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1. 发明申请

US20050252092A1 Slurry for CMP and method of polishing substrate using same 有权
标题翻译：用于CMP的浆料和使用其的抛光衬底的方法
公开(公告)号：US20050252092A1
公开(公告)日：2005-11-17
申请号：US11127441
申请日：2005-05-11
申请人： Dae Kim , Seok Hong , Jae Jeon , Ho Kim , Hyun Park , Un Paik , Jae Park , Yong Kim
发明人： Dae Kim , Seok Hong , Jae Jeon , Ho Kim , Hyun Park , Un Paik , Jae Park , Yong Kim
IPC分类号： B24B1/00 , B24C1/00 , B24D3/02 , C09G1/02 , C09K3/14 , H01L21/3105
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/31053
摘要： Disclosed herein is a polishing slurry and a method of producing the same. The polishing slurry has high selectivity in terms of a polishing speed of an oxide layer to that of a nitride layer used in CMP of an STI process which is essential to produce ultra highly integrated semiconductors having a design rule of 256 mega D-RAM or more, for example, a design rule of 0.13 μm or less. A method and a device for pre-treating polishing particles, a dispersing device and a method of operating the dispersing device, a method of adding a chemical additive and an amount added, and a device for transferring samples are properly employed to produce a high performance nano ceria slurry essential to CMP for a process of producing ultra highly integrated semiconductors of 0.13 μm or less, particularly, the STI process.
摘要翻译：本文公开了抛光浆料及其制备方法。抛光浆料在氧化物层的研磨速度与STI工艺的CMP中使用的氮化物层的研磨速度方面具有高选择性，该制造方法对于制造具有256兆D-RAM以上的设计规则的超高度集成半导体是必不可少的，例如，0.13mum以下的设计规则。用于预处理抛光颗粒的方法和装置，分散装置和操作分散装置的方法，添加化学添加剂和添加量的方法以及用于转移样品的装置被适当地用于产生高性能纳米二氧化铈浆料对于生产0.13毫米或更小的超高度集成半导体的工艺，特别是STI工艺。

2. 发明申请

US20050198912A1 Polishing slurry, method of producing same, and method of polishing substrate 有权
标题翻译：抛光浆料，其制造方法以及抛光底物的方法
公开(公告)号：US20050198912A1
公开(公告)日：2005-09-15
申请号：US11078538
申请日：2005-03-11
申请人： Dae Kim , Seok Hong , Jae Jeon , Ho Kim , Hyun Park , Un Paik , Jae Park , Yong Kim
发明人： Dae Kim , Seok Hong , Jae Jeon , Ho Kim , Hyun Park , Un Paik , Jae Park , Yong Kim
IPC分类号： B24D3/02 , C08J3/14 , H01L21/304
CPC分类号： B24B37/044 , C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
摘要： Disclosed herein is a polishing slurry for chemical mechanical polishing. The polishing slurry comprises polishing particles, which have a particle size distribution including separated fine and large polishing particle peaks. The polishing slurry also comprises polishing particles, which have a median size of 50-150 nm. The present invention provides the slurry having an optimum polishing particle size, in which the polishing particle size is controlled and which is useful to produce semiconductors having fine design rules by changing the production conditions of the slurry. The present invention also provides the polishing slurry and a method of producing the same, in which a desirable CMP removal rate is assured and scratches are suppressed by controlling a polishing particle size distribution, and a method of polishing a substrate.
摘要翻译：本文公开了用于化学机械抛光的抛光浆料。抛光浆料包括抛光颗粒，其具有包括分离的精细和大的抛光颗粒峰的粒度分布。抛光浆料还包括中值粒径为50-150nm的抛光颗粒。本发明提供了具有最佳抛光粒度的浆料，其中抛光粒度被控制，并且通过改变浆料的生产条件，可用于制备具有精细设计规则的半导体。本发明还提供了研磨浆料及其制造方法，其中通过控制抛光粒度分布来确保理想的CMP去除速率和抑制刮痕，以及抛光基材的方法。

3. 发明申请

US20060131698A1 Wafer-scale microcolumn array using low temperature co-fired ceramic substrate 失效
公开(公告)号：US20060131698A1
公开(公告)日：2006-06-22
申请号：US11259959
申请日：2005-10-24
申请人： Jin Jeong , Dae Kim , Sang Choi , Dae Kim , Ho Kim
发明人： Jin Jeong , Dae Kim , Sang Choi , Dae Kim , Ho Kim
IPC分类号： H01L23/544
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/04 , H01J2237/0492 , H01J2237/1205 , H01J2237/1518
摘要： Provided is a wafer-scale microcolumn array using a low temperature co-fired ceramic (LTCC) substrate. The microcolumn array includes a LTCC substrate having wirings and wafer-scale beam deflector arrays, which are attached to at least one side of the LTCC substrate and has an array of deflection devices deflecting electron beams. The wafer-scale microcolumn array using the LTCC substrate makes it possible to significantly increase the throughput of semiconductor wafers, simplify its manufacturing process, and lower its production cost.

