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1. 发明授权

US06911234B2 Chemical vapor deposition apparatus and method 有权
标题翻译：化学气相沉积装置及方法
公开(公告)号：US06911234B2
公开(公告)日：2005-06-28
申请号：US10852079
申请日：2004-05-24
申请人： Bruce M. Warnes , Andrew L. Purvis , Daniel L. Near
发明人： Bruce M. Warnes , Andrew L. Purvis , Daniel L. Near
IPC分类号： C23C16/44 , C23C16/448 , C23C16/455 , C23C16/08
CPC分类号： C23C16/4557 , C23C16/4488
摘要： Chemical vapor deposition apparatus and method are provided with coating gas distribution and exhaust systems that provide more uniform coating gas temperature and coating gas flow distribution among a plurality of distinct coating zones disposed along the length of a coating chamber.
摘要翻译：化学气相沉积装置和方法设置有涂层气体分布和排气系统，其在沿着涂覆室的长度设置的多个不同的涂层区域之间提供更均匀的涂覆气体温度和涂覆气体流量分布。

2. 发明授权

US06793966B2 Chemical vapor deposition apparatus and method 有权
标题翻译：化学气相沉积装置及方法
公开(公告)号：US06793966B2
公开(公告)日：2004-09-21
申请号：US09950013
申请日：2001-09-10
申请人： Bruce M. Warnes , Andrew L. Purvis , Daniel L. Near
发明人： Bruce M. Warnes , Andrew L. Purvis , Daniel L. Near
IPC分类号： C23C1608
CPC分类号： C23C16/4557 , C23C16/4488
摘要： Chemical vapor deposition apparatus and method are provided with external metal halide gas generators that reduce leakage of air into the generators so as to improve efficiency of use of the metal charge residing in each generator.
摘要翻译：化学气相沉积装置和方法设置有外部金属卤化物气体发生器，其减少空气向发生器的泄漏，以提高驻留在每个发电机中的金属电荷的使用效率。

3. 发明授权

US06849132B2 CVD codeposition of A1 and one or more reactive (gettering) elements to form protective aluminide coating 有权
标题翻译： A1和一种或多种反应性（吸气）元素的CVD共沉积形成保护性铝化物涂层
公开(公告)号：US06849132B2
公开(公告)日：2005-02-01
申请号：US10645292
申请日：2003-08-20
申请人： Bruce M. Warnes , David C. Punola , Jeffery S. Smith , Daniel L. Near
发明人： Bruce M. Warnes , David C. Punola , Jeffery S. Smith , Daniel L. Near
IPC分类号： C23C10/14 , C23C16/08 , C23C16/448 , C23C10/28
CPC分类号： C23C16/08 , C23C10/14 , C23C16/4488 , Y10T428/12493 , Y10T428/12736 , Y10T428/1275 , Y10T428/12944
摘要： CVD aluminide coatings including a small concentration of a reactive, gettering element for surface active impurities dispersed therein are formed for improved oxidation resistance. The aluminide coatings are formed by CVD codeposition of Al and the gettering element on the substrate using coating gases for the gettering element generated either outside or inside the coating retort depending on the chlorination temperature needed for the particular gettering element.
摘要翻译：形成包含少量浓度的分散于其中的表面活性杂质的反应性吸杂元素的CVD铝化物涂层，以提高耐氧化性。铝化物涂层通过使用涂覆气体的Al和通过CVD覆盖在基底上的吸气元件形成，所述吸附元件根据特定吸气元件所需的氯化温度在涂层蒸馏器的外部或内部产生。

4. 发明授权

US06689422B1 CVD codeposition of A1 and one or more reactive (gettering) elements to form protective aluminide coating 失效
标题翻译： A1和一种或多种反应性（吸气）元素的CVD共沉积形成保护性铝化物涂层
公开(公告)号：US06689422B1
公开(公告)日：2004-02-10
申请号：US08197497
申请日：1994-02-16
申请人： Bruce M. Warnes , David C. Punola , Jeffery S. Smith , Daniel L. Near
发明人： Bruce M. Warnes , David C. Punola , Jeffery S. Smith , Daniel L. Near
IPC分类号： C23C1600
CPC分类号： C23C16/08 , C23C10/14 , C23C16/4488 , Y10T428/12493 , Y10T428/12736 , Y10T428/1275 , Y10T428/12944
摘要： CVD aluminide coatings including a small concentration of a reactive, gettering element for surface active impurities dispersed therein are formed for improved oxidation resistance. The aluminide coatings are formed by CVD codeposition of Al and the gettering element on the substrate using coating gases for the gettering element generated either outside or inside the coating retort depending on the chlorination temperature needed for the particular gettering element.
摘要翻译：形成包含少量浓度的分散于其中的表面活性杂质的反应性吸杂元素的CVD铝化物涂层，以提高耐氧化性。铝化物涂层通过使用涂覆气体的Al和通过CVD覆盖在基底上的吸气元件形成，所述吸附元件根据特定吸气元件所需的氯化温度在涂层蒸馏器的外部或内部产生。

