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1. 发明授权

US06238544B1 Method of purification of salt solutions for electrolysis 失效
标题翻译：纯化电解盐溶液的方法
公开(公告)号：US06238544B1
公开(公告)日：2001-05-29
申请号：US09374505
申请日：1999-08-16
申请人： Chisako Oohara , Terumi Matsuoka , Takamichi Kishi , Takako Okuno
发明人： Chisako Oohara , Terumi Matsuoka , Takamichi Kishi , Takako Okuno
IPC分类号： C25B134
CPC分类号： C01D3/145 , C01D3/14 , Y02W10/37
摘要： In a method of removing impurities, especially iodine and/or silica ions, from a salt solution to be used for electrolysis, the salt solution and zirconium hydroxide are brought into contact with each other under acidic conditions, and the zirconium hydroxide adsorbs the impurities. Thereafter, the zirconium hydroxide containing the adsorbed impurities is brought into contact with an aqueous solution at a higher pH value to desorb the impurities from the zirconium hydroxide, thereby enabling the zirconium hydroxide to be recycled.
摘要翻译：在从用于电解的盐溶液中除去杂质，特别是碘和/或二氧化硅离子的方法中，在酸性条件下使盐溶液和氢氧化锆相互接触，氢氧化锆吸附杂质。此后，将含有吸附杂质的氢氧化锆与较高pH值的水溶液接触以从氢氧化锆中除去杂质，从而使氢氧化锆能够再循环。

2. 发明授权

US6132591A Method for removal of sulfate groups and chlorate groups from brine 失效
标题翻译：从盐水中除去硫酸根和氯酸根的方法
公开(公告)号：US6132591A
公开(公告)日：2000-10-17
申请号：US198455
申请日：1998-11-24
申请人： Terumi Matsuoka , Masahiro Ohara , Takamichi Kishi
发明人： Terumi Matsuoka , Masahiro Ohara , Takamichi Kishi
IPC分类号： C02F1/469 , B01J47/06 , C01D3/14 , C01D3/16 , C25B1/46 , C25B15/08 , C25B1/34 , C25B1/00 , C25B11/04 , C25C1/00
CPC分类号： C01D3/14 , C25B1/46 , C25B15/08
摘要： In removal of sulfate groups and chlorate groups from brine used for electrolysis, concentrated brine used in an electrolysis process or dilute brine whose concentration is decreased by electrolysis is fed to an anode chamber divided by a cation exchange membrane in a brine treating electrolyzer, where the concentrated or dilute brine is electrolyzed to recover chloride ions therein. The concentrated brine is electrolyzed at a rate of decomposition of salt higher than that in the ion exchange membrane electrolysis process of brine. Thereafter, the concentrated or dilute brine is discharged out of the electrolysis process.
摘要翻译：在从用于电解的盐水中除去硫酸基和氯酸根时，电解过程中使用的浓缩盐水或通过电解将浓度降低的稀盐水通过盐水处理电解槽中的阳离子交换膜进料到阳极室，电解浓缩或稀释的盐水以回收其中的氯离子。浓缩的盐水以比盐水的离子交换膜电解处理中的盐分解速率高的方式进行电解。此后，浓缩或稀释的盐水从电解过程中排出。

3. 发明授权

US5632847A Film removing method and film removing agent 失效
标题翻译：薄膜去除方法和除膜剂
公开(公告)号：US5632847A
公开(公告)日：1997-05-27
申请号：US427309
申请日：1995-04-24
申请人： Reiko Ohno , Terumi Matsuoka
发明人： Reiko Ohno , Terumi Matsuoka
IPC分类号： B08B3/08 , B29C63/00 , G03F1/00 , G03F1/68 , H01L21/027 , H01L21/304 , H01L21/308 , H01L21/311 , B32B35/00
CPC分类号： H01L21/31133 , B29C63/0013 , B29L2031/3061 , Y10S134/902 , Y10T156/1126 , Y10T156/1922
摘要： The method of removing a film from a substrate (wafer) comprises a step of injecting ozone (13) into an acid aqueous solution (12) (e.g., a mixed liquid of dilute hydrogen fluoride aqueous solution and dilute hydrochloric acid); and a step of bringing bubbles (18) formed by the ozone injection step into contact with a film (17) (e.g., organic or metal contaminated film) adhering on to the substrate to remove the film (17) from the substrate (16). Therefore, the organic film or metal contaminated film adhering onto the substrate surface can be removed easily and effectively. Further, the film removing agent is bubbles formed when ozone (13) is injected into an acid aqueous solution. Each bubble is composed of an inside ozone bubble and an outside acid aqueous solution bubble. Therefore, when the bubbles are brought into contact with the film, an intermediate between ozone and the film is first formed, and then the formed intermediate can be removed from the substrate by the acid aqueous solution.
摘要翻译：从基板（晶片）中除去膜的方法包括将臭氧（13）注入酸性水溶液（12）（例如稀氟化氢水溶液和稀盐酸的混合液）中的步骤; 以及将通过臭氧注入步骤形成的气泡（18）与附着在基板上的膜（17）（例如有机或金属污染膜）接触以从基板（16）去除膜（17）的步骤，。因此，可以容易且有效地除去附着在基板表面上的有机膜或金属污染膜。此外，除去膜是在将臭氧（13）注入酸性水溶液时形成的气泡。每个气泡由内部臭氧气泡和外部酸性水溶液气泡组成。因此，当使气泡与膜接触时，首先形成臭氧与膜之间的中间体，然后通过酸性水溶液将形成的中间体从基板除去。

