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1. 发明申请

US20120236281A1 SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION 有权
标题翻译：源检测的多重反射照明
公开(公告)号：US20120236281A1
公开(公告)日：2012-09-20
申请号：US13419157
申请日：2012-03-13
申请人： Daimian Wang , Daniel Wack , Damon F. Kvamme , Tao-Yi Fu
发明人： Daimian Wang , Daniel Wack , Damon F. Kvamme , Tao-Yi Fu
IPC分类号： G03B27/54
CPC分类号： G03F1/84
摘要： Methods and systems for source multiplexing illumination for mask inspection are disclosed. Such illumination systems enable EUV sources of small brightness to be used for EUV mask defect inspection at nodes below the 22 nm. Utilizing the multiple plane or conic mirrors that are either attached to a continuously rotating base with different angles or individually rotating to position for each pulse, the reflected beams may be directed through a common optical path. The light may then be focused by a condenser to an EUV mask. The reflected and scattered light from the mask may then be imaged by some imaging optics onto some sensors. The mask image may be subsequently processed for defect information.
摘要翻译：公开了用于掩模检查的源多路复用照明的方法和系统。这种照明系统使EUV源的小亮度可用于在22nm以下的节点进行EUV掩模缺陷检查。利用多个平面或圆锥镜，其连接到具有不同角度的连续旋转底座或单独旋转以适应每个脉冲的位置，反射光束可以被引导通过公共光路。然后可以通过冷凝器将光聚焦到EUV掩模。然后可以通过一些成像光学器件将来自掩模的反射和散射的光成像到一些传感器上。随后可以对掩模图像进行缺陷信息的处理。

2. 发明授权

US09625810B2 Source multiplexing illumination for mask inspection 有权
公开(公告)号：US09625810B2
公开(公告)日：2017-04-18
申请号：US13419157
申请日：2012-03-13
申请人： Daimian Wang , Daniel Wack , Damon F. Kvamme , Tao-Yi Fu
发明人： Daimian Wang , Daniel Wack , Damon F. Kvamme , Tao-Yi Fu
IPC分类号： G02B5/08 , G02B7/182 , G03F1/84
CPC分类号： G03F1/84
摘要： Methods and systems for source multiplexing illumination for mask inspection are disclosed. Such illumination systems enable EUV sources of small brightness to be used for EUV mask defect inspection at nodes below the 22 nm. Utilizing the multiple plane or conic mirrors that are either attached to a continuously rotating base with different angles or individually rotating to position for each pulse, the reflected beams may be directed through a common optical path. The light may then be focused by a condenser to an EUV mask. The reflected and scattered light from the mask may then be imaged by some imaging optics onto some sensors. The mask image may be subsequently processed for defect information.

3. 发明授权

US08917432B2 Multiplexing EUV sources in reticle inspection 有权
标题翻译：在掩模版检查中复用EUV源
公开(公告)号：US08917432B2
公开(公告)日：2014-12-23
申请号：US13563850
申请日：2012-08-01
申请人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
发明人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
IPC分类号： G02B26/08 , G03F7/20 , G02B26/12
CPC分类号： G02B26/123 , G01N21/8806 , G01N2021/95676 , G01N2201/105 , G03F1/24 , G03F1/84 , G03F7/7005
摘要： The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
摘要翻译：本公开涉及一种照明系统。照明系统可以包括可围绕旋转轴线旋转的基座构件和沿着基座构件的周边设置在基座构件的外表面上的多个反射镜。反射镜可以以预定角度定向。照明系统还包括至少两个照明源。第一多个反射镜的每个反射镜被配置为在第一时间在每个反射镜的第一部分处接收来自第一照明源的辐射。镜被配置为将辐射反射到光路。每个反射镜被进一步配置成在第二时间在反射镜的第二部分处接收来自第二照明光源的辐射。反射镜将从第二照明源的辐射反射到公共光路。

4. 发明申请

US20140036333A1 MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION 有权
标题翻译：反复检查中的多重EUV来源
公开(公告)号：US20140036333A1
公开(公告)日：2014-02-06
申请号：US13563850
申请日：2012-08-01
申请人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
发明人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
IPC分类号： G02B26/08
CPC分类号： G02B26/123 , G01N21/8806 , G01N2021/95676 , G01N2201/105 , G03F1/24 , G03F1/84 , G03F7/7005
摘要： The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
摘要翻译：本公开涉及一种照明系统。照明系统可以包括可围绕旋转轴线旋转的基座构件和沿着基座构件的周边设置在基座构件的外表面上的多个反射镜。反射镜可以以预定角度定向。照明系统还包括至少两个照明源。第一多个反射镜的每个反射镜被配置为在第一时间在每个反射镜的第一部分处接收来自第一照明源的辐射。镜被配置为将辐射反射到光路。每个反射镜被进一步配置成在第二时间在反射镜的第二部分处接收来自第二照明光源的辐射。反射镜将从第二照明源的辐射反射到公共光路。

