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1. 发明授权

US4513132A Heat-resistant silicone block polymer 失效
标题翻译：耐热硅胶聚合物
公开(公告)号：US4513132A
公开(公告)日：1985-04-23
申请号：US480789
申请日：1983-03-31
申请人： Fusaji Shoji , Issei Takemoto , Fumio Kataoka , Hitoshi Yokono , Tokio Isogai
发明人： Fusaji Shoji , Issei Takemoto , Fumio Kataoka , Hitoshi Yokono , Tokio Isogai
IPC分类号： C08G77/00 , C08G77/42 , C08G77/44 , C08G77/52 , C08G77/06
CPC分类号： C08G77/52 , C08G77/44
摘要： Heat-resistant silicone block polymer with a good flexibility obtained by reaction of an organosilsesquioxane with a silicone compound or organosiloxane in the presence of a basic catalyst in an organic solvent.
摘要翻译：通过有机倍半硅氧烷与有机硅化合物或有机硅氧烷在碱性催化剂存在下在有机溶剂中反应而获得的具有良好柔软性的耐热硅氧烷嵌段聚合物。

2. 发明授权

US4565767A Light-sensitive polymer composition with poly(amic acid), bisazide, and tertiary amine compound 失效
标题翻译：具有聚（酰胺酸），双叠氮化物和叔胺化合物的光敏聚合物组合物
公开(公告)号：US4565767A
公开(公告)日：1986-01-21
申请号：US603451
申请日：1984-04-24
申请人： Fumio Kataoka , Fusaji Shoji , Isao Obara , Issei Takemoto , Hitoshi Yokono , Tokio Isogai , Mitsumasa Kojima
发明人： Fumio Kataoka , Fusaji Shoji , Isao Obara , Issei Takemoto , Hitoshi Yokono , Tokio Isogai , Mitsumasa Kojima
IPC分类号： C08F290/00 , C08F299/00 , C08G73/00 , C08G73/02 , C08G73/10 , C08L79/08 , G03F7/012 , G03F7/038 , G03F7/26 , H01L21/312 , H01L21/47 , G03C1/71
CPC分类号： C08L79/08 , G03F7/0125 , Y10S430/12 , Y10S430/128
摘要： A light-sensitive polymer composition comprising a poly(amic acid), a special bisazide compound and an amine compound can give a film which has high sensitivity and in which portions exposed to light are not easily released by a developing solution at the time of development.
摘要翻译：包含聚（酰胺酸），特殊双叠氮化合物和胺化合物的光敏聚合物组合物可以产生具有高灵敏度的膜，并且其中暴露于光的部分在显影时不容易被显影溶液释放。

3. 发明授权

US4321319A Photosensitive compositions containing polyamides acid with photosensitive groups 失效
标题翻译：含有光敏基团的聚酰胺酸的光敏组合物
公开(公告)号：US4321319A
公开(公告)日：1982-03-23
申请号：US198952
申请日：1980-05-22
申请人： Fusaji Shoji , Issei Takemoto , Hitoshi Yokono , Tokio Isogai
发明人： Fusaji Shoji , Issei Takemoto , Hitoshi Yokono , Tokio Isogai
IPC分类号： C08G73/10 , C08G73/12 , C08G73/14 , G03F7/038 , G03C1/68
CPC分类号： C08G73/121 , C08G73/1025 , C08G73/1042 , C08G73/14 , G03F7/0387
摘要： There is described photosensitive polymer composition and a polyimide film-coated material made by applying the composition to a support, irradiating with ultraviolet and thereafter heating. The photosensitive polymer composition is prepared by adding a sensitizer to a photosensitive polyamide acid intermediate solution which is obtained by reacting in an inert solvent a first compound comprising 100 to 5% by weight of a photosensitive group-containing diamine and 0 to 95% by weight of a diamine having no photosensitive group, with a second compound comprising at least one compound selected from a tetracarboxylic acid dianhydride and a tricarboxylic acid anhydride monohalide.
摘要翻译：描述了感光聚合物组合物和通过将该组合物施加到载体上，用紫外线照射并随后加热而制成的聚酰亚胺膜涂覆材料。光敏聚合物组合物是通过将感光性聚酰胺酸中间体溶液加入到感光性聚酰胺酸中间体溶液中制备的，该溶液是通过在惰性溶剂中使包含100-5重量％含光敏基团的二胺和0至95重量％的具有无光敏基团的二胺，第二化合物包含至少一种选自四羧酸二酐和三羧酸酐一卤化物的化合物。

