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    • 6. 发明授权
    • Sensor with magnetic tunnel junction and moveable magnetic field source
    • 传感器具有磁性隧道结和可动磁场源
    • US07414396B2
    • 2008-08-19
    • US11192802
    • 2005-07-29
    • Young Sir ChungRobert W. Baird
    • Young Sir ChungRobert W. Baird
    • G01R33/02
    • G01R33/06B82Y25/00G01R33/093G01R33/098
    • Methods and apparatus are provided for sensing physical parameters. The apparatus comprises a magnetic tunnel junction (MTJ) and a magnetic field source whose magnetic field overlaps the MTJ and whose proximity to the MTJ varies in response to an input to the sensor. A magnetic shield is provided at least on a face of the MFS away from the MTJ. The MTJ comprises first and second magnetic electrodes separated by a dielectric configured to permit significant tunneling conduction therebetween. The first magnetic region has its spin axis pinned and the second magnetic electrode has its spin axis free. The magnetic field source is oriented closer to the second magnetic electrode than the first magnetic electrode. The overall sensor dynamic range is extended by providing multiple electrically coupled sensors receiving the same input but with different individual response curves and desirably but not essentially formed on the same substrate.
    • 提供了用于感测物理参数的方法和装置。 该装置包括磁隧道结(MTJ)和磁场源,其磁场与MTJ重叠,并且其与MTJ的接近度响应于对传感器的输入而变化。 至少在远离MTJ的MFS的面上设有磁屏蔽。 MTJ包括由电介质隔开的第一和第二磁极,其被配置为允许它们之间的显着的隧穿传导。 第一磁性区域的自旋轴被固定,第二磁极的自由轴自由。 磁场源比第一磁极更靠近第二磁极。 通过提供多个电耦合传感器来接收相同的输入但是具有不同的单个响应曲线并且期望地但不是基本上形成在相同的基板上来扩展总传感器动态范围。
    • 9. 发明申请
    • Semiconductor device with under-filled heat extractor
    • 半导体器件具有欠充电散热器
    • US20080061309A1
    • 2008-03-13
    • US11490922
    • 2006-07-21
    • Young Sir ChungRobert W. Baird
    • Young Sir ChungRobert W. Baird
    • H01L33/00
    • H01L29/0657H01L21/84H01L23/3677H01L2924/0002H01L2924/12044H01L2924/3011H01L2924/00
    • Structure (40, 61-13, 61-15, 61-18, 61-19) and method (60-5 . . . 60-19, 100, 200) are provided for a semiconductor device (40, 61-13, 61-15, 61-18, 61-19) with under-filled heat extractor(s) (46, 46′, 78, 78′). The device (40, 61-13, 61-15, 61-18, 61-19) comprises a substrate (48, 72) with upper (37) and lower (63, 73) surfaces. A semiconductor (38, 72) is located proximate the upper surface (37) with a device region (26) therein. One or more cavities (67, 77) underlying the device region (26) are etched in the substrate (48, 72) from the lower surface (63, 73). A higher thermal conductivity material (68) versus the substrate (48, 72) fills the one or more cavities (67) and has an exposed surface (69, 69′, 79, 79′) underlying the device region (26) at or beyond the lower surface (63, 73). This provides the under-filled heat extractor(s) (46, 46′, 78, 78′). A composite substrate (48) is preferred, having a first semiconductor (38) extending to the upper surface (37) containing the device region (26), a second semiconductor (42) extending to the lower surface (63) and an insulating layer (36) therebetween, wherein the one or more cavities (67) extend from the lower surface (63) to the insulating layer (36) and the etch depth (671) is self limiting.
    • 提供了用于半导体器件(40,61-13,13)的方法(40,51-13,61-15,61-18,61-19)和方法(60-5。.60-19,190,200) 61 - 15,61 - 18,61 - 19)与充足的散热器(46,46',78,78')。 装置(40,61-13,131-15,61-18,61-19)包括具有上部(37)和下部(63,73)表面的基底(48,72)。 半导体(38,72)位于靠近上表面(37)处,其中具有器件区域(26)。 下部表面(63,73)在衬底(48,72)中蚀刻位于器件区域(26)下面的一个或多个腔体(67,77)。 相对于衬底(48,72),较高的导热材料(68)填充一个或多个空腔(67),并且在器件区域(26)下方具有暴露的表面(69,69',79,79') 超出下表面(63,73)。 这提供了未填充的散热器(46,46',78,78')。 复合衬底(48)是优选的,具有延伸到包含器件区域(26)的上表面(37)的第一半导体(38),延伸到下表面(63)的第二半导体(42)和绝缘层 (36),其中所述一个或多个空腔(67)从所述下表面(63)延伸到所述绝缘层(36),并且所述蚀刻深度(671)是自限制的。