4. 发明申请

US20060131752A1 Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate 失效
标题翻译：微柱电子束装置形成于低温共烧陶瓷基片中
公开(公告)号：US20060131752A1
公开(公告)日：2006-06-22
申请号：US11260025
申请日：2005-10-24
申请人： Dae Kim , Jin Jeong , Sang Choi , Dae Kim , Ho Kim
发明人： Dae Kim , Jin Jeong , Sang Choi , Dae Kim , Ho Kim
IPC分类号： H01L23/52
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/1477 , H01J2237/03 , H01J2237/1205
摘要： A micro column electron beam apparatus having a reduced number of interconnections is provided. The micro column electron beam apparatus includes: a low temperature co-fired ceramic (LTCC) substrate; a plurality of deflector electrodes attached to a predetermined top portion of the LTCC substrate; a pad electrode placed at a top edge of the LTCC substrate and transmitting an external signal to the deflector electrodes; and a connection unit placed in the LTCC substrate and electrically connecting the deflector electrode and the pad electrode.
摘要翻译：提供了具有减少数量的互连的微型列电子束装置。微柱电子束装置包括：低温共烧陶瓷（LTCC）基板; 多个偏转器电极，附着到LTCC衬底的预定顶部; 放置在LTCC衬底的顶部边缘处并将外部信号传输到偏转器电极的焊盘电极; 以及连接单元，其放置在LTCC基板中并电连接偏转器电极和焊盘电极。

5. 发明申请

US20060071175A1 Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof 有权
标题翻译：用于微柱的提取器，用于提取器孔到电子发射器的对准方法，以及使用其的测量方法和对准方法
公开(公告)号：US20060071175A1
公开(公告)日：2006-04-06
申请号：US10538284
申请日：2003-12-30
申请人： Ho Kim , Seung Ahn , Dae Kim
发明人： Ho Kim , Seung Ahn , Dae Kim
IPC分类号： H01J3/14
CPC分类号： H01J3/028 , H01J3/10 , H01J37/067 , H01J37/15 , H01J2237/1205 , H01J2237/1501 , H01J2237/1502 , H01J2237/24465 , H01J2237/24507
摘要： The present invention provides a new extractor for a micro-column and an alignment method of the aperture of the extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method for measuring, and an alignment method using the principle of the alignment.
摘要翻译：本发明提供了用于微柱的新提取器和提取器的孔径和用于微柱的电子发射器的对准方法。此外，本发明提供了使用对准原理的测量系统，测量方法和对准方法。

6. 发明申请

US20070131971A1 Hetero junction bipolar transistor and method of manufacturing the same 失效
标题翻译：异质结双极晶体管及其制造方法
公开(公告)号：US20070131971A1
公开(公告)日：2007-06-14
申请号：US11634614
申请日：2006-12-06
申请人： Yong Kim , Eun Nam , Ho Kim , Sang Lee , Dong Jun , Hong Lee , Seon Hong , Dong Kim , Jong Lim , Myoung Oh
发明人： Yong Kim , Eun Nam , Ho Kim , Sang Lee , Dong Jun , Hong Lee , Seon Hong , Dong Kim , Jong Lim , Myoung Oh
IPC分类号： H01L31/00
CPC分类号： H01L29/7371 , H01L29/0817 , H01L29/41708 , H01L29/66318
摘要： Provided are a hetero-junction bipolar transistor (HBT) that can increase data processing speed and a method of manufacturing the hetero-junction bipolar transistor. The HBT includes a semi-insulating compound substrate, a sub-collector layer formed on the semi-insulating compound substrate, a pair of collector electrodes disposed at a predetermined distance apart from each other on a predetermined portion of the sub-collector layer, a collector layer and a base layer disposed between the collector electrodes, a pair of base electrodes disposed at a predetermined distance apart from each other on a predetermined portion of the base layer, an emitter layer stack disposed between the base electrodes, and an emitter electrode that is formed on the emitter layer stack, and includes a portion having a line width wider than the line width of the emitter layer stack, wherein both sidewalls of the emitter electrode are respectively aligned with inner walls of the pair of base electrodes, and sidewalls of the collector layer and the base layer are located between outer sidewalls of the pair of base electrodes of the pair of base electrodes.
摘要翻译：提供了可以提高数据处理速度的异质结双极晶体管（HBT）和制造异质结双极晶体管的方法。 HBT包括半绝缘复合基板，形成在半绝缘复合基板上的副集电极层，在副集电极层的预定部分上彼此隔开预定距离设置的一对集电极，集电极层和设置在集电极之间的基极层，在基极层的预定部分上彼此隔开预定距离设置的一对基底电极，设置在基极之间的发射极层叠层和发射极电极，形成在发射极层堆叠上，并且包括具有比发射极层堆叠的线宽宽的线宽的部分，其中发射极电极的两个侧壁分别与一对基底电极的内壁对齐，并且侧壁集电极层和基极层位于该对基极的一对基极的外侧壁之间。

