专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US11500194B2 Beam delivery system, focal length selecting method, and electronic device manufacturing method 有权
公开(公告)号：US11500194B2
公开(公告)日：2022-11-15
申请号：US17036412
申请日：2020-09-29
申请人： Gigaphoton Inc.
发明人： Takashi Suganuma , Takahiro Tatsumi
IPC分类号： H05G2/00 , G02B26/08 , G02B5/10 , G02B19/00
摘要： A beam delivery system according to an aspect of the present disclosure is used for an extreme ultraviolet light generation apparatus and includes a propagation mirror disposed on an optical path between a laser apparatus and a condensation optical system and configured to change the propagation direction of a pulse laser beam, and a curvature mirror disposed on an optical path between the propagation mirror and the condensation optical system and having a concave reflective surface configured to convert the pulse laser beam to be incident on the condensation optical system into a convergent beam. The curvature mirror has a focal length selected so that the beam spread angle of the pulse laser beam from the curvature mirror is constant irrespective of thermal deformation of the propagation mirror or constant with change in a predetermined allowable range irrespective of thermal deformation of the propagation mirror.

2. 发明授权

US08804902B2 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus 有权
标题翻译：用于极紫外光源装置的集光镜交换装置和方法
公开(公告)号：US08804902B2
公开(公告)日：2014-08-12
申请号：US13846894
申请日：2013-03-18
申请人： Gigaphoton, Inc.
发明人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
IPC分类号： G21K1/06 , G03F1/00 , G02B15/14 , G21K1/10 , G03F7/20 , B82Y10/00 , G03F1/22 , G02B13/14 , G02B15/173
CPC分类号： G21K1/06 , B82Y10/00 , G02B7/18 , G02B7/183 , G02B13/14 , G02B15/14 , G02B15/173 , G03F1/146 , G03F1/22 , G03F7/70175 , G03F7/702 , G03F7/70975 , G21K1/10 , G21K2201/067 , H05G2/001 , Y10T29/49895 , Y10T29/53087 , Y10T29/53539
摘要： A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
摘要翻译：一种集电镜交换装置，能够安全且容易地交换用于收集从极紫外光源装置的室内产生的等离子体发出的极紫外光的集光镜。集电镜更换装置包括：支撑集电镜或收集镜结构的支撑基座; 以及导轨，其设置在所述支撑基座上并且调节所述集光镜或所述集光镜结构的移动方向; 其特征在于，通过使所述集光镜或所述集光镜结构沿着所述支撑基座上的导轨移动，至少将所述集光镜从所述室取出。

3. 发明授权

US09680277B2 Slab amplifier, and laser apparatus and extreme ultraviolet light generation apparatus including slab amplifier 有权
公开(公告)号：US09680277B2
公开(公告)日：2017-06-13
申请号：US14657640
申请日：2015-03-13
申请人： Gigaphoton Inc.
发明人： Krzysztof Nowak , Takashi Suganuma , Takashi Saito , Yasufumi Kawasuji
IPC分类号： H01S3/034 , H01S3/07 , H01S3/09 , H01S3/23 , H01S3/223 , H01S3/22 , H01S3/0971 , H01S3/03 , H05G2/00
CPC分类号： H01S3/034 , H01S3/03 , H01S3/076 , H01S3/0971 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2366 , H01S3/2375 , H01S2301/02 , H05G2/008
摘要： There is provided a slab amplifier including an optical system (48, 51) provided in a chamber (47) to allow a seed beam having entered from a first window into the space between a pair of electrodes (42, 43) to be repeatedly reflected between the space so that the seed beam is amplified to be an amplified beam; a first aperture plate (61) provided between the first window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the seed beam and equal to or smaller than a dimension of the first window; and a second aperture plate (62) provided between the second window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the amplified beam and equal to or smaller than a dimension of the second window.

4. 发明授权

US09647406B2 Laser unit and extreme ultraviolet light generating system 有权
公开(公告)号：US09647406B2
公开(公告)日：2017-05-09
申请号：US15172757
申请日：2016-06-03
申请人： GIGAPHOTON INC.
发明人： Takashi Suganuma , Takayuki Yabu , Osamu Wakabayashi , Seiji Nogiwa
IPC分类号： H01S3/00 , H01S3/23 , H05G2/00 , H01S3/223
CPC分类号： H01S3/005 , H01S3/2232 , H01S3/2316 , H01S3/2366 , H05G2/005 , H05G2/008
摘要： There is provided a laser unit that may include a master oscillator, a laser amplifier, and an adjuster. The master oscillator may be configured to output a laser light beam. The laser amplifier may be disposed in a light path of the laser light beam outputted from the master oscillator. The adjuster may be disposed in the light path of the laser light beam, and may be configured to adjust a beam cross-sectional shape of the laser light beam amplified by the laser amplifier to be a substantially circular shape. The beam cross-sectional shape may be at a beam waist of the laser light beam or in the vicinity of the beam waist of the laser light beam, and may be in a plane orthogonal to a light path axis.

