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1. 发明授权

US5442061A Radiation-sensitive sulfonic acid esters and their use 失效
标题翻译：辐射敏感磺酸酯及其用途
公开(公告)号：US5442061A
公开(公告)日：1995-08-15
申请号：US139017
申请日：1993-10-21
申请人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
发明人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
IPC分类号： G03F7/004 , C07D251/24 , C08L61/06 , C08L61/28 , C09D161/06 , G03F7/00 , G03F7/029 , G03F7/038 , H01L21/027
CPC分类号： G03F7/038 , C07D251/24 , C09D161/06 , C08L61/06 , C08L61/28 , Y10S430/111 , Y10S430/12 , Y10S430/123
摘要： Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2. The radiation-sensitive mixture according to the invention is remarkable for a high resolution and a high sensitivity over a wide spectral range and can be used to produce a radiation-sensitive recording material suitable for producing photoresists, electronic components, or printing plates, or for chemical milling.
摘要翻译：公开了2,4-双三氯甲基-6-（单 - 或二羟基苯基）-1,3,5-三嗪的磺酸酯。还公开了含有这种化合物与含有至少两个酸可交联基团的化合物的负性辐射敏感性混合物，以及在碱性水溶液中可溶或至少可溶胀的水不溶性聚合物粘合剂。酯是式R-SO 3 H或R'（-SO 3 H）2的磺酸或磺酸与2,4-二三氯甲基-6-（单或二羟苯基）-1,3,5-三嗪的酯（C 1 -C 10）烷基，（C 5 -C 10）环烷基，（C 6 -C 10）芳基，（C 6 -C 10）芳基 - （C 1 -C 10）烷基或（C 1 -C 10） C3-C9）杂芳基，R'是任选取代的（C 1 -C 10）亚烷基，（C 6 -C 10）亚芳基或（C 3 -C 9）亚杂芳基，n可以是1或2.根据本发明对于在宽光谱范围内的高分辨率和高灵敏度是显着的，并且可用于生产适用于生产光刻胶，电子部件或印刷版或用于化学研磨的辐射敏感记录材料。

2. 发明授权

US5298364A Radiation-sensitive sulfonic acid esters and their use 失效
标题翻译：辐射敏感磺酸酯及其用途
公开(公告)号：US5298364A
公开(公告)日：1994-03-29
申请号：US895679
申请日：1992-06-09
申请人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
发明人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
IPC分类号： G03F7/004 , C07D251/24 , C08L61/06 , C08L61/28 , C09D161/06 , G03F7/00 , G03F7/029 , G03F7/038 , H01L21/027 , G03C1/71 , G03C1/76
CPC分类号： G03F7/038 , C07D251/24 , C09D161/06 , C08L61/06 , C08L61/28 , Y10S430/111 , Y10S430/12 , Y10S430/123
摘要： Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)-alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2. The radiation-sensitive mixture according to the invention is remarkable for a high resolution and a high sensitivity over a wide spectral range and can be used to produce a radiation-sensitive recording material suitable for producing photoresists, electronic components, or printing plates, or for chemical milling.
摘要翻译：公开了2,4-双三氯甲基-6-（单 - 或二羟基苯基）-1,3,5-三嗪的磺酸酯。还公开了含有这种化合物与含有至少两个酸可交联基团的化合物的负性辐射敏感性混合物，以及在碱性水溶液中可溶或至少可溶胀的水不溶性聚合物粘合剂。酯是式R-SO 3 H或R'（-SO 3 H）2的磺酸或磺酸与2,4-二三氯甲基-6-（单或二羟苯基）-1,3,5-三嗪的酯式（I）和（或）II（*化学结构*）（I）（*化学结构*）（II）其中R是任选进一步取代的（C 1 -C 10） - 烷基，（C 5 -C 10）环烷基，（C 6 -C 10 （C 1 -C 10）芳基，（C 6 -C 10）芳基 - （C 1 -C 10）烷基或（C 3 -C 9）杂芳基，R'是任选取代的（C 1 -C 10）亚烷基，（C 6 -C 10）亚芳基或（C 3 -C 9）亚杂芳基，n可以是1或2.根据本发明的辐射敏感性混合物在宽光谱范围内对于高分辨率和高灵敏度是显着的，并且可以用于产生适于生产的辐射敏感记录材料光刻胶，电子元件或印版，或用于化学研磨。

