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1. 发明授权

US08189169B2 Cooling apparatus and substrate treating apparatus 失效
标题翻译：冷却装置和基板处理装置
公开(公告)号：US08189169B2
公开(公告)日：2012-05-29
申请号：US12156896
申请日：2008-06-05
申请人： Futoshi Shimai , Shigeru Kawata
发明人： Futoshi Shimai , Shigeru Kawata
IPC分类号： G03B27/42
CPC分类号： H01L21/67109
摘要： The object of the present invention is to provide a cooling apparatus which makes it possible to cool a substrate uniformly in a short period of time even if the substrate has a large area. The cooling apparatus 3 comprises a flat-box-shaped body 10, a cooling medium supply tube 11 which is inserted into the body 10, a nozzle 12 which is attached to the cooling medium supply tube 11 so as to eject the cooling medium toward the internal surface of the body, a pipe 13 for withdrawing water (refrigerant) ejected from the nozzle 12 toward the body 10, a chiller 14 for cooling the water from the pipe 13 to a predetermined temperature, and a circulating pipe 15 for sending the water which has been cooled by the chiller 14 back to the cooling medium supply tube 11.
摘要翻译：本发明的目的是提供一种能够在短时间内均匀地冷却基板，即使基板面积大的冷却装置。冷却装置3包括平盒体10，插入主体10的冷却介质供给管11，安装在冷却介质供给管11上的喷嘴12，以将冷却介质朝向主体的内表面，用于将从喷嘴12排出的水（制冷剂）向主体10排出的管道13，用于将水从管道13冷却到预定温度的冷却器14，以及用于将水其被冷却器14冷却回冷却介质供应管11。

2. 发明授权

US07381270B2 Slit nozzle and apparatus for supplying treatment liquid using slit nozzle 有权
标题翻译：狭缝喷嘴和使用狭缝喷嘴供给处理液的装置
公开(公告)号：US07381270B2
公开(公告)日：2008-06-03
申请号：US11214480
申请日：2005-08-29
申请人： Futoshi Shimai , Shigeru Kawata
发明人： Futoshi Shimai , Shigeru Kawata
IPC分类号： B05C5/00 , B05C11/00 , B05C3/00 , B05B1/04
CPC分类号： B05C5/0254 , B05C5/0262 , B05C11/1042
摘要： A slit nozzle which is easily manufactured and in which no capillary action occurs, and an apparatus for supplying a treatment liquid using the slit nozzle are disclosed. The slit nozzle is constructed of a left portion and a right portion joined to each other, one of which is made of metal and the other of which is made of resin. In the apparatus for supplying a treatment liquid using one or more of the slit nozzles, the slit nozzles are provided in a circulating passage of a treatment liquid whose temperature is controlled.
摘要翻译：公开了一种易于制造并且不发生毛细作用的狭缝喷嘴，以及使用该狭缝喷嘴供给处理液的装置。狭缝喷嘴由彼此连接的左部和右部构成，其中一个由金属制成，另一个由树脂制成。在使用一个以上的狭缝喷嘴供给处理液的装置中，狭缝喷嘴设置在温度受控的处理液的循环通路中。

3. 发明申请

US20080304027A1 Cooling apparatus and substrate treating apparatus 失效
标题翻译：冷却装置和基板处理装置
公开(公告)号：US20080304027A1
公开(公告)日：2008-12-11
申请号：US12156896
申请日：2008-06-05
申请人： Futoshi Shimai , Shigeru Kawata
发明人： Futoshi Shimai , Shigeru Kawata
IPC分类号： G03B27/52
CPC分类号： H01L21/67109
摘要： The object of the present invention is to provide a cooling apparatus which makes it possible to cool a substrate uniformly in a short period of time even if the substrate has a large area. The cooling apparatus 3 comprises a flat-box-shaped body 10, a cooling medium supply tube 11 which is inserted into the body 10, a nozzle 12 which is attached to the cooling medium supply tube 11 so as to eject the cooling medium toward the internal surface of the body, a pipe 13 for withdrawing water (refrigerant) ejected from the nozzle 12 toward the body 10, a chiller 14 for cooling the water from the pipe 13 to a predetermined temperature, and a circulating pipe 15 for sending the water which has been cooled by the chiller 14 back to the cooling medium supply tube 11.
摘要翻译：本发明的目的是提供一种能够在短时间内均匀地冷却基板，即使基板面积大的冷却装置。冷却装置3包括平盒体10，插入主体10的冷却介质供给管11，安装在冷却介质供给管11上的喷嘴12，以将冷却介质朝向主体的内表面，用于将从喷嘴12排出的水（制冷剂）向主体10排出的管道13，用于将水从管道13冷却到预定温度的冷却器14，以及用于将水其被冷却器14冷却回冷却介质供应管11。

