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1. 发明授权

US07696094B2 Method for improved planarization in semiconductor devices 有权
标题翻译：改进半导体器件平面化的方法
公开(公告)号：US07696094B2
公开(公告)日：2010-04-13
申请号：US11616563
申请日：2006-12-27
申请人： David Matsumoto , Michael Brennan , Vidyut Gopal , Jean Yang
发明人： David Matsumoto , Michael Brennan , Vidyut Gopal , Jean Yang
IPC分类号： H01L21/302
CPC分类号： H01L21/31053 , H01L27/115 , H01L27/11521 , H01L27/11568
摘要： A method for forming a semiconductor device may include forming a silicon oxynitride mask layer over a first layer. The first layer may be etched using the silicon oxynitride mask layer, to form a pattern in the first layer. The pattern may be filled with a dielectric material. The dielectric material may be planarized using a ceria-based slurry and using the silicon oxynitride mask layer as a stop layer.
摘要翻译：形成半导体器件的方法可以包括在第一层上形成氮氧化硅掩模层。可以使用氮氧化硅掩模层来蚀刻第一层，以在第一层中形成图案。图案可以用电介质材料填充。介电材料可以使用二氧化铈基浆料并使用氧氮化硅掩模层作为停止层进行平面化。

2. 发明授权

US07829464B2 Planarization method using hybrid oxide and polysilicon CMP 有权
标题翻译：使用混合氧化物和多晶硅CMP的平面化方法
公开(公告)号：US07829464B2
公开(公告)日：2010-11-09
申请号：US11551390
申请日：2006-10-20
申请人： David Matsumoto , Vidyut Gopal
发明人： David Matsumoto , Vidyut Gopal
IPC分类号： H01L21/461 , H01L21/302
CPC分类号： H01L21/31053 , C09G1/02 , H01L21/76819
摘要： A method of planarizing a semiconductor device is provided. The semiconductor device includes a substrate, first and second components provided on the surface of the substrate, and a first material provided between and above the first and second components. The first component has a height greater than a height of the second component. The method includes performing a first polishing step on the semiconductor device to remove the first material above a top surface of the first component, to remove the first material above a top surface of the second component, and to level the top surface of the first component. The method also includes performing a second polishing step on the semiconductor device to planarize the top surfaces of the first and second components.
摘要翻译：提供了一种平面化半导体器件的方法。半导体器件包括衬底，设置在衬底的表面上的第一和第二组件以及设置在第一和第二组件之间和之上的第一材料。第一部件的高度大于第二部件的高度。该方法包括在半导体器件上执行第一抛光步骤以去除第一部件的顶表面上方的第一材料，以去除第二部件的顶表面上方的第一材料，并且使第一部件的顶表面平整。该方法还包括在半导体器件上执行第二抛光步骤以平坦化第一和第二部件的顶表面。

3. 发明申请

US20080096388A1 PLANARIZATION METHOD USING HYBRID OXIDE AND POLYSILICON CMP 有权
标题翻译：使用混合氧化物和多晶硅CMP的平面化方法
公开(公告)号：US20080096388A1
公开(公告)日：2008-04-24
申请号：US11551390
申请日：2006-10-20
申请人： David Matsumoto , Vidyut Gopal
发明人： David Matsumoto , Vidyut Gopal
IPC分类号： H01L21/302
CPC分类号： H01L21/31053 , C09G1/02 , H01L21/76819
摘要： A method of planarizing a semiconductor device is provided. The semiconductor device includes a substrate, first and second components provided on the surface of the substrate, and a first material provided between and above the first and second components. The first component has a height greater than a height of the second component. The method includes performing a first polishing step on the semiconductor device to remove the first material above a top surface of the first component, to remove the first material above a top surface of the second component, and to level the top surface of the first component. The method also includes performing a second polishing step on the semiconductor device to planarize the top surfaces of the first and second components.
摘要翻译：提供了一种平面化半导体器件的方法。半导体器件包括衬底，设置在衬底的表面上的第一和第二组件以及设置在第一和第二组件之间和之上的第一材料。第一部件的高度大于第二部件的高度。该方法包括在半导体器件上执行第一抛光步骤以去除第一部件的顶表面上方的第一材料，以去除第二部件的顶表面上方的第一材料，并且使第一部件的顶表面平整。该方法还包括在半导体器件上执行第二抛光步骤以平坦化第一和第二部件的顶表面。

