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1. 发明授权

US07509729B2 Method for making a perpendicular magnetic recording write head 失效
标题翻译：制作垂直磁记录头的方法
公开(公告)号：US07509729B2
公开(公告)日：2009-03-31
申请号：US11380189
申请日：2006-04-25
申请人： Donald G. Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Aron Pentek
发明人： Donald G. Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Aron Pentek
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49021 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for making a write pole in a perpendicular magnetic recording write head uses a metal mask to pattern the primary resist and only ion milling during the subsequent patterning steps. A layer of primary resist is deposited over the magnetic write pole material and a metal mask layer is deposited on the primary resist layer. An imaging resist layer is formed on the metal mask layer and lithographically patterned generally in the desired shape of the write pole. Ion milling without a reactive gas is then performed over the imaging resist pattern to pattern the underlying metal mask layer, which is then used as the mask to define the shape of the primary resist pattern. Ion milling with oxygen is then performed over the metal mask pattern to pattern the underlying primary resist. Ion milling without a reactive gas is then performed over the primary resist pattern to form the underlying write pole.
摘要翻译：用于在垂直磁记录写头中制作写极的方法使用金属掩模对主抗蚀剂进行图案化，并且在随后的图案化步骤期间仅使用离子铣削。一层主抗蚀剂沉积在磁写磁极材料上，并且金属掩模层沉积在主抗蚀剂层上。在金属掩模层上形成成像抗蚀剂层，并且通常以写入极的所需形状进行光刻图案化。然后在成像抗蚀剂图案上进行无反应气体的离子研磨以对下面的金属掩模层进行图案化，然后将其用作掩模以限定主抗蚀剂图案的形状。然后在金属掩模图案上进行用氧离子研磨以对下面的主抗蚀剂进行图案化。然后在主抗蚀剂图案上执行没有反应气体的离子研磨以形成下面的写极。

2. 发明授权

US07576951B2 Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
标题翻译：具有磁写入磁极的垂直磁性写头具有凹形后缘
公开(公告)号：US07576951B2
公开(公告)日：2009-08-18
申请号：US11411556
申请日：2006-04-25
申请人： Donald G. Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Wen-Chien David Hsiao , Yimin Hsu , Ming Jiang , Yinshi Liu , Aaron Neuhaus , Vladimir Nikitin , Aron Pentek , Katalin Pentek , Yi Zheng
发明人： Donald G. Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Wen-Chien David Hsiao , Yimin Hsu , Ming Jiang , Yinshi Liu , Aaron Neuhaus , Vladimir Nikitin , Aron Pentek , Katalin Pentek , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/11 , G11B5/1278 , G11B5/1871 , G11B5/3146 , G11B5/315 , G11B5/3163
摘要： A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.
摘要翻译：用于垂直磁记录的磁写头，具有带有凹后缘的写极。磁性写入极可以具有梯形形状，其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。写头可以包括或可以不包括磁性后屏蔽，并且如果包括后屏蔽，则其通过非磁性写间隙层与后缘分离。凹形后边缘提高磁性能，例如通过改善转变曲率。构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极，掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。然后沉积氧化铝填充层，并执行化学机械抛光以打开图像转印层。执行反应性蚀刻以去除图像转印层，并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。

