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1. 发明授权

US08427630B2 Semiconductor manufacturing apparatus 有权
标题翻译：半导体制造装置
公开(公告)号：US08427630B2
公开(公告)日：2013-04-23
申请号：US12805735
申请日：2010-08-17
申请人： George Barbastathis , Jose Antonio Dominguez-Caballero , Sung Jin Lee , Satoshi Takahashi
发明人： George Barbastathis , Jose Antonio Dominguez-Caballero , Sung Jin Lee , Satoshi Takahashi
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03F7/70291 , G03F7/70316 , G03F7/70533
摘要： Disclosed herein is a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus precisely adjusts the position and size of a light spot formed on a substrate, enabling formation of a target pattern or elimination of an unnecessary pattern in an accurate and rapid manner. The semiconductor manufacturing apparatus includes a light source, a light modulator to modulate light irradiated from the light source into a plurality of beams to correspond to a target pattern, a diffraction element to adjust a direction of each of the plurality of beams, and an optics system to allow the plurality of beams, the direction of which has been controlled by the diffraction element, to form a light spot having a target size.
摘要翻译：这里公开了一种半导体制造装置。半导体制造装置精确地调整形成在基板上的光点的位置和尺寸，能够以准确且快速的方式形成目标图案或消除不必要的图案。半导体制造装置包括光源，光调制器，用于将从光源照射的光调制成对应于目标图案的多个光束，用于调整多个光束中的每一个的方向的衍射元件，以及光学器件系统允许其方向已被衍射元件控制的多个光束形成具有目标尺寸的光点。

2. 发明申请

US20110042588A1 Semiconductor manufacturing apparatus 有权
标题翻译：半导体制造装置
公开(公告)号：US20110042588A1
公开(公告)日：2011-02-24
申请号：US12805735
申请日：2010-08-17
申请人： George Barbastathis , Jose Antonio Dominguez-Caballero , Sung Jin Lee , Satoshi Takahashi
发明人： George Barbastathis , Jose Antonio Dominguez-Caballero , Sung Jin Lee , Satoshi Takahashi
IPC分类号： H01L21/02
CPC分类号： G03F7/70291 , G03F7/70316 , G03F7/70533
摘要： Disclosed herein is a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus precisely adjusts the position and size of a light spot formed on a substrate, enabling formation of a target pattern or elimination of an unnecessary pattern in an accurate and rapid manner. The semiconductor manufacturing apparatus includes a light source, a light modulator to modulate light irradiated from the light source into a plurality of beams to correspond to a target pattern, a diffraction element to adjust a direction of each of the plurality of beams, and an optics system to allow the plurality of beams, the direction of which has been controlled by the diffraction element, to form a light spot having a target size.
摘要翻译：这里公开了一种半导体制造装置。半导体制造装置精确地调整形成在基板上的光点的位置和尺寸，能够以准确且快速的方式形成目标图案或消除不必要的图案。半导体制造装置包括光源，光调制器，用于将从光源照射的光调制成对应于目标图案的多个光束，用于调整多个光束中的每一个的方向的衍射元件，以及光学器件系统允许其方向已被衍射元件控制的多个光束形成具有目标尺寸的光点。

