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    • 1. 发明授权
    • Method of fabrication an ultra-thin quartz resonator
    • 制造超薄石英谐振器的方法
    • US08769802B1
    • 2014-07-08
    • US12831028
    • 2010-07-06
    • David T. ChangRandall L. KubenaPamela R. Patterson
    • David T. ChangRandall L. KubenaPamela R. Patterson
    • H04R31/00
    • H03H9/172H03H3/04
    • A method for manufacturing a resonator is presented in the present application. The method includes providing a handle substrate, providing a host substrate, providing a quartz substrate comprising a first surface opposite a second surface, applying interposer film to the first surface of the quartz substrate, bonding the quartz substrate to the handle substrate wherein the interposer film is disposed between the quartz substrate and the handle substrate, thinning the second surface of the quartz substrate, removing a portion of the bonded quartz substrate to expose a portion of the interposer film, bonding the quartz substrate to the host substrate, and removing the handle substrate and the interposer film, thereby releasing the quartz substrate.
    • 在本申请中提出了一种用于制造谐振器的方法。 该方法包括提供处理衬底,提供主体衬底,提供包括与第二表面相对的第一表面的石英衬底,将中介层膜施加到石英衬底的第一表面,将石英衬底接合到处理衬底,其中插入膜 设置在石英基板和手柄基板之间,使石英基板的第二表面变薄,去除一部分键合的石英基板以暴露中间层膜的一部分,将石英基板接合到主基板,并且移除手柄 基板和内插膜,从而释放石英基板。
    • 2. 发明授权
    • Method of fabricating a low frequency quartz resonator
    • 制造低频石英谐振器的方法
    • US07647688B1
    • 2010-01-19
    • US12189617
    • 2008-08-11
    • David T. ChangRandall L. KubenaFrederic P. StrattonPamela R. Patterson
    • David T. ChangRandall L. KubenaFrederic P. StrattonPamela R. Patterson
    • H04R31/00
    • H04R31/00H04R19/005Y10T29/42Y10T29/49005Y10T29/4908
    • A method for fabricating a low frequency quartz resonator includes metalizing a top-side of a quartz wafer with a metal etch stop, depositing a first metal layer over the metal etch stop, patterning the first metal layer to form a top electrode, bonding the quartz wafer to a silicon handle, thinning the quartz wafer to a desired thickness, depositing on a bottom-side of the quartz wafer a hard etch mask, etching the quartz wafer to form a quartz area for the resonator and to form a via through the quartz wafer, removing the hard etch mask without removing the metal etch stop, forming on the bottom side of the quartz wafer a bottom electrode for the low frequency quartz resonator, depositing metal for a substrate bond pad onto a host substrate wafer, bonding the quartz resonator to the substrate bond pad, and removing the silicon handle.
    • 一种用于制造低频石英谐振器的方法包括用金属蚀刻停止器将石英晶片的顶侧金属化,在金属蚀刻停止器上沉积第一金属层,图案化第一金属层以形成顶部电极,将石英 将晶片细化到硅手柄,将石英晶片细化到所需厚度,在石英晶片的底侧上沉积硬蚀刻掩模,蚀刻石英晶片以形成用于谐振器的石英区域,并通过石英形成通孔 晶片,去除硬蚀刻掩模而不去除金属蚀刻停止,在石英晶片的底侧上形成用于低频石英谐振器的底部电极,将用于衬底接合焊盘的金属沉积到主衬底晶片上,将石英谐振器 到基板接合焊盘,并且移除硅手柄。
    • 3. 发明授权
    • Method of fabricating an ultra thin quartz resonator component
    • 制造超薄石英谐振器元件的方法
    • US07802356B1
    • 2010-09-28
    • US12034852
    • 2008-02-21
    • David T. ChangRandall L. KubenaPamela R. Patterson
    • David T. ChangRandall L. KubenaPamela R. Patterson
    • H04R31/00
    • H03H9/172H03H3/04
    • A method for manufacturing a resonator is presented in the present application. The method includes providing a handle substrate, providing a host substrate, providing a quartz substrate comprising a first surface opposite a second surface, applying interposer film to the first surface of the quartz substrate, bonding the quartz substrate to the handle substrate wherein the interposer film is disposed between the quartz substrate and the handle substrate, thinning the second surface of the quartz substrate, removing a portion of the bonded quartz substrate to expose a portion of the interposer film, bonding the quartz substrate to the host substrate, and removing the handle substrate and the interposer film, thereby releasing the quartz substrate.
