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1. 发明授权

US08476580B2 Angle-measuring device and line of products with such angle-measuring devices 有权
标题翻译：角度测量装置和具有这种角度测量装置的产品线
公开(公告)号：US08476580B2
公开(公告)日：2013-07-02
申请号：US12988573
申请日：2009-03-12
申请人： Elmar Mayer , Thomas Schürmann , Christoph Lingk
发明人： Elmar Mayer , Thomas Schürmann , Christoph Lingk
IPC分类号： G01D5/34
CPC分类号： G01D5/2492 , H03M1/282
摘要： An angle-measuring device having a scanning device with which scanning of a closed serial first code and scanning of a closed serial second code is enabled, wherein a length of the closed serial second code is less than a length of the closed serial first code, and the closed serial first code and the closed serial second code have at least one common code section. The angle-measuring device includes a detector array for generating first and second sequences of code words of a predetermined scanning length upon scanning of the closed serial first code and second codes, respectively. The first sequence includes a first partial sequence and one common partial sequence, and wherein the common partial sequence is created upon scanning of the common code section. The second sequence includes a second partial sequence and the common partial sequence. The angle-measuring device further includes a decoding device designed for decoding the first and second sequences of code words, wherein the closed serial first and second codes as well as the predetermined scanning length are selected such that code words of the first and second sequences have a Hamming distance greater than 1.
摘要翻译：一种角度测量装置，其具有扫描装置，通过该扫描装置对封闭的串行第一码进行扫描，并且关闭串行第二码的扫描被使能，其中闭合串行第二码的长度小于闭合串行第一码的长度，并且封闭的串行第一代码和封闭的串行第二代码具有至少一个公共代码段。角度测量装置包括检测器阵列，用于分别在扫描闭合串行第一码和第二码时产生预定扫描长度的第一和第二码字序列。第一序列包括第一部分序列和一个公共部分序列，并且其中在扫描公共代码段时创建公共部分序列。第二序列包括第二部分序列和公共部分序列。角度测量装置还包括被设计用于解码第一和第二码字序列的解码装置，其中选择闭合串行第一和第二码以及预定扫描长度，使得第一和第二序列的码字具有汉明距离大于1。

2. 发明申请

US20110290888A1 ANGLE-MEASURING DEVICE AND LINE OF PRODUCTS COMPRISING SAID ANGLE-MEASURING DEVICES 有权
标题翻译：角度测量装置和包含角度测量装置的产品线
公开(公告)号：US20110290888A1
公开(公告)日：2011-12-01
申请号：US12988573
申请日：2009-03-12
申请人： Elmar Mayer , Thomas Schürmann , Christoph Lingk
发明人： Elmar Mayer , Thomas Schürmann , Christoph Lingk
IPC分类号： G06K7/10
CPC分类号： G01D5/2492 , H03M1/282
摘要： An angle-measuring device having a scanning device with which scanning of a closed serial first code and scanning of a closed serial second code is enabled, wherein a length of the closed serial second code is less than a length of the closed serial first code, and the closed serial first code and the closed serial second code have at least one common code section. The angle-measuring device includes a detector array for generating first and second sequences of code words of a predetermined scanning length upon scanning of the closed serial first code and second codes, respectively. The first sequence includes a first partial sequence and one common partial sequence, and wherein the common partial sequence is created upon scanning of the common code section. The second sequence includes a second partial sequence and the common partial sequence. The angle-measuring device further includes a decoding device designed for decoding the first and second sequences of code words, wherein the closed serial first and second codes as well as the predetermined scanning length are selected such that code words of the first and second sequences have a Hamming distance greater than 1.
摘要翻译：一种角度测量装置，其具有扫描装置，通过该扫描装置对封闭的串行第一码进行扫描，并且关闭串行第二码的扫描被使能，其中闭合串行第二码的长度小于闭合串行第一码的长度，并且封闭的串行第一代码和封闭的串行第二代码具有至少一个公共代码段。角度测量装置包括检测器阵列，用于分别在扫描闭合串行第一码和第二码时产生预定扫描长度的第一和第二码字序列。第一序列包括第一部分序列和一个公共部分序列，并且其中在扫描公共代码段时创建公共部分序列。第二序列包括第二部分序列和公共部分序列。角度测量装置还包括被设计用于解码第一和第二码字序列的解码装置，其中选择闭合串行第一和第二码以及预定扫描长度，使得第一和第二序列的码字具有汉明距离大于1。