3. 发明授权

US09256202B2 System, method and apparatus for phase-coded multi-plane microscopy 有权
标题翻译：用于相位编码多平面显微镜的系统，方法和装置
公开(公告)号：US09256202B2
公开(公告)日：2016-02-09
申请号：US13476768
申请日：2012-05-21
申请人： George Barbastathis , Yuan Luo
发明人： George Barbastathis , Yuan Luo
IPC分类号： G03H1/10 , G03H1/12 , G02B5/32 , G03H1/00 , G03H1/02 , G03H1/22 , G03H1/28 , G03H1/26
CPC分类号： G03H1/0005 , G02B5/32 , G03H1/0248 , G03H1/2286 , G03H1/28 , G03H2001/2675
摘要： A volume holographic imaging system enables the projection of a two-dimensional (2D) slice of a four-dimensional (4D) object. The 4D source object is illuminated to emit or scatter an optical field. A holographic element having one or more recorded holograms receives and diffracts the optical field into a diffracted plane beam. A phase mask is encoded in one or more multiplexed holographic gratings of the holographic element using a spatial filter. A collector lens focuses the diffracted plane beam to a 2D slice of the 4D probing source object. The focused 2D slice is projected onto a 2D imaging plane. The holographic element may have multiple multiplexed holograms that are arranged to diffract light from a corresponding slice of the 4D probing source object to a non-overlapping region of the detector.
摘要翻译：体积全息成像系统能够投影四维（4D）物体的二维（2D）切片。 4D源对象被照亮以发射或散射光场。具有一个或多个记录的全息图的全息元件接收衍射光学衍射到衍射平面光束。使用空间滤波器将相位掩模编码在全息元件的一个或多个复用全息光栅中。收集透镜将衍射平面光束聚焦到4D探测源对象的2D切片。聚焦的2D切片投影到2D成像平面上。全息元件可以具有多个复用全息图，其被布置成将来自4D探测源对象的相应切片的光衍射到检测器的非重叠区域。

4. 发明申请

US20130025322A1 PROCESS FOR MAKING NANOCONE STRUCTURES AND USING THE STRUCTURES TO MANUFACTURE NANOSTRUCTURED GLASS 有权
标题翻译：制造纳米结构和使用结构制造纳米结构玻璃的工艺
公开(公告)号：US20130025322A1
公开(公告)日：2013-01-31
申请号：US13446053
申请日：2012-04-13
申请人： Hyungryul Choi , Chih-Hao Chang , Kyoo Chul Park , Gareth H. McKinley , George Barbastathis , Jeong-gil Kim
发明人： Hyungryul Choi , Chih-Hao Chang , Kyoo Chul Park , Gareth H. McKinley , George Barbastathis , Jeong-gil Kim
IPC分类号： C03C15/00 , C03B13/16 , C03B13/08
CPC分类号： B81C1/00111 , B81C1/00103 , B81C2201/0132
摘要： Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.
摘要翻译：制作方法。至少第一和第二硬掩模沉积在衬底上，第一和第二硬掩模的厚度和材料被选择为提供相对于衬底的蚀刻选择性。在第一硬掩模上形成光刻胶的纳米尺度图案，并且硬掩模被蚀刻穿过以在第二硬掩模上产生纳米尺度图案。蚀刻第二个硬掩模，以在衬底中产生所需的锥形纳米结构。反应离子蚀刻是优选的。还公开了使用辊压印模块的玻璃制造工艺。

5. 发明授权

US07486163B2 Low-voltage micro-switch actuation technique 有权
标题翻译：低压微动开关技术
公开(公告)号：US07486163B2
公开(公告)日：2009-02-03
申请号：US10979350
申请日：2004-11-02
申请人： Gregory N. Nielson , George Barbastathis
发明人： Gregory N. Nielson , George Barbastathis
IPC分类号： H01H51/22
CPC分类号： H01H59/0009 , H01H47/00 , H01H2059/0054
摘要： An electro-mechanical switch structure includes at least one fixed electrode and a free electrode which is movable in the structure with a voltage potential applied between each fixed electrode and the free, movable electrode. The voltage potentials applied between each fixed electrode and the movable electrode are modulated to actuate the electro-mechanical switch structure.
摘要翻译：机电开关结构包括至少一个固定电极和自由电极，其可在结构中移动，其中施加有电压电位在每个固定电极和自由的可动电极之间。施加在每个固定电极和可动电极之间的电压被调制以致动机电开关结构。