4. 发明申请

US20070240642A1 Substrate processing apparatus 审中-公开
标题翻译：基板加工装置
公开(公告)号：US20070240642A1
公开(公告)日：2007-10-18
申请号：US11786202
申请日：2007-04-11
申请人： Futoshi Shimai , Shigeru Kawata
发明人： Futoshi Shimai , Shigeru Kawata
IPC分类号： B05B7/06 , B05B1/28 , B05C13/02 , B05C13/00
CPC分类号： H01L21/67051 , H01L21/67034
摘要： A multi-stage substrate processing apparatus in which each processing stage is carried out on a substrate while conveying said substrate includes a processing liquid supply device and a drying device arranged successively along a conveying direction of the substrate. The drying device comprises an air knife for drying a processing liquid on the substrate. A plurality of nozzles for supplying the processing liquid onto the substrate are provided in the processing liquid supply device. At least the nozzle in the final stage among the plurality of nozzles is pointed in an opposite direction to the conveying direction of the substrate. This apparatus shortens tact time of the processed substrate.
摘要翻译：一种多层基板处理装置，其中在输送所述基板的同时在基板上进行各处理台包括沿基板的输送方向依次配置的处理液供给装置和干燥装置。干燥装置包括用于干燥基板上的处理液体的气刀。在处理液供给装置中设置有用于将处理液供给到基板上的多个喷嘴。至少在多个喷嘴中的最后阶段的喷嘴相对于基板的传送方向指向相反的方向。该装置缩短处理后的基板的节拍时间。

5. 发明申请

US20070044712A1 Slit nozzle and apparatus for supplying treatment liquid using slit nozzle 有权
标题翻译：狭缝喷嘴和使用狭缝喷嘴供给处理液的装置
公开(公告)号：US20070044712A1
公开(公告)日：2007-03-01
申请号：US11214480
申请日：2005-08-29
申请人： Futoshi Shimai , Shigeru Kawata
发明人： Futoshi Shimai , Shigeru Kawata
IPC分类号： B05C5/00 , B05C11/00 , B05B1/14
CPC分类号： B05C5/0254 , B05C5/0262 , B05C11/1042
摘要： A slit nozzle which is easily manufactured and in which no capillary action occurs, and an apparatus for supplying a treatment liquid using the slit nozzle are disclosed. The slit nozzle is constructed of a left portion and a right portion joined to each other, one of which is made of metal and the other of which is made of resin. In the apparatus for supplying a treatment liquid using one or more of the slit nozzles, the slit nozzles are provided in a circulating passage of a treatment liquid whose temperature is controlled.
摘要翻译：公开了一种易于制造并且不发生毛细作用的狭缝喷嘴，以及使用该狭缝喷嘴供给处理液的装置。狭缝喷嘴由彼此连接的左部和右部构成，其中一个由金属制成，另一个由树脂制成。在使用一个以上的狭缝喷嘴供给处理液的装置中，狭缝喷嘴设置在温度受控的处理液的循环通路中。

6. 发明授权

US09010270B2 Coating device including substrate carrying, application and removal units 有权
标题翻译：涂布装置，包括载体，涂布和去除单元
公开(公告)号：US09010270B2
公开(公告)日：2015-04-21
申请号：US13116941
申请日：2011-05-26
申请人： Futoshi Shimai , Akihiko Sato , Tsutomu Sahoda , Kenji Maruyama
发明人： Futoshi Shimai , Akihiko Sato , Tsutomu Sahoda , Kenji Maruyama
IPC分类号： B05C5/00 , B05D3/00 , H01L21/67 , H01L21/677 , B05C5/02 , B05C9/04 , B05B13/02 , B05D1/00 , B05D1/26 , G11B5/842
CPC分类号： B05C5/02 , B05B13/02 , B05B13/0228 , B05B13/0278 , B05C9/04 , B05D1/002 , B05D1/26 , B05D3/007 , G11B5/842 , H01L21/67051 , H01L21/67155
摘要： Provided is a coating device including: a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion.
摘要翻译：本发明提供一种涂布装置，包括：基板承载单元，其在基板竖立时可旋转地保持基板，并且能够将保持的基板设置在第一位置和第二位置; 应用单元，其包括将液体材料喷射到布置在第一位置的基板的第一和第二表面中的液体材料喷嘴; 以及拆卸单元，其包括容纳机构，该容纳机构容纳设置在第二位置的基板的周缘部的一部分，以及清洗液喷出机构，其向周缘部喷射清洗液，除去周缘部的液体材料。

