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1. 发明授权

US5401608A Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith 失效
标题翻译：负面工作的辐射敏感性混合物和由此产生的辐射敏感记录材料
公开(公告)号：US5401608A
公开(公告)日：1995-03-28
申请号：US917364
申请日：1992-07-23
申请人： Georg Pawlowski , Ralph Dammel , Horst Roeschert , Winfried Meier , Walter Spiess , Klaus-Juergen Przybilla
发明人： Georg Pawlowski , Ralph Dammel , Horst Roeschert , Winfried Meier , Walter Spiess , Klaus-Juergen Przybilla
IPC分类号： G03F7/00 , C04B41/50 , G03F7/029 , G03F7/038 , H01L21/027 , G03C1/492
CPC分类号： C04B41/5035 , G03F7/0295 , Y10S430/124
摘要： A negative-working radiation-sensitive mixture containinga) a compound which contains at least one --CBr.sub.3 group bound to an atom not linked in turn to a hydrogen atom,b) an alkoxymethylated melamine andc) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions and contains phenolic OH groups,wherein(1) the mixture has an absorption of
摘要翻译：一种负性辐射敏感性混合物，其包含a）包含至少一个结合于未连接到氢原子上的原子的-CBr 3基团的化合物，b）烷氧基甲基化三聚氰胺和c）水不溶性聚合物粘合剂，其是可溶或至少可溶胀的碱性溶液，并且含有酚OH基团，其中（1）该混合物在248nm具有<0.4μm-1的吸收，（2）化合物a）的CBr 3基团被结合相对于组分b）和c）的总量，化合物a）以0.2至10重量％的量混合在混合物中，（3）质量比的组分b）和c）在50:50和5:95之间，和（4）组分c）是羟基苯乙烯或其衍生物的均聚物或共聚物，所述均聚物或共聚物的去除速率为200-3000nm 在含有2.38重量％四甲基氢氧化铵的含水碱性显影剂中，在21℃下进行优异的性能，包括对等离子体蚀刻的高抗性，以及出色的光刻性能，并且在记录材料中是有用的。

2. 发明授权

US5424166A Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom 失效
标题翻译：含有重氮甲烷酸发生器和辐射敏感记录材料的负性辐射敏感混合物
公开(公告)号：US5424166A
公开(公告)日：1995-06-13
申请号：US194307
申请日：1994-02-04
申请人： Georg Pawlowski , Ralph Dammel , Horst Roeschert , Walter Spiess , Winfried Meier
发明人： Georg Pawlowski , Ralph Dammel , Horst Roeschert , Walter Spiess , Winfried Meier
IPC分类号： G03F7/004 , C07D233/84 , G03F7/016 , G03F7/038 , H01L21/027 , G03F7/021
CPC分类号： G03F7/0163 , G03F7/038
摘要： A negative-working radiation-sensitive mixture which comprisesa) a compound, which forms a strong acid on irradiation, of the general formula ##STR1## in which R.sup.1 is a radical R.sup.2 --SO.sub.2 -- or R.sup.3 --C(O)-- andR.sup.2 and R.sup.3 independently of one another are an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical,b) a compound containing at least two reactive groups which can be crosslinked by an acid andc) a water-insoluble binder which is soluble or at least swellable in aqueous-alkaline solutions, is described.The radiation-sensitive mixture according to the invention is distinguished by a high sensitivity over a wide spectral range. It likewise exhibits a high heat stability and forms no corrosive photolysis products on exposure to light.
摘要翻译：一种负性辐射敏感性混合物，其包含a）在辐射下形成强酸的化合物，其中R 1是基团R 2 -SO 2 - 或R 3 -C（O） - ，并且 R 2和R 3彼此独立地是任选取代的烷基，环烷基，芳基或杂芳基，b）含有至少两个可被酸交联的反应性基团的化合物，和c）可溶于或在描述了在碱性水溶液中的最小溶胀性。根据本发明的辐射敏感混合物在宽光谱范围内被高灵敏度区分。它同样表现出高热稳定性，并且在曝光时不形成腐蚀性光解产物。