3. 发明授权

US5401608A Negative-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith 失效
标题翻译：负面工作的辐射敏感性混合物和由此产生的辐射敏感记录材料
公开(公告)号：US5401608A
公开(公告)日：1995-03-28
申请号：US917364
申请日：1992-07-23
申请人： Georg Pawlowski , Ralph Dammel , Horst Roeschert , Winfried Meier , Walter Spiess , Klaus-Juergen Przybilla
发明人： Georg Pawlowski , Ralph Dammel , Horst Roeschert , Winfried Meier , Walter Spiess , Klaus-Juergen Przybilla
IPC分类号： G03F7/00 , C04B41/50 , G03F7/029 , G03F7/038 , H01L21/027 , G03C1/492
CPC分类号： C04B41/5035 , G03F7/0295 , Y10S430/124
摘要： A negative-working radiation-sensitive mixture containinga) a compound which contains at least one --CBr.sub.3 group bound to an atom not linked in turn to a hydrogen atom,b) an alkoxymethylated melamine andc) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions and contains phenolic OH groups,wherein(1) the mixture has an absorption of
摘要翻译：一种负性辐射敏感性混合物，其包含a）包含至少一个结合于未连接到氢原子上的原子的-CBr 3基团的化合物，b）烷氧基甲基化三聚氰胺和c）水不溶性聚合物粘合剂，其是可溶或至少可溶胀的碱性溶液，并且含有酚OH基团，其中（1）该混合物在248nm具有<0.4μm-1的吸收，（2）化合物a）的CBr 3基团被结合相对于组分b）和c）的总量，化合物a）以0.2至10重量％的量混合在混合物中，（3）质量比的组分b）和c）在50:50和5:95之间，和（4）组分c）是羟基苯乙烯或其衍生物的均聚物或共聚物，所述均聚物或共聚物的去除速率为200-3000nm 在含有2.38重量％四甲基氢氧化铵的含水碱性显影剂中，在21℃下进行优异的性能，包括对等离子体蚀刻的高抗性，以及出色的光刻性能，并且在记录材料中是有用的。

4. 发明授权

US5364734A Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith 失效
标题翻译：后处理辐射敏感性混合物和辐射敏感记录材料
公开(公告)号：US5364734A
公开(公告)日：1994-11-15
申请号：US895649
申请日：1992-06-09
申请人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
发明人： Georg Pawlowski , Horst Roeschert , Walter Spiess , Klaus-Juergen Przybilla
IPC分类号： G03F7/00 , G03F7/004 , G03F7/029 , G03F7/033 , G03F7/039 , G03F7/075 , H01L21/027 , G03C1/52 , G03C3/00
CPC分类号： G03F7/075 , G03F7/0045 , Y10S430/121
摘要： A positive-working radiation-sensitive mixture is disclosed that contains(a) a compound that forms strong acid on exposure to actinic radiation that is an ester of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II: ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10) alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl- (C.sub.1 -C.sub.10) alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n is 1 or 2,(b) a compound that contains at least one acid-cleavable C--O--C or C--O--Si bond, and(c) a water-insoluble polymeric binder that is soluble or at least swellable in aqueous alkaline solutions.The radiation-sensitive mixture is remarkable for its high resolution and high sensitivity over a wide spectral range. A radiation-sensitive recording material suitable for producing photoresists, electronic components or printing plates, or for chemical milling is also disclosed.
摘要翻译：公开了一种正性辐射敏感性混合物，其包含（a）暴露于光化辐射下形成强酸的化合物，其为磺酸或式R-SO 3 H或R'（ - SO 3 H）的磺酸的酯， 2与式I和/或II的2,4-双三氯甲基-6-（单或二羟基苯基）-1,3,5-三嗪：其中R是任选的进一步取代的（C 1 -C 10）烷基，（C 5 -C 10）环烷基，（C 6 -C 10）芳基，（C 6 -C 10）芳基 - （C 1 -C 10）烷基或（C 3 -C 9）杂芳基，取代的（C 1 -C 10）亚烷基，（C 6 -C 10）亚芳基或（C 3 -C 9）亚杂芳基，n为1或2，（b）含有至少一个可酸切割的COC或CO-Si键的化合物，和（c）在碱性水溶液中可溶或至少可溶胀的水不溶性聚合物粘合剂。辐射敏感的混合物在宽光谱范围内的高分辨率和高灵敏度是显着的。还公开了适用于生产光致抗蚀剂，电子部件或印刷版或用于化学研磨的辐射敏感记录材料。