4. 发明授权

US4451551A Radiation-sensitive poly(amic acid) polymer composition 失效
标题翻译：辐射敏感聚（酰胺酸）聚合物组合物
公开(公告)号：US4451551A
公开(公告)日：1984-05-29
申请号：US331875
申请日：1981-12-17
申请人： Fumio Kataoka , Fusaji Shoji , Isao Obara , Hitoshi Yokono , Tokio Isogai , Mitumasa Kojima
发明人： Fumio Kataoka , Fusaji Shoji , Isao Obara , Hitoshi Yokono , Tokio Isogai , Mitumasa Kojima
IPC分类号： C08K5/00 , C08L79/08 , G03F7/008 , G03F7/038 , G03C1/68
CPC分类号： G03F7/0387 , C08K5/0041 , C08L79/08 , G03F7/008 , Y10S430/12 , Y10S430/121 , Y10S522/904
摘要： A light- or radiation-sensitive polymer composition comprising (a) a poly(amic acid) having as a major component a repeating unit of the formula: ##STR1## (b) one or more light- or radiation-sensitive compounds having an amino group and an aromatic azide group or aromatic sulfonylazide group in one molecule, and if necessary (c) one or more photosensitizers and/or amine compounds having at least one unsaturated bonding, and/or (d) one or more compounds having at least two unsaturated bonding in one molecule, is highly sensitive to light and radiation and can give a precise relief pattern on a substrate. Further, a finally obtained polyimide film is excellent in heat resistance.
摘要翻译：一种光或辐射敏感性聚合物组合物，其包含（a）作为主要组分的具有下式的重复单元的聚（酰胺酸）：（b）一种或多种具有氨基的光或辐射敏感性化合物（c）一种或多种具有至少一个不饱和键的光敏剂和/或胺化合物，和/或（d）一种或多种具有至少两个不饱和键的化合物，在一个分子中的不饱和键，对光和辐射具有高度敏感性，并且可以在基底上给出精确的浮雕图案。此外，最终得到的聚酰亚胺膜的耐热性优异。

5. 发明授权

US4273420A Liquid crystal display device 失效
标题翻译：液晶显示装置
公开(公告)号：US4273420A
公开(公告)日：1981-06-16
申请号：US56119
申请日：1979-07-09
申请人： Takeshi Watanabe , Ryoichi Sudo , Fusaji Shoji , Issei Takemoto , Hitoshi Yokono
发明人： Takeshi Watanabe , Ryoichi Sudo , Fusaji Shoji , Issei Takemoto , Hitoshi Yokono
IPC分类号： C09K19/40 , G02F1/1337 , G02F1/133
CPC分类号： G02F1/133711 , C09K19/408 , Y10T428/1014 , Y10T428/31612 , Y10T428/31663
摘要： A liquid crystal display device using an alignment film of ladder-type organosilicone polymer or cross-linking product of cross-linkable ladder-type organosilicone polymer makes a homogeneous liquid crystal orientation, irrespectively of the kind of the liquid crystal used, never lowers its orientation ability even when fusion-sealing or sealing of the liquid crystal device is made with glass or thermosetting resin, and makes a clear display owing to the alignment film being colorless. The alignment film is insoluble in the liquid crystal used.
摘要翻译：使用梯型有机硅聚合物的取向膜或交联性梯型有机硅聚合物的交联体的液晶显示装置，与所使用的液晶的种类无关，不会降低其取向即使使用玻璃或热固性树脂进行液晶装置的熔接或密封，由于取向膜是无色的，因此能够进行清晰的显示。取向膜不溶于所用液晶。

6. 发明授权

US4554237A Photosensitive resin composition and method for forming fine patterns with said composition 失效
标题翻译：光敏树脂组合物和用所述组合物形成精细图案的方法
公开(公告)号：US4554237A
公开(公告)日：1985-11-19
申请号：US452198
申请日：1982-12-22
申请人： Fumio Kataoka , Fusaji Shoji , Hitoshi Yokono , Daisuke Makino , Shigeru Koibuchi , Asao Isobe
发明人： Fumio Kataoka , Fusaji Shoji , Hitoshi Yokono , Daisuke Makino , Shigeru Koibuchi , Asao Isobe
IPC分类号： G03C1/72 , G03F7/008 , G03C1/52 , G03C1/60 , G03C5/16
CPC分类号： G03F7/008 , Y10S430/128
摘要： Disclosed are photosensitive resin composition useful for formation of fine patterns on semiconductor devices, magnetic bubble devices, etc. which is highly sensitive and is excellent in developability and which has no problem such as precipitation of azide compounds and remaining azide particles after development and a method for forming fine patterns with said composition.Said photosensitive resin composition comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): ##STR1## [wherein X is --N.sub.3 or --SO.sub.2 N.sub.3, Y is ##STR2## R.sup.1 is a lower alkylene such as --CH.sub.2 CH.sub.2 --, --CH.sub.2 CH.sub.2 CH.sub.2 --, or --CH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 CH.sub.2 --, a hydroxyalkylene or an aminoalkylene such as ##STR3## (wherein R.sup.4 and R.sup.5 are lower alkyl or hydrogen, R.sup.6 -R.sup.8 are lower alkyl groups, R.sup.3 is hydrogen, a lower alkyl group or --CH.sub.2 CH.sub.2 O).sub.n R.sup.9 wherein n is an integer of 3 or less and R.sup.9 is hydrogen or a lower alkyl group)].
摘要翻译：公开了用于在半导体器件上形成精细图案的光敏树脂组合物，具有高度敏感性和显影性优异的并且没有问题，例如显影后的叠氮化合物和剩余的叠氮化物颗粒的沉淀，以及方法用于用所述组合物形成精细图案。所述光敏树脂组合物包含（a）至少一种选自酚醛清漆树脂和聚羟基苯乙烯树脂的聚合物化合物和（b）由通式（1）表示的叠氮化合物：其中 X是-N3或-SO2N3，Y是低级亚烷基，例如-CH2CH2-，-CH2CH2CH2-或-CH2CH2OCH2CH2CH2-，羟基亚烷基或氨基亚烷基，例如

