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1. 发明授权

US6165255A Chemical-liquid controlling apparatus 有权
标题翻译：化学液体控制装置
公开(公告)号：US6165255A
公开(公告)日：2000-12-26
申请号：US267845
申请日：1999-03-12
申请人： Chien-Hsin Lai , Peng-Yih Peng , Li-Min Chang , Fu-Yang Yu
发明人： Chien-Hsin Lai , Peng-Yih Peng , Li-Min Chang , Fu-Yang Yu
IPC分类号： B01D19/00
CPC分类号： B01D19/0042 , B01D19/0068
摘要： A chemical-liquid controlling apparatus is described. The chemical-liquid controlling apparatus is mounted between a chemical-liquid container and an exhaust apparatus. During a chemical-liquid refilling process, once the chemical liquid is drawn out of the container by the exhaust apparatus, the chemical liquid first enters the chemical-liquid controlling apparatus. The chemical-liquid controlling apparatus separates the chemical liquid from a nitrogen gas and a chemical gas. In addition, the chemical-liquid refilling process is stopped by a signal transmitted from a leak sensor.
摘要翻译：描述了一种药液控制装置。药液控制装置安装在药液容器和排气装置之间。在化学液体再填充过程中，一旦化学液体被排气装置从容器中抽出，化学液体首先进入化学液体控制装置。药液控制装置将化学液体与氮气和化学气体分离。此外，通过从泄漏传感器传输的信号来停止药液补充过程。

2. 发明授权

US6120366A Chemical-mechanical polishing pad 有权
标题翻译：化学机械抛光垫
公开(公告)号：US6120366A
公开(公告)日：2000-09-19
申请号：US225367
申请日：1999-01-04
申请人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Edward Yang , Kun-Lin Wu , Fu-Yang Yu
发明人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Edward Yang , Kun-Lin Wu , Fu-Yang Yu
IPC分类号： B24B37/26 , B24D13/12 , B24D13/14 , H01L21/304 , B23F21/03 , B24B1/00
CPC分类号： B24B37/26
摘要： The invention provides a chemical-mechanical polishing pad, which includes a plurality of annular grooves and a plurality of streamline grooves designed according to principles of the hydrodynamics. The streamline grooves of polishing pad are designed according to flow equations derived from source flow and vortex flow, and the streamline grooves of polishing pad uniformly distribute the slurry on the polishing pad. An angle and a depth of the streamline groove, which are calculated by boundary layer effect of the streamline groove function, are used to design an optimum structure for polishing pad.
摘要翻译：本发明提供了一种化学机械抛光垫，其包括多个环形槽和根据流体动力学原理设计的多条流线槽。抛光垫的流线槽根据源流和涡流的流动方程设计，抛光垫的流线槽将浆料均匀分布在抛光垫上。使用由流线槽功能的边界层效应计算的流线槽的角度和深度来设计抛光垫的最佳结构。

3. 发明授权

US06352244B2 Auxiliary gasline-heating unit in chemical vapor deposition 有权
标题翻译：化学气相沉积辅助加气线加热装置
公开(公告)号：US06352244B2
公开(公告)日：2002-03-05
申请号：US09909498
申请日：2001-07-20
申请人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Fu-Yang Yu
发明人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Fu-Yang Yu
IPC分类号： B01F304
CPC分类号： C23C16/45561 , C23C16/4482
摘要： An auxiliary gasline-heating unit is used in a chemical vapor deposition apparatus. The auxiliary gasline-heating unit serves to increase the exit temperature of the mixture of N2 gas and He-dilute gas in order to prevent TDMAT, Ti[N(CH3)2]4, from being condensed and becoming a gasline contaminant when the mixture mixes with the TDMAT and a carrier gas.
摘要翻译：在化学气相沉积设备中使用辅助气体加热单元。辅助气体线路加热装置用于增加N 2气体和He稀释气体混合物的出口温度，以防止混合物中的TDMAT，Ti [N（CH 3）2] 4被冷凝并成为气体线路污染物与TDMAT和载气混合。

4. 发明授权

US06322057B1 Auxiliary gasline-heating unit in chemical vapor deposition 有权
公开(公告)号：US06322057B1
公开(公告)日：2001-11-27
申请号：US09577068
申请日：2000-05-22
申请人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Fu-Yang Yu
发明人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Fu-Yang Yu
IPC分类号： B01F304
CPC分类号： C23C16/45561 , C23C16/4482
摘要： An auxiliary gasline-heating unit is used in a chemical vapor deposition apparatus. The auxiliary gasline-heating unit serves to increase the exit temperature of the mixture of N2 gas and He-dilute gas in order to prevent TDMAT, Ti[N(CH3)2]4, from being condensed and becoming a gasline contaminant when the mixture mixes with the TDMAT and a carrier gas.

