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    • 5. 发明授权
    • Double self-aligned metal oxide TFT
    • 双自对准金属氧化物TFT
    • US08435832B2
    • 2013-05-07
    • US13406824
    • 2012-02-28
    • Chan-Long ShiehGang Yu
    • Chan-Long ShiehGang Yu
    • H01L21/00
    • H01L29/7869H01L21/02554H01L21/02565H01L29/42384H01L29/66969H01L29/78621
    • A method of fabricating MOTFTs on transparent substrates includes positioning opaque gate metal on the front surface of a transparent substrate and depositing transparent gate dielectric, transparent metal oxide semiconductor material, and passivation material on the gate metal and the surrounding area. Portions of the passivation material are exposed from the rear surface of the substrate. Exposed portions are removed to define a channel area overlying the gate area. A relatively thick conductive metal material is selectively deposited on the exposed areas of the semiconductor material to form thick metal source/drain contacts. The selective deposition includes either plating or printing and processing a metal paste.
    • 在透明基板上制造MOTFT的方法包括在透明基板的前表面上定位不透明栅极金属,并在栅极金属和周围区域上沉积透明栅极电介质,透明金属氧化物半导体材料和钝化材料。 钝化材料的一部分从基板的后表面露出。 去除暴露部分以限定覆盖栅极区域的沟道区域。 相对厚的导电金属材料被选择性地沉积在半导体材料的暴露区域上以形成厚的金属源极/漏极触点。 选择性沉积包括电镀或印刷和加工金属浆料。
    • 6. 发明申请
    • DOUBLE SELF-ALIGNED METAL OXIDE TFT
    • 双重自对准金属氧化物TFT
    • US20120300147A1
    • 2012-11-29
    • US13366503
    • 2012-02-06
    • Chan-Long ShiehGang Yu
    • Chan-Long ShiehGang Yu
    • G02F1/136
    • H01L29/7869H01L21/02554H01L21/02565H01L27/1225H01L27/1259H01L29/45H01L29/66969H01L29/78606
    • A method of fabricating metal oxide TFTs on transparent substrates includes the steps of positioning an opaque gate metal area on the front surface of the substrate, depositing transparent gate dielectric and transparent metal oxide semiconductor layers overlying the gate metal and a surrounding area, depositing transparent passivation material on the semiconductor material, depositing photoresist on the passivation material, exposing and developing the photoresist to remove exposed portions, etching the passivation material to leave a passivation area defining a channel area, depositing transparent conductive material over the passivation area, depositing photoresist over the conductive material, exposing and developing the photoresist to remove unexposed portions, and etching the conductive material to leave source and drain areas on opposed sides of the channel area.
    • 在透明基板上制造金属氧化物TFT的方法包括以下步骤:在衬底的前表面上定位不透明栅极金属区域,沉积覆盖栅极金属和周围区域的透明栅极电介质和透明金属氧化物半导体层,沉积透明钝化 在所述半导体材料上沉积光致抗蚀剂,在所述钝化材料上沉积光致抗蚀剂,曝光和显影所述光致抗蚀剂以去除暴露部分,蚀刻所述钝化材料以留下限定沟道区的钝化区,在所述钝化区上沉积透明导电材料, 导电材料,曝光和显影光致抗蚀剂以去除未曝光部分,并且蚀刻导电材料以在沟道区域的相对侧上留下源极和漏极区域。
    • 7. 发明授权
    • Self-aligned metal oxide TFT with reduced number of masks
    • 具有减少掩模数量的自对准金属氧化物TFT
    • US08273600B2
    • 2012-09-25
    • US13195882
    • 2011-08-02
    • Chan-Long ShiehGang YuFatt Foong
    • Chan-Long ShiehGang YuFatt Foong
    • H01L21/00
    • H01L29/7869H01L21/02554H01L21/02565
    • A method of fabricating MOTFTs on transparent substrates by positioning opaque gate metal on the substrate front surface and depositing gate dielectric material overlying the gate metal and a surrounding area and metal oxide semiconductor material on the dielectric material. Depositing selectively removable etch stop material on the semiconductor material and photoresist on the etch stop material to define an isolation area in the semiconductor material. Removing uncovered portions of the etch stop. Exposing the photoresist from the substrate rear surface using the gate metal as a mask and removing exposed portions leaving the etch stop material overlying the gate metal covered. Etching the semiconductor material to isolate the TFT. Selectively etching the etch stop layer to leave a portion overlying the gate metal defining a channel area. Depositing and patterning conductive material to form source and drain areas on opposed sides of the channel area.
