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1. 发明授权

US07435320B2 Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions 有权
标题翻译：用于监测电化学沉积溶液中有机添加剂的方法和装置
公开(公告)号：US07435320B2
公开(公告)日：2008-10-14
申请号：US10836546
申请日：2004-04-30
申请人： Jianwen Han , Mackenzie E. King , Weihua Wang , Glenn Tom , Jay Jung
发明人： Jianwen Han , Mackenzie E. King , Weihua Wang , Glenn Tom , Jay Jung
IPC分类号： G01N27/403
CPC分类号： C25D5/18 , C25D1/00 , C25D3/38 , C25D21/12 , C25D21/14 , G01N27/42 , H05K3/188 , H05K2203/163
摘要： The present invention relates in general to real-time analysis of electrochemical deposition (ECD) metal plating solutions, for the purpose of reducing plating defects and achieving high quality metal deposition. The present invention provides various new electrochemical analytical cell designs for reducing cross-contamination and increasing analytical signal strength. The present invention also provides improved plating protocols for increasing potential signal strength and reducing the time required for each measurement cycle. Further, the present invention provides new methods and algorithms for simultaneously determining concentrations of suppressor, accelerator, and leveler in a sample ECD solution within three experimental runs. A particularly preferred embodiment of the present invention provides a method for simultaneously determining concentrations of all three organic additives within a single experimental run by using a single analytical cell, while interactions between such additives are properly accounted for.
摘要翻译：本发明一般涉及电化学沉积（ECD）金属电镀溶液的实时分析，以减少电镀缺陷并实现高质量的金属沉积。本发明提供用于减少交叉污染和增加分析信号强度的各种新的电化学分析池设计。本发明还提供改进的电镀方案，用于增加潜在的信号强度并减少每个测量周期所需的时间。此外，本发明提供了用于在三个实验运行中同时测定样品ECD溶液中的抑制剂，促进剂和矫味剂的浓度的新方法和算法。本发明的一个特别优选的实施方案提供了一种通过使用单一分析电池同时测定单个实验运行中所有三种有机添加剂的浓度的方法，同时适当地考虑了这些添加剂之间的相互作用。

2. 发明申请

US20070274876A1 REACTOR DESIGN TO REDUCE PARTICLE DEPOSITION DURING PROCESS ABATEMENT 失效
标题翻译：反应器设计，以减少过程中的颗粒沉积
公开(公告)号：US20070274876A1
公开(公告)日：2007-11-29
申请号：US11838435
申请日：2007-08-14
申请人： Ho-Man Chiu , Daniel Clark , Shaun Crawford , Jay Jung , Leonard Todd , Robbert Vermeulen
发明人： Ho-Man Chiu , Daniel Clark , Shaun Crawford , Jay Jung , Leonard Todd , Robbert Vermeulen
IPC分类号： F01N3/26
CPC分类号： F23M5/085 , F23D2900/00016 , F23G7/065 , F23J9/00 , F23M2900/05002 , F23M2900/05004
摘要： The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.
摘要翻译：本发明涉及用于气态污染物的受控燃烧和分解的系统和方法，同时减少不需要的反应产物从处理系统内的沉积。该系统包括具有堆叠的网状陶瓷环的新型热反应室设计，通过该陶瓷环可以使流体（例如气体）被引导以沿着热反应室的内壁形成边界层，从而减少其上积累的颗粒物质。这些系统还包括从中心先导射流引入流体以改变热反应室内部的空气动力学。

