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    • 4. 发明申请
    • Back side wafer dicing
    • 背面晶圆切片
    • US20070275541A1
    • 2007-11-29
    • US11441453
    • 2006-05-25
    • Richard S. HarrisHo W. Lo
    • Richard S. HarrisHo W. Lo
    • H01L21/00
    • H01L21/78B23K26/04B23K26/40B23K2103/50B28D5/0011H01L21/67092
    • Systems and methods for scribing a semiconductor wafer with reduced or no damage or debris to or on individual integrated circuits caused by the scribing process. The semiconductor wafer is scribed from a back side thereof. In one embodiment, the back side of the wafer is scribed following a back side grinding process but prior to removal of back side grinding tape. Thus, debris generated from the scribing process is prevented from being deposited on a top surface of the wafer. To determine the location of dicing lanes or streets relative to the back side of the wafer, the top side of the wafer is illuminated with a light configured to pass through the grinding tape and the wafer. The light is detected from the back side of the wafer, and the streets are mapped relative to the back side. The back side of the wafer is then cut with a saw or laser.
    • 用于划片半导体晶片的系统和方法,其具有减少或不损坏或碎片到由划线过程引起的单个集成电路上或之上。 半导体晶片从其后侧划线。 在一个实施例中,在背面研磨过程之后但在去除背面研磨带之前,对晶片的背面进行划线。 因此,防止从划线工艺产生的碎屑沉积在晶片的顶表面上。 为了确定相对于晶片背面的切割车道或街道的位置,用构造成穿过研磨带和晶片的光来照射晶片的顶侧。 从晶片的背面检测光,并且相对于背面映射街道。 然后用锯或激光切割晶片的背面。
    • 6. 发明申请
    • BACK SIDE WAFER DICING
    • 后面倒角
    • US20090155935A1
    • 2009-06-18
    • US12389686
    • 2009-02-20
    • Richard S. HarrisHo W. Lo
    • Richard S. HarrisHo W. Lo
    • H01L21/02
    • H01L21/78B23K26/04B23K26/40B23K2103/50B28D5/0011H01L21/67092
    • Systems and methods for scribing a semiconductor wafer with reduced or no damage or debris to or on individual integrated circuits caused by the scribing process. The semiconductor wafer is scribed from a back side thereof. In one embodiment, the back side of the wafer is scribed following a back side grinding process but prior to removal of back side grinding tape. Thus, debris generated from the scribing process is prevented from being deposited on a top surface of the wafer. To determine the location of dicing lanes or streets relative to the back side of the wafer, the top side of the wafer is illuminated with a light configured to pass through the grinding tape and the wafer. The light is detected from the back side of the wafer, and the streets are mapped relative to the back side. The back side of the wafer is then cut with a saw or laser.
    • 用于划片半导体晶片的系统和方法,其具有减少或不损坏或碎片到由划线过程引起的单个集成电路上或之上。 半导体晶片从其后侧划线。 在一个实施例中,在背面研磨过程之后但在去除背面研磨带之前,对晶片的背面进行划线。 因此,防止从划线工艺产生的碎屑沉积在晶片的顶表面上。 为了确定相对于晶片背面的切割车道或街道的位置,用构造成穿过研磨带和晶片的光来照射晶片的顶侧。 从晶片的背面检测光,并且相对于背面映射街道。 然后用锯或激光切割晶片的背面。
    • 10. 发明授权
    • Method of and apparatus for modulating a laser beam
    • 用于调制激光束的方法和装置
    • US4930901A
    • 1990-06-05
    • US357979
    • 1989-05-26
    • Joel C. JohnsonRichard S. Harris
    • Joel C. JohnsonRichard S. Harris
    • G02B26/02B23K26/06H01L21/48H01L21/60H01S3/11H03L7/26
    • H01S3/117B23K26/06B23K26/064B23K26/0643H01L21/4825H01S3/10038
    • A laser system operable in both a lead bonding mode and a lead severing mode. When in the lead bonding mode, the light-amplifying medium (38) of the laser is optically pumped by a lamp (45) to produce laser pulses within the laser cavity (36). The power supply (56) is rapidly switched to provide the bonding pulses (L.sub.b) at a high repetition rate. A Q-switch (46) is disposed within the cavity (36) to shape the laser output pulses (L.sub.b) with a leading power spike (S.sub.b) that is suitable for reducing the reflectivity of the lead (20) surface, thereby facilitating maximum absorption of the laser energy for the bonding operation. When in the severing mode, the light-amplifying medium (38) is continuously pumped and the Q-switch (46) is repetitively switched at a rate high enough to generate laser pulses (L.sub.s) suitable for severing the leads (20) without heating adjacent portions of the leads (20).
    • 一种可在引线键合模式和引线切断模式下操作的激光系统。 当处于引线键合模式时,激光的光放大介质(38)被灯(45)光泵浦,以在激光腔(36)内产生激光脉冲。 快速切换电源(56)以提供高重复率的接合脉冲(Lb)。 Q型开关(46)设置在空腔(36)内,用适于降低引线(20)表面的反射率的引导功率尖峰(Sb)来形成激光输出脉冲(Lb),从而有助于最大化 吸收激光能量进行接合操作。 当处于切断模式时,光放大介质(38)被连续泵送,并且Q开关(46)以足够高的速率重复切换,以产生适合于切断引线(20)而不加热的激光脉冲(Ls) 引线(20)的相邻部分。