4. 发明授权

US07972962B2 Planarization method using hybrid oxide and polysilicon CMP 有权
标题翻译：使用混合氧化物和多晶硅CMP的平面化方法
公开(公告)号：US07972962B2
公开(公告)日：2011-07-05
申请号：US12887182
申请日：2010-09-21
申请人： David Matsumoto , Vidyut Gopal
发明人： David Matsumoto , Vidyut Gopal
IPC分类号： H01L21/461 , H01L21/302
CPC分类号： H01L21/31053 , C09G1/02 , H01L21/76819
摘要： A method of planarizing a semiconductor device is provided. The semiconductor device includes a substrate, first and second components provided on the surface of the substrate, and a first material provided between and above the first and second components. The first component has a height greater than a height of the second component. The method includes performing a first polishing step on the semiconductor device to remove the first material above a top surface of the first component, to remove the first material above a top surface of the second component, and to level the top surface of the first component. The method also includes performing a second polishing step on the semiconductor device to planarize the top surfaces of the first and second components.
摘要翻译：提供了一种平面化半导体器件的方法。半导体器件包括衬底，设置在衬底的表面上的第一和第二组件以及设置在第一和第二组件之间和之上的第一材料。第一部件的高度大于第二部件的高度。该方法包括在半导体器件上执行第一抛光步骤以去除第一部件的顶表面上方的第一材料，以去除第二部件的顶表面上方的第一材料，并且使第一部件的顶表面平整。该方法还包括在半导体器件上执行第二抛光步骤以平坦化第一和第二部件的顶表面。

5. 发明申请

US20110026779A1 SYSTEMS AND METHODS FOR ANALYZING FACIAL EXPRESSIONS, IDENTIFYING INTENT AND TRANSFORMING IMAGES THROUGH REVIEW OF FACIAL EXPRESSIONS 有权
标题翻译：用于分析FACIAL表达的系统和方法，通过对FACIAL表达的评估来识别INTENT和变换图像
公开(公告)号：US20110026779A1
公开(公告)日：2011-02-03
申请号：US12646211
申请日：2009-12-23
申请人： David Matsumoto , Paul Ekman
发明人： David Matsumoto , Paul Ekman
IPC分类号： G06K9/00
CPC分类号： G09B7/02 , G06K9/6253 , G06K9/6255
摘要： Methods of analyzing a plurality of facial expressions are disclosed that include: identifying a subject person, utilizing the subject person to create an image of a known target, removing at least one distracter expression from the target image to form a revised target image, and reviewing the revised target image with at least one third party participant to form a final target image. Additional methods of analyzing a plurality of facial expressions include: identifying a subject person, utilizing the subject person to create an image of a known target, digitizing the target image, removing at least one distracter expression from the target image to transform the target image to a revised target image, and reviewing the revised target image with at least one third party participant to transform the revised target image to a final target image. Software for implementing contemplated methods include: a set speed function, a pre-test phase function, an instruction phase function, a practice phase function, and a post-test phase function.
摘要翻译：公开了分析多个面部表情的方法，包括：识别对象人，利用对象人创建已知目标的图像，从目标图像中移除至少一个分离符表达以形成修订的目标图像，以及查看修改的目标图像与至少一个第三方参与者形成最终目标图像。分析多个面部表情的附加方法包括：识别被摄体人，利用对象人创建已知目标的图像，数字化目标图像，从目标图像中移除至少一个分离符表达，以将目标图像转换为修改的目标图像，并且与至少一个第三方参与者一起检查修改的目标图像以将修正的目标图像变换为最终目标图像。用于实现预期方法的软件包括：设定速度功能，预测相位功能，指令相位功能，练习相位功能和测试后相位功能。