3. 发明申请

US20050241948A1 Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions 有权
标题翻译：用于监测电化学沉积溶液中有机添加剂的方法和装置
公开(公告)号：US20050241948A1
公开(公告)日：2005-11-03
申请号：US10836546
申请日：2004-04-30
申请人： Jianwen Han , MacKenzie King , Weihua Wang , Glenn Tom , Jay Jung
发明人： Jianwen Han , MacKenzie King , Weihua Wang , Glenn Tom , Jay Jung
IPC分类号： C25D3/38 , C25D5/18 , C25D21/12 , C25D21/14 , G01N27/26 , G01N27/42
CPC分类号： C25D5/18 , C25D1/00 , C25D3/38 , C25D21/12 , C25D21/14 , G01N27/42 , H05K3/188 , H05K2203/163
摘要： The present invention relates in general to real-time analysis of electrochemical deposition (ECD) metal plating solutions, for the purpose of reducing plating defects and achieving high quality metal deposition. The present invention provides various new electrochemical analytical cell designs for reducing cross-contamination and increasing analytical signal strength. The present invention also provides improved plating protocols for increasing potential signal strength and reducing the time required for each measurement cycle. Further, the present invention provides new methods and algorithms for simultaneously determining concentrations of suppressor, accelerator, and leveler in a sample ECD solution within three experimental runs. A particularly preferred embodiment of the present invention provides a method for simultaneously determining concentrations of all three organic additives within a single experimental run by using a single analytical cell, while interactions between such additives are properly accounted for.
摘要翻译：本发明一般涉及电化学沉积（ECD）金属电镀溶液的实时分析，以减少电镀缺陷并实现高质量的金属沉积。本发明提供用于减少交叉污染和增加分析信号强度的各种新的电化学分析池设计。本发明还提供改进的电镀方案，用于增加潜在的信号强度并减少每个测量周期所需的时间。此外，本发明提供了用于在三个实验运行中同时测定样品ECD溶液中的抑制剂，促进剂和矫味剂的浓度的新方法和算法。本发明的一个特别优选的实施方案提供了一种通过使用单一分析电池同时测定单个实验运行中所有三种有机添加剂的浓度的方法，同时适当地考虑了这些添加剂之间的相互作用。

4. 发明授权

US06613230B2 Method for simultaneous removal of arsenic and fluoride from aqueous solutions 失效
标题翻译：从水溶液中同时去除砷和氟化物的方法
公开(公告)号：US06613230B2
公开(公告)日：2003-09-02
申请号：US09894229
申请日：2001-06-27
申请人： Gerald A. Krulik , Paul H. Dick , Josh H. Golden , Jay Jung , Gennadiy Sverdlov
发明人： Gerald A. Krulik , Paul H. Dick , Josh H. Golden , Jay Jung , Gennadiy Sverdlov
IPC分类号： C02F154
CPC分类号： C02F1/56 , C02F1/001 , C02F1/5245 , C02F2101/103 , C02F2101/14 , C02F2101/36 , C02F2209/06 , Y02W10/37 , Y10S210/911 , Y10S210/915
摘要： A method of removing arsenic and fluoride from aqueous solutions in the same process is provided. Specifically, the pH of the aqueous solution is adjusted to a pH in the range of about 5 to 8. A combination of calcium salts, and ferric or aluminum salts are added to form insoluble arsenic and fluoride bearing solids. The solids are then removed from the aqueous solution.
摘要翻译：提供了一种在同一工艺中从水溶液中除砷和氟化物的方法。具体地说，将水溶液的pH调节至约5至8范围内的pH。加入钙盐和铁或铝盐的组合以形成不溶的含砷和氟化物的固体。然后从水溶液中除去固体。

5. 发明申请

US20100119420A1 ABATEMENT SYSTEM HAVING ENHANCED EFFLUENT SCRUB AND MOISTURE CONTROL 审中-公开
标题翻译：具有增强功能的淋浴和水分控制的消费系统
公开(公告)号：US20100119420A1
公开(公告)日：2010-05-13
申请号：US12613181
申请日：2009-11-05
申请人： PHIL CHANDLER , DANIEL O. CLARK , FRANK HOOSHDARAN , DAN S. BROWN , BARRY PAGE , ALLEN FOX , GEORGE L. DANSEN, III , JAY JUNG
发明人： PHIL CHANDLER , DANIEL O. CLARK , FRANK HOOSHDARAN , DAN S. BROWN , BARRY PAGE , ALLEN FOX , GEORGE L. DANSEN, III , JAY JUNG
IPC分类号： B01D53/82 , B01J19/00
CPC分类号： B01D53/18 , B01D47/06 , B01D47/14 , B01D53/005 , B01D2257/2066 , B01D2257/702 , B01D2258/0216 , C23C16/4412
摘要： Apparatus for improved treatment of effluents are provided herein. In some embodiments, an abatement system may include an exhaust conduit to flow an effluent stream therethrough; a plurality of packed beds disposed in the exhaust conduit to remove non-exhaustible effluents from the effluent stream; one or more spray jets to provide an effluent treating agent between adjacent packed beds, the effluent treating agent to remove non-exhaustible effluents from the effluent stream; and a dripper disposed in the exhaust conduit above an uppermost packed bed to provide the effluent treating agent in large droplets to wet and rinse particulate from an upper surface of the uppermost packed bed substantially without forming fine droplets.
摘要翻译：本文提供了改善污水处理的设备。在一些实施例中，减排系统可以包括用于使流出物流流过其中的排气管道; 布置在所述排气管道中以从所述流出物流除去不可排出的流出物的多个填充床; 一个或多个喷射喷嘴以在相邻的填充床之间提供流出物处理剂，所述流出物处理剂从流出物流中除去不可排出的流出物; 以及设置在最上层填充床上方的排气管道中的滴水器，以提供大液滴的流出物处理剂，从而基本上不形成微小的液滴，从最上层的填充床的上表面润湿和漂洗颗粒。