3. 发明授权

US5286602A Acid-cleavable compounds, positive-working radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture 失效
标题翻译：可酸分解的化合物，含有这些化合物的正性辐射敏感性混合物和用该混合物生产的辐射敏感记录材料
公开(公告)号：US5286602A
公开(公告)日：1994-02-15
申请号：US871009
申请日：1992-04-20
申请人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Ralph Dammel
发明人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Ralph Dammel
IPC分类号： C09K11/00 , C07C235/08 , C07C271/16 , C07C275/04 , C07C275/24 , C07C275/28 , C07C323/10 , C07D317/54 , C08G69/00 , C08G71/00 , G01D15/14 , G03F7/004 , G03F7/039 , C08G12/12
CPC分类号： G03F7/039 , C07C271/16 , C07C275/24 , C07D317/54 , C08G69/00 , C08G71/00 , G03F7/0045 , Y10S430/106
摘要： Compounds having repeating units of the formula I ##STR1## in which R.sup.1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH.sub.2 groups may be replaced by oxygen or sulfur atoms,R.sup.2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical,R.sup.3 is an alkyl or aryl radical,X is --CO--, --O--CO-- or --NH--CO--, andn is an integer greater than 1, especially from 3 to 50.are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.
摘要翻译：式Ⅰ的化合物其中R 1是亚烷基，亚环烷基亚烷基，亚烯基，亚炔基或亚芳基双烷基，其中一个或多个脂族基团可被氧或硫原子代替，R 2 是烷基，烯基，炔基，环烷基，烷氧基烷基，芳基，芳烷基或芳氧基烷基，R 3是烷基或芳基，X是-CO-，-OCO-或-NHCO-之一，和 n是大于1，特别是3至50的整数，是可酸切割的，并且与光解酸供体和碱溶性粘合剂组合是正性混合物的组分，特别是用于记录材料用于紫外线辐射和高能辐射。材料的高分辨率与高图像对比度区分开来。

4. 发明授权

US5346806A Acid-cleavable radiation-sensitive compounds, radiation-sensitive mixture containing these compounds, and radiation-sensitive recording material produced with this mixture 失效
标题翻译：可酸裂解的辐射敏感化合物，含有这些化合物的辐射敏感性混合物，以及用该混合物生产的辐射敏感记录材料
公开(公告)号：US5346806A
公开(公告)日：1994-09-13
申请号：US871011
申请日：1992-04-20
申请人： Georg Pawlowski , Ralph Dammel , Horst Roeschert , Walter Spiess , Charlotte Eckes
发明人： Georg Pawlowski , Ralph Dammel , Horst Roeschert , Walter Spiess , Charlotte Eckes
IPC分类号： C09K9/02 , C07C309/65 , C07C309/66 , C07C309/73 , C07C309/74 , C07C309/75 , C07C309/77 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/73 , G03C1/725 , G03F7/025 , G03F7/027
CPC分类号： C07C309/65 , C07C309/66 , C07C309/73 , C07C309/74 , C07C309/75 , C07C309/77 , G03F7/039 , C07C2101/14 , C07C2102/28 , C07C2102/44 , C07C2103/68 , Y10S430/115 , Y10S430/12 , Y10S430/126
摘要： Ligomeric sulfonic acid derivatives having repeating units of the formula I ##STR1## in which R.sup.1 is an alkyl, haloalkyl or aryl radical,R.sup.2 is a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R.sup.1 --SO.sub.2 --O--).sub.n X--,R.sup.3 is a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl, heteroarylenedialkyl group, alkylene, alkenylene, alkynylene, cycloalkylene or arylene group,X is an alkylene, cycloalkylene or arylene group Y is O, S, CO, CO--O, SO.sub.2, SO.sub.2 --O, NR.sup.4, CO--NH, O--CO--NR.sup.5, NH--CO--NR.sup.5 or NR.sup.5 --CO--O,Z is O, CO--NR.sup.6, O--CO--NR.sup.6 or NH--CO--NR.sup.6,R.sup.4 is an acyl radical,R.sup.5 is a hydrogen atom or an alkyl-, cycloalkyl, alkenyl, alkynyl or aryl radical,R.sup.6 is an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical,k is 0, 1, 2, 3 or 4,m is an integer greater than 1 andn is 1, 2 or 3,generate sulfonic acids under irradiation and are cleavable by the latter. In combination with alkali-soluble binders, they give positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The recording materials are distinguished by a high resolution in conjunction with high image contrast and excellent storage stability.
摘要翻译：具有式I（I）的重复单元的二元磺酸衍生物，其中R 1是烷基，卤代烷基或芳基，R 2是氢原子，烷基，烯基或芳基或基团（R 1 -SO 2 - 环烷基亚烷基，亚芳基亚烷基，亚炔基，亚环烷基或亚芳基，X是亚烷基，亚环烷基或亚芳基，Y是O，S，CO，CO-O， SO2，SO2-O，NR4，CO-NH，O-CO-NR5，NH-CO-NR5或NR5-CO-O，Z是O，CO-NR6，O-CO-NR6或NH-CO-NR6， R4是酰基，R5是氢原子或烷基 - ，环烷基，烯基，炔基或芳基，R6是烷基，环烷基，烯基，炔基或芳基，k是0,1,2,3或4 ，m是大于1且n为1,2或3的整数，在照射下产生磺酸并可被后者切割。与碱溶性粘合剂组合使用时，它们可以提供特别用于UV辐射和高能辐射记录材料的正性混合物。记录材料通过高分辨率和高图像对比度以及优异的存储稳定性来区分。

