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    • 5. 发明申请
    • Process for assembly of corrugated pallets
    • 波纹托盘组装工艺
    • US20150360435A1
    • 2015-12-17
    • US14120694
    • 2014-06-16
    • Christopher W. GabrysJoseph J. DankoE. Neil Schopke
    • Christopher W. GabrysJoseph J. DankoE. Neil Schopke
    • B31D5/04B31F5/00
    • B31D5/04B31F5/005B65D19/0012B65D2519/00019B65D2519/00054B65D2519/00273B65D2519/00288B65D2519/00318B65D2519/00343B65D2519/00402B65D2519/00567
    • A process for assembling a corrugated pallet having of two die cut corrugated paperboard blanks that form a pallet top and a pallet bottom, with each having at least one vertically extending double thickness rib, each rib having at least one notch, wherein said notches lock the opposing ribs from opening when the pallet top and pallet bottom are vertically nested together. In performance of the process a mix of machine and human performed operations is used. The machine forms the rib on each blank by applying in-plane pressure to the blank through protruding elements on the machine that engage the blank and move in relation towards each other, and the machine maintains the in-plane pressure to keep the rib from opening until a time after the pallet top and bottom are nested together. The machine uses rib folding plates that apply out-of-plane forces to the blanks to assist forming of the ribs by rotating in the out-of-plane direction when the in-plane compression is applied. Human operators load the blanks into the machine and form the sidewalls and fork openings.
    • 一种用于组装瓦楞纸板的方法,其具有形成托盘顶部和托盘底部的两个模切瓦楞纸板坯料,每个具有至少一个垂直延伸的双重厚度肋条,每个肋条具有至少一个切口,其中所述凹口锁定 当托盘顶部和托盘底部垂直嵌套在一起时,相对的肋条开口。 在执行该过程时,使用机器和人机执行操作的混合。 机器在每个坯料上形成肋,通过机器上的突出元件向坯件施加平面内的压力,所述突出元件与坯件相接合并且相对于彼此移动,并且机器保持面内的压力以保持肋不被打开 直到托盘顶部和底部嵌套在一起的时间。 该机器使用肋板折叠板,其将平面外的力施加到坯件上,以帮助当施加平面内压缩时在面外方向上旋转来形成肋条。 人工操作员将坯料加载到机器中并形成侧壁和叉形开口。
    • 6. 发明授权
    • Integrated optic gyro with one Bragg transducer
    • 具有一个布拉格传感器的集成光学陀螺仪
    • US5325174A
    • 1994-06-28
    • US903622
    • 1992-06-23
    • Joseph J. Danko
    • Joseph J. Danko
    • G01C19/72
    • G01C19/727
    • A laser gyroscope is provided that utilizes a single frequency shifter, in the form of a Bragg cell, to adjust the frequencies of counter-rotating optical signals in a thin film waveguide to achieve resonance along the optical path encountered by each of the signals. The system also utilizes two voltage to frequency convertors, each of which outputs an RF signal to a respective frequency shifter. Each voltage to frequency convertor is modulated by a modulation signal that includes a DC component and an RF signal. The single frequency shifter approach results in fewer required components for proper operation of the thin film laser gyroscope. Redundant back-up components can be added to the gyroscope to guard against the event of a component failure. Alternately, the laser gyroscope is inherently more tolerable of low fabrication yield because of the redundancies.
