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1. 发明授权

US06567450B2 Very narrow band, two chamber, high rep rate gas discharge laser system 有权
公开(公告)号：US06567450B2
公开(公告)日：2003-05-20
申请号：US09943343
申请日：2001-08-29
申请人： David W. Myers , Herve A. Besaucele , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Xiaojiang J. Pan , Eckehard D. Onkels , Richard M. Ness , Daniel J. W. Brown
发明人： David W. Myers , Herve A. Besaucele , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Xiaojiang J. Pan , Eckehard D. Onkels , Richard M. Ness , Daniel J. W. Brown
IPC分类号： H01S322
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

2. 发明授权

US06757316B2 Four KHz gas discharge laser 有权
标题翻译：四KHz气体放电激光器
公开(公告)号：US06757316B2
公开(公告)日：2004-06-29
申请号：US09854097
申请日：2001-05-11
申请人： Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
发明人： Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
IPC分类号： H01S322
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

3. 发明授权

US06539042B2 Ultra pure component purge system for gas discharge laser 有权
标题翻译：用于气体放电激光的超纯组分清洗系统
公开(公告)号：US06539042B2
公开(公告)日：2003-03-25
申请号：US09771789
申请日：2001-01-29
申请人： Shahryar Rokni , Xiaojiang J. Pan , Eckehard D. Onkels
发明人： Shahryar Rokni , Xiaojiang J. Pan , Eckehard D. Onkels
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/0404 , H01S3/041 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： The present invention provides an ultra pure purge system for discharge lasers. The LNP, the output coupler, the wavemeter and selected high voltage components are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is filtered and directed to each of the inlet ports. Gas exiting the outlet ports may be directed to flow monitors having alarms so that any loss of purge will be immediately detected. Purge gas may be exhausted or recirculated.
摘要翻译：本发明提供一种用于放电激光器的超纯净化系统。 LNP，输出耦合器，波形计和选定的高电压部件都包含在密封室中，每个密封腔都具有清洗入口和净化出口。吹扫气体如N 2被过滤并引导到每个入口端口。离开出口的气体可以被引导到具有报警器的流量监视器，使得将立即检测到任何清除的损失。吹扫气体可能被排出或再循环。

4. 发明授权

US06529321B2 Protective overcoat for replicated diffraction gratings 有权
$Protective overcoat for replicated diffraction gratings$
标题翻译：复制衍射光栅的保护涂层
公开(公告)号：US06529321B2
公开(公告)日：2003-03-04
申请号：US09731938
申请日：2000-12-07
申请人： Xiaojiang J. Pan , Richard G. Morton , Alexander I. Ershov
发明人： Xiaojiang J. Pan , Richard G. Morton , Alexander I. Ershov
IPC分类号： G02B508
CPC分类号： H01S3/225 , C23C14/0694 , C23C14/16 , C23C14/225 , C23C14/24 , G02B1/105 , G02B1/14 , G02B5/1838 , G02B5/1847 , G02B5/1852 , G02B5/1861 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03
摘要： An overcoat protected diffraction grating. A replica grating having a thin aluminum reflective grating surface is produced by replication of a master grating or a submaster grating. The thin aluminum reflective surface may be cracked or have relatively thick grain boundaries containing oxides and hydroxides of aluminum and typically is also naturally coated with an aluminum oxide film. The grating is subsequently recoated in a vacuum chamber with a thin, pure, dense aluminum overcoat and then also in the vacuum the aluminum overcoat is coated with a thin film of MgF2. The grating is especially suited for use for wavelength selection in an ArF laser operating producing an ultraviolet laser beam at a wavelength of about 193 nm. The oxygen free aluminum overcoat prevents the ultraviolet light from causing damage by stimulating chemical reactions in grating materials under the aluminum grating surface or in the aluminum oxide film. The MgF2 additionally prevents oxidation on the surface, of the aluminum overcoat.
摘要翻译：外涂保护衍射光栅。具有薄铝反射光栅表面的复制光栅通过主光栅或子光栅的复制产生。薄的铝反射表面可能是破裂的或具有含有氧化物和铝的氢氧化物的相对较厚的晶界，并且通常也被氧化铝膜自然地涂覆。随后在具有薄的，纯的，致密的铝外涂层的真空室中重新涂覆光栅，然后在真空中将铝外涂层涂覆有MgF 2的薄膜。该光栅特别适合用于在大约193nm的波长下产生紫外激光束的ArF激光器中的波长选择。无氧铝外套防止紫外光通过在铝光栅表面或氧化铝膜下的光栅材料中刺激化学反应而引起损伤。 MgF2另外防止铝外涂层表面的氧化。

