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1. 发明授权

US07961763B2 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US07961763B2
公开(公告)日：2011-06-14
申请号：US11476342
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： H01S3/10 , H01S3/11 , H01S3/0915
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅立叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

2. 发明申请

US20060244956A1 System for detection of wafer defects 有权
公开(公告)号：US20060244956A1
公开(公告)日：2006-11-02
申请号：US11476322
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

3. 发明授权

US07633041B2 Apparatus for determining optimum position of focus of an imaging system 有权
标题翻译：用于确定成像系统的焦点的最佳位置的装置
公开(公告)号：US07633041B2
公开(公告)日：2009-12-15
申请号：US11524684
申请日：2006-09-21
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G02B7/04 , G01N21/86
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

4. 发明授权

US5659172A Reliable defect detection using multiple perspective scanning electron microscope images 失效
标题翻译：使用多视角扫描电子显微镜图像的可靠缺陷检测
公开(公告)号：US5659172A
公开(公告)日：1997-08-19
申请号：US606363
申请日：1996-02-23
申请人： Mark Wagner , Noam Dotan
发明人： Mark Wagner , Noam Dotan
IPC分类号： H01J37/22 , H01J37/00
CPC分类号： H01J37/222 , H01J2237/24495 , H01J2237/2817
摘要： A method for fast and reliable defect detection on semiconductor devices by comparing SEM images from a single perspective followed by a cross-check between at least two perspectives. An SEM equipped with at least two electron detectors each of which is capable of collecting electrons from different angular sectors. `Base` images of an area of the semiconductor wafer which is to be inspected are generated from both perspectives. For each perspective base image, a perspective `reference` image is generated, which is suitable for comparison with the base image. The reference image is registered with respect to the base image, for each perspective, the reference image is compared with the base image, and a comparison map of possible defect locations is produced, and, finally, a cross-check is carried out between the perspective comparison maps. The cross-check filters out events in the perspective comparison maps relating to variations other than defects such as pattern variations and noise.
摘要翻译：通过比较来自单个视角的SEM图像，然后在至少两个视角之间进行交叉检查，可以对半导体器件进行快速可靠的缺陷检测。配备有至少两个电子检测器的SEM，每个电子检测器能够从不同的角扇区收集电子。从两个角度生成要检查的半导体晶片的区域的“基”图像。对于每个透视基础图像，生成透视“参考”图像，其适合于与基本图像进行比较。参考图像相对于基本图像进行登记，对于每个透视图，将参考图像与基本图像进行比较，并且产生可能的缺陷位置的比较图，并且最后进行交叉检查透视比较图。交叉检查过滤掉与除了诸如图案变化和噪声之类的缺陷以外的变化相关的透视比较图中的事件。

5. 发明授权

US07843559B2 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US07843559B2
公开(公告)日：2010-11-30
申请号：US11476358
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

6. 发明申请

US20070013903A1 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US20070013903A1
公开(公告)日：2007-01-18
申请号：US11524684
申请日：2006-09-21
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅立叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

7. 发明申请

US20060244957A1 System for detection of wafer defects 审中-公开
公开(公告)号：US20060244957A1
公开(公告)日：2006-11-02
申请号：US11476356
申请日：2006-06-28
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

8. 发明申请

US20050110987A1 System for detection of wafer defects 有权
标题翻译：晶圆缺陷检测系统
公开(公告)号：US20050110987A1
公开(公告)日：2005-05-26
申请号：US11021393
申请日：2004-12-23
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01N20060101 , G01N1/00 , G01N21/88 , G01N21/95 , G01N21/956 , H01L21/20 , H01L21/66 , H04B10/08
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

9. 发明授权

US07813541B2 Method and apparatus for detecting defects in wafers 有权
标题翻译：用于检测晶片缺陷的方法和装置
公开(公告)号：US07813541B2
公开(公告)日：2010-10-12
申请号：US11069712
申请日：2005-02-28
申请人： Erez Sali , Tomer Yanir , Mark Wagner , Noam Dotan , Yuval Dorfan , Ran Zaslavsky
发明人： Erez Sali , Tomer Yanir , Mark Wagner , Noam Dotan , Yuval Dorfan , Ran Zaslavsky
IPC分类号： G06K9/00
CPC分类号： G01N21/95607 , G01N21/9501 , G06T7/001
摘要： A method for inspecting a wafer including a multiplicity of dies, the method including dividing an image of at least a portion of the wafer into a plurality of sub-images each representing a sub-portion of the wafer and selecting at least one defect candidate within each sub-image by comparing each sub-image to a corresponding sub-image of a reference including a representation, which is assumed to be faultless, of the portion of the wafer.
摘要翻译：一种用于检查包括多个管芯的晶片的方法，所述方法包括将晶片的至少一部分的图像划分成多个子图像，每个子图像表示晶片的子部分，并且选择至少一个缺陷候选物每个子图像通过将每个子图像与包括晶片的该部分的被认为是无故障的表示的参考的对应子图像进行比较。

10. 发明授权

US07525659B2 System for detection of water defects 有权
标题翻译：水缺陷检测系统
公开(公告)号：US07525659B2
公开(公告)日：2009-04-28
申请号：US10345097
申请日：2003-01-15
申请人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
发明人： Dov Furman , Gad Neumann , Mark Wagner , Noam Dotan , Ram Segal , Shai Silberstein
IPC分类号： G01B11/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N21/95623 , G01N2021/479 , G01N2021/8825 , G01N2201/0697 , G01N2201/0826
摘要： Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
摘要翻译：通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测，晶片的一部分在成像系统的视场内移动，并将移动的晶片成像到焦平面组件，在光学成像系统的焦平面处光学地形成光电检测器的连续表面。持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮，使得在晶片运动期间实际上没有图像污迹。激光脉冲具有足够的能量和亮度，以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。描述了一种有效减少源相干效应的新型光纤照明传输系统。该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统，用于晶片成像系统的自动聚焦的方法，以及通过傅里叶平面去除图像的重复特征的新颖方法过滤，以便更容易地检测晶片缺陷。

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