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    • 3. 发明授权
    • Liquid crystal display device and fabricating method thereof
    • 液晶显示装置及其制造方法
    • US08189162B2
    • 2012-05-29
    • US12789067
    • 2010-05-27
    • Byung Chul AhnByoung Ho LimJae Jun Ahn
    • Byung Chul AhnByoung Ho LimJae Jun Ahn
    • G02F1/1343G02F1/1345
    • G02F1/134363G02F1/1368G02F2001/136231G02F2001/136236
    • Disclosed is a thin film transistor substrate for a fringe filed switching type liquid crystal display device, and a fabrication method thereof, that reduces the number of required mask processes, and thus improves fabrication efficiency. The fabrication method involves three mask processes, wherein the masks are partial transmitting masks, and the resulting photo-resist patterns have varying thicknesses. By having photo-resist layers of varying thicknesses, structures can be formed in multiple etching steps using the same photo-resist pattern by incrementally removing the photo-resist according to its thickness. The thin film transistor substrate has a common line, a common electrode, a gate line and a gate electrode formed directly on the substrate. The common electrode overlaps the pixel electrode in the pixel area.
    • 公开了一种用于边缘场开关型液晶显示装置的薄膜晶体管基板及其制造方法,其减少了所需的掩模处理次数,从而提高了制造效率。 制造方法涉及三个掩模工艺,其中掩模是部分透射掩模,并且所得光刻胶图案具有变化的厚度。 通过具有不同厚度的光致抗蚀剂层,可以通过使用相同光刻胶图案的多个蚀刻步骤,通过根据其厚度逐渐去除光致抗蚀剂来形成结构。 薄膜晶体管基板具有直接形成在基板上的公共线,公共电极,栅极线和栅电极。 公共电极与像素区域中的像素电极重叠。
    • 4. 发明授权
    • Liquid crystal display device and fabricating method thereof
    • 液晶显示装置及其制造方法
    • US07999906B2
    • 2011-08-16
    • US12585845
    • 2009-09-25
    • Byung Chul AhnByoung Ho LimJae Jun Ahn
    • Byung Chul AhnByoung Ho LimJae Jun Ahn
    • G02F1/13G02F1/136G02F1/1345
    • G02F1/1368G02F1/13458G02F2001/136236
    • A liquid crystal display device, including: first and second substrates; a gate line on the first substrate; a data line crossing the gate line having a gate insulating film therebetween to define a pixel area; a pixel electrode formed of a transparent conductive film in a pixel hole passing through the gate insulating film in the pixel area; and a thin film transistor including a gate electrode, a source electrode, a drain electrode, and a semiconductor layer defining a channel between the source electrode and the drain electrode, wherein the semiconductor layer overlaps with a source and drain metal pattern including the data line, the source electrode and the drain electrode; and wherein the drain electrode protrudes from the semiconductor layer toward inside of the pixel electrode to be connected to the pixel electrode.
    • 一种液晶显示装置,包括:第一和第二基板; 第一基板上的栅极线; 与栅极线交叉的数据线,其间具有栅极绝缘膜,以限定像素区域; 在通过像素区域中的栅极绝缘膜的像素孔中由透明导电膜形成的像素电极; 以及薄膜晶体管,其包括栅电极,源电极,漏电极和限定在所述源电极和所述漏电极之间的沟道的半导体层,其中所述半导体层与包括所述数据线的源极和漏极金属图案重叠 源电极和漏电极; 并且其中所述漏电极从所述半导体层突出到所述像素电极的内部以连接到所述像素电极。
    • 8. 发明授权
    • Liquid crystal display of horizontal electric field applying type and fabricating method thereof
    • 水平电场施加型液晶显示器及其制造方法
    • US07132689B2
    • 2006-11-07
    • US10815843
    • 2004-04-02
    • Byung Chul AhnByoung Ho Lim
    • Byung Chul AhnByoung Ho Lim
    • H01L29/04H01L31/036
    • G02F1/13458G02F1/134363G02F2001/136236H01L27/124H01L27/1288
    • A liquid crystal display having an applied horizontal electric field comprising: a gate line; a common line substantially parallel to the gate line; a data line arranged to cross the gate line and the common line to define a pixel area; a thin film transistor formed at each crossing of the gate line and the data line; a common electrode formed in the pixel area and connected to the common line; a pixel electrode connected to the thin film transistor, wherein the horizontal electric field is formed between the pixel electrode and the common electrode in the pixel area; a gate pad formed with at least one conductive layer included in the gate line; a data pad formed with at least one conductive layer included in the data line; a common pad formed with at least one conductive layer included in the common line; a passivation film to expose at least one of the gate pad, the data pad and the common pad; and a driving integrated circuit mounted on a substrate to connect directly to one of the gate pad and the data pad.