5. 发明授权

US5989733A Active element modified platinum aluminide diffusion coating and CVD coating method 失效
标题翻译：活性元素改性的铂铝化物扩散涂层和CVD涂层法
公开(公告)号：US5989733A
公开(公告)日：1999-11-23
申请号：US685380
申请日：1996-07-23
申请人： Bruce M. Warnes , Daniel L. Near , David C. Punola , William C. Basta
发明人： Bruce M. Warnes , Daniel L. Near , David C. Punola , William C. Basta
IPC分类号： C23C10/28 , C23C10/02 , C23C10/08 , C23C14/14 , C23C16/06 , C23C16/08 , C23C26/00 , C23C28/00 , B32B15/00
CPC分类号： C23C28/321 , C23C10/02 , C23C10/28 , C23C16/08 , C23C28/325 , C23C28/345 , C23C28/3455 , Y02T50/67 , Y10S428/938 , Y10T428/1275 , Y10T428/12875 , Y10T428/12931
摘要： A CVD outwardly grown platinum aluminide diffusion coating on a nickel or cobalt base superalloy substrate wherein the platinum modified aluminide diffusion coating is modified to include silicon, hafnium, and optionally zirconium and/or other active elements (e.g. Ce, La, Y, etc.) each in a concentration of about 0.01 weight % to about 8 weight % of the outer additive (Ni,Pt)(Al,Si) layer of the coating. A particular coating includes about 0.01 weight % to less than 2 weight % of each of silicon, hafnium, and zirconium in the outer additive layer, preferably with a Hf/Si ratio less than about 1 and, when Zr also is present, a Hf+Zr/Si ratio of less than about 1. A coating microstructure is provided characterized by an inner diffusion zone or region adjacent the substrate and the outer additive (Ni,Pt)(Al,Si) layer including hafnium silicide second phase particles or regions dispersed throughout the outer additive layer of the coating.
摘要翻译：在镍或钴基超级合金基材上CVD外延生长的铂铝化物扩散涂层，其中铂改性的铝化物扩散涂层被修饰为包括硅，铪和任选的锆和/或其它活性元素（例如Ce，La，Y等）），其浓度为涂层的外添加剂（Ni，Pt）（Al，Si）层的约0.01重量％至约8重量％。特别的涂层在外添加层中包含约0.01重量％至小于2重量％的硅，铪和锆，优选Hf / Si比小于约1，当Zr也存在时，Hf + Zr / Si比小于约1.提供一种涂层微观结构，其特征在于与衬底相邻的内扩散区或区域，以及包括硅化铪第二相颗粒或区域的外添加剂（Ni，Pt）（Al，Si）分散在涂层的外部添加剂层中。

6. 发明授权

US6143361A Method of reacting excess CVD gas reactant 失效
标题翻译：反应过量CVD气体反应物的方法
公开(公告)号：US6143361A
公开(公告)日：2000-11-07
申请号：US175067
申请日：1998-10-19
申请人： Daniel L. Near , Bruce M. Warnes , Stephen M. Winters
发明人： Daniel L. Near , Bruce M. Warnes , Stephen M. Winters
IPC分类号： C23C16/44 , H01L21/285 , C23C16/08
CPC分类号： C23C16/4412
摘要： Method and apparatus for controlling deposition from excess gaseous reactant in an exhaust conduit of a chemical vapor deposition apparatus involves introducing a gaseous chemical reactant in the exhaust stream effective to react with the excess gaseous reactant in the exhaust stream to form solid reaction product particulates in a manner that reduces harmful deposition of liquid and/or solid metal in the exhaust system.
摘要翻译：用于控制化学气相沉积设备的排气管道中过量气态反应物的沉积的方法和装置包括在排气流中引入气态化学反应物，其有效地与废气流中的过量气态反应物反应，形成固体反应产物颗粒物减少排气系统中液体和/或固体金属的有害沉积的方式。