7. 发明授权

US08919756B2 Substrate processing system, carrying device, and coating device 有权
标题翻译：基板加工系统，承载装置和涂装装置
公开(公告)号：US08919756B2
公开(公告)日：2014-12-30
申请号：US12877881
申请日：2010-09-08
申请人： Tsutomu Sahoda , Futoshi Shimai , Akihiko Sato
发明人： Tsutomu Sahoda , Futoshi Shimai , Akihiko Sato
IPC分类号： B25B11/00 , H01L21/67 , H01L21/677
CPC分类号： H01L21/67051 , H01L21/67161 , H01L21/67196 , H01L21/67742 , H01L21/67751 , H01L21/67766 , H01L21/67778 , Y10S269/903
摘要： A substrate processing system includes a processing unit, a substrate loading unit, a substrate unloading unit, and a carrying unit. A carrying device has a constitution in which a suction portion suctioning and holding a substrate is rotatable about an arm portion provided in a base portion and the substrate is rotated in the state where the substrate is held by a holding portion. A coating device has a constitution in which a liquid material is ejected from a nozzle to both surfaces of the substrate rotating in an upright state.
摘要翻译：基板处理系统包括处理单元，基板装载单元，基板卸载单元和承载单元。携带装置具有这样一种构造，其中吸引和保持基板的吸附部分可以围绕设置在基部中的臂部分旋转，并且基板在通过保持部保持基板的状态下旋转。涂布装置具有液体材料从喷嘴喷射到以直立状态旋转的基板的两个表面的构造。

8. 发明授权

US07158039B2 Liquid leakage sensor and liquid leakage detecting system 有权
标题翻译：液体泄漏传感器和液体泄漏检测系统
公开(公告)号：US07158039B2
公开(公告)日：2007-01-02
申请号：US10977553
申请日：2004-10-29
申请人： Tatekazu Hayashida , Futoshi Shimai , Yohey Omata
发明人： Tatekazu Hayashida , Futoshi Shimai , Yohey Omata
IPC分类号： G08B21/00
CPC分类号： G01M3/16
摘要： Among plural liquid leakage sensors placed at the lower most portion of a system such as a floor surface, a leaked liquid storing portion, etc., an error-activated location of the sensor can be easily identified uniquely when the sensor is detecting any abnormality. In a liquid leakage detecting system including at least one liquid leakage sensor having at least one detecting portion contactable with a leaking liquid through an air layer or a liquid permeable layer, a warning device including a sound producing is placed within a specified spatial distance from each installation position of the liquid leakage sensor, wherein after detecting any abnormal conditions of the liquid leakage sensor, a warning signal is issued at least in an audio frequency based on the warning device in order to discriminate the error-activated leakage sensor from other non-activated leakage sensors placed outside of the specified spatial distance and uniquely identify the installation position of the activated leakage sensor.
摘要翻译：在传感器检测到任何异常情况下，在诸如地板表面，泄漏液体存储部分等系统的最下部的多个液体泄漏传感器中，可以容易地识别传感器的错误激活位置。在液体泄漏检测系统中，包括至少一个液体泄漏传感器，其具有至少一个检测部分，该检测部分通过空气层或液体渗透层与泄漏的液体接触，包括产生声音的警告装置位于与每个液体泄漏传感器的安装位置，其中在检测到液体泄漏传感器的任何异常状况之后，基于警告装置至少以音频的方式发出警告信号，以便将错误激活的泄漏传感器与其他非易失性传感器区分开，激活的泄漏传感器放置在指定的空间距离之外，并唯一地识别激活的泄漏传感器的安装位置。

