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1. 发明授权

US07400383B2 Environmental control in a reticle SMIF pod 有权
标题翻译：光栅SMIF盒中的环境控制
公开(公告)号：US07400383B2
公开(公告)日：2008-07-15
申请号：US11396949
申请日：2006-04-03
申请人： David L. Halbmaier , Anthony Simpson , William M. Goodwin , Oleg P. Kishkovich , Thomas B. Kielbaso , Frank Manganiello
发明人： David L. Halbmaier , Anthony Simpson , William M. Goodwin , Oleg P. Kishkovich , Thomas B. Kielbaso , Frank Manganiello
IPC分类号： G03B27/58
CPC分类号： H01L21/67017 , H01L21/67353 , H01L21/67359 , H01L21/67386 , H01L21/67389 , H01L21/67393
摘要： The present invention provides a standardized mechanical interface (SMIF) reticle pod that is configured to provide a controlled environment for supporting a reticle wherein the controlled environment is maintained substantially free of crystal growth causing contaminants. Accordingly, there is provided a layered filter with filter elements capable of filtering particulates and adsorbing gaseous contaminants. The filter has an inwardly facing face generally planar shaped with a surface area that is substantially half or more of the area of the reticle face. The inwardly facing face is placed in close proximity to the reticle patterned surface and has an area that is a significant fraction of the reticle patterned surface area. The SMIF pod is also provided with a purge system configured to inject a very dry gas within the controlled environment to flush the controlled environment of contaminants as well as to regenerate the filter.
摘要翻译：本发明提供了一种标准化的机械接口（SMIF）掩模版盒，其被配置为提供用于支撑掩模版的受控环境，其中所述受控环境基本上不含引起污染物的晶体生长。因此，提供了具有能够过滤颗粒并吸附气态污染物的过滤元件的层状过滤器。过滤器具有大致平面形状的面向内的面，其表面面积大致为掩模版面的面积的一半或更多。面向内的面被放置在靠近掩模版图案的表面，并且具有的面积是掩模版图案表面积的很大一部分。 SMIF吊舱还设有吹扫系统，其配置成在受控环境内喷射非常干燥的气体，以冲洗受污染物的受控环境以及再生过滤器。

2. 发明授权

US07329308B2 Air handling and chemical filtration system and method 有权
标题翻译：空气处理和化学过滤系统及方法
公开(公告)号：US07329308B2
公开(公告)日：2008-02-12
申请号：US10888573
申请日：2004-07-09
申请人： William M. Goodwin , Oleg P. Kishkovich , Anatoly Grayfer
发明人： William M. Goodwin , Oleg P. Kishkovich , Anatoly Grayfer
IPC分类号： B01D47/14
CPC分类号： F24F3/16 , B01D53/18 , B01D2258/0216 , F24F2003/1621 , Y10S438/909
摘要： The present invention relates to systems and methods for controlling humidity and temperature in gases or air streams used in semiconductor processing systems. These systems and methods can be used in combination with systems and methods for contaminant detection and removal.
摘要翻译：本发明涉及用于控制半导体处理系统中使用的气体或气流中的湿度和温度的系统和方法。这些系统和方法可以与用于污染物检测和去除的系统和方法结合使用。

3. 发明授权

US07092077B2 System and method for monitoring contamination 有权
标题翻译：污染监测系统和方法
公开(公告)号：US07092077B2
公开(公告)日：2006-08-15
申请号：US10662892
申请日：2003-09-15
申请人： Oleg P. Kishkovich , Anatoly Grayfer , William M. Goodwin , Devon Kinkead
发明人： Oleg P. Kishkovich , Anatoly Grayfer , William M. Goodwin , Devon Kinkead
IPC分类号： G01N1/00 , H01L21/66
CPC分类号： H01L21/67253 , B01D53/22 , G01N1/2205 , G01N1/2247 , G01N1/405
摘要： The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.
摘要翻译：本发明提供了一种用于监测半导体处理系统中的污染物的无源采样系统和方法。在一个实施例中，该无源采样系统包括与提供来自半导体处理系统的气体流的采样管线流体连通的收集装置。收集装置构造成通过在气流中扩散一种或多种污染物进行采样。