    • 提供了一种激光陀螺仪,其利用布拉格单元形式的单个移频器来调节薄膜波导中的反向旋转光信号的频率,以实现沿着每个信号所遇到的光路的谐振。 该系统还利用两个电压到频率转换器,每个电压到频率转换器将RF信号输出到相应的频率转换器。 每个电压到频率转换器由包括DC分量和RF信号的调制信号调制。 单个移频器方法导致较少的所需组件用于薄膜激光陀螺仪的正常操作。 可以将冗余的备份组件添加到陀螺仪中,以防止组件发生故障。 或者,由于冗余,激光陀螺仪固有地更可容忍低制造产量。
    • 7. 发明授权
    • Method and apparatus for inspecting a patterned semiconductor wafer
    • 用于检查图案化半导体晶片的方法和装置
    • US06774991B1
    • 2004-08-10
    • US09579593
    • 2000-05-26
    • Joseph J. Danko
    • Joseph J. Danko
    • G01N2100
    • H01L21/67288G01N21/95623
    • A method and apparatus for inspecting a surface of a semiconductor wafer having repetitive patterns for contaminant particles using scattered light which involves directing two beams of light at different approach angles onto the surface in a manner so as to illuminate two intersecting stripe shaped regions on the surface. An imaging lens collects scattered light from the surface as the semiconductor wafer is moving and then images the scattered light collected onto a CCD camera having a square array sensor and arranged to operate in a time delayed integration (TDI) mode. The field of view of the CCD camera is centered at the intersection of the two striped regions. Each light beam striking the surface produces a Fourier diffraction pattern of scattered light in the back focal plane of the imaging lens. In setting up the apparatus, the angle of incidence of one of the light beams is adjusted to shift one of the diffraction patterns, if necessary, so that it overlaps the other diffraction pattern. If the two approach angles are symmetrically disposed, then the two diffraction patterns overlap and adjustment of the angle of incidence of one of the beams is not necessary.
    • 用于使用散射光检查具有用于污染物颗粒的重复图案的半导体晶片的表面的方法和装置,其包括以不同的接近角将两束光引导到表面上,以便照亮表面上的两个相交的条形区域 。 当半导体晶片移动时,成像透镜从表面收集散射光,然后将收集的散射光成像到具有正方形阵列传感器的CCD相机上并且被布置成以时间延迟积分(TDI)模式操作。 CCD摄像机的视野位于两个条纹区域的交点处。 撞击表面的每个光束在成像透镜的后焦平面中产生散射光的傅里叶衍射图案。 在设置装置时,如果需要,调整一个光束的入射角以移动一个衍射图案,使得它与另一个衍射图案重叠。 如果两个入射角对称地设置,则两个衍射图案重叠,并且不需要调整一个光束的入射角。
    • 8. 发明授权
    • Particle detection method and apparatus
    • 粒子检测方法及装置
    • US06879391B1
    • 2005-04-12
    • US09579620
    • 2000-05-26
    • Joseph J. Danko
    • Joseph J. Danko
    • G01N21/21G01N21/95G01N21/956G01N21/88
    • G01N21/95623G01N21/94G01N21/9501G01N2021/217G01N2201/0675
    • An apparatus and method for detecting pattern defects and/or particles on the front surface of a semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier diffraction pattern of the area illuminated. A Fourier mask blocks out scattered light collected by the lens at locations in the Fourier diffraction pattern where the intensity is above a predetermined level indicative of background information and leaves in light at locations where the intensity is below the threshold level indicative of possible particle information. The Fourier mask includes a spatial light modulator and a polarization discriminator. The lens also images the area illuminated onto a camera using scattered light collected from the area by the lens and not blocked out by the Fourier mask. In one embodiment of the invention the spatial light modulator is optically addressable and in other embodiments of the invention the spatial light modulator is electrically addressable.
