02
申请号：US09894229
申请日：2001-06-27
申请人： Gerald A. Krulik , Paul H. Dick , Josh H. Golden , Jay Jung , Gennadiy Sverdlov
发明人： Gerald A. Krulik , Paul H. Dick , Josh H. Golden , Jay Jung , Gennadiy Sverdlov
IPC分类号： C02F154
CPC分类号： C02F1/56 , C02F1/001 , C02F1/5245 , C02F2101/103 , C02F2101/14 , C02F2101/36 , C02F2209/06 , Y02W10/37 , Y10S210/911 , Y10S210/915
摘要： A method of removing arsenic and fluoride from aqueous solutions in the same process is provided. Specifically, the pH of the aqueous solution is adjusted to a pH in the range of about 5 to 8. A combination of calcium salts, and ferric or aluminum salts are added to form insoluble arsenic and fluoride bearing solids. The solids are then removed from the aqueous solution.
摘要翻译：提供了一种在同一工艺中从水溶液中除砷和氟化物的方法。具体地说，将水溶液的pH调节至约5至8范围内的pH。加入钙盐和铁或铝盐的组合以形成不溶的含砷和氟化物的固体。然后从水溶液中除去固体。

2. 发明授权

US06645385B2 System and method for removal of fluoride from wastewater using single fluoride sensing electrode 失效
公开(公告)号：US06645385B2
公开(公告)日：2003-11-11
申请号：US09960614
申请日：2001-09-21
申请人： Gerald A. Krulik , Gennadiy Sverdlov , William Hannan
发明人： Gerald A. Krulik , Gennadiy Sverdlov , William Hannan
IPC分类号： C02F152
CPC分类号： C02F1/5245 , C02F1/001 , C02F1/66 , C02F2101/14 , C02F2209/001 , C02F2209/003 , C02F2209/06 , Y10S210/915
摘要： A system for removing fluoride from wastewater is provided. The system comprises a reaction tank for processing said wastewater by adding calcium salts, a filtration tank for removing the precipitated fluoride formed in the reaction tank, a single fluoride electrode disposed at the reaction tank for measuring a concentration of fluoride in the influent wastewater and providing an output signal, and a programmable controller for controlling addition of said calcium salts into said reaction tank. The programmable controller defines a setpoint of fluoride concentration in the reaction tank and automatically controls addition of calcium salts based on the setpoint and the output signal provided by the single fluoride electrode. A method of removing fluoride from wastewater is also provided.

3. 发明授权

US06582605B2 Method of treating industrial waste waters 有权
标题翻译：处理工业废水的方法
公开(公告)号：US06582605B2
公开(公告)日：2003-06-24
申请号：US09894527
申请日：2001-06-27
申请人： Gerald A. Krulik , Josh H. Golden
发明人： Gerald A. Krulik , Josh H. Golden
IPC分类号： C02F154
CPC分类号： C02F1/70 , C02F1/5236 , C02F1/54 , C02F2101/30 , C02F2209/06 , Y10S210/908
摘要： A method of treating industrial wastewaters is provided. Specifically, the wastewater includes one or more organic contaminant materials and is pre-treated prior to filtering by the following steps The pH of the wastewater is adjusted to a pH in the range of about 2 to 6, and a combination of iron salts and peroxide are added to the wastewater and allowed to react for a period of at least about three minutes. Next, the pH of the wastewater is adjusted upwards to a value of at least 7 and precipitating or flocculating agents are added to form an insoluble contaminant bearing compound. The compound is then filtered from the wastewater thereby removing the contaminant materials from the wastewater. This invention is particularly suited for use with single pass flow-through filters, and most particularly suitable for high flow rate single pass flow-through filters. The method of the present invention results in minimization of filter clogging and maintenance of high filtration flow rates, with reduced need for cleaning cycles using lengthy treatment by acid based or detergent mixtures.
摘要翻译：提供了一种处理工业废水的方法。具体地，废水包括一种或多种有机污染物质，并且在通过以下步骤过滤之前进行预处理。将废水的pH调节至约2至6范围内的pH，以及铁盐和过氧化物的组合被添加到废水中并允许反应至少约三分钟。接下来，将废水的pH调节至至少7的值，并加入沉淀或絮凝剂以形成不溶性污染物带有化合物。然后将化合物从废水中过滤，从而从废水中除去污染物质。本发明特别适用于单通流通过滤器，特别适用于高流速单通流通滤器。本发明的方法导致过滤器堵塞和维持高过滤流速的最小化，减少了通过使用酸性或洗涤剂混合物进行长时间处理的清洁循环的需要。