3. 发明申请

US20070258167A1 Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
标题翻译：具有磁写入磁极的垂直磁性写头具有凹形后缘
公开(公告)号：US20070258167A1
公开(公告)日：2007-11-08
申请号：US11411556
申请日：2006-04-25
申请人： Donald Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Wen-Chien Hsiao , Yimin Hsu , Ming Jiang , Yinshi Liu , Aron Neuhaus , Vladimir Nikitin , Aron Pentek , Katalin Pentek , Yi Zheng
发明人： Donald Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Wen-Chien Hsiao , Yimin Hsu , Ming Jiang , Yinshi Liu , Aron Neuhaus , Vladimir Nikitin , Aron Pentek , Katalin Pentek , Yi Zheng
IPC分类号： G11B5/147
CPC分类号： G11B5/3116 , G11B5/11 , G11B5/1278 , G11B5/1871 , G11B5/3146 , G11B5/315 , G11B5/3163
摘要： A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.
摘要翻译：用于垂直磁记录的磁写头，具有带有凹后缘的写极。磁性写入极可以具有梯形形状，其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。写头可以包括或可以不包括磁性后屏蔽，并且如果包括后屏蔽，则其通过非磁性写间隙层与后缘分离。凹形后边缘提高磁性能，例如通过改善转变曲率。构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极，掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。然后沉积氧化铝填充层，并执行化学机械抛光以打开图像转印层。执行反应性蚀刻以去除图像转印层，并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。

4. 发明申请

US20070245544A1 METHOD FOR MAKING A PERPENDICULAR MAGNETIC RECORDING WRITE HEAD 失效
标题翻译：一种完整的磁记录写头的方法
公开(公告)号：US20070245544A1
公开(公告)日：2007-10-25
申请号：US11380189
申请日：2006-04-25
申请人： Donald Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Aron Pentek
发明人： Donald Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Aron Pentek
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , Y10T29/49021 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for making a write pole in a perpendicular magnetic recording write head uses a metal mask to pattern the primary resist and only ion milling during the subsequent patterning steps. A layer of primary resist is deposited over the magnetic write pole material and a metal mask layer is deposited on the primary resist layer. An imaging resist layer is formed on the metal mask layer and lithographically patterned generally in the desired shape of the write pole. Ion milling without a reactive gas is then performed over the imaging resist pattern to pattern the underlying metal mask layer, which is then used as the mask to define the shape of the primary resist pattern. Ion milling with oxygen is then performed over the metal mask pattern to pattern the underlying primary resist. Ion milling without a reactive gas is then performed over the primary resist pattern to form the underlying write pole.
摘要翻译：用于在垂直磁记录写头中制作写极的方法使用金属掩模对主抗蚀剂进行图案化，并且在随后的图案化步骤期间仅使用离子铣削。一层主抗蚀剂沉积在磁写磁极材料上，并且金属掩模层沉积在主抗蚀剂层上。在金属掩模层上形成成像抗蚀剂层，并且通常以写入极的所需形状进行光刻图案化。然后在成像抗蚀剂图案上进行无反应气体的离子研磨以对下面的金属掩模层进行图案化，然后将其用作掩模以限定主抗蚀剂图案的形状。然后在金属掩模图案上进行用氧离子研磨以对下面的主抗蚀剂进行图案化。然后在主抗蚀剂图案上执行没有反应气体的离子研磨以形成下面的写极。

5. 发明申请

US20060043280A1 System, method, and apparatus for ion beam etching process stability using a reference for time scaling subsequent steps 失效
公开(公告)号：US20060043280A1
公开(公告)日：2006-03-02
申请号：US10930277
申请日：2004-08-30
申请人： Michael Feldbaum , Hung-Chin Guthrie , Wipul Jayasekara , Aron Pentek
发明人： Michael Feldbaum , Hung-Chin Guthrie , Wipul Jayasekara , Aron Pentek
IPC分类号： B01D59/44
CPC分类号： H01L22/20 , H01J2237/3114 , H01L21/31116 , H01L21/32136
摘要： A system for improving drift compensation for ion mill applications defines a reference step for purposes of time duration. The reference step is controlled by an end point detector and monitored for use with subsequent process steps. The time duration for a subsequent step is adjusted as a percentage of the reference step. A time scaling factor determines the actual duration of the subsequent step. Rather than directly using times of step duration, the system uses a percentage of the reference step for the latter step. The duration of the reference step varies depending on the tool drift. The overall duration is changed in the same proportion as the duration of the reference step, and thereby compensates for the influence of drift on the end product.

