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    • 7. 发明申请
    • Perpendicular magnetic write pole formation using an aluminum oxide wrap around mask
    • 使用氧化铝缠绕掩模的垂直磁性写入磁极形成
    • US20080072417A1
    • 2008-03-27
    • US11525788
    • 2006-09-21
    • Yimin HsuVladimir NikitinAron Pentek
    • Yimin HsuVladimir NikitinAron Pentek
    • G11B5/127
    • G11B5/1278G11B5/3146G11B5/315G11B5/3163Y10T29/49041Y10T29/49043Y10T29/49044Y10T29/49046Y10T29/49048Y10T29/49052
    • A method for manufacturing a write pole for a perpendicular magnetic write head. The method includes forming a mask structure over a full film layer of magnetic write pole material. A layer of hard mask material such as conformally deposited alumina is then deposited full film over the mask and write pole material. An ion mill, such as in an Ar or CHF3 chemistry is then used to preferentially remove horizontally disposed portions of the alumina layer (hard mask layer), thereby forming vertical hard mask walls at the sides of the mask structure. An ion mill is then used to form the write pole, with the alumna side walls providing excellent masking for forming well defined write pole edges. A relatively gentle clean up process can then be performed to remove the remaining mask material and side walls. The use of the alumina side walls eliminated the need to use an alumina hard mask that extends over the entire top of the write pole, Because of this, after forming the write pole, a relatively gentle clean up such as TMAH etch and NMP can be used to remove the remaining mask and alumina walls from the write pole.
    • 一种用于制造用于垂直磁写头的写极的方法。 该方法包括在磁性写入磁极材料的全部薄膜层上形成掩模结构。 然后将诸如保形沉积氧化铝的硬掩模材料层沉积在掩模上并写入极材料。 然后使用诸如Ar或CHF 3化学中的离子磨机来优先除去氧化铝层(硬掩模层)的水平设置的部分,从而在掩模结构的侧面形成垂直的硬掩模壁。 然后使用离子磨机形成写柱,校准侧壁为形成良好定义的写极边缘提供了优​​异的掩模。 然后可以执行相对温和的清理过程以除去剩余的掩模材料和侧壁。 使用氧化铝侧壁消除了使用在写入极的整个顶部上延伸的氧化铝硬掩模的需要。因此,在形成写入极之后,可以进行相对温和的清洁,例如TMAH蚀刻和NMP可以 用于从写入极上去除剩余的掩模和氧化铝壁。
    • 9. 发明授权
    • Method of multi-angled bump processing for magnetic pole fabrication and systems thereof
    • 用于磁极制造的多角度凸块加工方法及其系统
    • US08085497B2
    • 2011-12-27
    • US12341834
    • 2008-12-22
    • Wen-Chien David HsiaoVladimir NikitinAron PentekSue Siyang ZhangYi Zheng
    • Wen-Chien David HsiaoVladimir NikitinAron PentekSue Siyang ZhangYi Zheng
    • G11B5/127
    • G11B5/3116G11B5/3163
    • A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.
    • 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面,并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面,其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层,以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面,以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积,其中所述第二角度大于所述第一角度。