7. 发明授权

US07554902B2 Preamble design for frequency offset estimation and channel equalization in burst OFDM transmission system 有权
标题翻译：用于突发OFDM传输系统中的频偏估计和信道均衡的前导码设计
公开(公告)号：US07554902B2
公开(公告)日：2009-06-30
申请号：US10420693
申请日：2003-04-23
申请人： Ki-yun Kim , Ho Kim , Hyung-jin Choi
发明人： Ki-yun Kim , Ho Kim , Hyung-jin Choi
IPC分类号： H04J11/00
CPC分类号： H04L27/2607 , H04L27/2657 , H04L27/2675
摘要： Provided is a transmission data frame in an orthogonal frequency division multiplexing (OFDM) burst mode transmission, and more particularly, a frequency offset estimating method and a channel equalizing method using a transmission data frame. In the transmission data frame used in the orthogonal frequency division multiplexing burst mode transmission, a length of a guard interval in a preamble area for frequency offset estimation and channel estimation varies depending on a channel environment not being limited in consideration of a size of a data symbol, and only data of ending part of the guard interval in the preamble is used to estimate frequency offset in consideration of intersymbol interference. In the frequency offset estimating method, desired frequency estimation efficiency can be satisfied with the small number of samples. Also, when channel equalization is performed, two symbols are averaged in a time area to reduce the accuracy of channel estimation due to Gaussian random noise. In a frequency area, by referring to weight placed on an adjacent subcarrier, a channel equalization coefficient is obtained to efficiently reduce Gaussian random noise.
摘要翻译：提供了正交频分复用（OFDM）突发模式传输中的发送数据帧，更具体地，使用使用发送数据帧的频率偏移估计方法和信道均衡方法。在正交频分复用突发模式传输中使用的发送数据帧中，用于频偏估计和信道估计的前同步码区域中的保护间隔的长度根据不受数据大小限制的信道环境而变化符号，并且仅使用前导码中的保护间隔的结束部分的数据来估计考虑码间干扰的频率偏移。在频率偏移估计方法中，可以利用少量样本来满足期望的频率估计效率。此外，当执行信道均衡时，在时间区域中平均两个符号以降低由于高斯随机噪声导致的信道估计的准确度。在频率区域中，通过参考相邻子载波上的权重，获得信道均衡系数以有效地降低高斯随机噪声。

8. 外观设计

USD582935S1 Image display for a mobile phone 有权
公开(公告)号：USD582935S1
公开(公告)日：2008-12-16
申请号：US29290030
申请日：2007-10-12
申请人： Seong-Eun Lee , Ho Kim , Joo-Hyun Lee , Bo-Ran Lee , Young-Kyung Ahn , Mi-Na Kwag , Hye-Mi Hong , Min-Seung Song
设计人： Seong-Eun Lee , Ho Kim , Joo-Hyun Lee , Bo-Ran Lee , Young-Kyung Ahn , Mi-Na Kwag , Hye-Mi Hong , Min-Seung Song

9. 外观设计

USD582933S1 Image display for a mobile phone 有权
标题翻译：手机图像显示
公开(公告)号：USD582933S1
公开(公告)日：2008-12-16
申请号：US29290029
申请日：2007-10-12
申请人： Seong-Eun Lee , Ho Kim , Joo-Hyun Lee , Mi-Na Kwag , Bo-Ran Lee , Min-Seung Song , Hye-Mi Hong , Young-Kyung Ahn
设计人： Seong-Eun Lee , Ho Kim , Joo-Hyun Lee , Mi-Na Kwag , Bo-Ran Lee , Min-Seung Song , Hye-Mi Hong , Young-Kyung Ahn

10. 外观设计

USD579021S1 Image display for a mobile phone 有权
公开(公告)号：USD579021S1
公开(公告)日：2008-10-21
申请号：US29290025
申请日：2007-10-12
申请人： Young-Kyung Ahn , Seong-Eun Lee , Ho Kim , Joo-Hyun Lee , Hye-Mi Hong , Bo-Ran Lee , Mi-Na Kwag , Min-Seung Song
设计人： Young-Kyung Ahn , Seong-Eun Lee , Ho Kim , Joo-Hyun Lee , Hye-Mi Hong , Bo-Ran Lee , Mi-Na Kwag , Min-Seung Song

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