5. 发明授权

US06234876B1 Chemical-mechanical polish machines and fabrication process using the same 有权
公开(公告)号：US06234876B1
公开(公告)日：2001-05-22
申请号：US09425454
申请日：1999-10-22
申请人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Kun-Lin Wu , Daniel Chiu , Chih-Chiang Yang , Juan-Yuan Wu , Hao-Kuang Chiu
发明人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Kun-Lin Wu , Daniel Chiu , Chih-Chiang Yang , Juan-Yuan Wu , Hao-Kuang Chiu
IPC分类号： B24B100
CPC分类号： B24B37/32 , B24B37/042 , B24B57/02
摘要： A chemical mechanical polishing machine and a fabrication process using the same. The chemical mechanical polishing machine comprises a retainer ring having a plurality of slurry passages at the bottom of the retainer ring. The retainer ring further comprises a circular path. By conducting the slurry through the slurry passages and the circular, a wafer is planarized within the chemical mechanical polishing machine.

6. 发明授权

US06183350B2 Chemical-mechanical polish machines and fabrication process using the same 有权
标题翻译：化学机械抛光机及其制作工艺使用相同
公开(公告)号：US06183350B2
公开(公告)日：2001-02-06
申请号：US09425130
申请日：1999-10-22
申请人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Kun-Lin Wu , Daniel Chiu , Chih-Chiang Yang , Juan-Yuan Wu , Hao-Kuang Chiu
发明人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Kun-Lin Wu , Daniel Chiu , Chih-Chiang Yang , Juan-Yuan Wu , Hao-Kuang Chiu
IPC分类号： B24B100
CPC分类号： B24B37/32 , B24B37/042 , B24B57/02
摘要： A chemical mechanical polishing machine and a fabrication process using the same. The chemical mechanical polishing machine comprises a retainer ring having a plurality of slurry passages at the bottom of the retainer ring. The retainer ring further comprises a circular path. By conducting the slurry through the slurry passages and the circular, a wafer is planarized within the chemical mechanical polishing machine.
摘要翻译：化学机械抛光机及其制造方法。化学机械抛光机包括在保持环的底部具有多个浆料通道的保持环。保持环还包括圆形路径。通过将浆料通过浆料通道和圆形管，在化学机械抛光机内将晶片平坦化。

7. 发明授权

US6119294A Cleaning system with automatically controlled brush pressure 有权
标题翻译：具有自动控制刷压力的清洁系统
公开(公告)号：US6119294A
公开(公告)日：2000-09-19
申请号：US232203
申请日：1999-01-14
申请人： Chien-Hsin Lai , Juen-Kuen Lin , Kun-Lin Wu , Peng-Yih Peng
发明人： Chien-Hsin Lai , Juen-Kuen Lin , Kun-Lin Wu , Peng-Yih Peng
IPC分类号： H01L21/00 , A46B13/02
CPC分类号： H01L21/67046 , H01L21/6704
摘要： An auto brush pressure cleaning system is described. The system includes a first pneumatic brush, a second pneumatic brush disposed to align with the first pneumatic brush adjacent and parallel to the first pneumatic brush, and a computer. The system also includes a first brush pressure regulator electrically coupled to the computer and transmitting a first and a second signal to the computer and a second brush pressure regulator coupled to the second pneumatic brush and the first brush pressure regulator through a first three-way valve and electrically coupled to the computer, wherein the second pneumatic brush transmits a third signal to the second brush pressure regulator and to the first brush pressure regulator and the second brush pressure regulator transmits a fourth signal to the computer. The system further includes a first electro-pressure regulator coupled to the first brush pressure regulator and the first pneumatic brush through a second three-way valve, wherein the first brush pressure regulator receives a fifth signal from the first pneumatic brush and a second electro-pressure regulator coupled to the second pneumatic brush and electrically coupled to the first electro-pressure regulator and the computer, wherein the computer transmits a sixth signal to the second and the first electro-pressure regulators.
摘要翻译：描述了一种自动刷式压力清洗系统。该系统包括第一气动刷，设置成与第一气动刷相邻并平行于第一气动刷的第二气动刷以及计算机。该系统还包括电耦合到计算机并将第一和第二信号传送到计算机的第一电刷压力调节器和通过第一三通阀耦合到第二气动刷和第一电刷压力调节器的第二电刷压力调节器并且电耦合到所述计算机，其中所述第二气动刷将第三信号传输到所述第二电刷压力调节器和所述第一电刷压力调节器，并且所述第二电刷压力调节器将第四信号传输到所述计算机。该系统还包括通过第二三通阀联接到第一电刷压力调节器和第一气动刷的第一电压调节器，其中第一电刷压力调节器接收来自第一气动刷的第五信号和第二电 - 耦合到第二气动刷并且电耦合到第一电压调节器和计算机的压力调节器，其中计算机向第二和第一电压调节器传输第六信号。

