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1. 发明申请

US20110195186A1 PLANE-TYPE FILM CONTINUOUS EVAPORATION SOURCE AND THE MANUFACTURING METHOD AND SYSTEM USING THE SAME 审中-公开
标题翻译：平面型薄膜连续蒸发源及其制造方法和系统
公开(公告)号：US20110195186A1
公开(公告)日：2011-08-11
申请号：US13024010
申请日：2011-02-09
申请人： Chien-Chih Chen , Ching-Chiun Wang , Ching-Huei Wu , Fu-Ching Tung
发明人： Chien-Chih Chen , Ching-Chiun Wang , Ching-Huei Wu , Fu-Ching Tung
IPC分类号： C23C16/44 , C23C16/00
CPC分类号： C23C14/56 , C23C14/24 , C23C14/246
摘要： A manufacturing method and system using a plane-type film continuous evaporation source are disclosed, in which the manufacturing method comprises the steps of: providing a plane-type film continuous evaporation source, being a substrate having at least one evaporation material coated on a surface thereof while distributing the at least one evaporation material in a specific area of the substrate capable of covering all the plates to be processed by the evaporated evaporation material; arranging a heater inside the specific area to be used for enabling the at least one evaporation material to evaporate and thus spreading toward the processed plates. Thereby, the evaporated evaporation material can be controlled at the molecular/atomic level for enabling the same to form a film according to surface-nucleation, condensation and growth with superior evenness, nano-scale adjustability, specialized structure and function that can not be achieve by the films from conventional spray coating means.
摘要翻译：公开了一种使用平面型膜连续蒸发源的制造方法和系统，其中制造方法包括以下步骤：提供平面型膜连续蒸发源，其为具有涂覆在表面上的至少一种蒸镀材料的基材同时在衬底的特定区域中分配至少一种蒸发材料，其能够通过蒸发的蒸发材料覆盖待处理的所有板; 在特定区域内布置加热器以用于使至少一种蒸发材料蒸发并因此向加工板铺展。因此，可以将蒸发的蒸发材料控制在分子/原子水平，以使其能够根据表面成核，冷凝和生长形成具有优异的均匀性，纳米级可调性，专门的结构和功能的薄膜，其不能实现通过常规喷涂方式的薄膜。

2. 发明申请

US20130068160A1 EVAPORATION DEVICE AND EVAPORATION APPARATUS 审中-公开
标题翻译：蒸发装置和蒸发装置
公开(公告)号：US20130068160A1
公开(公告)日：2013-03-21
申请号：US13471462
申请日：2012-05-15
申请人： Ching-Chiun Wang , Chih-Yung Huang , Chien-Chih Chen , Szu-Hao Chen , Fu-Ching Tung , Atsushi Oda
发明人： Ching-Chiun Wang , Chih-Yung Huang , Chien-Chih Chen , Szu-Hao Chen , Fu-Ching Tung , Atsushi Oda
IPC分类号： C23C16/448 , C23C16/04
CPC分类号： C23C14/042 , C23C14/12 , C23C14/246 , C23C14/26
摘要： An evaporation device and an evaporation apparatus applying the same are adapted to performing evaporation process to an object to be coated. The evaporation device includes a tape carrier and a mask. The tape carrier has a heating region. The object to be coated is located over the heating region and is adapted to move along a feeding direction. The tape carrier is adapted to carry a coating material to pass through the heating region. The coating material is heated in the heating region and evaporated. The mask having an opening between the heating region and the object to be coated is disposed in the periphery of the heating region. The evaporated coating material is adapted to pass through the opening and coated on the object.
摘要翻译：蒸发装置和应用该蒸发装置的蒸发装置适于对被涂物进行蒸发处理。蒸发装置包括带状载体和掩模。带状载体具有加热区域。待涂覆的物体位于加热区域上方并且适于沿着进给方向移动。带状载体适于承载涂覆材料以通过加热区域。涂层材料在加热区域加热并蒸发。在加热区域的周围配置有在加热区域和被涂物体之间具有开口的掩模。蒸发的涂层材料适于穿过开口并涂覆在物体上。

