会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Broad spectrum surface-emitting led
    • 广谱表面发射LED
    • US5563900A
    • 1996-10-08
    • US287820
    • 1994-08-09
    • Donald E. AckleyPaige M. HolmMichael S. Lebby
    • Donald E. AckleyPaige M. HolmMichael S. Lebby
    • H01S5/183H01S5/40H01S3/18H01S3/103
    • H01S5/18397H01S5/1057H01S5/18308H01S5/18358H01S5/18361H01S5/2063
    • A surface emitting light emitting device with a semiconducting substrate, a semiconducting mirror stack positioned on the substrate surface, a spacer layer positioned on the mirror stack, an active region positioned on the spacer layer, a second spacer layer positioned on the active region, a second semiconducting mirror stack positioned on the second spacer layer, and a top contact layer positioned in contact with the second semiconducting mirror stack. The active region includes multiple quantum wells each having a different transition wavelength and positioned on the spacer layer with the quantum well possessing the longest transition wavelength located closest to the spacer layer and additional quantum wells of the multiple quantum wells positioned in order of decreasing transition wavelength so that the sum of the emission from all of the quantum wells results in a broad and uniform output emission spectrum.
    • 具有半导体衬底的表面发射发光器件,位于衬底表面上的半导体反射镜叠层,位于反射镜叠层上的间隔层,位于间隔层上的有源区,位于有源区上的第二间隔层, 位于第二间隔层上的第二半导体反射镜叠层和与第二半导体反射镜叠层定位接触的顶部接触层。 有源区包括多个量子阱,每个量子阱具有不同的跃迁波长并且位于间隔层上,其中量子阱具有位于最靠近间隔层的最长过渡波长,并且多个量子阱的额外量子阱按照降低的跃迁波长 使得来自所有量子阱的发射的总和导致宽而均匀的输出发射光谱。
    • 4. 发明授权
    • Method of growing gallium nitride on a spinel substrate
    • 在尖晶石衬底上生长氮化镓的方法
    • US5741724A
    • 1998-04-21
    • US774819
    • 1996-12-27
    • Jamal RamdaniMichael S. LebbyPaige M. Holm
    • Jamal RamdaniMichael S. LebbyPaige M. Holm
    • C30B29/38H01L21/20H01L21/203H01L21/205H01L33/00
    • H01L33/007H01L21/0242H01L21/02458H01L21/02488H01L21/02505H01L21/0254Y10S438/967
    • A method of growing gallium nitride on a spinel substrate by providing a supporting substrate having a surface, and disposing a plurality of buffer layers on the surface of the supporting substrate. The plurality of buffer layers including a first buffer layer of aluminum oxynitride having a low percentage of mismatch to the spinel substrate. The second buffer layer is disposed on the first buffer layer and includes a plurality of layers of a graded aluminum oxynitride having a low dislocation density. A third buffer layer of aluminum nitride is disposed on the second buffer layer. A fourth buffer layer of gallium nitride is disposed on the third buffer layer. Subsequently, a photonic device structure, such as a laser, LED or detector, an electronic device structure, such as a field effect transistor or modulation doped field effect transistor, or an optical waveguide is fabricated on the fourth buffer layer.
    • 一种通过提供具有表面的支撑衬底在尖晶石衬底上生长氮化镓的方法,并且在支撑衬底的表面上设置多个缓冲层。 多个缓冲层包括与尖晶石衬底失配百分比低的氮氧化铝的第一缓冲层。 第二缓冲层设置在第一缓冲层上,并且包括具有低位错密度的多层梯度的氮氧化铝。 氮化铝的第三缓冲层设置在第二缓冲层上。 氮化镓的第四缓冲层设置在第三缓冲层上。 随后,在第四缓冲层上制造诸如激光,LED或检测器之类的光子器件结构,诸如场效应晶体管或调制掺杂场效应晶体管的电子器件结构或光波导。
    • 6. 发明授权
    • Integrated multi-wavelength Fabry-Perot filter and method of fabrication
    • 集成多波长法布里 - 珀罗滤波器及其制作方法
    • US07378346B2
    • 2008-05-27
    • US11387468
    • 2006-03-22
    • Ngoc V. LeJeffrey H. BakerDiana J. ConveyPaige M. HolmSteven M. Smith
    • Ngoc V. LeJeffrey H. BakerDiana J. ConveyPaige M. HolmSteven M. Smith
    • H01L21/302H01L21/461
    • G01J3/26G02B5/284
    • A method is provided for forming a monolithically integrated optical filter, for example, a Fabry-Perot filter, over a substrate (10). The method comprises forming a first mirror (16) over the substrate (10). A plurality of etalon material layers (32, 34, 36, 38) are formed over the mirror (16), and a plurality of etch stop layers (42, 44, 46) are formed, one each between adjacent etalon material layers (32, 34, 36, 38). A photoresist is patterned to create an opening (54) over the top etalon material layer (38) and an etch (56) is performed down to the top etch stop layer (46). An oxygen plasma (58) may be applied to convert the etch stop layer (46) within the opening (54) to silicon dioxide (57). The photoresist patterning, etching, and applying of an oxygen plasma may be repeated as desired to obtain the desired number of levels (82, 84, 86, 88). A second mirror (72) is then formed on each of the levels (82, 84, 86, 88).