5. 发明授权

US5328973A Radiation-sensitive mixture with a polymeric binder containing units of .alpha.,.beta.-unsaturated carboxamides 失效
标题翻译：具有含有α，β-不饱和羧酰胺单元的聚合物粘合剂的辐射敏感混合物
公开(公告)号：US5328973A
公开(公告)日：1994-07-12
申请号：US922507
申请日：1992-07-31
申请人： Horst Roeschert , Georg Pawlowski , Klaus-Juergen Przybilla
发明人： Horst Roeschert , Georg Pawlowski , Klaus-Juergen Przybilla
IPC分类号： C07C233/20 , C08F20/58 , G03F7/039 , C08F20/60 , C08F24/00 , C08F30/08
CPC分类号： G03F7/039 , C07C233/20 , C08F20/58 , Y10S430/107 , Y10S430/111
摘要： A radiation-sensitive mixture which contains a polymeric binder having acid-labile side groups and a compound which generates a strong acid on irradiation wherein the binder is a polymer built up from novel amides of .alpha.,.beta.-unsaturated carboxylic acids, is highly sensitive in the shortwave uv region and useful in the production of recording material.
摘要翻译：包含具有酸不稳定侧基的聚合物粘合剂和在照射下产生强酸的化合物的辐射敏感性混合物，其中粘合剂是由新型α，β-不饱和羧酸的酰胺构成的聚合物，其高度敏感短波紫外线区域，并且用于生产记录材料。

6. 发明授权

US5326840A Radiation-sensitive mixture containing novel polymers embodying units composed of amides of .alpha., .beta.-unsaturated carboxylic acids as binders 失效
标题翻译：含有由α，β-不饱和羧酸作为粘合剂的酰胺构成的单元的新型聚合物的辐射敏感性混合物
公开(公告)号：US5326840A
公开(公告)日：1994-07-05
申请号：US895666
申请日：1992-06-09
申请人： Klaus-Juergen Przybilla , Georg Pawlowski , Horst Roeschert
发明人： Klaus-Juergen Przybilla , Georg Pawlowski , Horst Roeschert
IPC分类号： G03F7/00 , C07C233/27 , C08F20/58 , C08F120/58 , G03F7/004 , G03F7/027 , G03F7/028 , G03F7/033 , G03F7/037 , G03F7/038 , G03F7/039 , H01L21/027 , C08F20/60 , C08F24/00 , C08F30/08
CPC分类号： G03F7/039 , C07C233/27 , C08F20/58 , Y10S430/107 , Y10S430/111
摘要： A radiation-sensitive mixture is disclosed that contains a polymeric binder having acid-cleavable side groups and a compound which forms a strong acid on irradiation. Novel amides of .alpha.,.beta.-unsaturated carboxylic acids with which the polymers used as binders are synthesized are also disclosed. A positive- or negative-working radiation-sensitive recording material comprising a base and a layer of the radiation-sensitive mixture according to the invention is also disclosed.
摘要翻译：公开了一种辐射敏感性混合物，其包含具有酸可裂解侧基的聚合物粘合剂和在照射下形成强酸的化合物。还公开了合成用作粘合剂的聚合物的α，β-不饱和羧酸的新型酰胺。还公开了包括根据本发明的辐射敏感性混合物的基底和层的正或负工作的辐射敏感记录材料。