6. 发明授权

US07477812B2 System and method for providing fast, low voltage integrated optical elements 有权
标题翻译：用于提供快速，低电压集成光学元件的系统和方法
公开(公告)号：US07477812B2
公开(公告)日：2009-01-13
申请号：US11110511
申请日：2005-04-20
申请人： Gregory N. Nielson , George Barbastathis
发明人： Gregory N. Nielson , George Barbastathis
IPC分类号： G02B6/26
CPC分类号： G02B6/3508 , G02B6/12007 , G02B6/2773 , G02B6/28 , G02B6/3504 , G02B6/3536 , G02B6/356 , G02B6/357 , G02B6/3584 , G02B6/3594 , G02B6/3596
摘要： A switching system is disclosed for an optical signal. The switching system includes a first optical waveguide coupled to a first electrode, a second electrode, and a second optical waveguide. The second optical waveguide is coupled to a movable electrode. The movable electrode is supported by a support structure and is positioned with respect to the first and second electrodes so that the position of the movable electrode may be selectively placed in either a first closed state or a second open state defined by the first and second electrodes under application of a voltage with respect to one of the first and second electrodes. The first closed state provides that the first and second optical waveguides are sufficiently close to each other to provide optical coupling therebetween while the second open state provides that the first and second optical communication channels are not sufficiently close to each other to provide optical coupling therebetween, or provide some different amount of optical coupling than in the first closed state.
摘要翻译：公开了一种用于光信号的交换系统。开关系统包括耦合到第一电极，第二电极和第二光波导的第一光波导。第二光波导耦合到可动电极。可移动电极由支撑结构支撑并且相对于第一和第二电极定位，使得可动电极的位置可以选择性地放置在由第一和第二电极限定的第一闭合状态或第二开放状态在相对于所述第一和第二电极之一施加电压的情况下。第一闭合状态规定，第一和第二光波导彼此充分接近以在其间提供光耦合，而第二开放状态规定第一和第二光通信通道彼此之间不足够靠近以提供光耦合，或提供与第一关闭状态相比不同量的光耦合。

7. 发明授权

US07250837B2 Electro-mechanical micro-switch device 有权
标题翻译：机电微动开关装置
公开(公告)号：US07250837B2
公开(公告)日：2007-07-31
申请号：US10979706
申请日：2004-11-02
申请人： Gregory N. Nielson , George Barbastathis
发明人： Gregory N. Nielson , George Barbastathis
IPC分类号： H01H51/22
CPC分类号： H01H59/0009 , H01H2001/0042 , H01H2057/006 , H01H2059/0036 , H01H2059/0063
摘要： The electro-mechanical micro-switch device includes first and second fixed electrodes. A movable electrode is positioned with respect to the first and second fixed electrodes so that the position of the movable electrode can be selectively placed in one of two opposing states defined by the fixed electrodes. The stored elastic potential energy of the movable electrode and its flexible supporting structure is used for switching between the two states. An electrostatic hold voltage is used to hold the movable electrode in the two switch states.
摘要翻译：机电微开关装置包括第一和第二固定电极。可移动电极相对于第一固定电极和第二固定电极定位，使得可动电极的位置可以选择性地放置在由固定电极限定的两个相对状态之一中。可动电极及其柔性支撑结构的储能弹性势能用于两种状态之间的切换。静电保持电压用于将可动电极保持在两个开关状态。

8. 发明申请

US20060186355A1 Phase-shift masked zone plate array lithography 审中-公开
标题翻译：相移屏蔽区板阵列光刻
公开(公告)号：US20060186355A1
公开(公告)日：2006-08-24
申请号：US11347138
申请日：2006-02-03
申请人： Henry Smith , George Barbastathis , Rajesh Menon
发明人： Henry Smith , George Barbastathis , Rajesh Menon
IPC分类号： G21K5/10
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70283 , G03F7/70316 , G03F7/70358
摘要： A lithography system includes a source of radiation energy and a zone plate array to focus the radiation energy to create an array of images in order to produce a permanent pattern on a substrate. A phase-shift mask is optically located between the source of radiation energy and the zone plate array. The modulated wavefront produced by the phase-shift mask alters the field diffracted by the zone plate array, and the center lobe of the point-spread function narrows as a result.
摘要翻译：光刻系统包括辐射能量源和区板阵列，以聚焦辐射能量以产生图像阵列，以便在衬底上产生永久性图案。相移掩模光学地位于辐射能源和区板阵列之间。由相移掩模产生的调制波前改变由区域阵列衍射的场，结点是扩散函数的中心波瓣变窄。

