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1. 发明申请

US20110143548A1 ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP 审中-公开
标题翻译：超低硅低损耗植皮带
公开(公告)号：US20110143548A1
公开(公告)日：2011-06-16
申请号：US12636582
申请日：2009-12-11
申请人： David Cheung , Haoquan Fang , Jack Kuo , Ilia Kalinovski , Ted Li , Andrew Yao , Anirban Guha , Kirk Ostrowski
发明人： David Cheung , Haoquan Fang , Jack Kuo , Ilia Kalinovski , Ted Li , Andrew Yao , Anirban Guha , Kirk Ostrowski
IPC分类号： H01L21/3065 , C23F1/08
CPC分类号： H01L21/31138 , G03F7/427 , H01L21/31116 , H01L21/31144 , H01L21/32136 , H01L21/32137 , H01L21/32139
摘要： Improved methods for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, plasma is generated using elemental hydrogen, a fluorine-containing gas and a protectant gas. The plasma-activated gases reacts with the high-dose implant resist, removing both the crust and bulk resist layers, while simultaneously protecting exposed portions of the work piece surface. The work piece surface is substantially residue free with low silicon loss.
摘要翻译：提供了用于剥离光致抗蚀剂和从工件表面去除离子注入相关残留物的改进方法。根据各种实施例，使用元素氢，含氟气体和保护气体产生等离子体。等离子体活化气体与高剂量植入物抗蚀剂反应，去除了外壳和体抗蚀剂层，同时保护了工件表面的暴露部分。工件表面基本上无残留物，硅损耗低。

2. 发明授权

US08591661B2 Low damage photoresist strip method for low-K dielectrics 有权
标题翻译：低K电介质的低损伤光刻胶剥离方法
公开(公告)号：US08591661B2
公开(公告)日：2013-11-26
申请号：US12636601
申请日：2009-12-11
申请人： David Cheung , Ted Li , Anirban Guha , Kirk Ostrowski
发明人： David Cheung , Ted Li , Anirban Guha , Kirk Ostrowski
IPC分类号： B08B5/00
CPC分类号： H01L21/31058 , G03F7/427 , H01L21/67207
摘要： Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.
摘要翻译：提供了用于剥离光致抗蚀剂和从介电材料中去除蚀刻相关残留物的改进方法。在本发明的一个方面，方法包括使用采用弱氧化剂和含氟化合物的氢基蚀刻方法从介电层去除材料。底物温度保持在约160℃或更低，例如小于约90℃的水平。

3. 发明申请

US20110139176A1 LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS 有权
标题翻译：用于低K电介质的低损耗光电子条纹方法
公开(公告)号：US20110139176A1
公开(公告)日：2011-06-16
申请号：US12636601
申请日：2009-12-11
申请人： David Cheung , Ted Li , Anirban Guha , Kirk Ostrowski
发明人： David Cheung , Ted Li , Anirban Guha , Kirk Ostrowski
IPC分类号： B08B5/00 , B08B13/00 , C23F1/08
CPC分类号： H01L21/31058 , G03F7/427 , H01L21/67207
摘要： Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.
摘要翻译：提供了用于剥离光致抗蚀剂和从介电材料中去除蚀刻相关残留物的改进方法。在本发明的一个方面，方法包括使用采用弱氧化剂和含氟化合物的氢基蚀刻方法从介电层去除材料。底物温度保持在约160℃或更低，例如小于约90℃的水平。

4. 发明申请

US20120097331A1 GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES 审中-公开
标题翻译：气体流量分配装置，等离子体发生器系统和执行等离子体剥离方法的方法
公开(公告)号：US20120097331A1
公开(公告)日：2012-04-26
申请号：US13342757
申请日：2012-01-03
申请人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
发明人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
IPC分类号： H01L21/3065
CPC分类号： H01J37/3244 , C23C16/45519 , H01J37/32449 , H01L21/31138
摘要： Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
摘要翻译：提供了用于等离子体剥离的系统，系统组件和方法。在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔。第一和第二开口环提供与等离子体室的流动连通。所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。