5. 发明授权

US6063545A Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture 失效
标题翻译：负面工作的辐射敏感混合物和用该混合物生产的辐射敏感记录材料
公开(公告)号：US6063545A
公开(公告)日：2000-05-16
申请号：US871032
申请日：1992-04-20
申请人： Horst Roeschert , Juergen Fuchs , Walter Spiess , Charlotte Eckes , Georg Pawlowski , Ralph Dammel
发明人： Horst Roeschert , Juergen Fuchs , Walter Spiess , Charlotte Eckes , Georg Pawlowski , Ralph Dammel
IPC分类号： G03F7/00 , C07C303/28 , C07C309/65 , C07C309/66 , C07C309/73 , G03F7/004 , G03F7/028 , G03F7/038 , H01L21/027 , G03C1/73
CPC分类号： G03F7/038 , C07C303/28 , Y10S430/122
摘要： A negative-working radiation-sensitive mixture containinga) a compound which generates a strong acid under the action of actinic radiation,b) a compound having at least two groups crosslinkable by means of acid andc) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions,wherein the compound (a) comprises a di-, tri- or tetra-hydroxybenzene which may be further substituted, or a polymer containing a di-, tri-, or tetra- hydroxy phenyl radical, is esterified with respectively 2, 3 or 4 sulfonic acids of the formula R--SO.sub.3 H, and is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material produced with this mixture is suitable for the production of photoresists, electronic components, printing plates or for chemical milling.
摘要翻译：一种负性辐射敏感性混合物，其包含a）在光化辐射的作用下产生强酸的化合物，b）具有至少两个可通过酸交联的基团的化合物，和c）不溶于水的聚合物粘合剂并且在碱性水溶液中可溶或至少可溶胀，其中化合物（a）包含可被进一步取代的二 - ，三 - 或四 - 羟基苯，或含有二 - ，三 - 或四 - 羟基苯基分别用式R-SO 3 H的2,3或4个磺酸酯化，并且在宽光谱范围内被高分辨率和高灵敏度区分。它还显示出高的热稳定性，并且在暴露时不会形成任何腐蚀性光解产物。用该混合物生产的辐射敏感记录材料适用于制备光致抗蚀剂，电子部件，印版或用于化学研磨。

