专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5491203A Polyorganosiloxane and process for producing the same 失效
标题翻译：聚有机硅氧烷及其制造方法
公开(公告)号：US5491203A
公开(公告)日：1996-02-13
申请号：US302255
申请日：1994-09-08
申请人： Fumio Matsui , Nobuo Uotani , Masatoshi Murakami , Yuji Itoh
发明人： Fumio Matsui , Nobuo Uotani , Masatoshi Murakami , Yuji Itoh
IPC分类号： C08L61/20 , C08F290/06 , C08G18/61 , C08G77/06 , C08G77/14 , C08G77/20 , C08G77/22 , C08G77/28 , C08L83/04 , C09D183/04 , C08F283/00
CPC分类号： C08G77/22 , C08F290/068 , C08G77/14 , C08G77/20 , C08G77/28
摘要： This invention relates to a polyorganosiloxane comprising a polymethylsilsesquioxane structure as a main structural unit and having a methyl group and a reactive group at the side chains thereof, which is suitable as a polymer modifier; a process for producing the same; a copolymer resin obtained by polymerizing the polyorganosiloxane with a polymerizable monomer or by reacting the polyorganosiloxane with a polymer; a method for crosslinking the copolymer resin; and a coating composition containing the copolymer resin.
摘要翻译：本发明涉及一种聚有机硅氧烷，其包含聚甲基倍半硅氧烷结构作为主要结构单元，并且在侧链上具有甲基和反应性基团，其适合作为聚合物改性剂; 其制造方法; 通过使聚有机硅氧烷与可聚合单体聚合而获得的共聚物树脂或通过使聚有机硅氧烷与聚合物反应而获得; 交联共聚物树脂的方法; 和含有共聚物树脂的涂料组合物。

2. 发明申请

US20070128872A1 Polishing composition and polishing method 审中-公开
标题翻译：抛光组合物和抛光方法
公开(公告)号：US20070128872A1
公开(公告)日：2007-06-07
申请号：US10579335
申请日：2004-11-15
申请人： Yuji Itoh , Ayako Nishioka , Nobuo Uotani
发明人： Yuji Itoh , Ayako Nishioka , Nobuo Uotani
IPC分类号： H01L21/44 , H01L21/302
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/32115 , H01L21/3212 , H01L21/7684
摘要： As a polishing composition which allows high-speed polishing while dishing and erosion are prevented and the flatness of metal film is maintained, there is provided a polishing composition for polishing a metal film provided on a substrate having trenches such that the metal film fills the trenches, so as to provide a planarized surface, wherein the composition comprises water, a phosphate ester having a C≧6 carbon atom alkyl group in its molecule, and an etchant for the metal, and has a pH of 5 to 11.
摘要翻译：作为能够防止凹陷和侵蚀而进行高速抛光并且保持金属膜的平坦度的抛光组合物，提供了一种用于抛光设置在具有沟槽的基底上的金属膜的抛光组合物，使得金属膜填充沟槽，以提供平坦化的表面，其中组合物包含水，分子中具有C> = 6个碳原子烷基的磷酸酯和金属的蚀刻剂，并且具有5至11的pH。