3. 发明申请

US20120145078A1 SHOWERHEAD INTEGRATING INTAKE AND EXHAUST 审中-公开
标题翻译：淋浴收集和排气
公开(公告)号：US20120145078A1
公开(公告)日：2012-06-14
申请号：US13211309
申请日：2011-08-17
申请人： Chih-Yung Huang , Ching-Chiun Wang , Chen-Der Tsai , Wen-Tung Hsu , Fu-Ching Tung , Chien-Chih Chen , Yi-Tsung Pan , Chien-Jen Sun
发明人： Chih-Yung Huang , Ching-Chiun Wang , Chen-Der Tsai , Wen-Tung Hsu , Fu-Ching Tung , Chien-Chih Chen , Yi-Tsung Pan , Chien-Jen Sun
IPC分类号： C23C16/455 , B05B1/14
CPC分类号： C23C16/45565 , C23C16/4412
摘要： A showerhead integrating intake and exhaust is provided for showering a gas. The showerhead at least includes a showerhead body that has a gas-active surface and a plurality of intake bores thereon. The showerhead body further includes a central exhaust vent disposed on the gas-active surface. The central exhaust vent may exhaust standing gas and further pre-exhaust byproduct from reaction process.
摘要翻译：提供集成进气和排气的淋浴头，用于喷射气体。淋浴头至少包括具有气体活性表面和多个进气孔的喷头体。喷头体还包括设置在气体活性表面上的中央排气口。中央排气口可以从反应过程中排放站立气体和进一步预排气副产物。

4. 发明申请

US20080038020A1 SUBSTRATE TRANSPORT DEVICE 有权
标题翻译：基板运输装置
公开(公告)号：US20080038020A1
公开(公告)日：2008-02-14
申请号：US11616252
申请日：2006-12-26
申请人： Yun-Sheng Chung , Fu-Ching Tung , Hsin-Hung Huang
发明人： Yun-Sheng Chung , Fu-Ching Tung , Hsin-Hung Huang
IPC分类号： G03G15/08
CPC分类号： G03G15/6529 , B65G54/02
摘要： A substrate transport device includes a chamber, a rotary wheel, a first magnet, a carrier, and a second magnet. The rotary wheel is disposed outside the chamber. The first magnet is disposed on the rotary wheel. The carrier is disposed in the chamber. The second magnet is disposed on the carrier.
摘要翻译：基板输送装置包括室，旋转轮，第一磁体，载体和第二磁体。旋转轮设置在室外。第一磁铁设置在旋转轮上。载体设置在腔室中。第二磁体设置在载体上。

5. 发明申请

US20110079963A1 VACUUM APPARATUS OF ROTARY MOTION ENTRY 有权
标题翻译：旋转运动入口的真空装置
公开(公告)号：US20110079963A1
公开(公告)日：2011-04-07
申请号：US12615811
申请日：2009-11-10
申请人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
发明人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
IPC分类号： F16C33/10 , F16J15/32
CPC分类号： F16C33/76 , F16C2300/62 , Y10S277/913
摘要： A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.
摘要翻译：公开了一种旋转运动进入的真空装置，其包括：设置在真空系统的空腔壁上的轴套; 旋转轴，由轴套套管; 以及与驱动该旋转轴的旋转轴连接的变速器组; 其特征在于，所述旋转轴设置成穿过形成在所述轴套的基部上的孔，同时在所述孔内分开设置有第一轴承，第二轴承，密封环和轴密封件。此外，轴密封件具有形成为朝向孔中心延伸的片状唇缘凸缘，其能够通过将旋转轴插入孔而远离真空系统延伸，从而使得唇缘凸缘与大气压力紧密地与旋转轴啮合，从而将外界与真空系统隔离开来。

