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    • 3. 发明授权
    • Organically modified silicic acid polycondensates, production and use thereof
    • 有机改性硅酸缩聚物,其生产和使用
    • US06984483B1
    • 2006-01-10
    • US10030910
    • 2000-05-31
    • Christof RoscherRalf Buestrich
    • Christof RoscherRalf Buestrich
    • C08G77/06C08G77/14G03F7/075
    • C09D4/00C08G77/04C08G77/20
    • The invention relates to organically modified, stable in storage, UV curable, NIR permeable silicic acid polycondensates which are photostructurable in layers having a thickness of 1 to 150 μm. The invention also relates to the production and use thereof as negative resists. The polycondensates according to the invention are obtainable by condensation of organically modified silanediols of the formula I with organically modified silanes of the formula II. Ar2Si(OH)2   (I) RSi(OR′)3   (II) The radicals are identical or different and have the following meaning: Ar=a radical having 6 to 20 carbon atoms and at least one aromatic group, R=an organic radical having 2 to 15 carbon atoms and at least one epoxy group and/or at least one C═C double bond, R′=methyl or ethyl. Condensation occurs without the addition of water. The molar ratio of said compounds I and II is 1:1. Up to 90 mole percent of said compound of the formula II can be replaced by co-condensable compounds of boron, aluminum, silicon, germanium, titanium and zirconium.
    • 本发明涉及有机改性,稳定的储存,UV可固化,NIR可渗透的硅酸缩聚物,它们可以在1至150μm厚度的层中光可固化。 本发明还涉及其作为负型抗蚀剂的生产和使用。 根据本发明的缩聚物可通过将式I的有机改性硅烷二醇与式II的有机改性硅烷缩合而获得。 <?in-line-formula description =“In-line Formulas”end =“lead”?> Ar <2> Si(OH)2(I) line-formula description =“In-line Formulas”end =“tail”?> <?in-line-formula description =“In-line Formulas”end =“lead”?> RSi(OR')< (II)<?in-line-formula description =“In-line Formulas”end =“tail”?>基团相同或不同,具有以下含义:Ar =具有6至20个碳原子的基团 和至少一个芳族基团,R =具有2至15个碳原子和至少一个环氧基团的有机基团和/或至少一个CC双键,R'=甲基或乙基。 冷凝发生时不加水。 所述化合物I和II的摩尔比为1:1。 所述式(II)化合物最多达90摩尔%可由硼,铝,硅,锗,钛和锆的共缩合化合物代替。