6. 发明申请

US20070174654A1 System and method for error recovery 有权
标题翻译：用于错误恢复的系统和方法
公开(公告)号：US20070174654A1
公开(公告)日：2007-07-26
申请号：US11332011
申请日：2006-01-13
申请人： Russell Berman , Giles Biddison , Felix Chuang , David Matsumoto , Joseph Barco
发明人： Russell Berman , Giles Biddison , Felix Chuang , David Matsumoto , Joseph Barco
IPC分类号： G06F11/00
CPC分类号： G01N35/00594 , G01N35/0092 , G01N35/0095
摘要： An automated laboratory device that comprises a mechanism that performs operations on laboratory samples, a scheduler that causes the mechanism to process laboratory samples in accordance with programmed processes, logic that detects an error occurring in a process controlled by the scheduler, logic that accepts a user-defined error handling routine for the error, and logic that executes the error handling routine when the error is encountered. Also described is an embodiment of the invention directed to a laboratory automation system, a method of laboratory automation, a computer implemented software program product, a method of doing business, and a laboratory automation network.
摘要翻译：一种自动化实验室设备，包括对实验室样品执行操作的机构，调度器，其使机构根据编程过程处理实验室样品，检测由调度器控制的过程中发生的错误的逻辑，接受用户的逻辑用于错误的定义错误处理例程，以及遇到错误时执行错误处理例程的逻辑。还描述了本发明的实施例，其涉及实验室自动化系统，实验室自动化方法，计算机实现的软件程序产品，业务方法和实验室自动化网络。

7. 发明申请

US20070174653A1 Distributed system and method for error recovery 有权
标题翻译：分布式系统和错误恢复方法
公开(公告)号：US20070174653A1
公开(公告)日：2007-07-26
申请号：US11331765
申请日：2006-01-13
申请人： Russell Berman , Giles Biddison , Felix Chuang , David Matsumoto , Joseph Barco
发明人： Russell Berman , Giles Biddison , Felix Chuang , David Matsumoto , Joseph Barco
IPC分类号： G06F11/00
CPC分类号： G01N35/00623
摘要： An automated laboratory device that comprises a mechanism that performs operations on laboratory samples, a scheduler that causes the mechanism to process laboratory samples in accordance with programmed processes, logic that detects an error occurring in a process controlled by the scheduler, logic that accepts a user-defined error handling routine for the error, and logic that executes the error handling routine when the error is encountered. Also described is an embodiment of the invention directed to a laboratory automation system, a method of laboratory automation, a computer implemented software program product, a method of doing business, and a laboratory automation network.
摘要翻译：一种自动化实验室设备，包括对实验室样品执行操作的机构，调度器，其使机构根据编程过程处理实验室样品，检测由调度器控制的过程中发生的错误的逻辑，接受用户的逻辑用于错误的定义错误处理例程，以及遇到错误时执行错误处理例程的逻辑。还描述了本发明的实施例，其涉及实验室自动化系统，实验室自动化方法，计算机实现的软件程序产品，业务方法和实验室自动化网络。

8. 发明授权

US07468296B1 Thin film germanium diode with low reverse breakdown 有权
标题翻译：薄膜锗二极管具有低反向击穿功能
公开(公告)号：US07468296B1
公开(公告)日：2008-12-23
申请号：US11290787
申请日：2005-11-30
申请人： Ercan Adem , Matthew Buynoski , Robert Chiu , Bryan Choo , Calvin Gabriel , Joong Jeon , David Matsumoto , Jeffrey Shields , Bhanwar Singh , Winny Stockwell , Wen Yu
发明人： Ercan Adem , Matthew Buynoski , Robert Chiu , Bryan Choo , Calvin Gabriel , Joong Jeon , David Matsumoto , Jeffrey Shields , Bhanwar Singh , Winny Stockwell , Wen Yu
IPC分类号： H01L21/8234 , H01L27/10
CPC分类号： H01L27/1021
摘要： In fabricating an electronic structure, a substrate is provided, and a first barrier layer is provided on the substrate. A germanium thin film diode is provided on the first barrier layer, and a second barrier layer is provided on the germanium thin film diode. A memory device is provided over and connected to the second barrier layer.
摘要翻译：在制造电子结构时，提供基板，并且在基板上设置第一阻挡层。锗薄膜二极管设置在第一阻挡层上，第二阻挡层设置在锗薄膜二极管上。存储器件设置在第二阻挡层上并连接到第二阻挡层。