4. 发明授权

US6143155A Method for simultaneous non-contact electrochemical plating and planarizing of semiconductor wafers using a bipiolar electrode assembly 失效
标题翻译：使用双极电极组件同时进行非接触电化学电镀和半导体晶片平面化的方法
公开(公告)号：US6143155A
公开(公告)日：2000-11-07
申请号：US96131
申请日：1998-06-11
申请人： John A. Adams , Gerald A. Krulik , Everett D. Smith
发明人： John A. Adams , Gerald A. Krulik , Everett D. Smith
IPC分类号： C25D5/04 , C25D7/12 , H01L21/288 , H01L21/321 , H01L21/768 , C25D5/00
CPC分类号： C25D7/001 , C25D5/04 , C25D7/123 , H01L21/2885 , H01L21/32115 , H01L21/7684
摘要： Simultaneous non-contact plating and planarizing of copper interconnections in semiconductor wafer manufacturing is performed by providing relative motion between a bipolar electrode and a metallized surface of a semiconductor wafer without necessary physical contact with the wafer or direct electrical connection thereto.
摘要翻译：通过提供双极电极和半导体晶片的金属化表面之间的相对运动，而不需要与晶片的物理接触或与其直接电连接，来实现半导体晶片制造中的铜互连的同时非接触电镀和平坦化。

5. 发明授权

US5556553A Recycle process for regeneration of ammoniacal copper etchant 失效
标题翻译：氨铜腐蚀剂再生回收工艺
公开(公告)号：US5556553A
公开(公告)日：1996-09-17
申请号：US447752
申请日：1995-05-23
申请人： Gerald A. Krulik , Nenad V. Mandich , Rajwant Singh
发明人： Gerald A. Krulik , Nenad V. Mandich , Rajwant Singh
IPC分类号： C23F1/46 , B44C1/22 , C23F1/00
CPC分类号： C23F1/46
摘要： A process for control of recycle of ammoniacal copper etchant which uses metallic aluminum to remove copper without substantially adding undesirable byproducts, by controlling the temperature and mixture rate of the removal process. The very rapid reaction can be controlled by using a diluent of copper-free etchant, heating to process temperature, then adding spent, copper containing etchant at a controlled rate while actively cooling the system to control the temperature. The copper concentration can be monitored by colorimetry while maintaining the pH above pH 8. The separated metallic copper and aluminum hydroxide sludge are easily filtered from the etchant. The purified etchant is now suitable for chemical adjustment and reuse.
摘要翻译：用于控制氨铜腐蚀剂的再循环的方法，其通过控制除去过程的温度和混合速率，其使用金属铝去除铜而基本上不加入不需要的副产物。可以通过使用无铜蚀刻剂的稀释剂，加热至加工温度，然后以有控制的速率加入废铜的蚀刻剂，同时主动冷却系统以控制温度，来控制非常快的反应。可以通过比色法监测铜浓度，同时保持pH高于pH8。分离的金属铜和氢氧化铝污泥容易从蚀刻剂中过滤。纯化的蚀刻剂现在适用于化学调整和再利用。

6. 发明授权

US5512201A Solder and tin stripper composition 失效
标题翻译：锡和锡剥离剂组合物
公开(公告)号：US5512201A
公开(公告)日：1996-04-30
申请号：US388444
申请日：1995-02-13
申请人： Rajwant Singh , Nenad Mandich , Gerald A. Krulik
发明人： Rajwant Singh , Nenad Mandich , Gerald A. Krulik
IPC分类号： C23F1/44 , C23D1/00
CPC分类号： C23F1/44
摘要： A metal dissolving liquid and method for stripping tin and solder coatings, including the underlying tin-copper alloy, from the copper substrate of a printed circuit board. The liquid includes an aqueous solution of nitric acid in an amount sufficient to dissolve solder and tin, a source of ferric ions in an amount sufficient to dissolve tin-copper alloy, a source of halide ions in an amount sufficient to solubilize tin, an effective amount of methylsulfonic acid as promoter for complete stripping, and a source of an organic, water soluble amine. The combination of ingredients will substantially eliminate sludge formation, reduce attack on the copper substrate and provide a bright copper finish after solder removal. A liquid further including organic triazoles including benzotriazole in amounts not more than about 5% by weight and sulfamic ions in amounts not more than about 2.5% by weight.
摘要翻译：一种金属溶解液以及从印刷电路板的铜基底上剥离锡和焊料涂层（包括下面的锡 - 铜合金）的方法。该液体包括硝酸水溶液，其量足以溶解锡和锡，铁离子源的量足以溶解锡 - 铜合金，卤素源的量足以溶解锡，有效甲基磺酸的量作为完全汽提的促进剂，以及有机水溶性胺的来源。成分的组合将基本上消除污泥形成，减少对铜基材的侵蚀并且在去除焊料后提供亮的铜表面。进一步包括含量不超过约5重量％的有机三唑（包括苯并三唑）和不超过约2.5重量％的氨基磺酸根离子的液体。

