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1. 发明申请

US20140139826A1 METHOD AND DEVICE OF MEASURING WAVEFRONT ABERRATION, METHOD OF MANUFACTURING OPTICAL SYSTEM, AND RECORDING MEDIUM 有权
标题翻译：测量波前偏差的方法和装置，制造光学系统的方法和记录介质
公开(公告)号：US20140139826A1
公开(公告)日：2014-05-22
申请号：US14082779
申请日：2013-11-18
申请人： CANON KABUSHIKI KAISHA
发明人： Yasuyuki Unno
IPC分类号： G01M11/02
CPC分类号： G01M11/0257
摘要： A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Optical paths from the positions of the measured spot images toward a light source are calculated, parameters of the test optical system when light rays from the positions of the spot images converge at the light source are specified, and a wavefront aberration of the test optical system corresponding to the parameters of the test optical system is calculated.
摘要翻译：波前像差测量方法通过使通过测试光学系统透射的光入射到小透镜阵列上并测量斑点图像的位置而形成多个斑点图像。计算从所测量的点图像朝向光源的位置的光路，当来自点图像的位置的光线在光源处会聚时，测试光学系统的参数被指定，并且测试光学系统的波前像差对应于测试光学系统的参数进行计算。

2. 发明授权

US09170171B2 Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording medium 有权
标题翻译：测量波前像差的方法和装置，制造光学系统的方法和记录介质
公开(公告)号：US09170171B2
公开(公告)日：2015-10-27
申请号：US14082779
申请日：2013-11-18
申请人： CANON KABUSHIKI KAISHA
发明人： Yasuyuki Unno
IPC分类号： G01B9/00 , G01M11/02
CPC分类号： G01M11/0257
摘要： A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Optical paths from the positions of the measured spot images toward a light source are calculated, parameters of the test optical system when light rays from the positions of the spot images converge at the light source are specified, and a wavefront aberration of the test optical system corresponding to the parameters of the test optical system is calculated.
摘要翻译：波前像差测量方法通过使通过测试光学系统透射的光入射到小透镜阵列上并测量斑点图像的位置而形成多个斑点图像。计算从所测量的点图像朝向光源的位置的光路，当来自点图像的位置的光线在光源处会聚时，测试光学系统的参数被指定，并且测试光学系统的波前像差对应于测试光学系统的参数进行计算。

3. 发明授权

US12098913B2 Detector that detects relative positions of marks while blocking non-interference light 有权
公开(公告)号：US12098913B2
公开(公告)日：2024-09-24
申请号：US17321731
申请日：2021-05-17
申请人： CANON KABUSHIKI KAISHA
发明人： Takamitsu Komaki , Yasuyuki Unno , Tooru Kawashima
IPC分类号： G01B11/14 , G01B9/02001 , G03F7/00
CPC分类号： G01B11/14 , G01B9/02011 , G03F7/0002 , G03F7/0005
摘要： A detector that detects relative positions of a first object and a second object in directions different from each other on a predetermined plane, includes an illumination optical system configured to illuminate a first mark provided on the first object and a second mark provided on the second object, and a detection optical system configured to detect interference light of diffracted lights from the first mark and the second mark illuminated by the illumination optical system. A light intensity distribution is formed, on a pupil plane of the illumination optical system, to illuminate the first mark and the second mark from a direction tilted with respect to a normal of the predetermined plane. A pupil plane of the detection optical system allows the interference light to pass through and block at least a part light other than the interference light.

4. 发明授权

US10777440B2 Detection device, imprint apparatus, planarization device, detection method, and article manufacturing method 有权
公开(公告)号：US10777440B2
公开(公告)日：2020-09-15
申请号：US16422701
申请日：2019-05-24
申请人： CANON KABUSHIKI KAISHA
发明人： Toshiki Iwai , Takamitsu Komaki , Yasuyuki Unno , Nozomu Hayashi
IPC分类号： G02B27/42 , H01L21/68 , G01D5/26
摘要： A detection device includes an illumination optical system and a detection optical system. The illumination optical system is configured to illuminate a first diffraction grating having a first period in a first direction and a second diffraction grating having a second period different from the first period. The detection optical system is configured to detect light diffracted by the first and second diffraction gratings. The illumination optical system includes an optical member configured to form, on a pupil plane, a first pole and a second pole opposite to the first pole. The illumination optical system causes lights from the first and second poles to obliquely enter the first and second diffraction gratings from the first direction to illuminate the first and second diffraction gratings. The detection optical system detects diffracted light diffracted by one of the first and second diffraction gratings and by an other diffraction grating.

5. 发明申请

US20190371642A1 DETECTION DEVICE, IMPRINT APPARATUS, PLANARIZATION DEVICE, DETECTION METHOD, AND ARTICLE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20190371642A1
公开(公告)日：2019-12-05
申请号：US16422701
申请日：2019-05-24
申请人： CANON KABUSHIKI KAISHA
发明人： Toshiki Iwai , Takamitsu Komaki , Yasuyuki Unno , Nozomu Hayashi
IPC分类号： H01L21/68 , G01D5/26 , G02B27/42
摘要： A detection device includes an illumination optical system and a detection optical system. The illumination optical system is configured to illuminate a first diffraction grating having a first period in a first direction and a second diffraction grating having a second period different from the first period. The detection optical system is configured to detect light diffracted by the first and second diffraction gratings. The illumination optical system includes an optical member configured to form, on a pupil plane, a first pole and a second pole opposite to the first pole. The illumination optical system causes lights from the first and second poles to obliquely enter the first and second diffraction gratings from the first direction to illuminate the first and second diffraction gratings. The detection optical system detects diffracted light diffracted by one of the first and second diffraction gratings and by an other diffraction grating.