6. 发明申请

US20060104879A1 Reactor design to reduce particle deposition during process abatement 失效
标题翻译：反应器设计，以减少过程减少过程中的颗粒沉积
公开(公告)号：US20060104879A1
公开(公告)日：2006-05-18
申请号：US10987921
申请日：2004-11-12
申请人： Ho-Man Chiu , Daniel Clark , Shaun Crawford , Jay Jung , Leonard Todd , Robbert Vermeulen
发明人： Ho-Man Chiu , Daniel Clark , Shaun Crawford , Jay Jung , Leonard Todd , Robbert Vermeulen
IPC分类号： B01D53/72
CPC分类号： F23M5/085 , F23D2900/00016 , F23G7/065 , F23J9/00 , F23M2900/05002 , F23M2900/05004
摘要： The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.
摘要翻译：本发明涉及用于气态污染物的受控燃烧和分解的系统和方法，同时减少不需要的反应产物从处理系统内的沉积。该系统包括具有堆叠的网状陶瓷环的新型热反应室设计，通过该陶瓷环可以使流体（例如气体）被引导以沿着热反应室的内壁形成边界层，从而减少其上积累的颗粒物质。这些系统还包括从中心先导射流引入流体以改变热反应室内部的空气动力学。

7. 发明申请

US20060104878A1 Safety, monitoring and control features for thermal abatement reactor 失效
标题翻译：热消除反应堆的安全，监控和控制功能
公开(公告)号：US20060104878A1
公开(公告)日：2006-05-18
申请号：US10991740
申请日：2004-11-18
申请人： Ho-Man Chiu , Daniel Clark , Shaun Crawford , Jay Jung , Youssef Loldj , Robbert Vermeulen
发明人： Ho-Man Chiu , Daniel Clark , Shaun Crawford , Jay Jung , Youssef Loldj , Robbert Vermeulen
IPC分类号： G05D23/00 , F01N3/10 , B01D53/70
CPC分类号： F23G5/50 , B01D2258/0216 , F23G7/065 , F23K5/005 , F23N5/08 , F23N5/242 , F23N2027/02 , F23N2027/04 , F23N2029/02 , F23N2031/08 , F23N2031/18 , Y02C20/30 , Y02T50/677
摘要： The present invention relates to a thermal reactor apparatus used to treat industrial effluent fluids, for example waste effluent produced in semiconductor and liquid crystal display manufacturing processes. Specifically, the present invention relates to improved monitoring and control features for the thermal reactor apparatus, including a flame sensing device, an intrinsically safe flammable gas sensing device, and a sequential mode of operation having built-in safety redundancy. The improved monitoring and control features ensure the safe and efficient abatement of waste effluent within the thermal reactor apparatus.
摘要翻译：本发明涉及一种用于处理工业废水的热反应器装置，例如在半导体和液晶显示器制造工艺中产生的废液。具体地，本发明涉及用于热反应器装置的改进的监测和控制特征，包括火焰感测装置，本质安全的可燃气体感测装置和具有内置安全冗余的顺序操作模式。改进的监测和控制特征确保在热反应器装置内安全有效地减少废物流出物。

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