7. 发明授权

US4486232A Electrode material for semi-conductor devices 失效
标题翻译：半导体器件用电极材料
公开(公告)号：US4486232A
公开(公告)日：1984-12-04
申请号：US523857
申请日：1983-08-17
申请人： Mitsuo Nakatani , Haruhiko Matsuyama , Masaaki Okunaka , Hitoshi Yokono , Tokio Isogai , Tadashi Saitoh , Sumiyuki Midorikawa
发明人： Mitsuo Nakatani , Haruhiko Matsuyama , Masaaki Okunaka , Hitoshi Yokono , Tokio Isogai , Tadashi Saitoh , Sumiyuki Midorikawa
IPC分类号： H01L31/04 , H01L21/28 , H01L21/283 , H01L21/288 , H01L29/43 , H01L31/0224 , H01B1/02
CPC分类号： H01L31/022408 , H01L31/022425 , Y02E10/50
摘要： An electrode material for semi-conductor device such as solar cells comprises Ag powders, at least one metal of zirconium, hafnium, vanadium, niobium, and tantalum, an organic binder, and an organic solvent, and, if necessary, glass, Pd powders and Pt powders.The electrodes are prepared from the electrode material by printing, drying and firing at a low temperature and have a low contact resistance without any junction breakage or increase in leak current.
摘要翻译：用于半导体器件如太阳能电池的电极材料包括Ag粉末，至少一种锆，铪，钒，铌和钽金属，有机粘合剂和有机溶剂，并且如果需要，玻璃，Pd粉末和Pt粉末。电极由电极材料通过在低温下进行印刷，干燥和烧制而制备，并且具有低接触电阻而没有任何断裂或漏电流增加。

8. 发明授权

US4347304A Process for forming metallic image 失效
标题翻译：金属图像形成工艺
公开(公告)号：US4347304A
公开(公告)日：1982-08-31
申请号：US277049
申请日：1981-06-24
申请人： Hideki Sakurai , Mitsuo Nakatani , Hitoshi Oka , Hitoshi Yokono , Tokio Isogai
发明人： Hideki Sakurai , Mitsuo Nakatani , Hitoshi Oka , Hitoshi Yokono , Tokio Isogai
IPC分类号： G03C5/58 , G03F7/004 , H05K3/18 , G03C5/00
CPC分类号： H05K3/185 , G03C5/58 , G03F7/0043 , Y10S430/143
摘要： Metallic images of uniform quality can be formed on substrates having through-holes by a process using a positive type resist characterized by using as a coating solution for the substrate a solution of a photosensitive material of (a) at least one organic compound having at least one linkage of --M--M--M ).sub.n (M=Si, Ge or Sn; n=0, 1 or more) in the molecule or (b) a mixture of at least one organic compound (a) mentioned above and at least one photosensitizer, dissolved in a solvent such as a halogenated hydrocarbon, an aromatic hydrocarbon, a heterocyclic compound, or a mixture thereof, followed by irradiation with an actinic light through a photomask and electroless plating.
摘要翻译：可以通过使用正型抗蚀剂的方法在具有通孔的基板上形成具有均匀质量的金属图像，其特征在于使用作为基底的涂布溶液的（a）至少一种有机化合物的感光材料的溶液，所述有机化合物至少具有分子中nMM（M = Si，Ge或Sn; n = 0,1或更多）的一个连接，或（b）上述至少一种有机化合物（a）和至少一种光敏剂的混合物，溶解在溶剂如卤代烃，芳族烃，杂环化合物或其混合物中，然后通过光掩模和化学镀被光化的光照射。