9. 发明申请

US20050162280A1 Liquid leakage sensor and liquid leakage detecting system 有权
标题翻译：液体泄漏传感器和液体泄漏检测系统
公开(公告)号：US20050162280A1
公开(公告)日：2005-07-28
申请号：US10977553
申请日：2004-10-29
申请人： Tatekazu Hayashida , Futoshi Shimai , Yohey Omata
发明人： Tatekazu Hayashida , Futoshi Shimai , Yohey Omata
IPC分类号： G01M3/16 , G08B21/00
CPC分类号： G01M3/16
摘要： Among plural liquid leakage sensors placed at the lowermost portion of a system such as a floor surface, a leaked liquid storing portion, etc., an error-activated location of the sensor can be easily identified uniquely when the sensor is detecting any abnormality. In a liquid leakage detecting system including at least one liquid leakage sensor having at least one detecting portion contactable with a leaking liquid through an air layer or a liquid permeable layer, a warning means including a sound producing means is placed within a specified spatial distance from each installation position of said liquid leakage sensor, wherein after detecting any abnormal conditions of said liquid leakage sensor, a warning signal is issued at least in an audio frequency based on said warning means in order to discriminate said error-activated leakage sensor from other non-activated leakage sensors placed outside of said specified spatial distance and uniquely identify said installation position of said activated leakage sensor.
摘要翻译：在传感器检测到任何异常的情况下，在诸如地板表面，泄漏的液体存储部分等系统的最下部的多个液体泄漏传感器中，可以容易地识别传感器的错误激活位置。在具有至少一个液体泄漏传感器的液体泄漏检测系统中，具有至少一个检测部分，其通过空气层或液体渗透层与泄漏的液体接触，包括声音产生装置的报警装置被放置在距离所述液体泄漏传感器的每个安装位置，其中在检测到所述液体泄漏传感器的任何异常情况之后，至少基于所述警告装置的音频频率发出警告信号，以便将所述错误激活的泄漏传感器与其他非易失性传感器激活的泄漏传感器放置在所述指定空间距离之外，并且唯一地识别所述激活的泄漏传感器的所述安装位置。

10. 发明授权

US6015467A Method of removing coating from edge of substrate 失效
标题翻译：从基材边缘去除涂层的方法
公开(公告)号：US6015467A
公开(公告)日：2000-01-18
申请号：US859926
申请日：1997-05-21
申请人： Koichi Nagasawa , Naomi Kawaguchi , Futoshi Shimai , Mitsuru Sato , Kouji Harada , Jun Koshiyama
发明人： Koichi Nagasawa , Naomi Kawaguchi , Futoshi Shimai , Mitsuru Sato , Kouji Harada , Jun Koshiyama
IPC分类号： B08B3/10 , B08B3/12 , C11D7/06 , C11D7/26 , C11D7/32 , C11D7/50 , G03F7/16 , G03F7/42 , H01L21/00 , B08B1/02 , B08B3/08
CPC分类号： C11D7/261 , B08B3/10 , B08B3/12 , C11D7/06 , C11D7/3218 , C11D7/3281 , C11D7/5022 , G03F7/162 , G03F7/425 , H01L21/6708 , C11D7/263
摘要： In a method of removing a coating from an edge of a substrate a solvent reservoir is filled with a solvent to dissolve and remove a photoresist film, the solvent includes one of dipropylene glycol monoalkyl ether, a mixture of this ether and an easily volatile organic solvent (boiling point of 75-130.degree. C., vapor pressure of 5-75 mmHg at 20.degree. C.), and an alkaline aqueous solution, an edge of a substrate W is horizontally inserted in the reservoir, and thereafter, the edge of the substrate W is immersed in the solvent for a period of time, so as to dissolve and remove a coating such as photoresist from the edge of the substrate. The solvent may be filled into the solvent reservoir either before or after the edge of the substrate is inserted therein, and the method may further involve aspirating the solvent from the reservoir after the substrate edge has been inserted therein.
摘要翻译：在从基材的边缘去除涂层的方法中，溶剂储存器填充有溶剂以溶解并除去光致抗蚀剂膜，溶剂包括二丙二醇单烷基醚，该醚和易挥发的有机溶剂的混合物（沸点75-130℃，20℃蒸气压5-75mmHg）和碱性水溶液，将基材W的边缘水平地插入储存器中，然后将边缘将衬底W浸入溶剂中一段时间，从而从衬底的边缘溶解并除去诸如光致抗蚀剂的涂层。在将基材的边缘插入其中之前或之后，可以将溶剂填充到溶剂容器中，并且该方法还可以包括在衬底边缘已插入其中之后从储存器吸出溶剂。

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