6. 发明授权

US09347853B2 Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording medium 有权
标题翻译：测量波前像差的方法和装置，制造光学系统的方法和记录介质
公开(公告)号：US09347853B2
公开(公告)日：2016-05-24
申请号：US14081548
申请日：2013-11-15
申请人： CANON KABUSHIKI KAISHA
发明人： Yasuyuki Unno
IPC分类号： G01M11/02
CPC分类号： G01M11/0257 , G01M11/0242
摘要： A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Based on the measured positions of the spot images, a wavefront aberration of the test optical system is calculated. When the positions of the spot images are measured, at least one lenslet forming the lenslet array is shielded from light, and the spot images are measured.
摘要翻译：波前像差测量方法通过使通过测试光学系统透射的光入射到小透镜阵列上并测量斑点图像的位置而形成多个斑点图像。基于点图像的测量位置，计算测试光学系统的波前像差。当测量点图像的位置时，形成小透镜阵列的至少一个小透镜被遮光，并且测量光点图像。

7. 发明申请

US20220236650A1 DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD 有权
公开(公告)号：US20220236650A1
公开(公告)日：2022-07-28
申请号：US17577677
申请日：2022-01-18
申请人： CANON KABUSHIKI KAISHA
发明人： Ryo Nakayama , Yasuyuki Unno , Takahiro Matsumoto , Takafumi Miyaharu , Tooru Kawashima
IPC分类号： G03F7/20
摘要： A detection apparatus that detects a position deviation between an original and a substrate is provided. The apparatus includes an illumination optical system configured to illuminate a first diffraction grating arranged on the original and a second diffraction grating arranged on the substrate, and a detection optical system configured to detect interference light formed by diffracted light diffracted by the first diffraction grating and diffracted light diffracted by the second diffraction grating. The illumination optical system performs dipole illumination by light including two poles in a pupil plane of the illumination optical system, and polarization directions of light beams emitted from the two poles, respectively, and incident on the substrate are orthogonal to each other.

8. 发明申请

US20210372776A1 DETECTOR, IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 有权
公开(公告)号：US20210372776A1
公开(公告)日：2021-12-02
申请号：US17321731
申请日：2021-05-17
申请人： CANON KABUSHIKI KAISHA
发明人： Takamitsu Komaki , Yasuyuki Unno , Tooru Kawashima
IPC分类号： G01B11/14 , G03F7/00 , G01B9/02
摘要： A detector that detects relative positions of a first object and a second object in directions different from each other on a predetermined plane, includes an illumination optical system configured to illuminate a first mark provided on the first object and a second mark provided on the second object, and a detection optical system configured to detect interference light of diffracted lights from the first mark and the second mark illuminated by the illumination optical system. A light intensity distribution is formed, on a pupil plane of the illumination optical system, to illuminate the first mark and the second mark from a direction tilted with respect to a normal of the predetermined plane. A pupil plane of the detection optical system allows the interference light to pass through and block at least a part light other than the interference light.

9. 发明申请

US20150130922A1 OBJECTIVE OPTICAL SYSTEM AND IMAGE ACQUISITION APPARATUS 审中-公开
标题翻译：目标光学系统和图像采集设备
公开(公告)号：US20150130922A1
公开(公告)日：2015-05-14
申请号：US14533261
申请日：2014-11-05
申请人： CANON KABUSHIKI KAISHA
发明人： Kazumasa Tanaka , Yasuyuki Unno
IPC分类号： G02B21/36
CPC分类号： G02B21/361
摘要： The objective optical system includes a first optical system configured to collimate a divergent light flux from an object, a second optical system configured to converge the light flux from the first optical system, a beam splitter disposed between the first optical system and the second optical system, a reflector disposed on a side where the light flux from the second optical system is condensed and configured to reflect the light flux, and a third optical system configured to converge the light flux reflected by the reflector and then passing through the second optical system and the beam splitter. When a direction in which the light flux travels in the objective optical system is defined as an optical axis direction, positions of respective portions of the reflector in the optician axis direction are each changeable.
摘要翻译：物镜光学系统包括：第一光学系统，被配置为准直来自物体的发散光束;第二光学系统，被配置为会聚来自第一光学系统的光束;分束器，设置在第一光学系统和第二光学系统之间设置在来自第二光学系统的光束被冷凝并被配置为反射光束的一侧的反射器;以及第三光学系统，被配置为会聚由反射器反射的光束，然后通过第二光学系统，分束器。当物镜光学系统中光束行进的方向被定义为光轴方向时，反射器在眼镜轴方向上各部分的位置各自是可变的。

10. 发明申请

US20140139825A1 METHOD AND DEVICE OF MEASURING WAVEFRONT ABERRATION, METHOD OF MANUFACTURING OPTICAL SYSTEM, AND RECORDING MEDIUM 有权
标题翻译：测量波前偏差的方法和装置，制造光学系统的方法和记录介质
公开(公告)号：US20140139825A1
公开(公告)日：2014-05-22
申请号：US14081548
申请日：2013-11-15
申请人： CANON KABUSHIKI KAISHA
发明人： Yasuyuki Unno
IPC分类号： G01M11/02
CPC分类号： G01M11/0257 , G01M11/0242
摘要： A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Based on the measured positions of the spot images, a wavefront aberration of the test optical system is calculated. When the positions of the spot images are measured, at least one lenslet forming the lenslet array is shielded from light, and the spot images are measured.
摘要翻译：波前像差测量方法通过使通过测试光学系统透射的光入射到小透镜阵列上并测量斑点图像的位置而形成多个斑点图像。基于点图像的测量位置，计算测试光学系统的波前像差。当测量点图像的位置时，形成小透镜阵列的至少一个小透镜被遮光，并且测量光点图像。

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