7. 发明授权

US5247096A Process for preparing N-tert-butoxycarbonylmaleimide 失效
标题翻译：制备N-叔丁基羧基甲酰亚胺的方法
公开(公告)号：US5247096A
公开(公告)日：1993-09-21
申请号：US914453
申请日：1992-07-17
申请人： Horst Roeschert , Ralph Dammel , Georg Pawlowski , Klaus-Juergen Przybilla
发明人： Horst Roeschert , Ralph Dammel , Georg Pawlowski , Klaus-Juergen Przybilla
IPC分类号： C07D207/452 , C07D207/44 , C07D207/444
CPC分类号： C07D207/452
摘要： A process is described for preparing N-tert-butoxycarbonylmaleimide from maleimide and di-tert-butyl dicarbonate which comprises reacting maleimide with di-tert-butyl dicarbonate in the presence of a basic compound of the general formula I ##STR1## in which A represents the ring members required to complete a five- or six-membered saturated ring and R is (C.sub.1 -C.sub.4)alkyl, in one stage to give the end product.In a preferred embodiment, the compound of the general formula I is N-methylmorpholine.The product is useful as a monomer for polymerization, with the styrene copolymers being particularly suitable for chemically reinforced radiation-sensitive mixtures.
摘要翻译：描述了从马来酰亚胺和二碳酸二叔丁酯制备N-叔丁氧基羰基马来酰亚胺的方法，该方法包括使马来酰亚胺与二碳酸二叔丁酯在通式Ⅰ的碱性化合物（I）的存在下反应，其中A表示完成五元或六元饱和环所需的环成员，R是（C 1 -C 4）烷基，在一个阶段中得到最终产物。在优选的实施方案中，通式I的化合物是N-甲基吗啉。该产品可用作聚合单体，苯乙烯共聚物特别适用于化学增强的辐射敏感混合物。

