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1. 发明申请

US20140036333A1 MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION 有权
标题翻译：反复检查中的多重EUV来源
公开(公告)号：US20140036333A1
公开(公告)日：2014-02-06
申请号：US13563850
申请日：2012-08-01
申请人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
发明人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
IPC分类号： G02B26/08
CPC分类号： G02B26/123 , G01N21/8806 , G01N2021/95676 , G01N2201/105 , G03F1/24 , G03F1/84 , G03F7/7005
摘要： The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
摘要翻译：本公开涉及一种照明系统。照明系统可以包括可围绕旋转轴线旋转的基座构件和沿着基座构件的周边设置在基座构件的外表面上的多个反射镜。反射镜可以以预定角度定向。照明系统还包括至少两个照明源。第一多个反射镜的每个反射镜被配置为在第一时间在每个反射镜的第一部分处接收来自第一照明源的辐射。镜被配置为将辐射反射到光路。每个反射镜被进一步配置成在第二时间在反射镜的第二部分处接收来自第二照明光源的辐射。反射镜将从第二照明源的辐射反射到公共光路。

2. 发明授权

US08917432B2 Multiplexing EUV sources in reticle inspection 有权
标题翻译：在掩模版检查中复用EUV源
公开(公告)号：US08917432B2
公开(公告)日：2014-12-23
申请号：US13563850
申请日：2012-08-01
申请人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
发明人： Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
IPC分类号： G02B26/08 , G03F7/20 , G02B26/12
CPC分类号： G02B26/123 , G01N21/8806 , G01N2021/95676 , G01N2201/105 , G03F1/24 , G03F1/84 , G03F7/7005
摘要： The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
摘要翻译：本公开涉及一种照明系统。照明系统可以包括可围绕旋转轴线旋转的基座构件和沿着基座构件的周边设置在基座构件的外表面上的多个反射镜。反射镜可以以预定角度定向。照明系统还包括至少两个照明源。第一多个反射镜的每个反射镜被配置为在第一时间在每个反射镜的第一部分处接收来自第一照明源的辐射。镜被配置为将辐射反射到光路。每个反射镜被进一步配置成在第二时间在反射镜的第二部分处接收来自第二照明光源的辐射。反射镜将从第二照明源的辐射反射到公共光路。

3. 发明授权

US09268031B2 Advanced debris mitigation of EUV light source 有权
标题翻译： EUV光源的先进碎片减缓
公开(公告)号：US09268031B2
公开(公告)日：2016-02-23
申请号：US13856328
申请日：2013-04-03
申请人： Karl R. Umstadter
发明人： Karl R. Umstadter
IPC分类号： G01T1/16 , H01J49/00 , B08B17/02 , G03F7/20 , H05G2/00
CPC分类号： G01T1/16 , B08B17/02 , G03F7/70033 , G03F7/70916 , H01J49/0031 , H05G2/003 , H05G2/008
摘要： Systems and methods for debris mitigation in an EUV light source for semiconductor processes are disclosed. Pulsed DC electric fields are applied to the path of EUV light to reject ions from the EUV path. The pulsed DC fields are triggered to coincide with the presence of debris in the EUV optical path. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：公开了用于半导体工艺的EUV光源中用于碎片减轻的系统和方法。将脉冲直流电场施加到EUV光的路径以从EUV路径中排除离子。触发脉冲的DC场与EUV光路中的碎片的存在一致。要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

4. 发明申请

US20130313423A1 ADVANCED DEBRIS MITIGATION OF EUV LIGHT SOURCE 有权
标题翻译： EUV光源的进一步消除
公开(公告)号：US20130313423A1
公开(公告)日：2013-11-28
申请号：US13856328
申请日：2013-04-03
申请人： Karl R. Umstadter
发明人： Karl R. Umstadter
IPC分类号： G01T1/16 , B08B17/02 , H01J49/00
CPC分类号： G01T1/16 , B08B17/02 , G03F7/70033 , G03F7/70916 , H01J49/0031 , H05G2/003 , H05G2/008
摘要： Systems and methods for debris mitigation in an EUV light source for semiconductor processes are disclosed. Pulsed DC electric fields are applied to the path of EUV light to reject ions from the EUV path. The pulsed DC fields are triggered to coincide with the presence of debris in the EUV optical path. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：公开了用于半导体工艺的EUV光源中用于碎片减轻的系统和方法。将脉冲直流电场施加到EUV光的路径以从EUV路径中排除离子。触发脉冲的DC场与EUV光路中的碎片的存在一致。要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

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