4. 发明授权

US06207460B1 Detection of base contaminants in gas samples 失效
公开(公告)号：US06207460B1
公开(公告)日：2001-03-27
申请号：US09232199
申请日：1999-01-14
申请人： Oleg P. Kishkovich , William M. Goodwin
发明人： Oleg P. Kishkovich , William M. Goodwin
IPC分类号： G01N3300
CPC分类号： G01N33/0006 , G01N33/0013 , G01N33/0024 , G01N33/0037 , G01N33/007 , Y02A50/245 , Y10T436/117497 , Y10T436/13 , Y10T436/17 , Y10T436/173845 , Y10T436/175383 , Y10T436/177692
摘要： A detection system for detecting contaminant gases includes a converter, a detector, a primary channel for delivering a target gas sample through the converter to the detector, and at least two scrubbing channels for delivering a reference gas sample through the converter to the detector. Each of the scrubbing channels includes a scrubber for removing basic nitrogen compounds from the reference gas sample, while the primary channel preferably transmits the target gas sample without scrubbing. The converter converts gaseous nitrogen compounds in the target gas sample to an indicator gas, such as nitric oxide (NO), and a control system directs the flow of a gas sample among the primary channel and the scrubbing channels. In accordance with one aspect of the invention, the basic-nitrogen-compound concentration can be measured by comparing the concentration of the indicator gas detected in the reference sample with the detected indicator-gas concentration in the target sample. The use of multiple scrubbing channels enables the detection to operate continuously since each scrubber can be alternately purged while another is scrubbing.

5. 发明授权

US06855557B2 Detection of base contaminants in gas samples 失效
标题翻译：检测气体样品中的基础污染物
公开(公告)号：US06855557B2
公开(公告)日：2005-02-15
申请号：US09783232
申请日：2001-02-14
申请人： Oleg P. Kishkovich , William M. Goodwin
发明人： Oleg P. Kishkovich , William M. Goodwin
IPC分类号： G01N31/00 , G01N1/00 , G01N1/22 , G01N1/36 , G01N21/78 , G01N33/00 , G01N31/12 , G01N21/00 , G01N35/08 , G01N37/00
CPC分类号： G01N33/0006 , G01N33/0013 , G01N33/0024 , G01N33/0037 , G01N33/007 , Y02A50/245 , Y10T436/117497 , Y10T436/13 , Y10T436/17 , Y10T436/173845 , Y10T436/175383 , Y10T436/177692
摘要： A detection system for detecting contaminant gases includes a converter, a detector, a primary channel for delivering a target gas sample through the converter to the detector, and at least two scrubbing channels for delivering a reference gas sample through the converter to the detector. Each of the scrubbing channels includes a scrubber for removing basic nitrogen compounds from the reference gas sample, while the primary channel preferably transmits the target gas sample without scrubbing. The converter converts gaseous nitrogen compounds in the target gas sample to an indicator gas, such as nitric oxide (NO), and a control system directs the flow of a gas sample among the primary channel and the scrubbing channels. In accordance with one aspect of the invention, the basic-nitrogen-compound concentration can be measured by comparing the concentration of the indicator gas detected in the reference sample with the detected indicator-gas concentration in the target sample. The use of multiple scrubbing channels enables the detection to operate continuously since each scrubber can be alternately purged while another is scrubbing.
摘要翻译：用于检测污染气体的检测系统包括转换器，检测器，用于将目标气体样品通过转换器传送到检测器的主要通道，以及用于将参考气体样品通过转换器传送到检测器的至少两个洗涤通道。每个洗涤通道包括用于从参考气体样品中除去碱性氮化合物的洗涤器，而主通道优选地透射目标气体样品而不进行洗涤。转化器将目标气体样品中的气态氮化合物转化为指示气体，例如一氧化氮（NO），并且控制系统引导主要通道和洗涤通道中的气体样品的流动。根据本发明的一个方面，可以通过将在参考样品中检测的指示剂气体的浓度与目标样品中检测到的指示剂 - 气体浓度进行比较来测量碱 - 氮化合物浓度。使用多个洗涤通道使得检测能够连续操作，因为每个洗涤器可以在另一个洗涤时交替地清洗。