    • 一种具有施加的水平电场的液晶显示器,包括:栅极线; 基本上平行于栅极线的公共线; 布置成跨越所述栅极线和所述公共线以限定像素区域的数据线; 形成在栅极线和数据线的每个交叉处的薄膜晶体管; 在像素区域中形成并连接到公共线的公共电极; 连接到所述薄膜晶体管的像素电极,其中在像素区域中的像素电极和公共电极之间形成水平电场; 栅极焊盘,其形成有包括在栅极线中的至少一个导电层; 数据焊盘,其形成有包括在所述数据线中的至少一个导电层; 公共焊盘,其形成有包括在所述公共线中的至少一个导电层; 钝化膜以暴露所述栅极焊盘,所述数据焊盘和所述公共焊盘中的至少一个; 以及安装在基板上以直接连接到所述栅极焊盘和所述数据焊盘之一的驱动集成电路。
    • 9. 发明授权
    • Liquid crystal display device and method for manufacturing the same
    • 液晶显示装置及其制造方法
    • US06987548B2
    • 2006-01-17
    • US10662436
    • 2003-09-16
    • Byoung Ho LimSoon Sung YooDong Yeung KwakJae Gu Lee
    • Byoung Ho LimSoon Sung YooDong Yeung KwakJae Gu Lee
    • G02F1/1335G02F1/1343
    • G02F1/1368G02F1/133516G02F1/136209G02F2001/136222G02F2001/136231
    • A liquid crystal display (LCD) device and method for manufacturing the same in which a plurality of patterns are formed on one substrate reduces the manufacturing cost and simplifies the process steps by minimizing the number of masks required to form the patterns. The LCD device includes first and second substrates, a thin film transistor (TFT) formed in a predetermined region on the first substrate, a pixel electrode formed in a pixel region on the first substrate, a color filter layer formed on the pixel electrode, a black matrix pattern formed in a region other than the pixel electrode, and a liquid crystal layer formed between the first and second substrates. The method for manufacturing the LCD device having a pixel region defined by gate and data lines, includes the steps of forming a TFT on a first substrate, forming a black matrix pattern in a region other than the pixel region, forming a pixel electrode in the pixel region, and forming a color filter layer on the pixel electrode.
    • 在一个基板上形成多个图案的液晶显示器(LCD)装置及其制造方法减少了制造成本,并且通过最小化形成图案所需的掩模的数量来简化处理步骤。 LCD装置包括第一和第二基板,形成在第一基板上的预定区域中的薄膜晶体管(TFT),形成在第一基板上的像素区域中的像素电极,形成在像素电极上的滤色器层, 形成在除了像素电极之外的区域中的黑色矩阵图案,以及形成在第一和第二基板之间的液晶层。 制造具有由栅极和数据线限定的像素区域的LCD器件的方法包括以下步骤:在第一衬底上形成TFT,在除了像素区域之外的区域中形成黑矩阵图案,形成像素电极 像素区域,并且在像素电极上形成滤色器层。
    • 10. 发明授权
    • X-ray detecting device and fabricating method thereof
    • X射线检测装置及其制造方法
    • US06570161B2
    • 2003-05-27
    • US09749671
    • 2000-12-28
    • Myung Ho YouByoung Ho Lim
    • Myung Ho YouByoung Ho Lim
    • H01L2500
    • H01L27/14658
    • An X-ray detecting device and a fabricating method thereof capable of preventing a short between a lower electrode of a capacitor and a data line are presented. In the device, a data line insulating layer is formed to cover the data line and a gate line. The gate line is exposed through a contact hole defined in the data line insulating. Then a lower electrode is formed on the data line insulating layer and is electrically connected to the gate line via the contact hole. Subsequently, an upper electrode is formed to complete the device. The data line insulating layer prevents a short between the data line and the lower electrode when residual conductive materials are formed when the lower electrode is formed.
    • 提出了能够防止电容器的下部电极与数据线之间短路的X射线检测装置及其制造方法。 在该器件中,形成数据线绝缘层以覆盖数据线和栅极线。 栅极线通过数据线绝缘中限定的接触孔露出。 然后在数据线绝缘层上形成下电极,并通过接触孔与栅极线电连接。 随后,形成上电极以完成该装置。 当形成下电极时,当残留的导电材料形成时,数据线绝缘层防止数据线和下电极之间的短路。