3. 发明授权

US06952025B2 Semiconductor light-emitting device 失效
标题翻译：半导体发光装置
公开(公告)号：US06952025B2
公开(公告)日：2005-10-04
申请号：US10048854
申请日：2001-06-05
申请人： Takayuki Kamemura , Kazuhiro Mitani , Teruyuki Kobayashi , Nobuo Uotani , Kasumi Nakamura , Yuji Itoh
发明人： Takayuki Kamemura , Kazuhiro Mitani , Teruyuki Kobayashi , Nobuo Uotani , Kasumi Nakamura , Yuji Itoh
IPC分类号： H01L33/46 , H01L21/00 , H01L29/22 , H01L29/227
CPC分类号： H01L33/46
摘要： A small-sized semiconductor light-emitting device of high emission directivity and high output is provided. A portion of a light extraction section of a semiconductor light-emitting device including a pn-junction portion is covered with a light-shielding substance of low conductivity. The electrical resistance of the light-shielding substance is 106 Ωm or higher, and the substance contains powder of at least one species selected from metals and pigments. The powder of metal contains at least one species selected from among Al, Cu, Ag, Au, Pt, Ti, Ni, Sn, Pb, Mg, Zn, Fe, Co, and Cr. The powder is a plate-like powder having a thickness falling within a range of 0.001-10 μm and a length falling within a range of 0.01-100 μm.
摘要翻译：提供了高发射方向性和高输出的小尺寸半导体发光器件。包括pn结部分的半导体发光器件的光提取部分的一部分被低导电性的遮光物体覆盖。遮光物质的电阻为10 -6Ω以上，该物质含有选自金属和颜料中的至少一种的粉末。金属粉末含有选自Al，Cu，Ag，Au，Pt，Ti，Ni，Sn，Pb，Mg，Zn，Fe，Co和Cr中的至少一种。粉末是厚度在0.001-10μm范围内且长度落在0.01-100μm范围内的板状粉末。

4. 发明授权

US06362348B1 Additive for inkjet printing, recording solution, method for preventing discoloration and fading of image, and recording sheet 失效
标题翻译：用于喷墨印刷，记录溶液，防止图像变色和褪色的方法以及记录纸的添加剂
公开(公告)号：US06362348B1
公开(公告)日：2002-03-26
申请号：US09496647
申请日：2000-02-03
申请人： Hiroshi Takahashi , Nobuo Uotani , Yuji Itoh , Toshio Koshikawa
发明人： Hiroshi Takahashi , Nobuo Uotani , Yuji Itoh , Toshio Koshikawa
IPC分类号： C07D30762
CPC分类号： B41M5/5227 , B41M7/0027 , C09D11/38
摘要： An additive for inkjet printing, comprising a stabilized ascorbic acid derivative. Also disclosed are a recording solution, a method for preventing discoloration and fading of an image, and a recording sheet, each using the additive. The color change of an image can be prevented by incorporating the stabilized ascorbic acid derivative into an inkjet-printed image.
摘要翻译：一种用于喷墨印刷的添加剂，其包含稳定的抗坏血酸衍生物。还公开了各种使用添加剂的记录溶液，防止图像的变色和褪色的方法和记录片材。可以通过将稳定的抗坏血酸衍生物并入喷墨打印图像中来防止图像的颜色变化。

5. 发明授权

US06299659B1 Polishing material composition and polishing method for polishing LSI devices 有权
标题翻译：用于抛光LSI器件的抛光材料组成和抛光方法
公开(公告)号：US06299659B1
公开(公告)日：2001-10-09
申请号：US09564205
申请日：2000-05-04
申请人： Takanori Kido , Fumio Tsujino , Kagetaka Ichikawa , Nobuo Uotani
发明人： Takanori Kido , Fumio Tsujino , Kagetaka Ichikawa , Nobuo Uotani
IPC分类号： C09K314
CPC分类号： C09G1/02 , C09K3/1463
摘要： A polishing-material composition, for polishing of LSI devices, which is a polishing-material composition comprising water and cerium oxide which has been surface-treated with a coupling agent, wherein the maximum value is no greater than about 5 &mgr;m and the average value is about 0.01-1.0 &mgr;m in the secondary particle size distribution of the cerium oxide. Also, a polishing method for LSI devices which employs the polishing-material composition.
摘要翻译：一种用于抛光LSI器件的抛光材料组合物，其是用偶联剂表面处理的包含水和氧化铈的抛光材料组合物，其中最大值不大于约5μm，平均值在氧化铈的二次粒径分布中为约0.01〜1.0μm。另外，采用该研磨材料组合物的LSI装置的研磨方法。