    • 提供了一种用于在衬底(10)上形成单片集成滤光器(例如法布里 - 珀罗滤光片)的方法。 该方法包括在衬底(10)上形成第一反射镜(16)。 多个标准具材料层(32,34,36,38)形成在反射镜(16)上方,并且形成多个蚀刻停止层(42,44,46),每个蚀刻停止层之间相邻的标准具材料层(32 ,34,36,38)。 图案化光致抗蚀剂以在顶部标准具材料层(38)上方形成开口(54),并且向下蚀刻停止层(46)进行蚀刻(56)。 可以施加氧等离子体(58)以将开口(54)内的蚀刻停止层(46)转化为二氧化硅(57)。 可以根据需要重复光刻胶图案化,蚀刻和施加氧等离子体以获得所需数量的水平(82,84,86,88)。 然后在每个级(82,84,86,88)上形成第二反射镜(72)。
    • 7. 发明授权
    • Vertically integrated photosensor for CMOS imagers
    • 用于CMOS成像器的垂直集成光电传感器
    • US06984816B2
    • 2006-01-10
    • US10641216
    • 2003-08-13
    • Paige M. HolmJon J. Candelaria
    • Paige M. HolmJon J. Candelaria
    • H01J40/14
    • H01L27/14601H01L27/14636H01L27/14643
    • An exemplary system and method for providing a vertically integrated photosensing element suitably adapted for use in CMOS imaging applications is disclosed as comprising inter alia: a processed CMOS layer (420); and a photosensing element (380) fabricated in a vertically integrated optically active layer (320, 350), where the optically active layer (320, 350) is bonded to the CMOS layer (420) and the optically active layer (320, 350) is positioned near a metalization surface (405) of the CMOS layer (420). Disclosed features and specifications may be variously controlled, configured, adapted or otherwise optionally modified to further improve or otherwise optimize photosensing performance or other material characteristics. Exemplary embodiments of the present invention representatively provide for integrated photosensing components that may be readily incorporated with existing technologies for the improvement of CMOS imaging, device package form factors, weights and/or other manufacturing, device or material performance metrics.
    • 公开了一种用于提供适合于在CMOS成像应用中使用的垂直集成光敏元件的示例性系统和方法,其特别包括:经处理的CMOS层(420); 以及在垂直集成的光学有源层(320,350)中制造的光敏元件(380),其中光学活性层(320,350)被结合到CMOS层(420)和光学活性层(320,350) 位于CMOS层(420)的金属化表面(405)附近。 公开的特征和规格可以被不同地控制,配置,适配或以其他方式任意地修改,以进一步改善或以其它方式优化光敏性能或其它材料特性。 本发明的示例性实施例代表性地提供了可以容易地与现有技术结合以用于改进CMOS成像,设备封装外形,重量和/或其它制造,器件或材料性能度量的集成光敏元件。
    • 9. 发明授权
    • Method of manufacturing a distributed drive optoelectronic integrated
circuit
    • 制造分布式驱动光电集成电路的方法
    • US5221633A
    • 1993-06-22
    • US756734
    • 1991-09-09
    • Paige M. HolmGeorge W. Rhyne
    • Paige M. HolmGeorge W. Rhyne
    • H01L21/8252H01L27/15
    • H01L21/8252H01L27/15Y10S148/072
    • A method of manufacturing a transmitter optoelectronic integrated circuit (10) which comprises a double heterostructure optical emission device (11) and drive circuitry (16). The optical emission device (11) comprises a plurality of optical emission loci (21) distributed throughout an active layer (12) of the optical emission device (11). Drive circuit (16) comprises a plurality of first portions (17) and a second portion (18) wherein the plurality of first portions (17) are above the plurality of emission loci (21). Second portion (18) is integrated in a lateral orientation with respect to the plurality of first portions (17). The chemical composition of the plurality of first portions (17) are such that they are nonabsorbing to optical emissions from the optical emission device (11).
    • 一种制造发射器光电集成电路(10)的方法,其包括双异质结构光发射装置(11)和驱动电路(16)。 光发射装置(11)包括分布在光发射装置(11)的有源层(12)的多个光发射轨道(21)。 驱动电路(16)包括多个第一部分(17)和第二部分(18),其中多个第一部分(17)在多个发射轨迹(21)之上。 第二部分(18)相对于多个第一部分(17)以横向方向被一体化。 多个第一部分(17)的化学成分使得它们不吸收来自光发射装置(11)的光发射。