    • 一种在透明基板上制造MOTFT的方法,该方法是将不透明栅极金属定位在衬底前表面上,并沉积覆盖在栅极金属上的栅介质材料以及介电材料上的周围区域和金属氧化物半导体材料。 在半导体材料和蚀刻停止材料上的光致抗蚀剂上沉积选择性可移除的蚀刻停止材料以限定半导体材料中的隔离区域。 去除蚀刻停止件的未覆盖部分。 使用栅极金属作为掩模从基板后表面露出光致抗蚀剂,并去除暴露部分,留下覆盖栅极金属的蚀刻停止材料。 蚀刻半导体材料以隔离TFT。 选择性地蚀刻蚀刻停止层以留下覆盖栅极金属的部分限定沟道区域。 沉积和图案化导电材料以在通道区域的相对侧上形成源区和漏区。
    • 9. 发明授权
    • Two-terminal switching devices and their methods of fabrication
    • 两端开关器件及其制造方法
    • US08193594B2
    • 2012-06-05
    • US13015013
    • 2011-01-27
    • Gang YuChan-Long ShiehHsing-Chung Lee
    • Gang YuChan-Long ShiehHsing-Chung Lee
    • H01L21/00H01L47/00H01L29/04
    • H01L29/861G02F1/1365G02F1/167H01L29/22H01L29/417H01L29/786H01L45/00H01L51/0035H01L51/0579H01L51/0587
    • Two-terminal switching devices characterized by high on/off current ratios and by high breakdown voltage are provided. These devices can be employed as switches in the driving circuits of active matrix displays, e.g., in electrophoretic, rotating element and liquid crystal displays. The switching devices include two electrodes, and a layer of a broad band semiconducting material residing between the electrodes. According to one example, the cathode comprises a metal having a low work function, the anode comprises an organic material having a p+ or p++ type of conductivity, and the broad band semiconductor comprises a metal oxide. The work function difference between the cathode and the anode material is preferably at least about 0.6 eV. The on/off current ratios of at least 10,000 over a voltage range of about 15 V can be achieved. The devices can be formed, if desired, on flexible polymeric substrates having low melting points.
    • 提供了具有高导通/截止电流比和高击穿电压特性的两端开关器件。 这些器件可以用作有源矩阵显示器的驱动电路中的开关,例如在电泳,旋转元件和液晶显示器中。 开关器件包括两个电极和位于电极之间的宽带半导体材料层。 根据一个示例,阴极包括具有低功函数的金属,阳极包括具有p +或p ++类型的导电性的有机材料,并且宽带半导体包括金属氧化物。 阴极和阳极材料之间的功函数差异优选为至少约0.6eV。 可以实现在约15V的电压范围内的至少10,000的开/关电流比。 如果需要,可以在具有低熔点的柔性聚合物基材上形成装置。
    • 10. 发明申请
    • FULL-COLOR ACTIVE MATRIX ORGANIC LIGHT EMITTING DISPLAY WITH HYBRID
    • 全彩色有源矩阵有机发光显示与混合
    • US20110309389A1
    • 2011-12-22
    • US13170382
    • 2011-06-28
    • Gang YuChan-Long Shieh
    • Gang YuChan-Long Shieh
    • H01L33/08H01L33/00
    • H01L27/322H01L27/3244H01L51/5036
    • A full-color AM OLED includes a transparent substrate, a color filter positioned on an upper surface of the substrate, and a metal oxide thin film transistor backpanel positioned in overlying relationship on the color filter and defining an array of pixels. An array of OLEDs is formed on the backpanel and positioned to emit light downwardly through the backpanel, the color filter, and the substrate in a full-color display. Light emitted by each OLED includes a first emission band with wavelengths extending across the range of two of the primary colors and a second emission band with wavelengths extending across the range of the remaining primary color. The color filter includes for each pixel, two zones separating the first emission band into two separate primary colors and a third zone passing the second emission band.
    • 全色AM OLED包括透明基板,位于基板的上表面上的滤色器和金属氧化物薄膜晶体管背板,其位于滤色器上并且限定像素阵列。 OLED阵列形成在背板上并且定位成以全色显示器向下通过背板,滤色器和基板发光。 由每个OLED发射的光包括第一发射带,其波长在两种原色的范围内延伸,第二发射带具有延伸超过剩余原色范围的波长。 滤色器包括每个像素,将第一发射带分成两个分开的原色的两个区和通过第二发射带的第三区。