    • 在本申请中提出了一种用于制造谐振器的方法。 该方法包括提供处理衬底,提供主体衬底,提供包括与第二表面相对的第一表面的石英衬底,将中介层膜施加到石英衬底的第一表面,将石英衬底接合到处理衬底,其中插入膜 设置在石英基板和手柄基板之间,使石英基板的第二表面变薄,去除一部分键合的石英基板以暴露中间层膜的一部分,将石英基板接合到主基板,并且移除手柄 基板和内插膜,从而释放石英基板。
    • 5. 发明授权
    • Supercapacitor cells and micro-supercapacitors
    • 超级电容器和微型超级电容器
    • US08503161B1
    • 2013-08-06
    • US13070467
    • 2011-03-23
    • David T. ChangPamela R. PattersonPing Liu
    • David T. ChangPamela R. PattersonPing Liu
    • H01G9/00H01G9/08
    • H01G11/10B82Y10/00B82Y40/00H01G11/28H01G11/36H01G11/46H01G11/82H01L28/91H01L29/0676H01L29/66439H01L29/66469H01L29/775Y02E60/13
    • This invention provides a micro-supercapacitor with high energy density and high power density. In some variations, carbon nanostructures, such as carbon nanotubes, coated with a metal oxide, such as ruthenium oxide, are grown in a supercapacitor cavity that contains no separator. A lid is bonded to the cavity using a bonding process to form a hermetic seal. These micro-supercapacitors may be fabricated from silicon-on-insulator wafers according to the disclosed methods. An exemplary micro-supercapacitor is cubic with a length of about 50-100 μm. The absence of a separator translates to higher energy storage volume and less wasted space within the supercapacitor cell. The energy density of the micro-supercapacitor may exceed 150 J/cm3 and the peak output power density may be in the range of about 2-20 W/cm3, in various embodiments.
    • 本发明提供了具有高能量密度和高功率密度的微型超级电容器。 在一些变型中,涂覆有金属氧化物(例如氧化钌)的碳纳米管结构,例如在不含隔板的超级电容器腔中生长。 使用接合工艺将盖结合到腔体以形成气密密封。 根据所公开的方法,这些微超级电容器可以由绝缘体上硅晶片制造。 示例性的微超级电容器是长度为约50-100μm的立方体。 没有分离器可以转换为更高的能量存储容量,并且在超级电容器单元内减少浪费的空间。 在各种实施例中,微超级电容器的能量密度可以超过150J / cm 3,峰值输出功率密度可以在约2-20W / cm 3的范围内。
    • 6. 发明授权
    • Methods of making supercapacitor cells and micro-supercapacitors
    • 制造超级电容器电池和微超级电容器的方法
    • US08778800B1
    • 2014-07-15
    • US13887370
    • 2013-05-06
    • David T. ChangPamela R. PattersonPing Liu
    • David T. ChangPamela R. PattersonPing Liu
    • H01L21/44
    • H01G11/10B82Y10/00B82Y40/00H01G11/28H01G11/36H01G11/46H01G11/82H01L28/91H01L29/0676H01L29/66439H01L29/66469H01L29/775Y02E60/13
    • This invention provides a micro-supercapacitor with high energy density and high power density. In some variations, carbon nanostructures, such as carbon nanotubes, coated with a metal oxide, such as ruthenium oxide, are grown in a supercapacitor cavity that contains no separator. A lid is bonded to the cavity using a bonding process to form a hermetic seal. These micro-supercapacitors may be fabricated from silicon-on-insulator wafers according to the disclosed methods. An exemplary micro-supercapacitor is cubic with a length of about 50-100 μm. The absence of a separator translates to higher energy storage volume and less wasted space within the supercapacitor cell. The energy density of the micro-supercapacitor may exceed 150 J/cm3 and the peak output power density may be in the range of about 2-20 W/cm3, in various embodiments.
    • 本发明提供了具有高能量密度和高功率密度的微型超级电容器。 在一些变型中,涂覆有金属氧化物(例如氧化钌)的碳纳米管结构,例如在不含隔板的超级电容器腔中生长。 使用接合工艺将盖结合到腔体以形成气密密封。 根据所公开的方法,这些微超级电容器可以由绝缘体上硅晶片制造。 示例性的微超级电容器是长度为约50-100μm的立方体。 没有分离器可以转换为更高的能量存储容量,并且在超级电容器单元内减少浪费的空间。 在各种实施例中,微超级电容器的能量密度可以超过150J / cm 3,峰值输出功率密度可以在约2-20W / cm 3的范围内。