6. 发明授权

US5256517A Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units 失效
标题翻译：用于暴露于UV辐射的正性辐射敏感混合物和记录材料，其含有具有α-重氮基 - β-酮酯单元和磺酸酯单元的多官能化合物
公开(公告)号：US5256517A
公开(公告)日：1993-10-26
申请号：US694353
申请日：1991-05-01
申请人： Horst Roeschert , Georg Pawlowski , Hans-Joachim Merrem , Ralph Dammel , Walter Spiess
发明人： Horst Roeschert , Georg Pawlowski , Hans-Joachim Merrem , Ralph Dammel , Walter Spiess
IPC分类号： G03F7/016 , G03F7/039 , H01L21/027 , G03F7/022 , G03F7/023
CPC分类号： G03F7/0163
摘要： A positive-working radiation-sensitive mixture is described which essentially contains a photoactive component and a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solution, wherein a compound is used, as photoactive component, which contains .alpha.-diazo-.beta.-keto ester units and sulfonate units of the formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, are an unsubstituted or substituted aliphatic, cycloaliphatic, araliphatic or aromatic radical having 4 to 20 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by N or NH groups and/or contain keto groups,X is an unsubstituted or substituted aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by the groups --NR.sup.3 --, --C(O)--0--, --C(O)--NR.sup.3 --, ##STR2## --NR.sup.3 --C(O)--NR.sup.4 --, --O--C(O)--NR.sup.3 --, ##STR3## or --O--C(O)--O--, or CH groups to be replaced by ##STR4## in which R.sup.3 and R.sup.4, independently of one another, are hydrogen or an unsubstituted or substituted aliphatic, carbocyclic or araliphatic radical,m is an integer from 3 to 8,n is an integer from 1 to 3, and m>n.The radiation-sensitive mixture is especially suitable for exposure to radiation having a wavelength of about 190 to 300 nm.
摘要翻译：描述了一种正性辐射敏感性混合物，其基本上含有光活性组分和在碱性水溶液中可溶或至少可溶胀的水不溶性粘合剂，其中使用化合物作为光敏组分，其含有α- 其中R 1和R 2彼此独立地是具有4至20个碳原子的未取代或取代的脂族，脂环族，芳脂族或芳族基团的重氮基 - β-酮酯单元和磺酸酯单元各个CH 2基团可以被氧或硫原子或N或NH基团和/或含有酮基取代，X是未取代或取代的具有2至22个碳原子的脂族，脂环族，碳环，杂环或芳脂族基团各个CH 2基团可以被氧或硫原子或基团-NR 3 - ， - C（O）-O-，-C（O）-NR 3 - ， - NR 3 -C （O）-NR 4 - ， - OC（O）-NR 3 - ， - 或 - OC （O）-O-或CH基团，其中R 3和R 4彼此独立地为氢或未取代或取代的脂族，碳环或芳脂族基团，m为3至8的整数，n为1〜3的整数，m> n。辐射敏感混合物特别适用于暴露于波长为约190至300nm的辐射。

7. 发明授权

US5346804A Acid-cleavable radiation-sensitive compounds, positive working radiation-sensitive mixture containing theses compounds, and radiation-sensitive recording material produced with this mixture 失效
标题翻译：可酸裂解的辐射敏感化合物，含有这些化合物的正性工作辐射敏感性混合物和用该混合物生产的辐射敏感记录材料
公开(公告)号：US5346804A
公开(公告)日：1994-09-13
申请号：US871008
申请日：1992-04-20
申请人： Geog Pawlowski , Ralph Dammel , Horst Roeschert , Walter Spiess , Charlotte Eckes
发明人： Geog Pawlowski , Ralph Dammel , Horst Roeschert , Walter Spiess , Charlotte Eckes
IPC分类号： C07D207/408 , C07C309/65 , C07C309/66 , C07C309/73 , C07C309/74 , C07C309/75 , C07C309/77 , C07D207/40 , C07D207/404 , C07D207/44 , C07D207/452 , C07D317/24 , C09K9/02 , G03F7/004 , G03C1/73 , G03C1/725 , G03F7/025 , G03F7/027
CPC分类号： C07D207/404 , C07C309/65 , C07C309/66 , C07C309/73 , C07C309/74 , C07C309/75 , C07C309/77 , C07D207/452 , C07D317/24 , G03F7/0045 , C07C2101/14 , C07C2102/28 , Y10S430/115 , Y10S430/12 , Y10S430/126
摘要： A radiation-sensitive mixture which contains compounds of the formula I which generate under irradiation sulfonic acids and are cleavable by the latter ##STR1## in which R.sup.1 is an unsubstituted or substituted alkyl, fluorinated alkyl, perfluoroalkyl or aryl radical,R.sup.2 is a hydrogen atom, an unsubstituted or substituted alkyl radical, or an unsubstituted or substituted aryl radical, (R.sup.1 --SO.sub.2 --O--).sub.n X--, or R.sub.3 O--,R.sup.3 and R.sup.4 are identical or different and are unsubstituted or substituted alkyl, cycloalkylalkyl, cycloalkenylalkyl or aralkyl radicals, in which 1 to 3 aliphatic CH.sub.2 or CH groups are optionally replaced by one or more of NR.sup.5, O, S, CO, CO--O, CO--NH, O--CO--NH, CO--NH--CO, NH--CO--NH, SO.sub.2, SO.sub.2 --O or SO.sub.2 --NH, or unsubstituted or substituted alkenyl, alkynyl, cycloalkyl or cycloalkenyl radicals, or R.sup.3 and R.sup.4 are mutually linked to form an unsubstituted or substituted heterocyclic ring,R.sup.5 is an acyl radical,n is an integer from 1 to 3, andX is an alkylene, cyloalkylene, or arylene group.and which, in combination with alkali-soluble binders, give positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast and excellent storage stability.
摘要翻译：一种辐射敏感性混合物，其包含式Ⅰ化合物，其在照射磺酸时产生并且可被后者可裂解（Ⅰ），其中R1是未取代或取代的烷基，氟化烷基，全氟烷基或芳基，R2是氢原子，未取代或取代的烷基或未取代或取代的芳基，（R1-SO2-O-）nX-或R3O-，R3和R4相同或不同，为未取代或取代的烷基，环烷基烷基，其中1至3个脂族CH 2或CH基团任选被NR 5，O，S，CO，CO-O，CO-NH，O-CO-NH，CO-NH-CO中的一种或多种替代的环烯基烷基或芳烷基，NH-CO-NH，SO2，SO2-O或SO2-NH，或未取代或取代的烯基，炔基，环烷基或环烯基，或R3和R4相互连接形成未取代或取代的杂环，R5是酰基自由基，n为1〜3的整数，X为亚烷基，亚环烷基或亚芳基。并且与碱溶性粘合剂组合，得到特别用于记录UV辐射和高能辐射材料的正性混合物。该材料的高分辨率与高图像对比度以及优异的储存稳定性相结合。