8. 发明授权

US6051139A Device for filtering slurry 失效
标题翻译：浆料过滤装置
公开(公告)号：US6051139A
公开(公告)日：2000-04-18
申请号：US143582
申请日：1998-08-31
申请人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng
发明人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng
IPC分类号： B01D29/11 , B01D35/30 , B01D29/90 , B01D35/22
CPC分类号： B01D35/30 , B01D29/114
摘要： A filtering device used to filter the slurry is disclosed, including a crossflow fan within the filter housing, and a driving mechanism relative to the crossflow fan under the filter housing to drive the crossflow fan spinning to agitate the slurry in the filter housing, so as to prevent the particles in the slurry from adhering to the surface of the filter. The filtering device further includes a spoiler between the crossflow fan and the filter, so that larger particles remain circulating somewhere between the tip of the spoiler and the crossflow fan, instead of flowing to the filter, to prolong the lifetime of the filter.
摘要翻译：公开了用于过滤浆料的过滤装置，其包括过滤器壳体内的横流风扇，以及相对于过滤器壳体下方的横流风扇的驱动机构，以驱动横流风扇纺丝以搅拌过滤器壳体中的浆料，使得以防止浆料中的颗粒粘附到过滤器的表面上。过滤装置还包括在横流风扇和过滤器之间的扰流器，使得更大的颗粒保持循环在扰流器的尖端与横流风扇之间的某处，而不是流到过滤器，以延长过滤器的寿命。

9. 发明授权

US06293850B1 Chemical-mechanical polish machines and fabrication process using the same 有权
公开(公告)号：US06293850B1
公开(公告)日：2001-09-25
申请号：US09426937
申请日：1999-10-22
申请人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Kun-Lin Wu , Daniel Chiu , Chih-Chiang Yang , Juan-Yuan Wu , Hao-Kuang Chiu
发明人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Kun-Lin Wu , Daniel Chiu , Chih-Chiang Yang , Juan-Yuan Wu , Hao-Kuang Chiu
IPC分类号： B24B100
CPC分类号： B24B37/32 , B24B37/042 , B24B57/02
摘要： A chemical mechanical polishing machine and a fabrication process using the same. The chemical mechanical polishing machine comprises a retainer ring having a plurality of slurry passages at the bottom of the retainer ring. The retainer ring further comprises a circular path. By conducting the slurry through the slurry passages and the circular, a wafer is planarized within the chemical mechanical polishing machine.

10. 发明授权

US06220930B1 Wafer polishing head 有权
公开(公告)号：US06220930B1
公开(公告)日：2001-04-24
申请号：US09482936
申请日：2000-01-14
申请人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Chia-Jui Chang
发明人： Juen-Kuen Lin , Chien-Hsin Lai , Peng-Yih Peng , Chia-Jui Chang
IPC分类号： B24B4900
CPC分类号： B24B37/30 , B24B37/32 , B24B49/16
摘要： A wafer polishing head for planarizing a wafer. The wafer polishing head comprises a carrier, a retaining ring, a first pressure chamber, a second pressure chamber and an automatic control system. The retaining ring is surrounding the carrier. The first pressure chamber having a first inner pressure is disposed above the retaining ring. The second pressure chamber having a second inner pressure is disposed on the carrier. The automatic control system is respectively coupled to the first pressure chamber and the second pressure chamber.

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