6. 发明授权

US07075094B2 System, method, and apparatus for ion beam etching process stability using a reference for time scaling subsequent steps 失效
标题翻译：使用参考时间缩放后续步骤的离子束蚀刻工艺稳定性的系统，方法和装置
公开(公告)号：US07075094B2
公开(公告)日：2006-07-11
申请号：US10930277
申请日：2004-08-30
申请人： Michael Feldbaum , Hung-Chin Guthrie , Wipul Pemsiri Jayasekara , Aron Pentek
发明人： Michael Feldbaum , Hung-Chin Guthrie , Wipul Pemsiri Jayasekara , Aron Pentek
IPC分类号： H01J37/305
CPC分类号： H01L22/20 , H01J2237/3114 , H01L21/31116 , H01L21/32136
摘要： A system for improving drift compensation for ion mill applications defines a reference step for purposes of time duration. The reference step is controlled by an end point detector and monitored for use with subsequent process steps. The time duration for a subsequent step is adjusted as a percentage of the reference step. A time scaling factor determines the actual duration of the subsequent step. Rather than directly using times of step duration, the system uses a percentage of the reference step for the latter step. The duration of the reference step varies depending on the tool drift. The overall duration is changed in the same proportion as the duration of the reference step, and thereby compensates for the influence of drift on the end product.
摘要翻译：用于改进离子磨应用的漂移补偿的系统为了持续时间而定义了参考步骤。参考步骤由端点检测器控制，并被监控以用于随后的处理步骤。后续步骤的持续时间作为参考步骤的百分比进行调整。时间缩放因子确定后续步骤的实际持续时间。而不是直接使用步骤持续时间，系统使用后一步骤的参考步骤百分比。参考步骤的持续时间取决于刀具漂移。整个持续时间以与参考步骤的持续时间相同的比例改变，从而补偿漂移对最终产品的影响。

7. 发明授权

US07881010B2 Process for self-aligned flare point and shield throat definition prior to main pole patterning 有权
标题翻译：在主极图案化之前，自对准耀斑和屏蔽喉定义的过程
公开(公告)号：US07881010B2
公开(公告)日：2011-02-01
申请号：US11956277
申请日：2007-12-13
申请人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/187
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3146 , G11B5/315
摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.
摘要翻译：一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

8. 发明授权

US07675709B2 Magnetic write head having a stair notched, steep shouldered pole and a write gap bump 失效
标题翻译：磁性写头具有阶梯式切口，陡峭的肩部极点和写入间隙凸起
公开(公告)号：US07675709B2
公开(公告)日：2010-03-09
申请号：US11525789
申请日：2006-09-21
申请人： Hung-Chin Guthrie , Wen-Chien David Hsiao , Jyh-Shuey Lo , Aron Pentek
发明人： Hung-Chin Guthrie , Wen-Chien David Hsiao , Jyh-Shuey Lo , Aron Pentek
IPC分类号： G11B5/31 , G11B5/187
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： A magnetic write head structure that maximizes write field strength while minimizing stray fields. The write pole structure maximizes write field strength by minimizing saturation of the magnetic pole tips, and minimizes stray field writing by preventing magnetic fields from extending laterally from the sides of the magnetic pole. The write head structure includes a write pole having a pole tip configured with a stair notched shape and a steep shouldered base beneath the stair notched portion. This configuration maximizes the amount of flux that can be delivered to the pole tip while also avoiding stray fields. The magnetic pole can also be configured with wing shaped extensions that extend laterally from the pole tip region but which are recessed from the ABS by a desired amount. The magnetic write head structure can be manufactured by forming a magnetic pole with a raised portion, depositing a write gap material over the magnetic pole and then forming a magnetic pedestal over the magnetic pole and write gap, the pedestal having a width significantly smaller than the width of the raised portion of the magnetic pole, a first ion mill can then be performed to notch and trim the magnetic pole. Then a non-magnetic layer such as alumina can be deposited and a second ion mill performed to form a stair notched configuration. An alumina bump can be formed prior to ion milling to provide a mask for forming the laterally extending, recessed wings in the pole tip of the magnetic pole.
摘要翻译：磁写头结构，使写入场强度最大化，同时最小化杂散场。写磁极结构通过最小化磁极尖端的饱和度来最大化写入场强度，并且通过防止磁场从磁极的侧面横向延伸来最小化杂散磁场写入。写头结构包括具有构造为具有阶梯形切口形状的极尖的写入极和在阶梯切口部下方的陡峭的肩部基座。该配置最大化可以传送到极尖的通量，同时也避免杂散场。磁极还可以配置有翼形延伸部，其从极尖区域横向延伸，但是从ABS凹入所需量。可以通过形成具有凸起部分的磁极来制造磁性写入头结构，在磁极上沉积写入间隙材料，然后在磁极和写入间隙上形成磁性基座，该基座具有明显小于磁极的凸起部分的宽度，然后可以执行第一离子磨机来切割和修整磁极。然后可以沉积诸如氧化铝的非磁性层，并且执行第二离子磨，以形成阶梯形缺口构型。可以在离子研磨之前形成氧化铝凸块，以提供用于在磁极的极尖中形成横向延伸的凹入的翼的掩模。