6. 发明授权

US06620630B2 System and method for determining and controlling contamination 失效
标题翻译：用于确定和控制污染物的系统和方法
公开(公告)号：US06620630B2
公开(公告)日：2003-09-16
申请号：US09961802
申请日：2001-09-24
申请人： Oleg P. Kishkovich , Anatoly Grayfer , William M. Goodwin , Devon Kinkead
发明人： Oleg P. Kishkovich , Anatoly Grayfer , William M. Goodwin , Devon Kinkead
IPC分类号： H01L2100
CPC分类号： H01L21/67253 , B01D53/22 , Y10T29/41
摘要： A system and method for determining and removing contamination recognizes the need to determine contamination caused by a plurality of contaminants which includes refractory compounds, high molecular weight compounds and low molecular compounds operating at different rates. The system in accordance with a preferred embodiment of the present invention includes a collection device that emulates the environment of the surfaces of certain optical elements. The method for determining and preferably removing contamination includes maintaining an extended duration sampling time to enable the collection of a desirable mass of high molecular weight compounds. In a preferred embodiment, the collection device is operated past a breakthrough capacity to quantitatively measure high molecular weight compounds and other contaminants.
摘要翻译：用于确定和去除污染的系统和方法认识到需要确定由多种污染物引起的污染物，所述污染物包括以不同速率操作的耐火化合物，高分子量化合物和低分子化合物。根据本发明的优选实施例的系统包括模拟某些光学元件的表面的环境的收集装置。用于确定和优选去除污染物的方法包括保持延长的持续时间采样时间以使得能够收集所需质量的高分子量化合物。在优选实施例中，收集装置经过突破能力操作以定量测量高分子量化合物和其它污染物。

7. 发明申请

US20100294397A1 SYSTEM FOR PURGING RETICLE STORAGE 有权
标题翻译：用于储存存货的系统
公开(公告)号：US20100294397A1
公开(公告)日：2010-11-25
申请号：US12305895
申请日：2007-06-19
申请人： Oleg P. Kishkovich , Xavier Gabarre , William M. Goodwin , James Lo , Troy Scoggins
发明人： Oleg P. Kishkovich , Xavier Gabarre , William M. Goodwin , James Lo , Troy Scoggins
IPC分类号： B65B31/04
CPC分类号： H01L21/67769 , G03F1/66 , G03F7/70741 , G03F7/70866 , G03F7/70916 , G03F7/70925 , G03F7/70933 , H01L21/67017 , H01L21/67253 , H01L21/67353 , H01L21/67359 , H01L21/67386 , H01L21/67389 , H01L21/67393 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be “recharged” during the substantially continual purging of the reticle, a reduced desirable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves that each include a plurality of reticle storage receptacles.
摘要翻译：本发明提供一种用于保护标线的方法，系统和组件，并且特别地用于最小化在保存和使用期间掩模版上的雾化形成。通过基本上连续地保持在具有降低的刻度上的湿度水平的储存壳体中的吹扫，或者当不被清除时将掩模版临时存储在接近干燥剂或吸气剂的容器中时，可以消除，最小化或充分控制雾度形成。此外，容器中的过滤介质可以被定位成在基本上持续地清洗标线板期间被“再充电”，当容器当前不被清除时，可以容易地保持在标线容器中减少的所需湿度水平。另外，本发明的系统可以包括与吹扫系统相关联的离子发生器。例如，离子发生器可以与净化系统的多条清除管线中的至少一条相关联。本发明的系统还可以包括连接到吹扫系统的吹扫气体源，其包括CDA源或额外的CDA。存储壳体可以包括多个搁架，每个搁架都包括多个标线保管容器。

