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1. 发明申请

US20210372776A1 DETECTOR, IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 有权
公开(公告)号：US20210372776A1
公开(公告)日：2021-12-02
申请号：US17321731
申请日：2021-05-17
申请人： CANON KABUSHIKI KAISHA
发明人： Takamitsu Komaki , Yasuyuki Unno , Tooru Kawashima
IPC分类号： G01B11/14 , G03F7/00 , G01B9/02
摘要： A detector that detects relative positions of a first object and a second object in directions different from each other on a predetermined plane, includes an illumination optical system configured to illuminate a first mark provided on the first object and a second mark provided on the second object, and a detection optical system configured to detect interference light of diffracted lights from the first mark and the second mark illuminated by the illumination optical system. A light intensity distribution is formed, on a pupil plane of the illumination optical system, to illuminate the first mark and the second mark from a direction tilted with respect to a normal of the predetermined plane. A pupil plane of the detection optical system allows the interference light to pass through and block at least a part light other than the interference light.

2. 发明授权

US11181363B2 Measurement device, imprint apparatus, method for manufacturing product, light amount determination method, and light amount adjustment method 有权
公开(公告)号：US11181363B2
公开(公告)日：2021-11-23
申请号：US15491723
申请日：2017-04-19
申请人： CANON KABUSHIKI KAISHA
发明人： Kenji Yaegashi , Toshiki Iwai , Takamitsu Komaki
IPC分类号： G01B11/27 , G02B27/60 , G03F9/00 , G02B27/32
摘要： A measurement device for measuring a relative position between alignment marks includes an illumination unit capable of illuminating the alignment marks at a plurality of wavelengths, a detection unit that detects light from the alignment marks, a processing unit that obtain the relative position between the alignment marks, and an adjustment unit that adjusts a relative amount between light amounts of the plurality of wavelengths so that a relative value between detection light amounts of light from the alignment marks falls within a predetermined range.

3. 发明申请

US20190250525A1 DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 审中-公开
公开(公告)号：US20190250525A1
公开(公告)日：2019-08-15
申请号：US16270889
申请日：2019-02-08
申请人： CANON KABUSHIKI KAISHA
发明人： Takamitsu Komaki , Takashi Shibayama
IPC分类号： G03F9/00 , G03F7/00
摘要： The present invention provides a detection apparatus for detecting a plurality of marks provided on a substrate, comprising: an optical system; an illumination unit configured to selectively illuminate the plurality of marks with a plurality of light beams via the optical system such that each of the plurality of marks is illuminated with at least one light beam; and an image capturing device configured to capture an image of the plurality of marks via the optical system, wherein the illumination unit includes a change unit configured to individually change an incident angle of each of the plurality of light beams on a pupil plane of the optical system, thereby changing an irradiated position of each of the plurality of light beams on the substrate.

4. 发明申请

US20210263432A1 POSITION MEASUREMENT APPARATUS, OVERLAY INSPECTION APPARATUS, POSITION MEASUREMENT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD 有权
公开(公告)号：US20210263432A1
公开(公告)日：2021-08-26
申请号：US17152362
申请日：2021-01-19
申请人： CANON KABUSHIKI KAISHA
发明人： Toshiki Iwai , Takamitsu Komaki , Tomokazu Taki
IPC分类号： G03F9/00 , G03F7/20
摘要： Provided is a position measurement apparatus in which a measurement error in a target is reduced.
A position measurement apparatus measuring a position of a target includes an illumination unit configured to illuminate the target with illumination light including light of a first wavelength and light of a second wavelength different from the first wavelength, a measurement unit configured to measure the position of the target by detecting light from the target illuminated with the illumination light, and a control unit configured to adjust a ratio of a light intensity of the first wavelength to a light intensity of the second wavelength such that a measurement error varying depending on the position of the target in the measurement unit is reduced.

5. 发明申请

US20190285996A1 ALIGNMENT APPARATUS, ALIGNMENT METHOD, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 审中-公开
公开(公告)号：US20190285996A1
公开(公告)日：2019-09-19
申请号：US16433051
申请日：2019-06-06
申请人： CANON KABUSHIKI KAISHA
发明人： Takashi Shibayama , Takamitsu Komaki
IPC分类号： G03F9/00 , G01B11/27 , B29C43/04 , B29C43/58 , G03F7/00
摘要： In an alignment apparatus, a measurement device includes an illuminator that illuminates a first original-side mark and a second original-side mark arranged in an original and a first substrate-side mark and second substrate-side mark arranged in a substrate. The measurement device performs coarse measurement based on light beams from the first original-side mark and the first substrate-side mark by causing the illuminator to illuminate the first original-side mark and the first substrate-side mark under a first condition, and performs fine measurement based on light beams from the second original-side mark and the second substrate-side mark by causing the illuminator to illuminate the second original-side mark and the second substrate-side mark under a second condition.