    • 用于检测具有重复图案的半导体晶片的表面上的图案缺陷和/或颗粒的装置和方法包括:用偏振光束照射前表面上的区域的激光器。 透镜收集从该区域散射的光,并形成照明区域的傅里叶衍射图案。 傅立叶方差掩模在傅立叶衍射图案中的强度高于指示背景信息的预定水平的位置遮挡由透镜收集的散射光,并且在强度低于表示可能的粒子信息的阈值水平的位置处留下光。 傅里叶掩模包括空间光调制器和偏振鉴别器。 透镜还可以使用透镜从该区域收集的散射光照射到相机上的区域,并且不会被傅里叶面罩遮挡。 在本发明的一个实施例中,空间光调制器是可光学寻址的,并且在本发明的其它实施例中,空间光调制器可电寻址。
    • 9. 发明授权
    • Method and apparatus for inspecting a patterned semiconductor wafer
    • 用于检查图案化半导体晶片的方法和装置
    • US06621570B1
    • 2003-09-16
    • US09518977
    • 2000-03-04
    • Joseph J. Danko
    • Joseph J. Danko
    • G01N2100
    • H01L21/67288G01N21/95623
    • A method and apparatus for inspecting a surface of a semiconductor wafer having repetitive patterns for contaminant particles using scattered light by illuminating an area on the surface with two beams of light at different approach angles which are independent from each other and then imaging the area illuminated onto a camera positioned above the surface using an imaging lens. Each light beam striking the surface of the semiconductor wafer produces a Fourier diffraction pattern of light scattered from the surface in the back focal plane of the imaging lens. The two diffraction patterns are offset from each other if the two approach angles are not symmetrically disposed relative to an axis of the wafer. In setting up the apparatus, the angle of incidence of one of the beams is adjusted to shift one of the diffraction patterns, if necessary, so that it overlaps the other diffraction pattern. In this way, a spatial filter having masking bars sized and shaped to mask off the diffraction pattern from one beam will also mask off the diffraction pattern from the other beam. If the two approach angles are symmetrically disposed, then the two diffraction patterns overlap and adjustment of the angle of incidence of one of the beams is not necessary. The apparatus includes an arrangement for independently setting each one of the two approach angles and independently adjusting the angle of incidence of each light beam.
    • 一种用于使用散射光检测具有用于污染物颗粒的重复图案的半导体晶片的表面的方法和装置,通过以彼此独立的不同接近角的两束光照射表面上的区域,然后对照射到 使用成像透镜定位在表面上方的相机。 撞击半导体晶片表面的每个光束产生从成像透镜的后焦平面中的表面散射的光的傅里叶衍射图案。 如果两个接近角度相对于晶片的轴线不对称地设置,则两个衍射图案彼此偏移。 在设置装置时,如果需要,调整一个光束的入射角以移动其中一个衍射图案,使得其与另一个衍射图案重叠。 以这种方式,具有尺寸和形状以遮蔽衍射图案的遮蔽条的空间滤光器也将掩蔽来自另一个光束的衍射图案。 如果两个入射角对称地设置,则两个衍射图案重叠,并且不需要调整一个光束的入射角。 该装置包括用于独立设置两个入射角中的每一个并且独立地调节每个光束的入射角的装置。
    • 10. 发明授权
    • Particle detection method and apparatus
    • 粒子检测方法及装置
    • US5805278A
    • 1998-09-08
    • US668494
    • 1996-06-18
    • Joseph J. Danko
    • Joseph J. Danko
    • G01N21/94G01N21/95G01N21/956G01R31/311G03F7/20G01N21/00
    • G01N21/9501G01N21/95623G01R31/311G03F7/7065G01N21/94G01N2201/0675
    • An apparatus and method for detecting particles on a surface of a semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface at grazing angle of incidence with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier diffraction pattern of the area illuminated. A Fourier mask blocks out light collected by the lens at locations in the Fourier diffraction pattern where the intensity is above a predetermined level indicative of background information and leaves in light at locations where the intensity is below the threshold level indicative of possible particle information. The Fourier mask includes an optically addressable spatial light modulator and a polarization discriminator. A camera detects scattered light collected from the area by the lens and not blocked out by the Fourier mask.
    • 用于检测具有重复图案的半导体晶片的表面上的颗粒的装置和方法包括:激光器,用于以偏振光束以掠射入射角照射前表面上的区域。 透镜收集从该区域散射的光,并形成照明区域的傅里叶衍射图案。 傅立叶掩模在傅立叶衍射图案中的强度高于指示背景信息的预定水平的位置处遮挡由透镜收集的光,并且在强度低于阈值水平的位置处留下指示可能的粒子信息的位置。 傅里叶掩模包括光可寻址空间光调制器和偏振鉴别器。 相机通过镜头检测从该区域收集的散射光,并且不被傅里叶面罩遮挡。