8. 发明授权

US5442061A Radiation-sensitive sulfonic acid esters and their use 失效
标题翻译：辐射敏感磺酸酯及其用途
公开(公告)号：US5442061A
公开(公告)日：1995-08-15
申请号：US139017
申请日：1993-10-21
申请人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
发明人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
IPC分类号： G03F7/004 , C07D251/24 , C08L61/06 , C08L61/28 , C09D161/06 , G03F7/00 , G03F7/029 , G03F7/038 , H01L21/027
CPC分类号： G03F7/038 , C07D251/24 , C09D161/06 , C08L61/06 , C08L61/28 , Y10S430/111 , Y10S430/12 , Y10S430/123
摘要： Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2. The radiation-sensitive mixture according to the invention is remarkable for a high resolution and a high sensitivity over a wide spectral range and can be used to produce a radiation-sensitive recording material suitable for producing photoresists, electronic components, or printing plates, or for chemical milling.
摘要翻译：公开了2,4-双三氯甲基-6-（单 - 或二羟基苯基）-1,3,5-三嗪的磺酸酯。还公开了含有这种化合物与含有至少两个酸可交联基团的化合物的负性辐射敏感性混合物，以及在碱性水溶液中可溶或至少可溶胀的水不溶性聚合物粘合剂。酯是式R-SO 3 H或R'（-SO 3 H）2的磺酸或磺酸与2,4-二三氯甲基-6-（单或二羟苯基）-1,3,5-三嗪的酯（C 1 -C 10）烷基，（C 5 -C 10）环烷基，（C 6 -C 10）芳基，（C 6 -C 10）芳基 - （C 1 -C 10）烷基或（C 1 -C 10） C3-C9）杂芳基，R'是任选取代的（C 1 -C 10）亚烷基，（C 6 -C 10）亚芳基或（C 3 -C 9）亚杂芳基，n可以是1或2.根据本发明对于在宽光谱范围内的高分辨率和高灵敏度是显着的，并且可用于生产适用于生产光刻胶，电子部件或印刷版或用于化学研磨的辐射敏感记录材料。