9. 发明授权

US08642441B1 Self-aligned STI with single poly for manufacturing a flash memory device 有权
标题翻译：自对准STI与单个poly制造闪存设备
公开(公告)号：US08642441B1
公开(公告)日：2014-02-04
申请号：US11639667
申请日：2006-12-15
申请人： Tim Thurgate , Shenqing Fang , Kuo-Tung Chang , YouSeok Suh , Meng Ding , Hidehiko Shiraiwa , Amol Joshi , Harpreet Sachar , David Matsumoto , Lovejeet Singh , Chih-Yuh Yang
发明人： Tim Thurgate , Shenqing Fang , Kuo-Tung Chang , YouSeok Suh , Meng Ding , Hidehiko Shiraiwa , Amol Joshi , Harpreet Sachar , David Matsumoto , Lovejeet Singh , Chih-Yuh Yang
IPC分类号： H01L21/76
CPC分类号： H01L27/11563 , H01L21/28282 , H01L21/76232 , H01L21/823481 , H01L27/11568 , H01L29/66833
摘要： A method for fabricating a memory device with a self-aligned trap layer and rounded active region corners is disclosed. In the present invention, an STI process is performed before any of the charge-trapping and top-level layers are formed. Immediately after the STI process, the sharp corners of the active regions are exposed. Because these sharp corners are exposed at this time, they are available to be rounded through any number of known rounding techniques. Rounding the corners improves the performance characteristics of the memory device. Subsequent to the rounding process, the charge-trapping structure and other layers can be formed by a self-aligned process.
摘要翻译：公开了一种用于制造具有自对准陷阱层和圆形有源区域拐角的存储器件的方法。在本发明中，在形成电荷捕获层和顶层之前进行STI工艺。 STI过程之后立即暴露有源区域的尖角。因为这些尖角在这个时候被曝光，所以它们可以通过任何数量的已知的四舍五入技术进行四舍五入。四舍五入改善了存储设备的性能特征。在舍入处理之后，电荷捕获结构和其它层可以通过自对准工艺形成。

10. 发明授权

US08416988B2 Systems and methods for analyzing facial expressions, identifying intent and transforming images through review of facial expressions 有权
标题翻译：用于分析面部表情的系统和方法，通过审视面部表情来识别意图和转换图像
公开(公告)号：US08416988B2
公开(公告)日：2013-04-09
申请号：US12646211
申请日：2009-12-23
申请人： David Matsumoto , Paul Ekman
发明人： David Matsumoto , Paul Ekman
IPC分类号： G06K9/00 , G08B29/00
CPC分类号： G09B7/02 , G06K9/6253 , G06K9/6255
摘要： Methods of analyzing a plurality of facial expressions are disclosed that include: identifying a subject person, utilizing the subject person to create an image of a known target, removing at least one distracter expression from the target image to form a revised target image, and reviewing the revised target image with at least one third party participant to form a final target image. Additional methods of analyzing a plurality of facial expressions include: identifying a subject person, utilizing the subject person to create an image of a known target, digitizing the target image, removing at least one distracter expression from the target image to transform the target image to a revised target image, and reviewing the revised target image with at least one third party participant to transform the revised target image to a final target image. Software for implementing contemplated methods include: a set speed function, a pre-test phase function, an instruction phase function, a practice phase function, and a post-test phase function.
摘要翻译：公开了分析多个面部表情的方法，包括：识别对象人，利用对象人创建已知目标的图像，从目标图像中移除至少一个分离符表达以形成修订的目标图像，以及查看修改的目标图像与至少一个第三方参与者形成最终目标图像。分析多个面部表情的附加方法包括：识别被摄体人，利用对象人创建已知目标的图像，数字化目标图像，从目标图像中移除至少一个分离符表达，以将目标图像转换为修改的目标图像，并且与至少一个第三方参与者一起检查修改的目标图像以将修正的目标图像变换为最终目标图像。用于实现预期方法的软件包括：设定速度功能，预测相位功能，指令相位功能，练习相位功能和测试后相位功能。

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