6. 发明授权

US07927425B2 Power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same 有权
标题翻译：使用该等离子体增强化学气相沉积的动力输送机构和装置
公开(公告)号：US07927425B2
公开(公告)日：2011-04-19
申请号：US11847316
申请日：2007-08-29
申请人： Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
发明人： Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
IPC分类号： C23C16/00 , C23C16/458 , C23C16/509 , H01L21/3065
CPC分类号： H01L21/6719 , H01J37/32431 , H01J37/32568 , H01L21/67748 , H01L21/68792
摘要： A power-delivery mechanism is provided in the present invention, which utilizes an element with airtight and flexible characteristics coupled to a power-generating unit so as to generate a motion in a specific direction. Besides, an apparatus of plasma -enhanced chemical vapor deposition (PECVD) is also provided in the present invention, which comprises the power-delivery mechanism to load/unload a workpiece onto a stage for processing automatically. Meanwhile, the present invention also provides a height-adjusting unit and a position-indicating unit allowing the operator to adjust the distance between an upper electrode and a lower electrode of the PECVD so that the operator is capable of monitoring and adjusting the distance easily between the upper electrode and the lower electrode outside the chamber of the PECVD.
摘要翻译：在本发明中提供了一种动力输送机构，其利用与发电单元相耦合的气密和柔性特征的元件，以便产生沿特定方向的运动。此外，在本发明中还提供了等离子体化学气相沉积（PECVD）装置，其包括将工件装载/卸载到工作台上以自动处理的动力输送机构。同时，本发明还提供了一种高度调节单元和位置指示单元，其允许操作者调节PECVD的上电极和下电极之间的距离，使得操作者能够容易地监测和调整距离 PECVD室的上电极和下电极。

7. 发明申请

US20080295771A1 POWER-DELIVERY MECHANISM AND APPARATUS OF PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION USING THE SAME 有权
标题翻译：动力传递机理及其等离子体增强化学气相沉积的设备
公开(公告)号：US20080295771A1
公开(公告)日：2008-12-04
申请号：US11847316
申请日：2007-08-29
申请人： Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
发明人： Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
IPC分类号： C23C16/00
CPC分类号： H01L21/6719 , H01J37/32431 , H01J37/32568 , H01L21/67748 , H01L21/68792
摘要： A power-delivery mechanism is provided in the present invention, which utilizes an element with airtight and flexible characteristics coupled to a power-generating unit so as to generate a motion in a specific direction. Besides, an apparatus of plasma -enhanced chemical vapor deposition (PECVD) is also provided in the present invention, which comprises the power-delivery mechanism to load/unload a workpiece onto a stage for processing automatically. Meanwhile, the present invention also provides a height-adjusting unit and a position-indicating unit allowing the operator to adjust the distance between an upper electrode and a lower electrode of the PECVD so that the operator is capable of monitoring and adjusting the distance easily between the upper electrode and the lower electrode outside the chamber of the PECVD.
摘要翻译：在本发明中提供了一种动力输送机构，其利用与发电单元相耦合的气密和柔性特性的元件，以产生沿特定方向的运动。此外，在本发明中还提供了等离子体化学气相沉积（PECVD）装置，其包括将工件装载/卸载到工作台上以自动处理的动力输送机构。同时，本发明还提供了一种高度调节单元和位置指示单元，其允许操作者调节PECVD的上电极和下电极之间的距离，使得操作者能够容易地监测和调整距离 PECVD室的上电极和下电极。

8. 发明申请

US20080114174A1 RUTHENIUM COMPLEXES WITH TRIDENTATE HETEROCYCLIC LIGAND AND DYE-SENSITIZED SOLAR CELLS USING THE SAME 有权
标题翻译：具有三元杂环配体和染料敏感的太阳能电池的钌复合物
公开(公告)号：US20080114174A1
公开(公告)日：2008-05-15
申请号：US11939559
申请日：2007-11-14
申请人： Ching-Yen Wei , Chao-Ining Yu , Fu-Ching Tung , Yun Chi , Hsing-Yi Chen , I-Hui Lin
发明人： Ching-Yen Wei , Chao-Ining Yu , Fu-Ching Tung , Yun Chi , Hsing-Yi Chen , I-Hui Lin
IPC分类号： C07D401/14
CPC分类号： C07D401/14 , C07F15/0053 , C09B57/10 , H01G9/2031 , H01G9/2059 , H01L51/0086 , Y02E10/542 , Y02E10/549
摘要： A ruthenium complex having a chemical formula of RuL1L2X is provided. The chemical formula includes a structural formula represented by the following Formula (I): in which, X is a monodentate anion ligand, L1 and L2 respectively represent a heterocyclic tridentate ligand with a structure shown in the following structural formula (II): and a bipyridine ligand derivative with a structure shown in the following structural formula (III): in which R1, R2, R4 and R5 of L1 and L2 are the same or different substituents and represent alkyl, alkoxy, aminoalkyl, haloalkanes or substituted phenyl group, carboxylic acid group or acid radical salt thereof, sulfonic acid group or acid radical salt thereof, phosphoric acid group or acid radical salt thereof or hydrogen atom. R3 represents perhalogenated alkyl group, alkoxy, alkyl, amino, halogens, or hydrogen atom. The ruthenium complexes are suitable for being used as dye-sensitizers for fabricating dye-sensitized solar cells.
摘要翻译：提供化学式为RuL 1 L 2 X的钌络合物。化学式包括由下式（I）表示的结构式：其中X是单齿阴离子配体，L 1和L 2分别表示杂环三齿具有以下结构式（II）所示结构的配体和具有如下结构式（III）所示结构的联吡啶配体衍生物：其中R 1，R 2，，L 1和L 2的R 4和R 5都是相同或不同的取代基和/或代表烷基，烷氧基，氨基烷基，卤代烷基或取代的苯基，羧酸基团或其酸基盐，磺酸基或其酸基盐，磷酸基或其酸基盐或氢原子。 R 3表示全卤代烷基，烷氧基，烷基，氨基，卤素或氢原子。钌配合物适用于染料敏化剂制造染料敏化太阳能电池。