3. 发明申请

US20110208475A1 ABSOLUTE ANGLE CODING AND ANGLE MEASURING DEVICE 审中-公开
标题翻译：绝对角度编码和角度测量装置
公开(公告)号：US20110208475A1
公开(公告)日：2011-08-25
申请号：US13126699
申请日：2009-10-01
申请人： Christoph Lingk
发明人： Christoph Lingk
IPC分类号： G06F15/00
CPC分类号： G01D5/2492 , H03M1/282
摘要： An absolute angle coding that includes a first code sequence disposed within 360°, wherein the first code sequence has a first length and is disposed NA times in succession. The absolute angle coding includes a second code sequence disposed within 360°, wherein the second code sequence has a second length and is disposed NB times in succession, wherein the first code sequence and the second code sequence in combination absolutely unambiguously encode said 360°. In addition, NA is greater than or equal to 2 and NB is greater than or equal to 2 and NA is not equal to NB. The first length is not equal to the second length and the first code sequence and the second code sequence are disposed in one common track, in that a part of the first code sequence and a part of the second code sequence are disposed in alternation.
摘要翻译：一种绝对角度编码，其包括设置在360°内的第一编码序列，其中第一编码序列具有第一长度并且被连续布置为NA倍。绝对角度编码包括设置在360°内的第二代码序列，其中第二代码序列具有第二长度并且被连续布置为NB次，其中组合的第一代码序列和第二代码序列绝对地明确地编码所述360°。此外，NA大于或等于2，NB大于或等于2，NA不等于NB。第一长度不等于第二长度，并且第一代码序列和第二代码序列被布置在一个共同的轨道中，因为第一代码序列的一部分和第二代码序列的一部分被交替地布置。

4. 发明申请

US20110218761A1 ABSOLUTE POSITION MEASURING DEVICE 审中-公开
标题翻译：绝对位置测量装置
公开(公告)号：US20110218761A1
公开(公告)日：2011-09-08
申请号：US13126605
申请日：2009-10-01
申请人： Christoph Lingk
发明人： Christoph Lingk
IPC分类号： G06F15/00
CPC分类号： G01D5/3473 , G01D5/2455 , G01D5/2495 , G01D5/2497
摘要： An absolute angle coding that includes a first cyclically continued code sequence that cyclically continues a first code sequence a multiple number of times, wherein the first code sequence is disposed within 360° and includes a first succession of code elements that defines a first angle sector. The code further includes a second cyclically continued code sequence that cyclically continues a second code sequence a multiple number of times, wherein the second code sequence is disposed within 360° and includes a second succession of code elements that defines a second angle sector, wherein the first cyclically continued sequence and the second cyclically continued code sequence in combination unambiguously absolutely encode the 360°. The first angle sector is not equal to the second angle sector, and at least one of the second code sequences of the second cyclically continued code sequence is embodied only partially within said 360° and with a succeeding second code sequence forms a joint.
摘要翻译：绝对角度编码包括循环地继续第一代码序列多次的第一循环连续代码序列，其中第一代码序列被设置在360°内，并且包括定义第一角度扇区的第一序列代码元素。代码还包括周期性地继续第二代码序列多次的第二周期性连续代码序列，其中第二代码序列设置在360°内，并且包括限定第二角度扇区的第二序列代码元素，其中，第一个循环连续序列，第二个循环连续的码序列组合明确绝对编码360°。第一角度扇区不等于第二角度扇区，并且第二循环连续代码序列的第二代码序列中的至少一个仅部分地体现在所述360°内，并且随后的第二代码序列形成关节。

5. 发明授权

US06297154B1 Process for semiconductor device fabrication having copper interconnects 有权
标题翻译：具有铜互连的半导体器件制造工艺
公开(公告)号：US06297154B1
公开(公告)日：2001-10-02
申请号：US09143037
申请日：1998-08-28
申请人： Michal Edith Gross , Christoph Lingk
发明人： Michal Edith Gross , Christoph Lingk
IPC分类号： H01L2144
CPC分类号： H01L21/76877 , H01L21/2885
摘要： A process for fabricating a semiconductor device with copper interconnects is disclosed. In the process of the present invention, a layer of dielectric material is formed on a substrate. At least one recess is formed in the layer of dielectric material. Barrier layers and seed layers for electroplating are then deposited over the entire surface of the substrate. The recess is then filled with copper by electroplating copper over the surface of the substrate. The electroplated copper has an average grain size of about 0.1 &mgr;m to about 0.2 &mgr;m immediately after deposition. The substrate is then annealed to increase the grain size of the copper and to provide a grain structure that is stable over time at ambient conditions and during subsequent processing. After annealing, the average grain size of the copper is at least about 1 &mgr;m in at least one dimension. The copper that is electroplated on the dielectric layer is then removed using an expedient such as chemical mechanical polishing. The copper that remains is the copper in the recess.
摘要翻译：公开了一种制造具有铜互连的半导体器件的工艺。在本发明的方法中，在基板上形成介电材料层。在电介质材料层中形成至少一个凹槽。然后在衬底的整个表面上沉积用于电镀的阻挡层和籽晶层。然后通过在基板的表面上电镀铜来将凹槽填充铜。电镀铜在沉积后立即具有约0.1μm至约0.2μm的平均粒度。然后将衬底退火以增加铜的晶粒尺寸，并提供在环境条件下和随后的处理期间随时间稳定的晶粒结构。在退火之后，至少一个维度上铜的平均晶粒尺寸至少约为1μm。然后使用诸如化学机械抛光的方法去除在电介质层上电镀的铜。剩下的铜是凹槽中的铜。

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