5. 发明授权

US08698116B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US08698116B2
公开(公告)日：2014-04-15
申请号：US13873001
申请日：2013-04-29
申请人： Gigaphoton Inc.
发明人： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC分类号： G21K5/04
CPC分类号： G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
摘要翻译：一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔超过由驱动器激光器施加的激光束的最短波长的一半。

6. 发明授权

US10842008B2 Laser device, and extreme ultraviolet light generation system 有权
公开(公告)号：US10842008B2
公开(公告)日：2020-11-17
申请号：US16261313
申请日：2019-01-29
申请人： Gigaphoton Inc.
发明人： Takashi Suganuma
IPC分类号： H05G2/00 , H01S3/13 , H01S3/10 , H01S3/23 , H01S3/00 , G03F7/20
CPC分类号： H05G2/008 , G03F7/70033 , H01S3/0071 , H01S3/1003 , H01S3/1302 , H01S3/1307 , H01S3/2316 , H05G2/00 , H01S3/2366
摘要： A laser device includes at least one amplification unit configured to amplify laser light emitted from a laser oscillator, and an amplification control unit configured to control the amplification unit. The amplification unit includes an incident-side optical adjustment unit including a wavefront adjustment unit configured to adjust a wavefront of the laser light and a first direction adjustment unit configured to adjust an optical axis thereof, an amplifier configured to amplify the laser light, an emission-side optical adjustment unit including a second direction adjustment unit configured to adjust an optical axis of the laser light, and a measurement unit configured to measure the laser light and acquire information on at least one of an optical axis, a wavefront and energy of the laser light. The amplification control unit controls the incident-side optical adjustment unit and/or the emission-side optical adjustment unit, based on a measurement result of the measurement unit.

7. 发明授权

US10374381B2 Extreme ultraviolet light generating apparatus 有权
公开(公告)号：US10374381B2
公开(公告)日：2019-08-06
申请号：US15590238
申请日：2017-05-09
申请人： Gigaphoton Inc.
发明人： Toru Suzuki , Takashi Suganuma , Akihiro Takayama , Yoshiaki Kurosawa
IPC分类号： H01S3/10 , H05G2/00 , H01L21/30 , H01S3/00 , H01S5/00
摘要： A beam adjusting apparatus of an extreme ultraviolet light generating apparatus may include: a first pair of mirrors constituted by a first concave mirror and a first convex mirror, provided along the optical path of the pulsed laser beam; a second pair of mirrors constituted by a second concave mirror and a second convex mirror, which are arranged in an order reversed from the order of arrangement of the first concave mirror and the first convex mirror, provided along the optical path of the pulsed laser beam downstream from the first pair of mirrors; and a moving apparatus configured to simultaneously increase or simultaneously decrease the distance between the first concave mirror and the first convex mirror and the distance between the second concave mirror and the second convex mirror.

8. 发明授权

US10194515B2 Beam delivery system and control method therefor 有权
公开(公告)号：US10194515B2
公开(公告)日：2019-01-29
申请号：US15613789
申请日：2017-06-05
申请人： GIGAPHOTON INC.
发明人： Yoshifumi Ueno , Takashi Suganuma , Yoshiaki Kurosawa
IPC分类号： G01N21/64 , H05G2/00 , G01J1/02 , G01J1/04 , G01J1/42 , G02B26/08 , H01S3/00
摘要： A beam delivery system may include: beam adjusters configured to adjust a divergence angle of a pulse laser beam; a beam sampler configured to separate a part of the pulse laser beam outputted from a first beam adjuster provided at the most downstream among the beam adjusters to acquire a sample beam; a beam monitor configured to receive the sample beam and output a monitored diameter; and a beam delivery controller configured to control the beam adjusters based on the monitored diameter. The beam delivery controller may adjust each of beam adjusters other than the first beam adjuster selected one after another from the most upstream so that the monitored diameter at the beam monitor becomes a predetermined value specific to the beam adjuster, and adjust the first beam adjuster so that the pulse laser beam becomes focused at a position downstream of a target position.

9. 发明授权

US09153927B2 Regenerative amplifier, laser apparatus, and extreme ultraviolet light generation system 有权
标题翻译：再生放大器，激光设备和极紫外光发生系统
公开(公告)号：US09153927B2
公开(公告)日：2015-10-06
申请号：US13956282
申请日：2013-07-31
申请人： GIGAPHOTON INC.
发明人： Krzysztof Nowak , Takashi Suganuma , Osamu Wakabayashi
IPC分类号： H01S3/23 , H01S3/139 , H01S3/08 , H01S3/05 , B82Y20/00 , H01S3/22 , H01S5/042 , H01S5/06 , H01S3/03 , H01S3/223 , H01S5/14 , H01S5/34
CPC分类号： H01S3/05 , B82Y20/00 , H01S3/0315 , H01S3/08031 , H01S3/139 , H01S3/22 , H01S3/2232 , H01S3/2325 , H01S3/235 , H01S3/2366 , H01S3/2375 , H01S5/042 , H01S5/06 , H01S5/14 , H01S5/3401
摘要： A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position.
摘要翻译：根据本公开的一个方面的再生放大器与激光装置组合使用，再生放大器可以包括：构成光谐振器的一对谐振器镜; 设置在所述一对所述谐振器镜之间用于放大从所述激光装置输出的预定波长的激光束的平板放大器; 以及光学系统，被配置为配置多个光路，激光束沿着该光路在所述平板放大器内部往复运动，所述光学系统将所述激光束的光学图像在第一位置处作为所述激光束的光学图像在第二位置。

10. 发明授权

US09954339B2 Laser unit and extreme ultraviolet light generating system 有权
公开(公告)号：US09954339B2
公开(公告)日：2018-04-24
申请号：US15040645
申请日：2016-02-10
申请人： GIGAPHOTON INC.
发明人： Takashi Suganuma , Hakaru Mizoguchi , Osamu Wakabayashi
IPC分类号： H01S3/00 , H05G2/00 , G02B27/28 , H01S3/23 , H01S3/038 , G03F7/20
CPC分类号： H01S3/005 , G02B27/286 , G03F7/70033 , G03F7/70041 , H01S3/038 , H01S3/2316 , H05G2/008
摘要： There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式