5. 发明申请

US20120235049A1 EUV ACTINIC RETICLE INSPECTION SYSTEM USING IMAGING SENSOR WITH THIN FILM SPECTRAL PURITY FILTER COATING 有权
标题翻译：使用成像传感器与薄膜光谱过滤器涂层的EUV ACTINIC RETICLE检查系统
公开(公告)号：US20120235049A1
公开(公告)日：2012-09-20
申请号：US13419042
申请日：2012-03-13
申请人： Daimian Wang
发明人： Daimian Wang
IPC分类号： G01J1/42
CPC分类号： G03F1/84 , G01N21/956 , G01N2021/95676 , G03F1/24 , H01L27/1462 , H01L27/14625
摘要： An extreme ultraviolet (EUV) actinic reticle imaging system suitable for discharge produced plasma (DPP) or laser produced plasma (LPP) reticle imaging systems using a thin film coating spectral purity filter (SPF) positioned on or proximate to the EUV imaging sensor; an EUV imaging sensor carrying this SPF; and methods for making and using the SPF for reticle inspection. The coating may be applied to the imaging sensor in any manner suitable for the particular coating selected. The coating may be composed of a single layer or multiple layers. Typical SPF coating materials include zirconium (Zr) and silicon-zirconium (Si/Zr) in a thickness between 10 nm and 100 nm.
摘要翻译：适用于放电产生的等离子体（DPP）或激光产生等离子体（LPP）掩模版成像系统的极紫外（EUV）光电掩模版成像系统，其使用位于EUV成像传感器上或其附近的薄膜涂层光谱纯度滤光器（SPF）; 携带该SPF的EUV成像传感器; 以及制造和使用SPF进行掩模版检查的方法。可以以适合所选择的特定涂层的任何方式将涂层施加到成像传感器。涂层可以由单层或多层组成。典型的SPF涂层材料包括厚度在10nm和100nm之间的锆（Zr）和硅 - 锆（Si / Zr）。

6. 发明授权

US08916831B2 EUV actinic reticle inspection system using imaging sensor with thin film spectral purity filter coating 有权
标题翻译： EUV光电掩模检测系统采用成像传感器，薄膜光谱纯度过滤器涂层
公开(公告)号：US08916831B2
公开(公告)日：2014-12-23
申请号：US13419042
申请日：2012-03-13
申请人： Daimian Wang
发明人： Daimian Wang
IPC分类号： G01J1/42 , G03F1/84 , H01L27/146 , G01N21/956 , G03F1/24
CPC分类号： G03F1/84 , G01N21/956 , G01N2021/95676 , G03F1/24 , H01L27/1462 , H01L27/14625
摘要： An extreme ultraviolet (EUV) actinic reticle imaging system suitable for discharge produced plasma (DPP) or laser produced plasma (LPP) reticle imaging systems using a thin film coating spectral purity filter (SPF) positioned on or proximate to the EUV imaging sensor; an EUV imaging sensor carrying this SPF; and methods for making and using the SPF for reticle inspection. The coating may be applied to the imaging sensor in any manner suitable for the particular coating selected. The coating may be composed of a single layer or multiple layers. Typical SPF coating materials include zirconium (Zr) and silicon-zirconium (Si/Zr) in a thickness between 10 nm and 100 nm.
摘要翻译：适用于放电产生的等离子体（DPP）或激光产生等离子体（LPP）掩模版成像系统的极紫外（EUV）光电掩模版成像系统，其使用位于EUV成像传感器上或其附近的薄膜涂层光谱纯度滤光器（SPF）; 携带该SPF的EUV成像传感器; 以及制造和使用SPF进行掩模版检查的方法。可以以适合所选择的特定涂层的任何方式将涂层施加到成像传感器。涂层可以由单层或多层组成。典型的SPF涂层材料包括厚度在10nm和100nm之间的锆（Zr）和硅 - 锆（Si / Zr）。

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