9. 发明授权

US5498506A Positive-acting radiation-sensitive mixture and recording material produced therewith 失效
标题翻译：正向辐射敏感性混合物和由其制成的记录材料
公开(公告)号：US5498506A
公开(公告)日：1996-03-12
申请号：US362491
申请日：1995-01-09
申请人： Horst Wengenroth , Horst Roeschert , Walter Spiess , Gerhard Buhr , Georg Pawlowski
发明人： Horst Wengenroth , Horst Roeschert , Walter Spiess , Gerhard Buhr , Georg Pawlowski
IPC分类号： G03F7/004 , G03F7/039 , G03F7/075 , H01L21/027 , G03C1/492
CPC分类号： G03F7/0758 , G03F7/0045 , G03F7/039
摘要： The invention relates to a radiation-sensitive mixture comprising a) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, b) a compound which forms an acid under the action of actinic radiation and c) a compound which contains at least one C-O-C or C-O-Si bond which can be cleaved by an acid, wherein said mixture additionally contains 0.1 to 70 mol %, based on the maximum amount of acid which can theoretically be produced from the compound b), of at least one compound having at least one nitrogen atom in an amine or amide bond. The mixture is used in particular in the production of electronic components. The invention also relates to a recording material having a substrate and a radiation-sensitive coating.
摘要翻译： PCT No.PCT / EP93 / 01430 Sec。 371日期1995年1月9日 102（e）1995年4月9日PCT PCT 1993年6月7日PCT公布。出版物WO94 / 01805 日本1990年1月20日。本发明涉及一种辐射敏感性混合物，其包含a）不溶于水但在碱性水溶液中可溶或至少可溶胀的粘合剂，b）在光化反应的作用下形成酸的化合物辐射和c）含有至少一个可被酸裂解的COC或CO-Si键的化合物，其中所述混合物另外含有0.1-70mol％，基于理论上可从化合物b），至少一种在胺或酰胺键中具有至少一个氮原子的化合物。该混合物特别用于生产电子元件。本发明还涉及具有基底和辐射敏感性涂层的记录材料。

10. 发明授权

US5364734A Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith 失效
标题翻译：后处理辐射敏感性混合物和辐射敏感记录材料
公开(公告)号：US5364734A
公开(公告)日：1994-11-15
申请号：US895649
申请日：1992-06-09
申请人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
发明人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
IPC分类号： G03F7/00 , G03F7/004 , G03F7/029 , G03F7/033 , G03F7/039 , G03F7/075 , H01L21/027 , G03C1/52 , G03C3/00
CPC分类号： G03F7/075 , G03F7/0045 , Y10S430/121
摘要： A positive-working radiation-sensitive mixture is disclosed that contains(a) a compound that forms strong acid on exposure to actinic radiation that is an ester of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II: ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10) alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl- (C.sub.1 -C.sub.10) alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n is 1 or 2,(b) a compound that contains at least one acid-cleavable C--O--C or C--O--Si bond, and(c) a water-insoluble polymeric binder that is soluble or at least swellable in aqueous alkaline solutions.The radiation-sensitive mixture is remarkable for its high resolution and high sensitivity over a wide spectral range. A radiation-sensitive recording material suitable for producing photoresists, electronic components or printing plates, or for chemical milling is also disclosed.
摘要翻译：公开了一种正性辐射敏感性混合物，其包含（a）暴露于光化辐射下形成强酸的化合物，其为磺酸或式R-SO 3 H或R'（ - SO 3 H）的磺酸的酯， 2与式I和/或II的2,4-双三氯甲基-6-（单或二羟基苯基）-1,3,5-三嗪：其中R是任选的进一步取代的（C 1 -C 10）烷基，（C 5 -C 10）环烷基，（C 6 -C 10）芳基，（C 6 -C 10）芳基 - （C 1 -C 10）烷基或（C 3 -C 9）杂芳基，取代的（C 1 -C 10）亚烷基，（C 6 -C 10）亚芳基或（C 3 -C 9）亚杂芳基，n为1或2，（b）含有至少一个可酸切割的COC或CO-Si键的化合物，和（c）在碱性水溶液中可溶或至少可溶胀的水不溶性聚合物粘合剂。辐射敏感的混合物在宽光谱范围内的高分辨率和高灵敏度是显着的。还公开了适用于生产光致抗蚀剂，电子部件或印刷版或用于化学研磨的辐射敏感记录材料。

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