6. 发明申请

US20170307367A1 MEASUREMENT DEVICE, IMPRINT APPARATUS, METHOD FOR MANUFACTURING PRODUCT, LIGHT AMOUNT DETERMINATION METHOD, AND LIGHT AMOUNT ADJUSTMENT METHOD 审中-公开
公开(公告)号：US20170307367A1
公开(公告)日：2017-10-26
申请号：US15491723
申请日：2017-04-19
申请人： CANON KABUSHIKI KAISHA
发明人： Kenji Yaegashi , Toshiki Iwai , Takamitsu Komaki
IPC分类号： G01B11/27 , G02B27/60 , G03F9/00
CPC分类号： G01B11/272 , G02B27/32 , G02B27/60 , G03F9/7042 , G03F9/7088
摘要： A measurement device for measuring a relative position between alignment marks includes an illumination unit capable of illuminating the alignment marks at a plurality of wavelengths, a detection unit that detects light from the alignment marks, a processing unit that obtain the relative position between the alignment marks, and an adjustment unit that adjusts a relative amount between light amounts of the plurality of wavelengths so that a relative value between detection light amounts of light from the alignment marks falls within a predetermined range.

7. 发明授权

US11372342B2 Position measurement apparatus, overlay inspection apparatus, position measurement method, imprint apparatus, and article manufacturing method 有权
公开(公告)号：US11372342B2
公开(公告)日：2022-06-28
申请号：US17152362
申请日：2021-01-19
申请人： CANON KABUSHIKI KAISHA
发明人： Toshiki Iwai , Takamitsu Komaki , Tomokazu Taki
IPC分类号： G03F9/00 , G03F7/20
摘要： Provided is a position measurement apparatus in which a measurement error in a target is reduced.
A position measurement apparatus measuring a position of a target includes an illumination unit configured to illuminate the target with illumination light including light of a first wavelength and light of a second wavelength different from the first wavelength, a measurement unit configured to measure the position of the target by detecting light from the target illuminated with the illumination light, and a control unit configured to adjust a ratio of a light intensity of the first wavelength to a light intensity of the second wavelength such that a measurement error varying depending on the position of the target in the measurement unit is reduced.

8. 发明申请

US20200376739A1 IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20200376739A1
公开(公告)日：2020-12-03
申请号：US16880160
申请日：2020-05-21
申请人： CANON KABUSHIKI KAISHA
发明人： Kenji Yaegashi , Takamitsu Komaki
IPC分类号： B29C59/02 , B29C33/42 , B29C33/12 , B29C35/08
摘要： An imprint apparatus brings an imprint material on a substrate including a first mark into contact with a mold including a second mark and cures the imprint material, thereby forming a cured product of the imprint material on the substrate. The apparatus includes a plurality of detectors used for alignment detection, and a controller configured to obtain a plurality of pieces of relative position information by detecting a relative position between the first mark and the second mark a plurality of times using the plurality of detectors in a state in which the imprint material is cured and a positional relationship between the substrate and the mold is maintained, and to calibrate, based on the plurality of pieces of relative position information, a plurality of detection processing operations each performed using each of the plurality of detectors.

9. 发明申请

US20160299444A1 IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD 审中-公开
标题翻译：印刷装置和制品制造方法
公开(公告)号：US20160299444A1
公开(公告)日：2016-10-13
申请号：US15091096
申请日：2016-04-05
申请人： CANON KABUSHIKI KAISHA
发明人： Takamitsu Komaki , Yoshiyuki Usui , Nozomu Hayashi
IPC分类号： G03F9/00 , G03F7/00
摘要： An imprint apparatus for forming a pattern on an imprinting material includes an alignment unit that detects a mold-side mark formed on a mold and a substrate-side mark formed on the substrate, forming a mark pair, and aligns the mold and the substrate on the basis of a detection result. The alignment unit obtains, by using the detection result of a first mark pair and the detection result of a second mark pair, which is different from the first mark pair, positional deviation information of the first mark pair and positional deviation information of the second mark pair in the same direction; obtains a determination value by using the positional deviation information of the first mark pair and the positional deviation information of second mark pair; and determines that mark detection is abnormal when the determination value is not in an allowable range.
摘要翻译：用于在压印材料上形成图案的压印装置包括对准单元，其检测形成在模具上的模具侧标记和形成在基板上的基板侧标记，形成标记对，并将模具和基板对准检测结果的基础。对准单元通过使用与第一标记对不同的第一标记对的检测结果和第二标记对的检测结果，获得第一标记对的位置偏差信息和第二标记的位置偏差信息配对在同一个方向; 通过使用第一标记对的位置偏差信息和第二标记对的位置偏差信息来获得确定值; 并且当确定值不在允许范围内时，确定标记检测异常。

10. 发明授权

US12098913B2 Detector that detects relative positions of marks while blocking non-interference light 有权
公开(公告)号：US12098913B2
公开(公告)日：2024-09-24
申请号：US17321731
申请日：2021-05-17
申请人： CANON KABUSHIKI KAISHA
发明人： Takamitsu Komaki , Yasuyuki Unno , Tooru Kawashima
IPC分类号： G01B11/14 , G01B9/02001 , G03F7/00
CPC分类号： G01B11/14 , G01B9/02011 , G03F7/0002 , G03F7/0005
摘要： A detector that detects relative positions of a first object and a second object in directions different from each other on a predetermined plane, includes an illumination optical system configured to illuminate a first mark provided on the first object and a second mark provided on the second object, and a detection optical system configured to detect interference light of diffracted lights from the first mark and the second mark illuminated by the illumination optical system. A light intensity distribution is formed, on a pupil plane of the illumination optical system, to illuminate the first mark and the second mark from a direction tilted with respect to a normal of the predetermined plane. A pupil plane of the detection optical system allows the interference light to pass through and block at least a part light other than the interference light.

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