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    • 5. 发明申请
    • Method of Using a Mask to Provide a Patterned Substrate
    • 使用掩模提供图案化基板的方法
    • US20130068723A1
    • 2013-03-21
    • US13518915
    • 2010-12-20
    • Matthew S. StayMikhail L. Pekurovsky
    • Matthew S. StayMikhail L. Pekurovsky
    • H05K3/10
    • H05K3/10B41M5/38207B82Y10/00B82Y40/00G03F7/0002H05K3/0085H05K3/184H05K2203/0108H05K2203/1415H05K2203/1545
    • A method of producing substrates having a patterned mask layer with fine features such as repeating stripes. The method including the steps of forming a substrate having a transfer layer with a predetermined pattern on a first major surface of the substrate; providing the substrate having the transfer layer on the first major surface; providing a structured tool having a body and a plurality of contact portions, the contact portions having a Young's Modulus between about 0.5 Gpa to about 30 Gpa; heating either the structured tool or the substrate; contacting the transfer layer with the structured tool; cooling the transfer layer; and withdrawing the structured tool from the transfer layer such that portions of the transfer layer separate with the structured tool leaving openings in the transfer layer that extend all the way through the transfer layer to the substrate forming the transfer layer with the predetermined pattern.
    • 一种制造具有图案化掩模层的基板的方法,其具有诸如重复条纹的精细特征。 该方法包括以下步骤:在衬底的第一主表面上形成具有预定图案的转印层的衬底; 在第一主表面上提供具有转移层的基板; 提供具有主体和多个接触部分的结构化工具,所述接触部分具有在约0.5Gpa至约30Gpa之间的杨氏模量; 加热结构化工具或衬底; 使转移层与结构化工具接触; 冷却转印层; 并且从转移层中取出结构化工具,使得转移层的部分与结构化工具分离,在转移层中留下开口,其一直延伸通过转移层到具有预定图案的形成转移层的基底。