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1. 发明授权

US06844027B1 Environment exchange control for material on a wafer surface 有权
标题翻译：晶圆表面材料的环境交换控制
公开(公告)号：US06844027B1
公开(公告)日：2005-01-18
申请号：US09563775
申请日：2000-05-02
申请人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Scott C. Wackerman , Reese Reynolds
发明人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Scott C. Wackerman , Reese Reynolds
IPC分类号： G03F7/039 , G03F7/16 , G03F7/20 , G03F7/26 , G03F7/38 , H01L21/027 , B05D3/12
CPC分类号： G03F7/70866 , G03F7/168 , G03F7/26 , G03F7/38
摘要： Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).
摘要翻译：描述了用于晶片表面上的聚合物的环境交换控制的系统和方法。用于控制位于环境中的晶片表面上的环境和聚合物之间的交换的装置包括：适于保持晶片的腔室，限定环境，并将聚合物保持在与环境相邻的关系中; 以及耦合到所述室的加热器。提高旋涂材料的性能的方法包括：在晶片的表面上形成旋涂材料; 然后将旋涂材料定位在环境中，使得所述环境与所述旋涂材料相邻; 然后控制旋涂材料和所述环境之间的交换。系统和方法提供了优点，因为通过仔细控制环境温度和环境物质分压（例如相对湿度）来减轻不适当的脱保护。

2. 发明授权

US06911091B2 Environment exchange control for material on a wafer surface 有权
公开(公告)号：US06911091B2
公开(公告)日：2005-06-28
申请号：US10161840
申请日：2002-06-03
申请人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Scott C. Wackerman , Reese Reynolds
发明人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Scott C. Wackerman , Reese Reynolds
IPC分类号： G03F7/039 , G03F7/16 , G03F7/20 , G03F7/26 , G03F7/38 , H01L21/027 , B05C11/00 , B05C11/02
CPC分类号： G03F7/70866 , G03F7/168 , G03F7/26 , G03F7/38
摘要： Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber.A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).

3. 发明授权

US06780461B2 Environment exchange control for material on a wafer surface 有权
标题翻译：晶圆表面材料的环境交换控制
公开(公告)号：US06780461B2
公开(公告)日：2004-08-24
申请号：US09798345
申请日：2001-03-01
申请人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Scott C. Wackerman , Reese Reynolds
发明人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Scott C. Wackerman , Reese Reynolds
IPC分类号： B05D304
CPC分类号： G03F7/70866 , G03F7/168 , G03F7/26 , G03F7/38
摘要： Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).
摘要翻译：描述了用于晶片表面上的聚合物的环境交换控制的系统和方法。用于控制位于环境中的晶片表面上的环境和聚合物之间的交换的装置包括：适于保持晶片的腔室，限定环境，并将聚合物保持在与环境相邻的关系中; 以及耦合到所述室的加热器。提高旋涂材料的性能的方法包括：在晶片的表面上形成旋涂材料; 然后将旋涂材料定位在环境中，使得所述环境与所述旋涂材料相邻; 然后控制旋涂材料和所述环境之间的交换。系统和方法提供了优点，因为通过仔细控制环境温度和环境物质分压（例如相对湿度）来减轻不适当的脱保护。

4. 发明授权

US06468586B1 Environment exchange control for material on a wafer surface 有权
标题翻译：晶圆表面材料的环境交换控制
公开(公告)号：US06468586B1
公开(公告)日：2002-10-22
申请号：US09566605
申请日：2000-05-08
申请人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Scott C. Wackerman , Reese Reynolds
发明人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Scott C. Wackerman , Reese Reynolds
IPC分类号： B05D304
CPC分类号： G03F7/70866 , G03F7/168 , G03F7/26 , G03F7/38
摘要： Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).
摘要翻译：描述了用于晶片表面上的聚合物的环境交换控制的系统和方法。用于控制位于环境中的晶片表面上的环境和聚合物之间的交换的装置包括：适于保持晶片的腔室，限定环境，并将聚合物保持在与环境相邻的关系中; 以及耦合到所述室的加热器。提高旋涂材料的性能的方法包括：在晶片的表面上形成旋涂材料; 然后将旋涂材料定位在环境中，使得所述环境与所述旋涂材料相邻; 然后控制旋涂材料和所述环境之间的交换。系统和方法提供了优点，因为通过仔细控制环境温度和环境物质分压（例如相对湿度）来减轻不适当的脱保护。