9. 发明授权

US06433911B1 Frustrated total internal reflection-based micro-opto-electro-mechanical modulator/demodulator 失效
标题翻译：沮丧的全内反射微机电调制解调器
公开(公告)号：US06433911B1
公开(公告)日：2002-08-13
申请号：US09574267
申请日：2000-05-19
申请人： Dye-Zone A. Chen , George Barbastathis
发明人： Dye-Zone A. Chen , George Barbastathis
IPC分类号： G02B2608
CPC分类号： G02B6/3522 , G02B6/29307 , G02B6/2931 , G02B6/29311 , G02B6/29383 , G02B6/29395 , G02B6/3516 , G02B6/3548 , G02B6/356 , G02B6/4215 , G02B26/02
摘要： A micro-opto-electro-mechanical systems (MOEMS) modulator based on the phenomenon of frustrated total internal reflection (FTIR). The modulator effects amplitude and phase modulation at the boundary of a waveguide. Wavelength-specific switching is achieved by spatially separating the wavelength channels by dispersing a broadband input signal into its wavelength components through a grating. In exemplary embodiments, an array of micro-fabricated actuators is used to switch or modulate wavelengths individually. Applications include wavelength and space-resolved phase and amplitude modulation of optical beams, and re-configurable add/drop switching of dense wavelength-division multiplexed (DWDM) optical communication signals.
摘要翻译：基于沮丧全内反射（FTIR）现象的微光机电系统（MOEMS）调制器。调制器在波导的边界处实现幅度和相位调制。通过通过光栅将宽带输入信号分散到其波长分量中，通过空间分离波长信道来实现波长特定的切换。在示例性实施例中，微制造致动器的阵列用于单独地切换或调制波长。应用包括光束的波长和空间分辨相位和幅度调制，以及密集波分复用（DWDM）光通信信号的可重新配置的分插交换。

10. 发明授权

US5671073A Holographic storage using shift multiplexing 失效
标题翻译：全息存储使用移位复用
公开(公告)号：US5671073A
公开(公告)日：1997-09-23
申请号：US389890
申请日：1995-02-15
申请人： Demetri Psaltis , Michael J. Levene , Allen Pu , George Barbastathis
发明人： Demetri Psaltis , Michael J. Levene , Allen Pu , George Barbastathis
IPC分类号： G03H1/26 , G11B7/0065 , G03H1/12 , G11B7/00 , G11C13/04
CPC分类号： G03H1/26 , G11B7/0065 , G03H2001/2675
摘要： The invention is embodied in a method of recording successive holograms in a recording medium, using at least a fan of M waves along at least a first axis with a separation angle between adjacent waves and directing the fan of M waves as a reference beam along a reference beam path onto the recording medium, successively modulating a wave with a succession of images to produce a succession of signal beams along a signal beam path lying at a propagation angle relative to the reference beam path so that the signal and reference beams intersect at a beam intersection lying within the medium, the beam intersection having a size corresponding to beam areas of the reference and signal beams, producing a succession of relative displacements in a direction parallel to the first axis between the recording medium and the beam intersection of the signal and reference beam paths in synchronism with the succession of signal beams, each of the displacements being less than the size of the intersection whereby to record successive holograms partially overlapped along a direction of the displacements.
摘要翻译：本发明体现在一种在记录介质中记录连续的全息图的方法，至少使用沿着至少第一轴的M波的风扇，并在相邻的波之间具有分隔角，并将M波的风扇作为参考光束沿着参考光束路径到记录介质上，连续地调制具有一系列图像的波，以沿着相对于参考光束路径传播角度的信号光束路径产生一系列信号光束，使得信号和参考光束在光束交叉处具有对应于参考和信号光束的光束区域的大小的光束交叉，在平行于第一轴的方向上产生一系列相对位移，该相对位移在记录介质与信号和参考光束路径与信号光束的连续同步，每个位移小于相交的大小从而记录连续的全息图沿着位移的方向部分重叠。

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