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1. 发明授权

US07633041B2 Apparatus for determining optimum position of focus of an imaging system 有权
标题翻译：用于确定成像系统的焦点的最佳位置的装置
公开(公告)号：US07633041B2
公开(公告)日：2009-12-15
申请号：US11524684
申请日：2006-09-21
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G02B7/04 , G01N21/86
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

2. 发明授权

US07961763B2 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US07961763B2
公开(公告)日：2011-06-14
申请号：US11476342
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： H01S3/10 , H01S3/11 , H01S3/0915
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅立叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

3. 发明申请

US20060244956A1 System for detection of wafer defects 有权
公开(公告)号：US20060244956A1
公开(公告)日：2006-11-02
申请号：US11476322
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

4. 发明授权

US07525659B2 System for detection of water defects 有权
标题翻译：水缺陷检测系统
公开(公告)号：US07525659B2
公开(公告)日：2009-04-28
申请号：US10345097
申请日：2003-01-15
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01B11/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

5. 发明授权

US07477383B2 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US07477383B2
公开(公告)日：2009-01-13
申请号：US11476322
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

6. 发明申请

US20070019856A1 System for detection of wafer defects 有权
公开(公告)号：US20070019856A1
公开(公告)日：2007-01-25
申请号：US11476342
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

7. 发明申请

US20060244958A1 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US20060244958A1
公开(公告)日：2006-11-02
申请号：US11476358
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。连续地比像素停留时间短，从而在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅立叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

8. 发明授权

US07843559B2 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US07843559B2
公开(公告)日：2010-11-30
申请号：US11476358
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

9. 发明申请

US20070013903A1 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US20070013903A1
公开(公告)日：2007-01-18
申请号：US11524684
申请日：2006-09-21
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅立叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

10. 发明申请

US20060244957A1 System for detection of wafer defects 审中-公开
公开(公告)号：US20060244957A1
公开(公告)日：2006-11-02
申请号：US11476356
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

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