9. 发明授权

US06220771B1 Wafer backside protection apparatus 有权
标题翻译：晶片背面保护装置
公开(公告)号：US06220771B1
公开(公告)日：2001-04-24
申请号：US09461349
申请日：1999-12-15
申请人： Fu-Ching Tung , Hong-Ming Chen , Wu-Lang Lin , Chia-Ming Chen , Jen-Rong Huang , Peter L. Mahneke , Janathan Wang
发明人： Fu-Ching Tung , Hong-Ming Chen , Wu-Lang Lin , Chia-Ming Chen , Jen-Rong Huang , Peter L. Mahneke , Janathan Wang
IPC分类号： G03D500
CPC分类号： H01L21/6708 , G03F7/707 , G03F7/70916 , H01L21/67028
摘要： A wafer backside protection apparatus includes a motor, a vacuum chuck, an annular seat and a top cover. The motor has an output shaft upon which the chuck is mounted. The chuck has a front surface to suck and hold a wafer from its backside. The chuck has a backside in which a water guard ring and a plurality of slant bores are formed. The slant bores run from the water guard ring through the wafer front surface. The annular seat is located below the chuck and has two symmetrical slant nozzles projecting toward motor rotating direction for ejecting protection liquid to the water guard ring. Protection liquid may be spun and splashed out through the slant bores to form a protection liquid film between the chuck and the wafer backside due to centrifugal force resulting from chuck and wafer rotation driven by the motor. The protection liquid film may protect wafer backside from chemical erosion and contamination resulting from wafer production process.
摘要翻译：晶片背面保护装置包括电动机，真空吸盘，环形座和顶盖。马达具有输出轴，卡盘安装在该输出轴上。卡盘具有从其背面吸取并保持晶片的前表面。卡盘具有背面，其中形成有防水环和多个倾斜孔。倾斜的孔从防水环穿过晶片正面。环形座位于卡盘下方，并具有朝向马达旋转方向突出的两个对称倾斜喷嘴，用于将防护液喷射到防水环上。保护液体可以通过倾斜孔旋转溅出，由卡盘和由马达驱动的晶片旋转产生的离心力在卡盘和晶片背面之间形成保护液膜。保护液膜可以保护晶片背面免受晶片生产过程中的化学侵蚀和污染。

10. 发明授权

US08198793B2 Cathode discharge apparatus 有权
标题翻译：阴极放电装置
公开(公告)号：US08198793B2
公开(公告)日：2012-06-12
申请号：US12411797
申请日：2009-03-26
申请人： Fu-Ching Tung , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
发明人： Fu-Ching Tung , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
IPC分类号： H01J17/26
CPC分类号： H01J37/32449 , H01J37/3244
摘要： A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.
摘要翻译：提供阴极放电装置。阴极放电装置包括阳极，阴极和多个阴极室。阴极位于阳极的内部，其中阴极具有多个流动通道和至少一个流动通道孔，并且多个流动通道通过流动通道孔相互连接。多个阴极室位于阴极内，其中每个阴极室具有腔室出口和与至少一个流动通道连接的室入口。

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