5. 发明申请

US20120247674A1 PLASMA GENERATOR APPARATUS 有权
标题翻译：等离子发生器装置
公开(公告)号：US20120247674A1
公开(公告)日：2012-10-04
申请号：US13493655
申请日：2012-06-11
申请人： James A. Fair , Vincent Decaux , Anirban Guha , David Cheung , John Keller , Peter Jagusch
发明人： James A. Fair , Vincent Decaux , Anirban Guha , David Cheung , John Keller , Peter Jagusch
IPC分类号： C23F1/08
CPC分类号： H01J37/32449 , H01J37/321 , H01J37/3244 , H01J37/32458 , H01J37/32467 , H01J37/32633 , H01J37/32651 , H01J2237/335
摘要： Embodiments of a plasma generator apparatus for ashing a work piece are provided. The apparatus includes a container adapted for continuous gas flow there through from an inlet end to an outlet end thereof. The container is fabricated of a dielectric material and adapted for ionization therein of a portion of at least one component of gas flowing therethrough. A gas flow distributor is configured to direct gas flow to a region within the container and a coil surrounds at least a portion of side walls of the container adjacent the region of the container to which the gas flow distributor directs gas flow. A radio frequency generator is coupled to the coil.
摘要翻译：提供了用于灰化工件的等离子体发生器装置的实施例。该装置包括适于在其中从其入口端到其出口端的连续气体流动的容器。容器由电介质材料制成并且适于其中流过其中的至少一种气体成分的一部分进行电离。气流分配器构造成将气流引导到容器内的区域，并且线圈围绕容器的与气流分配器引导气体流动的区域相邻的容器侧壁的至少一部分。射频发生器耦合到线圈。

6. 发明授权

US08110068B2 Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes 有权
标题翻译：气体流量分配容器，等离子体发生器系统和用于执行等离子体剥离工艺的方法
公开(公告)号：US08110068B2
公开(公告)日：2012-02-07
申请号：US12052401
申请日：2008-03-20
申请人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
发明人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
IPC分类号： H01L21/3065 , C23C16/00 , C23C16/455
CPC分类号： H01J37/3244 , C23C16/45519 , H01J37/32449 , H01L21/31138
摘要： Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
摘要翻译：提供了用于等离子体剥离的系统，系统组件和方法。在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔。第一和第二开口环提供与等离子体室的流动连通。所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。

7. 发明申请

US20080156264A1 Plasma Generator Apparatus 审中-公开
标题翻译：等离子发生器装置
公开(公告)号：US20080156264A1
公开(公告)日：2008-07-03
申请号：US11616324
申请日：2006-12-27
申请人： James A. Fair , Vincent Decaux , Anirban Guha , David Cheung , John Keller , Peter Jagusch
发明人： James A. Fair , Vincent Decaux , Anirban Guha , David Cheung , John Keller , Peter Jagusch
IPC分类号： C23C16/00
CPC分类号： H01J37/32449 , H01J37/321 , H01J37/3244 , H01J37/32458 , H01J37/32467 , H01J37/32633 , H01J37/32651 , H01J2237/335
摘要： Embodiments of a plasma generator apparatus for ashing a work piece are provided. The apparatus includes a container adapted for continuous gas flow there through from an inlet end to an outlet end thereof. The container is fabricated of a dielectric material and adapted for ionization therein of a portion of at least one component of gas flowing therethrough. A gas flow distributor is configured to direct gas flow to a region within the container and a coil surrounds at least a portion of side walls of the container adjacent the region of the container to which the gas flow distributor directs gas flow. A radio frequency generator is coupled to the coil.
摘要翻译：提供了用于灰化工件的等离子体发生器装置的实施例。该装置包括适于在其中从其入口端到其出口端的连续气体流动的容器。容器由电介质材料制成并且适于其中流过其中的至少一种气体成分的一部分进行电离。气流分配器构造成将气流引导到容器内的区域，并且线圈围绕容器的与气流分配器引导气体流动的区域相邻的容器侧壁的至少一部分。射频发生器耦合到线圈。