8. 发明授权

US5776658A Silicone-compatible photoinitiators, and photosensitive mixtures comprising them 失效
标题翻译：与硅酮相容的光引发剂和包含它们的光敏混合物
公开(公告)号：US5776658A
公开(公告)日：1998-07-07
申请号：US536738
申请日：1995-09-29
申请人： Claus-Peter Niesert , Georg Pawlowski , Willi-Kurt Gries , Klaus-Juergen Przybilla
发明人： Claus-Peter Niesert , Georg Pawlowski , Willi-Kurt Gries , Klaus-Juergen Przybilla
IPC分类号： C07F7/08 , C07F7/18 , C08F2/50 , C08G77/04 , C08G77/382 , G03F7/075 , C08J3/28 , C08G77/06 , C08G77/18
CPC分类号： C07F7/0854 , C07F7/1836 , C08F2/50 , C08G77/382 , G03F7/075 , Y10S522/904 , Y10S522/905
摘要： Compounds of the general formula I: (SIL--X--).sub.m IN (I), in which SIL is a radical of the formula Si(R.sup.1)(R.sup.2)(R.sup.3), where R.sup.1 is an alkyl, haloalkyl or alkoxy radical of 1 to 8 carbon atoms, an alkenyl radical, an alkenyloxy or acyloxy radical of 2 to 8 carbon atoms, an aryl or aryloxy radical of 6 to 10 carbon atoms, or a dialkyl-, diaryl- or alkylaryl-methyleneaminooxy radical having C.sub.1 -C.sub.4 -alkyl or C.sub.6 -aryl groups; and R.sup.2 and R.sup.3 are identical or different radicals with the meaning of R.sup.1 or X--IN; X is a group C.sub.n H.sub.2n ; IN is the radical of a compound which is active as a photoinitiator or photosensitizer and which has at least one carbonyl group located on an aromatic nucleus; m is a number from 1 to 4; and n is a number from 2 to 12, or of the formula II: Si.sub.o O.sub.o-1 (--X--IN).sub.p R.sup.4.sub.2o+2-p (II), in which R.sup.4 is a radical with the meaning of R.sup.1, and two or more radicals R.sup.4 may be the same as or different from one another; o is a number from 2 to 20,000; and p is a number from 1 to o, and the symbols X and IN are as defined above, the group X being attached to an aromatic carbon atom which is positioned ortho to the carbonyl group of IN. The compounds are prepared by reacting a compound IN--H with a compound SIL--X' or a compound Si.sub.o O.sub.o-1 (--X').sub.p R.sup.4.sub.2o+2-p in the presence of a ruthenium compound. They are suitable as radical-forming photoinitiators or as photosensitizers in silicone-containing photopolymerizable mixtures, in particular for the production of waterless-printing planographic printing plates.
摘要翻译：通式I：（SIL-X-）mIN（I）的化合物，其中SIL是式Si（R1）（R2）（R3）的基团，其中R1是烷基，卤代烷基或烷氧基 2至8个碳原子的烯基，烯氧基或酰氧基，6至10个碳原子的芳基或芳氧基，或具有C 1 -C 4烷基的二烷基 - ，二芳基 - 或烷基芳基 - 亚甲基氨基氧基，烷基或C6-芳基; R2和R3是相同或不同的具有R1或X-IN含义的基团; X是CnH2n基团; IN是作为光引发剂或光敏剂具有活性的化合物的基团，其具有位于芳香核上的至少一个羰基; m是从1到4的数字; 并且n是2至12的数，或式II：SioOo-1（-X-IN）pR42o + 2-p（II）的数，其中R 4是具有R 1的含义的基团，以及两个或更多个基团R 4可以彼此相同或不同; o是从2到20,000的数字; 并且p是1至o的数，符号X和IN如上所定义，基团X连接到位于与IN的羰基邻位的芳族碳原子上。化合物通过化合物IN-H与化合物SIL-X'或化合物SioOo-1（-X'）pR42o + 2-p在钌化合物的存在下反应制备。它们适用于含硅酮的光聚合混合物中的自由基形成光引发剂或光敏剂，特别是用于生产无水印刷平版印刷版。

9. 发明授权

US5773187A Water developable diazonium and mineral acid containing recording material for producing water-free offset printing plates 失效
标题翻译：含水可显影重氮和无机酸的记录材料，用于生产无水胶版印刷版
公开(公告)号：US5773187A
公开(公告)日：1998-06-30
申请号：US640702
申请日：1996-05-01
申请人： Willi-Kurt Gries , Klaus-Peter Konrad , Klaus-Juergen Przybilla , Hans-Joachim Schlosser
发明人： Willi-Kurt Gries , Klaus-Peter Konrad , Klaus-Juergen Przybilla , Hans-Joachim Schlosser
IPC分类号： G03F7/004 , G03F7/00 , G03F7/021 , G03F7/032 , G03F7/075
CPC分类号： G03F7/021 , G03F7/0752
摘要： A radiation-sensitive recording material comprising: a base; a radiation-sensitive layer comprising a diazonium salt polycondensation product and 3 to 50% by weight, relative to the total weight of the radiation-sensitive layer, of a mineral acid; and a silicone layer.
摘要翻译：一种辐射敏感记录材料，包括：基底; 包含重氮盐缩聚产物和相对于辐射敏感层的总重量为3至50重量％的无机酸的辐射敏感层; 和硅树脂层。

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