7. 发明授权

US3940270A Reproduction system utilizing ion modulator and dielectric imaging surface 失效
标题翻译：利用离子调制器和介电成像表面的再现系统
公开(公告)号：US3940270A
公开(公告)日：1976-02-24
申请号：US467391
申请日：1974-05-06
申请人： Gerald A. Krulik , Harvey J. Sable
发明人： Gerald A. Krulik , Harvey J. Sable
IPC分类号： G03G5/02 , G03G15/05 , G03G15/16 , G03G13/14
CPC分类号： G03G15/167 , G03G15/051 , G03G5/02
摘要： An electrophotographic system is described in which a photoconductive ion modulator screen is used in conjunction with an anodized aluminum dielectric imaging surface. This combination enables the steps of image transfer and fixing to be carried out simultaneously without destroying the latent image produced on the dielectric imaging surface.A duplex anodized aluminum coating is prepared by forming a porous aluminum oxide layer by electrolytically oxidizing an aluminum surface and thereafter continuing the electrolytic oxidation under conditions which produce a barrier type aluminum oxide layer. The resulting duplex anodized aluminum coating containing both porous type aluminum oxide and barrier type aluminum oxide is used as the dielectric imaging surface in this electrophotographic system.
摘要翻译：描述了一种电子照相系统，其中光电离离子调制器屏幕与阳极氧化铝电介质成像表面结合使用。这种组合使得能够同时执行图像转印和定影的步骤，而不会破坏在电介质成像表面上产生的潜像。

8. 发明授权

US3937571A Reproduction system utilizing ion modular and dielectric imaging surface 失效
标题翻译：使用离子模块化和电介质成像表面的再生系统
公开(公告)号：US3937571A
公开(公告)日：1976-02-10
申请号：US531462
申请日：1974-12-11
申请人： Gerald A. Krulik , Harvey J. Sable
发明人： Gerald A. Krulik , Harvey J. Sable
IPC分类号： G03G5/02 , G03G15/05 , G03G15/16 , G03G15/00
CPC分类号： G03G15/167 , G03G15/051 , G03G5/02
摘要： An electrophotographic system is described in which a photoconductive ion modulator screen is used in conjunction with an anodized aluminum dielectric imaging surface. This combination enables the steps of image transfer and fixing to be carried out simultaneously without destroying the latent image produced on the dielectric imaging surface.A duplex anodized aluminum coating is prepared by forming a porous aluminum oxide layer by electrolytically oxidizing an aluminum surface and thereafter continuing the electrolytic oxidation under conditions which produce a barrier type aluminum oxide layer. The resulting duplex anodized aluminum coating containing both porous type aluminum oxide and barrier type aluminum oxide is used as the dielectric imaging surface in this electrophotographic system.

9. 发明授权

US5755614A Rinse water recycling in CMP apparatus 失效
标题翻译：在CMP设备中冲洗水回收
公开(公告)号：US5755614A
公开(公告)日：1998-05-26
申请号：US819533
申请日：1997-03-17
申请人： John A. Adams , Gerald A. Krulik , C. Randall Harwood
发明人： John A. Adams , Gerald A. Krulik , C. Randall Harwood
IPC分类号： B24B37/04 , B24B55/03 , B24B57/00
CPC分类号： B24B57/02 , B24B37/04 , B24B55/03 , Y10S134/902
摘要： Recycled slurry is continuously blended with the slurry in use to provide a consistent polishing rate while consuming or discarding a small fraction of the slurry flowing continuously across the polishing pad. The slurry is recovered in a catch ring and fed to a recycle loop to blend the recovered slurry with fresh slurry, rejuvenating chemicals, or water; test the blend; filter the blend; and return the blend to the polishing pad. The volume returned to the pad slightly exceeds the volume recovered, causing the catch ring to overflow. Rinse water is recycled in the same fashion to keep the polishing pad wet between polishing cycles.
摘要翻译：再循环浆料与浆料在使用中连续混合以提供一致的抛光速率，同时消耗或丢弃连续流过抛光垫的少量浆料。将浆料回收到捕获环中并进料到循环回路中以将回收的浆料与新鲜浆料，再生化学品或水混合; 测试混合物; 过滤混合物; 并将混合物返回到抛光垫。返回到垫的体积稍微超过恢复的体积，导致卡环溢出。冲洗水以相同的方式回收，以保持抛光垫在抛光周期之间变湿。

10. 发明授权

US5524780A Control of regeneration of ammoniacal copper etchant 失效
标题翻译：控制氨铜腐蚀剂的再生
公开(公告)号：US5524780A
公开(公告)日：1996-06-11
申请号：US381510
申请日：1995-01-31
申请人： Gerald A. Krulik , Nenad V. Mandich , Rajwant Singh
发明人： Gerald A. Krulik , Nenad V. Mandich , Rajwant Singh
IPC分类号： C23F1/46
CPC分类号： C23F1/46
摘要： A method of improved control of recycle of ammoniacal copper etchant which uses metallic aluminum to remove copper without substantially adding undesirable byproducts. The very rapid reaction can be controlled by using a diluent of copper-free etchant, eliminating overheating. The separated copper and aluminum hydroxide sludge are easily filtered from the etchant. The purified etchant is now suitable for chemical adjustment and reuse.
摘要翻译：一种改进控制氨铜腐蚀剂的方法，其使用金属铝去除铜而基本上不增加不期望的副产物。通过使用无铜蚀刻剂的稀释剂可以控制非常快的反应，从而消除过热。分离的铜和氢氧化铝污泥容易从蚀刻剂过滤。纯化的蚀刻剂现在适用于化学调整和再利用。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式