9. 发明申请

US20060171069A1 P1 write pole with shoulder formation and method of fabrication 失效
标题翻译： P1写杆与肩部形成和制造方法
公开(公告)号：US20060171069A1
公开(公告)日：2006-08-03
申请号：US11046740
申请日：2005-01-31
申请人： Daniel Bedell , Hung-Chin Guthrie , Ming Jiang , Hieu Lam , Jyh-Shuey Lo , Edward Lee , Aron Pentek
发明人： Daniel Bedell , Hung-Chin Guthrie , Ming Jiang , Hieu Lam , Jyh-Shuey Lo , Edward Lee , Aron Pentek
IPC分类号： G11B5/147
CPC分类号： G11B5/1871 , G11B5/3116
摘要： A magnetic disk drive head is disclosed including a write head, which includes a P1 layer having a pedestal portion, a gap layer formed on the P1 layer, and a P2 layer formed on the gap layer. The P1 layer includes a shoulder formation having a neck portion and a beveled portion. Also disclosed is a disk drive having a write head with a P1 layer with shoulder formation, and a method for fabricating a write pole for a magnetic recording head having a P1 layer with shoulder formation.
摘要翻译：公开了一种包括写头的磁盘驱动器头，该写头包括具有基座部分的P 1层，在P 1层上形成的间隙层和形成在间隙层上的P 2层。 P 1层包括具有颈部和斜面部分的肩部结构。还公开了一种具有具有肩部形成的P 1层的写入头的磁盘驱动器，以及用于制造具有具有肩部形成的P 1层的磁性记录头的写入磁极的方法。

10. 发明申请

US20050219748A1 Method of manufacturing a metal write gap for an inductive write head 失效
标题翻译：制造感性写入头的金属写入间隙的方法
公开(公告)号：US20050219748A1
公开(公告)日：2005-10-06
申请号：US10816062
申请日：2004-03-31
申请人： Hung-Chin Guthrie , Edward Pong Lee , Aron Pentek
发明人： Hung-Chin Guthrie , Edward Pong Lee , Aron Pentek
IPC分类号： G11B5/147 , G11B5/187 , G11B5/23 , G11B5/31
CPC分类号： G11B5/23 , G11B5/187 , G11B5/3116 , G11B5/313
摘要： A method for manufacturing an inductive write head having a metal write gap layer. The method reduces the number of necessary process steps and avoids corrosion of other write head elements such as magnetic back gap.
摘要翻译：一种用于制造具有金属写入间隙层的电感写入头的方法。该方法减少了必要的处理步骤的数量，并避免了其他写头元件（如磁背隙）的腐蚀。

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