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    • 1. 发明授权
    • Secondary electron spectroscopy method and system
    • 二次电子光谱法和系统
    • US06627886B1
    • 2003-09-30
    • US09312271
    • 1999-05-14
    • Dov ShachalNoam Dotan
    • Dov ShachalNoam Dotan
    • H01J37244
    • H01J37/256H01J27/14H01J2237/2806Y10S977/881
    • A system and a method for fast characterization of sample's material composition, which is especially beneficial for semiconductor fabrication. The material composition is characterized by analyzing secondary electrons emission from the sample. According to one feature, electron detector is used to collect secondary electrons emanating from the sample. The detector is controlled to collect a specific narrow band of secondary electrons, and the band is controlled to allow for collection of SE at different energies. Two modes are disclosed: spot mode and secondary electron spectroscopy material imaging (SESMI). In the spot mode, a spectrum of SE is obtained from a single spot on the sample, and its characteristics are investigated to obtain information of the material composition of the spot. In the SESMI mode, an SEM image of an area on the sample is obtained. The SE spectrum at each pixel is investigated and correlated to a particular spectrum group. The image is then coded according to the SE spectrum grouping. The coding is preferably a color coding.
    • 用于快速表征样品材料组成的系统和方法,这对于半导体制造特别有利。 材料组成的特征在于分析来自样品的二次电子发射。 根据一个特征,使用电子检测器来收集从样品发出的二次电子。 控制检测器以收集特定窄带的二次电子,并且控制该带以允许以不同能量收集SE。 公开了两种模式:点模式和二次电子光谱材料成像(SESMI)。 在斑点模式下,从样品上的单个斑点获得SE光谱,并对其特征进行调查以获得斑点材料成分的信息。 在SESMI模式中,获得样品上的区域的SEM图像。 研究每个像素的SE谱,并与特定的光谱组相关。 然后根据SE光谱分组对图像进行编码。 编码优选是颜色编码。
    • 4. 发明授权
    • Reliable defect detection using multiple perspective scanning electron
microscope images
    • 使用多视角扫描电子显微镜图像的可靠缺陷检测
    • US5659172A
    • 1997-08-19
    • US606363
    • 1996-02-23
    • Mark WagnerNoam Dotan
    • Mark WagnerNoam Dotan
    • H01J37/22H01J37/00
    • H01J37/222H01J2237/24495H01J2237/2817
    • A method for fast and reliable defect detection on semiconductor devices by comparing SEM images from a single perspective followed by a cross-check between at least two perspectives. An SEM equipped with at least two electron detectors each of which is capable of collecting electrons from different angular sectors. `Base` images of an area of the semiconductor wafer which is to be inspected are generated from both perspectives. For each perspective base image, a perspective `reference` image is generated, which is suitable for comparison with the base image. The reference image is registered with respect to the base image, for each perspective, the reference image is compared with the base image, and a comparison map of possible defect locations is produced, and, finally, a cross-check is carried out between the perspective comparison maps. The cross-check filters out events in the perspective comparison maps relating to variations other than defects such as pattern variations and noise.
    • 通过比较来自单个视角的SEM图像,然后在至少两个视角之间进行交叉检查,可以对半导体器件进行快速可靠的缺陷检测。 配备有至少两个电子检测器的SEM,每个电子检测器能够从不同的角扇区收集电子。 从两个角度生成要检查的半导体晶片的区域的“基”图像。 对于每个透视基础图像,生成透视“参考”图像,其适合于与基本图像进行比较。 参考图像相对于基本图像进行登记,对于每个透视图,将参考图像与基本图像进行比较,并且产生可能的缺陷位置的比较图,并且最后进行交叉检查 透视比较图。 交叉检查过滤掉与除了诸如图案变化和噪声之类的缺陷以外的变化相关的透视比较图中的事件。
    • 5. 发明授权
    • Apparatus for determining optimum position of focus of an imaging system
    • 用于确定成像系统的焦点的最佳位置的装置
    • US07633041B2
    • 2009-12-15
    • US11524684
    • 2006-09-21
    • Dov FurmanGad NeumannMark WagnerNoam DotanRam SegalShai Silberstein
    • Dov FurmanGad NeumannMark WagnerNoam DotanRam SegalShai Silberstein
    • G02B7/04G01N21/86
    • G01N21/9501G01N21/8806G01N21/95607G01N21/95623G01N2021/479G01N2021/8825G01N2201/0697G01N2201/0826
    • Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
    • 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅里叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。
    • 9. 发明授权
    • Optical inspection system for distinguishing between first and second
components in a laminate
    • 光学检查系统,用于区分层压板中的第一和第二部件
    • US5216479A
    • 1993-06-01
    • US735328
    • 1991-07-24
    • Noam DotanAbraham Gross
    • Noam DotanAbraham Gross
    • G01N21/956
    • G01N21/956G01N2021/95638
    • An optical inspection system for distinguishing between a laminate formed of a first component having a second component disposed on a first surface thereof, comprising a collection optics including a cylindrical concave elliptical reflecting surface and having a first focal line coplanar with a first surface of the laminate. A light source in fixed spatial relationship with the collection optics directs a first beam of light through an aperture in the elliptical reflecting surface towards the laminate so as to strike the surface along the first focal line and to produce a substantially conical fluorescent emission and so as to be reflected as a substantially conical reflection beam from respective first and second components of the laminate. A filter is disposed near a second focal line of the elliptical reflecting surface for separating the fluorescent emission from the reflection beam. First and second collectors collect the separated fluorescent emission and the separated reflection beam both emanating from limited areas of the laminate, while an analyzing means is coupled to the first and second collectors and responsive to respective collector signals for analyzing the first and second components of the laminate.
    • 一种用于区分由具有设置在其第一表面上的第二部件的第一部件形成的层压体的光学检查系统,包括收集光学元件,该收集光学元件包括圆柱形凹形椭圆形反射表面,并且具有与层压体的第一表面共面的第一焦线 。 与收集光学器件具有固定空间关系的光源将第一光束通过椭圆反射表面中的孔朝着层压体引导,以便沿着第一焦线撞击表面,并产生基本上圆锥形的荧光发射,并且因此 被反射成层叠体的相应第一和第二组分的基本上圆锥形的反射光束。 滤光器设置在椭圆反射表面的第二焦线附近,用于将荧光发射与反射光束分离。 第一和第二收集器收集分离的荧光发射和从层压板的有限区域发出的分离的反射光束,而分析装置耦合到第一和第二收集器,并且响应于相应的收集器信号来分析第一和第二分量 层压板。
    • 10. 发明授权
    • System for detection of wafer defects
    • 晶圆缺陷检测系统
    • US07843559B2
    • 2010-11-30
    • US11476358
    • 2006-06-28
    • Dov FurmanGad NeumannMark WagnerNoam DotanRam SegalShai Silberstein
    • Dov FurmanGad NeumannMark WagnerNoam DotanRam SegalShai Silberstein
    • G01N21/00
    • G01N21/9501G01N21/8806G01N21/95607G01N21/95623G01N2021/479G01N2021/8825G01N2201/0697G01N2201/0826
    • Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
    • 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅里叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。