6. 发明授权

US4954590A Preparation of polymer having isoindole structures 失效
标题翻译：具有异吲哚结构的聚合物的制备
公开(公告)号：US4954590A
公开(公告)日：1990-09-04
申请号：US327875
申请日：1989-03-23
申请人： Haruo Yoshida , Nobuo Uotani , Yoshihiro Saida
发明人： Haruo Yoshida , Nobuo Uotani , Yoshihiro Saida
IPC分类号： C08G73/06 , C08G61/12 , H01B1/12
CPC分类号： C08G61/124 , H01B1/127
摘要： A polymer having an isoindole structure represented by the following general formula: ##STR1##wherein R.sup.1, R.sup.2 and R.sup.3 independently represent a hydrogen atom or a hydrocarbon group having 1 to 5 carbon atoms, X.sup.- represents an anion of an electrolyte, y is a number of from 0.01 to 1, which indicates the proportion of the anion to 1 mole of the monomer, and n is a number of from 5 to 500, which indicates the degree of polymerization,shows a high electroconductivity when doped, and the stability of the polymer in the oxidized state is high. This polymer is obtained by subjecting an isoindole compound represented by the following general formula: ##STR2## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined above, to (1) electrochemical polymerization in the presence of an electrolyte in a solvent or (2) oxidative polymerization in a solvent by the action of an oxidant.

7. 发明授权

US06811597B2 Ink composition, recording medium, inkjet recording method, and recording 失效
标题翻译：油墨组合物，记录介质，喷墨记录方法和记录
公开(公告)号：US06811597B2
公开(公告)日：2004-11-02
申请号：US10103661
申请日：2002-03-21
申请人： Yasuhiro Oki , Kazuhiko Kitamura , Tetsuya Aoyama , Kyoichi Oka , Nobuo Uotani , Hiroshi Takahashi , Yuji Ito
发明人： Yasuhiro Oki , Kazuhiko Kitamura , Tetsuya Aoyama , Kyoichi Oka , Nobuo Uotani , Hiroshi Takahashi , Yuji Ito
IPC分类号： C09D1100
CPC分类号： C09D11/38
摘要： An ink composition and/or a recording medium are made to contain a compound expressed by general formula (1) and a hydrazide compound. An ink composition thereby obtained does not clog and the ink composition and recording medium thus obtained can offer high quality images that hardly cause yellowing of the resulting recording with superior light resistance. Recording and an inkjet recording method pertaining thereto are also provided. The compound of general formula (1) is:
摘要翻译：制备油墨组合物和/或记录介质以含有由通式（1）表示的化合物和酰肼化合物。由此获得的油墨组合物不会堵塞，并且由此获得的油墨组合物和记录介质可以提供难以使得所得记录变黄的高质量图像，具有优异的耐光性。还提供了记录和喷墨记录方法。通式（1）的化合物为：

8. 发明授权

US06547843B2 LSI device polishing composition and method for producing LSI device 有权
公开(公告)号：US06547843B2
公开(公告)日：2003-04-15
申请号：US09775611
申请日：2001-07-02
申请人： Yoshitomo Shimazu , Takanori Kido , Nobuo Uotani
发明人： Yoshitomo Shimazu , Takanori Kido , Nobuo Uotani
IPC分类号： C09G102
CPC分类号： C09G1/02 , C09K3/1436 , C09K3/1463 , H01L21/3212
摘要： The present invention provides an LSI device polishing composition containing water, abrasive grains, an organic acid, and an oxidizing agent, and having a pH of 5.5-10.0 adjusted by an alkaline substance, the LSI device polishing composition being used for polishing a copper-containing metal wiring layer in which copper is deposited on an insulating film via barrier metal formed of Ta or TaN; and a method for producing LSI devices by use of the polishing composition. During polishing of a barrier metal such as Ta or TaN and a copper wiring layer, the rate of polishing Ta or TaN can be enhanced, to thereby prevent dishing and erosion.