5. 发明授权

US06254936B1 Environment exchange control for material on a wafer surface 有权
标题翻译：晶圆表面材料的环境交换控制
公开(公告)号：US06254936B1
公开(公告)日：2001-07-03
申请号：US09222117
申请日：1998-12-29
申请人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Reese Reynolds , Scott C. Wackerman
发明人： Emir Gurer , Ed C. Lee , Tom Zhong , Kevin Golden , John W. Lewellen , Reese Reynolds , Scott C. Wackerman
IPC分类号： B05D300
CPC分类号： G03F7/70866 , G03F7/168 , G03F7/26 , G03F7/38
摘要： Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).
摘要翻译：描述了用于晶片表面上的聚合物的环境交换控制的系统和方法。用于控制位于环境中的晶片表面上的环境和聚合物之间的交换的装置包括：适于保持晶片的腔室，限定环境，并将聚合物保持在与环境相邻的关系中; 以及耦合到所述室的加热器。提高旋涂材料的性能的方法包括：在晶片的表面上形成旋涂材料; 然后将旋涂材料定位在环境中，使得所述环境与所述旋涂材料相邻; 然后控制旋涂材料和所述环境之间的交换。系统和方法提供了优点，因为通过仔细控制环境温度和环境物质分压（例如相对湿度）来减轻不适当的脱保护。

6. 发明授权

US06327793B1 Method for two dimensional adaptive process control of critical dimensions during spin coating process 有权
标题翻译：旋涂过程中二维自适应过程控制关键尺寸的方法
公开(公告)号：US06327793B1
公开(公告)日：2001-12-11
申请号：US09531912
申请日：2000-03-20
申请人： Emir Gurer , Tom Zhong , John W. Lewellen , Eddie Lee
发明人： Emir Gurer , Tom Zhong , John W. Lewellen , Eddie Lee
IPC分类号： F26B508
CPC分类号： G03F7/162 , B05D1/005 , B05D3/0254 , G03F7/16
摘要： A process for drying a polymeric material present on a substrate is provided. Temperatures of the polymeric material is measured and the ambient temperature in the vicinity of the substrate. A temperature of the substrate is also measured. A variation in the measured ambient temperature is detected. The substrate temperature, polymeric temperature, ambient temperature or a substrate drying spin speed is adjusted in response to the detected variation in the measured ambient temperature.
摘要翻译：提供了一种用于干燥存在于基底上的聚合物材料的方法。测量聚合物材料的温度和基材附近的环境温度。还测量衬底的温度。检测到测量的环境温度的变化。响应于检测到的测量环境温度的变化来调节衬底温度，聚合物温度，环境温度或衬底干燥旋转速度。

7. 发明授权

US06662466B2 Method for two dimensional adaptive process control of critical dimensions during spin coating process 有权
公开(公告)号：US06662466B2
公开(公告)日：2003-12-16
申请号：US10013785
申请日：2001-12-11
申请人： Emir Gurer , Tom Zhong , John W. Lewellen , Eddie Lee
发明人： Emir Gurer , Tom Zhong , John W. Lewellen , Eddie Lee
IPC分类号： F26B508
CPC分类号： G03F7/162 , B05D1/005 , B05D3/0254 , G03F7/16
摘要： A process for drying a polymeric material present on a substrate is provided. Temperatures of the polymeric material is measured and the ambient temperature in the vicinity of the substrate. A temperature of the substrate is also measured. A variation in the measured ambient temperature is detected. The substrate temperature, polymeric temperature, ambient temperature or a substrate drying spin speed is adjusted in response to the detected variation in the measured ambient temperature.