8. 发明授权

US09209000B2 Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes 有权
标题翻译：气体流量分配容器，等离子体发生器系统和用于执行等离子体剥离工艺的方法
公开(公告)号：US09209000B2
公开(公告)日：2015-12-08
申请号：US13342757
申请日：2012-01-03
申请人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
发明人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
IPC分类号： H01J37/32 , C23C16/455 , H01L21/311
CPC分类号： H01J37/3244 , C23C16/45519 , H01J37/32449 , H01L21/31138
摘要： Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
摘要翻译：提供了用于等离子体剥离的系统，系统组件和方法。在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔。第一和第二开口环提供与等离子体室的流动连通。所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。

9. 发明授权

US08864935B2 Plasma generator apparatus 有权
标题翻译：等离子发生器装置
公开(公告)号：US08864935B2
公开(公告)日：2014-10-21
申请号：US13493655
申请日：2012-06-11
申请人： James A. Fair , Vincent Decaux , Anirban Guha , David Cheung , John Keller , Peter Jagusch
发明人： James A. Fair , Vincent Decaux , Anirban Guha , David Cheung , John Keller , Peter Jagusch
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32449 , H01J37/321 , H01J37/3244 , H01J37/32458 , H01J37/32467 , H01J37/32633 , H01J37/32651 , H01J2237/335
摘要： Embodiments of a plasma generator apparatus for ashing a work piece are provided. The apparatus includes a container adapted for continuous gas flow there through from an inlet end to an outlet end thereof. The container is fabricated of a dielectric material and adapted for ionization therein of a portion of at least one component of gas flowing therethrough. A gas flow distributor is configured to direct gas flow to a region within the container and a coil surrounds at least a portion of side walls of the container adjacent the region of the container to which the gas flow distributor directs gas flow. A radio frequency generator is coupled to the coil.
摘要翻译：提供了用于灰化工件的等离子体发生器装置的实施例。该装置包括适于在其中从其入口端到其出口端的连续气体流动的容器。容器由电介质材料制成并且适于其中流过其中的至少一种气体成分的一部分进行电离。气流分配器构造成将气流引导到容器内的区域，并且线圈围绕容器的与气流分配器引导气体流动的区域相邻的容器侧壁的至少一部分。射频发生器耦合到线圈。

10. 发明申请

US20080156631A1 Methods of Producing Plasma in a Container 审中-公开
标题翻译：容器中等离子体的生产方法
公开(公告)号：US20080156631A1
公开(公告)日：2008-07-03
申请号：US11616326
申请日：2006-12-27
申请人： James A. Fair , Vincent Decaux , Anirban Guha , David Cheung , John Keller , Peter Jagusch
发明人： James A. Fair , Vincent Decaux , Anirban Guha , David Cheung , John Keller , Peter Jagusch
IPC分类号： H05H1/00
CPC分类号： H05H1/46 , H01J37/32357 , H01J37/32458
摘要： Methods of using a plasma generator to ash a work piece is provided. In an exemplary embodiment, the method includes flowing gas that has a gaseous component able to form plasma under conditions of radio-frequency energy excitation into the container. A proportion of the gas is directed to a first region of the container to form a higher gas density in the first region of the container and a corresponding lower gas density in a second region of the container. Sufficient energy is applied to the gas in at least the first region to excite a proportion of the gaseous component able to form plasma.
摘要翻译：提供了使用等离子体发生器来灰化工件的方法。在示例性实施例中，该方法包括使气体具有能够在射频能量激发的条件下形成等离子体的气体成分进入容器。气体的一部分被引导到容器的第一区域，以在容器的第一区域中形成更高的气体密度，并且在容器的第二区域中形成相应较低的气体密度。在至少第一区域中对气体施加足够的能量以激发能够形成等离子体的一部分气态组分。

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