9. 发明授权

US4324629A Process for regenerating chemical copper plating solution 失效
标题翻译：化学镀铜液再生方法
公开(公告)号：US4324629A
公开(公告)日：1982-04-13
申请号：US160201
申请日：1980-06-17
申请人： Hitoshi Oka , Hiroshi Kikuchi , Hitoshi Yokono , Haruo Suzuki , Toyofusa Yoshimura , Akira Matsuo , Osamu Miyazawa , Isamu Tanaka , Tokio Isogai
发明人： Hitoshi Oka , Hiroshi Kikuchi , Hitoshi Yokono , Haruo Suzuki , Toyofusa Yoshimura , Akira Matsuo , Osamu Miyazawa , Isamu Tanaka , Tokio Isogai
IPC分类号： C23C18/16 , C23C18/31 , C23G1/36 , C25D21/16 , B01D13/02
CPC分类号： B01D61/44 , C23C18/1617 , B01D2311/04 , Y10S204/13
摘要： During recyclic use of a chemical copper plating solution, counter anions to copper ions, anions formed by oxidation of a reducing agent, and carbon dioxide by absorption of carbon dioxide from air, which all have an inhibiting effect upon the plating, and also sodium ions having no inhibiting effect are accumulated in the plating solution.These accumulated ions can be removed by electrodialysis. Particularly, regeneration can be satisfactorily regenerated by adjusting the pH of used chemical plating solution to 2-11 before the electrodialysis, and using a selectively monovalent anion permeable membrane as an anion exchange membrane at the electrodialysis.
摘要翻译：在循环使用化学镀铜溶液时，与铜离子相反的阴离子，通过还原剂的氧化形成的阴离子，以及二氧化碳从空气中吸收二氧化碳，这些都对电镀具有抑制作用，还有钠离子在电镀溶液中没有积累抑制作用。这些积聚的离子可以通过电渗析去除。特别地，通过在电渗析之前将所使用的化学镀溶液的pH调节至2-11，并且在电渗析中使用选择性的单价阴离子可渗透膜作为阴离子交换膜，可以令人满意地再生。

10. 发明授权

US4369208A Process for producing transparent electroconductive film 失效
标题翻译：制造透明导电膜的方法
公开(公告)号：US4369208A
公开(公告)日：1983-01-18
申请号：US215334
申请日：1980-12-11
申请人： Masaaki Okunaka , Ryoichi Sudo , Hitoshi Yokono , Tokio Isogai , Mitsuo Yamazaki
发明人： Masaaki Okunaka , Ryoichi Sudo , Hitoshi Yokono , Tokio Isogai , Mitsuo Yamazaki
IPC分类号： H01B13/00 , C03C17/27 , C23C18/12 , C23C18/14 , H05K1/09 , H05K3/02 , B05D3/06
CPC分类号： C23C18/14 , C03C17/27 , C23C18/1216 , C23C18/1245 , C03C2217/211 , C03C2217/215 , C03C2217/24 , C03C2218/11 , C03C2218/322 , H05K1/092 , H05K3/02
摘要： A transparent electroconductive film of lower resistance with a smaller content of remaining organic components and less pinholes than those of the conventional transparent electroconductive film is produced by applying a coating solution selected from (a) a coating solution comprising an inorganic indium compound free from a photosensitive group in the molecule or an inorganic tin compound free from a photosensitive group in the molecule, an organic ligand, and an organic solvent, (b) a coating solution comprising an organic indium compound free from a photosensitive group in the molecule, or an organic tin compound free from a photosensitive group in the molecule, and an organic solvent, and (c) the coating solution (a) or (b) further containing a dopant to the surface of a substrate, thereby forming a film thereon, and then irradiating the substrate with radiation capable of exciting organic groups, for example, ultraviolet rays in a state where the substrate is kept at a high temperature (100.degree.-600.degree. C.), and then baking the substrate at a high temperature.
摘要翻译：通过涂布选自（a）包含无光感光体的无机铟化合物的涂布溶液的涂布溶液，制备具有较低电阻的透明导电膜，其具有较少的剩余有机组分含量和较少的针孔，或分子中不含光敏基团的无机锡化合物，有机配体和有机溶剂，（b）包含在分子中不含感光性基团的有机铟化合物的涂布溶液或有机溶剂分子内不含光敏基团的锡化合物和有机溶剂，和（c）在基材表面还含有掺杂剂的涂布液（a）或（b），从而在其上形成膜，然后照射具有能够激发有机基团的辐射的基板，例如在基板保持高温的状态下的紫外线（100°-600℃），然后在高温下烘烤该基材。

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