8. 发明授权

US07394201B2 Field emission cathode gating for RF electron guns and planar focusing cathodes 有权
标题翻译：用于射频电子枪和平面聚焦阴极的场发射阴极门控
公开(公告)号：US07394201B2
公开(公告)日：2008-07-01
申请号：US11248661
申请日：2005-10-11
申请人： John W. Lewellen , John Noonan
发明人： John W. Lewellen , John Noonan
IPC分类号： H01J25/00
CPC分类号： H01J3/14 , H01J3/021 , H01J23/06
摘要： A novel method of gating electron emission from field-emitter cathodes for radio frequency (RF) electrode guns and a novel cathode that provides a focused electron beam without the need for magnetic fields or a curved cathode surface are provided. The phase and strength of a predefined harmonic field, such as the 3rd harmonic field, are adjusted relative to a fundamental field to cause a field emission cathode to emit electrons at predefined times for the generation of high-brightness electron beams. The emission time is gated responsive to the combined harmonic and fundamental fields and the response of the FE cathode to the combined fields. A planar focusing cathode includes a selected dielectric material, such as a ceramic material, to provide an electron beam emission surface. Metal surfaces are provided both radially around and behind the dielectric material to shape the electric fields that accelerate and guide the beam from the cathode surface.
摘要翻译：提供了一种用于射频（RF）电极枪的场发射极阴极的电子发射的新颖方法和提供聚焦电子束而不需要磁场或弯曲阴极表面的新型阴极。预定谐波场（例如三次谐波场）的相位和强度相对于基波场被调整，以使场致发射阴极在预定时间内发射电子以产生高亮度电子束。发射时间响应于组合谐波和基波场以及FE阴极对组合场的响应而选通。平面聚焦阴极包括选择的介电材料，例如陶瓷材料，以提供电子束发射表面。在电介质材料的周围和后面设置金属表面，以形成加速和引导来自阴极表面的光束的电场。

9. 发明授权

US07250727B2 High power, long focus electron source for beam processing 有权
标题翻译：用于光束处理的大功率，长焦距电子源
公开(公告)号：US07250727B2
公开(公告)日：2007-07-31
申请号：US11143417
申请日：2005-06-02
申请人： John W. Lewellen , John Noonan
发明人： John W. Lewellen , John Noonan
IPC分类号： H01J7/24
CPC分类号： H01J37/065 , H01J3/021 , H01J37/073 , H01J37/305 , H01J2201/317 , H01J2237/303 , H01J2237/3104 , H01J2237/3132
摘要： Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.
摘要翻译：包括电子束焊接和用于薄膜沉积的电子束蒸发的光束处理方法是用新的大功率长焦点电子源来实现的。大功率长焦点电子源产生电子束。电子束通过一系列转向磁铁传送以转向光束。提供至少一个重新聚焦磁体以重新聚焦电子束。最终的转向磁铁将电子束弯曲成对准目标，例如焊接接头或沉积靶。

10. 发明授权

US07760054B2 Tubular RF cage field confinement cavity 失效
标题翻译：管状RF笼式场限制腔
公开(公告)号：US07760054B2
公开(公告)日：2010-07-20
申请号：US11747021
申请日：2007-05-10
申请人： John W. Lewellen , John Noonan , Terry L. Smith , Geoff Waldschmidt
发明人： John W. Lewellen , John Noonan , Terry L. Smith , Geoff Waldschmidt
IPC分类号： H01P7/06
CPC分类号： H01P7/06
摘要： An RF cavity is provided with a plurality of tubes that are formed into a tubular cage in a predefined shape to define the RF cavity. A selected number of tubes and a selected tube diameter are provided to form a confinement cage for the RF fields within the RF cavity defined by the tubes. The multiple, small metal tubes are selectively bent to form different cavity shapes and sizes as needed to accelerate the particles and function as a confinement cage for the RF fields within the RF cavity defined by the tubes. The cost to fabricate RF cavities using the tubular cage design is significantly lower than the cost of producing a solid cavity using conventional fabrication technology.
摘要翻译： RF空腔设置有多个管，其形成为预定形状的管状保持架以限定RF空腔。提供选定数量的管和选定的管直径以形成用于由管限定的RF空腔内的RF场的约束笼。多个小金属管被选择性地弯曲以形成不同的腔形状和尺寸，以加速颗粒并且用作用于由管限定的RF空腔内的RF场的约束笼。使用管状保持架设计制造射频腔的成本远低于使用常规制造技术制造固体腔的成本。

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