4. 发明授权

US5578218A Brine treatment method 失效
标题翻译：盐水处理方法
公开(公告)号：US5578218A
公开(公告)日：1996-11-26
申请号：US514624
申请日：1995-08-14
申请人： Terumi Matsuoka , Masahiro Ohara , Izumi Kawamura
发明人： Terumi Matsuoka , Masahiro Ohara , Izumi Kawamura
IPC分类号： B01D15/04 , B01J41/04 , C01D3/16 , C01F5/30 , C01F11/32 , C02F1/42
CPC分类号： C01D3/16 , C01F11/32 , C01F5/30
摘要： In a brine treatment method of removing sulfate ions from sulfate-ion contained brine, sulfate-ion contained brine is brought into dispersive contact with granular ion exchange resin carrying zirconium hydrous oxide thereon in a fluid state under an acidic condition to thereby cause the sulfate ions to be adsorbed by the ion exchange resin and removed from the brine, then the granular ion exchange resin is washed with aqueous solution whose pH value is equal to or lower than a pH value in the adsorbing step, thereby removing chloride ions from the granular ion exchange resin, then in a fluid state, the granular ion exchange resin adsorbing the sulfate ions is brought into dispersive contact with aqueous solution of pH value higher than the pH value in the adsorbing step, thereby desorbing the adsorbed sulfate ions from the granular ion exchange resin, and then the granular ion exchange resin is washed with water.
摘要翻译：在从含有硫酸根离子的盐水中除去硫酸根离子的盐水处理方法中，在酸性条件下，将含有硫酸根离子的盐水与流动状态的载有氧化锆水的粒状离子交换树脂分散接触，从而使硫酸根离子被离子交换树脂吸附并从盐水中除去，然后用吸附步骤中pH值等于或低于pH值的水溶液洗涤粒状离子交换树脂，从而从颗粒离子中除去氯离子在流体状态下，吸附硫酸根离子的粒状离子交换树脂与吸附工序中pH值以上的pH值分散接触，从而从粒状离子交换器吸附硫酸根离子树脂，然后用水洗涤颗粒状离子交换树脂。

5. 发明授权

US5378317A Method for removing organic film 失效
标题翻译：去除有机膜的方法
公开(公告)号：US5378317A
公开(公告)日：1995-01-03
申请号：US110646
申请日：1993-08-23
申请人： Masaharu Kashiwase , Terumi Matsuoka
发明人： Masaharu Kashiwase , Terumi Matsuoka
IPC分类号： G03F7/42 , H01L21/311 , H01L21/312
CPC分类号： G03F7/423 , H01L21/31133 , Y10S438/98
摘要： The method for removing organic film according to the present invention is very effective for removing a photo resist film in a process for manufacturing semiconductor device. A substrate (32) having a photo resist film (31) formed on it is processed in a wet processing tank (34) filled with a processing solution such as a mixed solution containing sulfuric acid and hydrogen peroxide or by a dry processing using oxygen plasma. Then, it is processed in an ozone processing tank (34) filled with a solution where ozone or ozone water has been infused, and the organic film is removed.
摘要翻译： PCT No.PCT / JP91 / 01374 Sec。 371日期：1992年6月8日 102（e）日期1992年6月8日PCT 1991年10月9日PCT PCT。出版物WO92 / 06489 日期：1992年4月16日。根据本发明的除去有机膜的方法在半导体器件的制造工艺中去除光致抗蚀剂膜是非常有效的。在其上形成有光致抗蚀剂膜（31）的基板（32）在填充有诸如含有硫酸和过氧化氢的混合溶液等处理溶液的湿处理槽（34）中进行处理，或者使用氧等离子体。然后，在填充有输入了臭氧或臭氧水的溶液的臭氧处理槽（34）中进行处理，除去有机膜。

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