9. 发明授权

US06498222B1 Water resistance imparter, ink composition, reactive fluid, and method of ink-jet recording with two fluids 有权
标题翻译：耐水突变体，油墨组合物，反应性流体以及用两种流体喷墨记录的方法
公开(公告)号：US06498222B1
公开(公告)日：2002-12-24
申请号：US09744090
申请日：2001-03-09
申请人： Kazuhiko Kitamura , Hitoshi Ota , Tetsuya Aoyama , Nobuo Uotani , Yuji Ito , Hiroshi Takahashi
发明人： Kazuhiko Kitamura , Hitoshi Ota , Tetsuya Aoyama , Nobuo Uotani , Yuji Ito , Hiroshi Takahashi
IPC分类号： C08F22602
CPC分类号： C09D11/30 , B41J2/17 , B41J2/2114 , B41M5/5245 , C08F220/60 , C09D11/54
摘要： Disclosed is a cationic water-soluble resin which comprises a (co)polymer of, in formula (I), repeating units (a) represented by formula (a) and repeating units (b) represented by formula (b), the content of the repeating units (a) in the (co)polymer being 100 to 0% by mole, the (co)polymer having in its molecule a carboxyl-containing group as one of the terminal groups and an aromatic ring-containing group as the other terminal group. The addition of this resin to ink compositions can realize the formation of images possessing excellent waterfastness and lightfastness and having no significant feathering or color bleeding. Likewise, the addition of this resin to a reaction solution for ink jet recording involving the deposition of two liquids, an ink composition and a reaction solution, onto a recording medium, can realize the formation of images possessing excellent waterfastness and lightfastness and no significant feathering or color bleeding. wherein R1 represents hydrogen or methyl; R2 and R3 represent C1-3 alkyl; R4 represents hydrogen or methyl; R5, R6, and R7 represent C1-3 alkyl; Z− represents a counter ion; and k and 1 are each 1, 2, or 3.
摘要翻译：公开了一种阳离子型水溶性树脂，其包含式（I）中的（共）聚合物，由式（a）表示的重复单元（a）和由式（b）表示的重复单元（b）），其含量（共）聚合物中的重复单元（a）为100〜0摩尔％，在其分子中具有含羧基的端基中的（共）聚合物和作为其它的含芳环的基团终端组。将这种树脂添加到油墨组合物中可以实现具有优异的耐水性和耐光性并且没有明显的羽化或着色渗色的图像的形成。同样地，将这种树脂添加到用于喷墨记录的反应溶液中，包括将两种液体，油墨组合物和反应溶液沉积在记录介质上，可以实现具有优异耐水性，耐光性和无明显羽化的图像的形成或颜色渗色。其中R1表示氢或甲基; R2和R3表示C1-3烷基; R4代表氢或甲基; R5，R6和R7表示C1-3烷基; Z-表示抗衡离子; 而k和1分别为1,2或3。

10. 发明申请

US20090093118A1 POLISHING COMPOSITION 审中-公开
标题翻译：抛光组合物
公开(公告)号：US20090093118A1
公开(公告)日：2009-04-09
申请号：US11911508
申请日：2006-04-14
申请人： Nobuo Uotani , Hiroshi Takahashi , Takashi Sato , Hajime Sato
发明人： Nobuo Uotani , Hiroshi Takahashi , Takashi Sato , Hajime Sato
IPC分类号： H01L21/461 , C09G1/02
CPC分类号： H01L21/3212 , B24B37/044 , C09G1/02 , C09K3/1463
摘要： In order to polish a wiring metal, a polishing composition ensuring that etching and erosion are suppressed and the residual wiring metal on the portion other than wiring is decreased, is provided, in which a polishing composition comprising (A) an azole group-containing compound having 3 or more azole groups within the molecule and a molecular weight of 300 to 15,000, (B) an oxidant, and (C) one, two or more acids selected from the group consisting of an amino acid, an organic acid and an inorganic acid is provided.
摘要翻译：为了研磨布线金属，可以提供确保蚀刻和侵蚀的抛光组合物，并且布线以外的部分上的残留布线金属减少，其中包含（A）含唑类化合物在分子内具有3个或更多个唑基，分子量为300至15,000，（B）氧化剂，和（C）选自氨基酸，有机酸和无机酸的一种或多种酸提供酸。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式