8. 发明申请

US20080257159A1 Air handling and chemical filtration system and method 审中-公开
公开(公告)号：US20080257159A1
公开(公告)日：2008-10-23
申请号：US12069514
申请日：2008-02-11
申请人： William M. Goodwin , Oleg P. Kishkovich , Anatoly Grayfer
发明人： William M. Goodwin , Oleg P. Kishkovich , Anatoly Grayfer
IPC分类号： B01D47/14
CPC分类号： F24F3/16 , B01D53/18 , B01D2258/0216 , F24F2003/1621 , Y10S438/909
摘要： The present invention relates to systems and methods for controlling humidity and temperature in gases or air streams used in semiconductor processing systems. These systems and methods can be used in combination with systems and methods for contaminant detection and removal.

9. 发明授权

US07014693B2 Filters employing both acidic polymers and physical-adsorption media 有权
公开(公告)号：US07014693B2
公开(公告)日：2006-03-21
申请号：US10851687
申请日：2004-05-21
申请人： Oleg P. Kishkovich , Devon Kinkead , Anatoly Grayfer , William M. Goodwin , David Ruede
发明人： Oleg P. Kishkovich , Devon Kinkead , Anatoly Grayfer , William M. Goodwin , David Ruede
IPC分类号： B01D35/143
CPC分类号： B01D53/0407 , B01D53/0454 , B01D2253/102 , B01D2253/202 , B01D2253/308 , B01D2257/406 , B01D2258/0216 , B01D2259/4009 , B01J20/20 , B01J20/261 , B33Y80/00 , Y10S95/901
摘要： A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalchols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.

10. 发明授权

US08776841B2 System for purging reticle storage 有权
标题翻译：净化掩模版存储系统
公开(公告)号：US08776841B2
公开(公告)日：2014-07-15
申请号：US12305895
申请日：2007-06-19
申请人： Oleg P. Kishkovich , Xavier Gabarre , William M. Goodwin , James Lo , Troy Scoggins
发明人： Oleg P. Kishkovich , Xavier Gabarre , William M. Goodwin , James Lo , Troy Scoggins
IPC分类号： H01L21/67 , H01L21/677
CPC分类号： H01L21/67769 , G03F1/66 , G03F7/70741 , G03F7/70866 , G03F7/70916 , G03F7/70925 , G03F7/70933 , H01L21/67017 , H01L21/67253 , H01L21/67353 , H01L21/67359 , H01L21/67386 , H01L21/67389 , H01L21/67393 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be “recharged” during the substantially continual purging of the reticle, a reduced desirable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves that each include a plurality of reticle storage receptacles.
摘要翻译：本发明提供一种用于保护标线的方法，系统和组件，并且特别地用于最小化在保存和使用期间掩模版上的雾化形成。通过基本上连续地保持在具有降低的刻度上的湿度水平的储存壳体中的吹扫，或者当不被清除时将掩模版临时存储在接近干燥剂或吸气剂的容器中时，可以消除，最小化或充分控制雾度形成。此外，容器中的过滤介质可以被定位成在基本上持续地清洗标线板期间被“再充电”，当容器当前不被清除时，可以容易地保持在标线容器中减少的所需湿度水平。另外，本发明的系统可以包括与吹扫系统相关联的离子发生器。例如，离子发生器可以与净化系统的多条清除管线中的至少一条相关联。本发明的系统还可以包括连接到吹扫系统的吹扫气体源，其包括CDA源或额外的CDA。存储壳体可以包括多个搁架，每个搁架都包括多个标线保管容器。

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