5. 发明授权

US06511703B2 Protective overcoat for replicated diffraction gratings 有权
$Protective overcoat for replicated diffraction gratings$
标题翻译：复制衍射光栅的保护涂层
公开(公告)号：US06511703B2
公开(公告)日：2003-01-28
申请号：US09910362
申请日：2001-07-20
申请人： Xiaojiang J. Pan , Richard G. Morton , Alexander I. Ershov
发明人： Xiaojiang J. Pan , Richard G. Morton , Alexander I. Ershov
IPC分类号： C23C1424
CPC分类号： C23C14/225 , C23C14/0694 , C23C14/16 , C23C14/24 , G02B1/105 , G02B1/14 , G02B5/1847 , G02B5/1852 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70558 , G03F7/70575
摘要： An overcoat protected diffraction grating. A replica grating having a thin aluminum reflective grating surface is produced by replication of a master grating or a submaster grating. The thin aluminum reflective surface may be cracked or have relatively thick grain boundaries containing oxides and hydroxides of aluminum and typically is also naturally coated with an aluminum oxide film. The grating is subsequently overcoated in a vacuum chamber with one or two thin, pure, dense aluminum overcoat layers and then also in the vacuum the aluminum overcoat layer or layers are coated with one or more thin protective layers of a material transparent to ultraviolet radiation. In preferred embodiments this protective layer is a single layer of MgF2, SiO2 or Al2O3. In other preferred embodiments the layer is a layer of MgF2 or SiO2 covered with a layer of Al2O3 and in a third preferred embodiment the protective layer is made up of four alternating layers of MgF2 and Al2O3 or four alternating layers of SiO2 and Al2O3. Preferably, the thickness of the transparent protective layers are chosen to produce a phase shift at the proposed operating wavelengths of an integral number of 2&pgr;.
摘要翻译：外涂保护衍射光栅。具有薄铝反射光栅表面的复制光栅通过主光栅或子光栅的复制产生。薄的铝反射表面可能是破裂的或具有含有氧化物和铝的氢氧化物的相对较厚的晶界，并且通常也被氧化铝膜自然地涂覆。随后，在具有一个或两个薄的，纯的，致密的铝外涂层的真空室中涂覆光栅，然后在真空中涂覆一层或多层对紫外线辐射透明的材料的薄保护层。在优选的实施方案中，该保护层是MgF 2，SiO 2或Al 2 O 3的单层。在其它优选实施例中，该层是由Al 2 O 3层覆盖的MgF 2或SiO 2层，在第三优选实施例中，保护层由MgF2和Al2O3的四个交替层或SiO 2和Al 2 O 4的四个交替层组成。优选地，选择透明保护层的厚度以在所提出的整数2pi的工作波长下产生相移。

6. 发明授权

US6109574A Gas laser chamber/optics support structure 有权
标题翻译：气体激光腔/光学支架结构
公开(公告)号：US6109574A
公开(公告)日：2000-08-29
申请号：US174155
申请日：1998-10-16
申请人： Xiaojiang J. Pan , James K. Howey , Curtiss L. Mixon
发明人： Xiaojiang J. Pan , James K. Howey , Curtiss L. Mixon
IPC分类号： G12B5/00 , G02B7/00 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/225 , F16M11/00
CPC分类号： G02B7/00 , H01S3/02 , H01S3/225
摘要： A chamber/optics support structure for a laser having a laser chamber with a vibration source. The chamber and the laser resonance cavity optical elements are supported on a platform. The chamber is supported by a plurality of wheels which in turn rests on two tracks on track supports mounted on the platform. A flexible clamp flexibly clamps the chamber in a horizontal position to align it with the resonance cavity optical elements and to substantially decouple vibration between the chamber vibration source to the optical elements in a frequency range of concern.The invention is especially useful for positioning the heavy laser chamber of a narrow band excimer laser and for decoupling vibrations resulting from its blower from the lasers line narrowing module and output coupler. In a preferred embodiment the plurality of wheels is three wheels, two of which rest in a V-groove track and one of which rests on a flat track. This preferred embodiment uses two flex-clamps each having an adjustment bolt and four symmetrically spaced silicon rubber vibration isolators. Precise horizontal alignment of the chamber is accomplished using the adjustment bolt which is then held in position with a lock nut and a clamping bolt. Silicon rubber dampers in the isolators decouple horizontal chamber vibrations from the optical elements.
摘要翻译：一种用于具有具有振动源的激光室的激光器的腔室/光学器件支撑结构。腔室和激光共振腔光学元件支撑在平台上。该室由多个轮支撑，多个轮依次放置在安装在平台上的轨道支架上的两个轨道上。柔性夹具可灵活地将腔室夹持在水平位置，以将其与谐振腔光学元件对准，并且在所考虑的频率范围内基本上将室振动源与光学元件之间的振动解耦。本发明对于定位窄带准分子激光器的重激光室以及将其鼓风机产生的振动与激光线窄线模块和输出耦合器分离是特别有用的。在优选实施例中，多个车轮是三个车轮，其中两个车轮搁置在V形槽轨道中，其中一个车轮搁置在平坦轨道上。该优选实施例使用两个具有调节螺栓和四个对称间隔的硅橡胶隔振器的挠性夹具。使用调节螺栓实现腔室的精确水平对准，调节螺栓然后通过锁紧螺母和夹紧螺栓保持在适当的位置。隔离器中的硅橡胶阻尼器将水平室振动与光学元件分离。

7. 发明授权

US06466601B1 Beam seal for line narrowed production laser 有权
标题翻译：线束生产激光的束封
公开(公告)号：US06466601B1
公开(公告)日：2002-10-15
申请号：US09834840
申请日：2001-04-13
申请人： Xiaojiang J. Pan , Vladimir Kulgeyko
发明人： Xiaojiang J. Pan , Vladimir Kulgeyko
IPC分类号： H01S303
CPC分类号： H01S3/225 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/22 , H01S3/2207
摘要： A gas discharge modular laser with beam train isolation between laser chamber module and front and rear optics which define the laser resonant cavity. Beam train isolation units isolates the beam train from atmospheric air while permitting quick and easy removal of the laser chamber without disturbing the optics of the resonant cavity. In preferred embodiments, metal bellows units are bolted at only side so that the chamber module can be removed and replaced without unbolting the bellows unit.
摘要翻译：一种气体放电模块激光器，其激光腔室模块与前后光学器件之间具有光束驱动隔离，其限定了激光谐振腔。光束列车隔离单元将光束与大气隔离，同时允许快速且容易地去除激光室，而不会干扰谐振腔的光学器件。在优选实施例中，金属波纹管单元仅在一侧螺栓连接，使得腔室模块可以被拆卸并且不拆卸波纹管单元而被更换。

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