7. 发明授权

US06291014B1 Active element modified platinum aluminide diffusion coating and CVD coating method 有权
标题翻译：活性元素改性的铂铝化物扩散涂层和CVD涂层法
公开(公告)号：US06291014B1
公开(公告)日：2001-09-18
申请号：US09392766
申请日：1999-09-07
申请人： Bruce M. Warnes , Daniel L. Near , David C. Punola , William C. Basta
发明人： Bruce M. Warnes , Daniel L. Near , David C. Punola , William C. Basta
IPC分类号： C23C1608
CPC分类号： C23C28/321 , C23C10/02 , C23C10/28 , C23C16/08 , C23C28/325 , C23C28/345 , C23C28/3455 , Y02T50/67 , Y10S428/938 , Y10T428/1275 , Y10T428/12875 , Y10T428/12931
摘要： A CVD outwardly grown platinum aluminide diffusion coating on a nickel or cobalt base superalloy substrate wherein the platinum modified aluminide diffusion coating is modified to include silicon, hafnium, and optionally zirconium and/or other active elements (e.g. Ce, La, Y, etc.) each in a concentration of about 0.01 weight % to about 8 weight % of the outer additive (Ni,Pt)(Al,Si) layer of the coating. A particular coating includes about 0.01 weight % to less than 2 weight % of each of silicon, hafnium, and zirconium in the outer additive layer, preferably with a Hf/Si ratio less than about 1 and, when Zr also is present, a Hf+Zr/Si ratio of less than about 1. A coating microstructure is provided characterized by an inner diffusion zone or region adjacent the substrate and the outer additive (Ni,Pt)(Al,Si) layer including hafnium silicide second phase particles or regions dispersed throughout the outer additive layer of the coating.
摘要翻译：在镍或钴基超级合金基材上CVD外延生长的铂铝化物扩散涂层，其中铂改性的铝化物扩散涂层被修饰为包括硅，铪和任选的锆和/或其它活性元素（例如Ce，La，Y等）），其浓度为涂层的外添加剂（Ni，Pt）（Al，Si）层的约0.01重量％至约8重量％。特别的涂层在外添加层中包含约0.01重量％至小于2重量％的硅，铪和锆，优选Hf / Si比小于约1，当Zr也存在时，Hf + Zr / Si比小于约1.提供一种涂层微观结构，其特征在于与衬底相邻的内扩散区或区域，以及包括硅化铪第二相颗粒或区域的外添加剂（Ni，Pt）（Al，Si）分散在涂层的外部添加剂层中。

8. 发明授权

US07901788B2 CVD condeposition of A1 and one or more reactive (gettering) elements to form protective aluminide coating 有权
标题翻译： CVD沉积A1和一种或多种反应性（吸气）元素以形成保护性铝化物涂层
公开(公告)号：US07901788B2
公开(公告)日：2011-03-08
申请号：US10645707
申请日：2003-08-20
申请人： Bruce M. Warnes , David C. Punola , Jeffery S. Smith , Daniel L. Near
发明人： Bruce M. Warnes , David C. Punola , Jeffery S. Smith , Daniel L. Near
IPC分类号： B32B15/04
CPC分类号： C23C16/08 , C23C10/14 , C23C16/4488 , Y10T428/12493 , Y10T428/12736 , Y10T428/1275 , Y10T428/12944
摘要： CVD aluminide coatings including a small concentration of a reactive, gettering element for surface active impurities dispersed therein are formed for improved oxidation resistance. The aluminide coatings are formed by CVD codeposition of Al and the gettering element on the substrate using coating gases for the gettering element generated either outside or inside the coating retort depending on the chlorination temperature needed for the particular gettering element.
摘要翻译：形成包含少量浓度的分散于其中的表面活性杂质的反应性吸杂元素的CVD铝化物涂层，以提高耐氧化性。铝化物涂层通过使用涂覆气体的Al和通过CVD覆盖在基底上的吸气元件形成，所述吸附元件根据特定吸气元件所需的氯化温度在涂层蒸馏器的外部或内部产生。

9. 发明授权

US07273635B2 Method of forming aluminide diffusion coatings 有权
标题翻译：形成铝化物扩散涂层的方法
公开(公告)号：US07273635B2
公开(公告)日：2007-09-25
申请号：US10674059
申请日：2003-09-29
申请人： Andrew L. Purvis , Bruce M. Warnes , Irving R. McFarren , Joel L. Cockerill
发明人： Andrew L. Purvis , Bruce M. Warnes , Irving R. McFarren , Joel L. Cockerill
IPC分类号： C23C16/12
CPC分类号： C23C28/021 , C23C8/02 , C23C8/06 , C23C28/023 , C23C28/028
摘要： Method of forming an outwardly grown aluminide diffusion coating on a superalloy substrate disposed in a coating retort including the steps of heating the substrate to a temperature of 900 to 1200 degrees C., flowing a coating gas comprising aluminum trichloride and a carrier gas through the coating retort at a flow rate of the coating gas of about 100 to about 450 standard cubic feet per hour, providing a concentration of aluminum trichloride in the retort of less than 1.4% by volume of the coating gas, and providing a total pressure of the coating gas in the coating retort of about 100 to about 450 Torr.
摘要翻译：在设置在涂层蒸煮器中的超级合金基底上形成向外生长的铝化物扩散涂层的方法，包括以下步骤：将基底加热至900至1200℃的温度，使包含三氯化铝和载气的涂覆气体通过涂层以约100至约450标准立方英尺/小时的涂覆气体的流速进行蒸煮，提供在蒸煮中的三氯化铝浓度小于涂布气体的1.4体积％，并提供涂层的总压力涂层蒸馏器中的气体约为100至约450乇。

10. 发明授权

US5658614A Platinum aluminide CVD coating method 失效
标题翻译：镀铂铝镀层法
公开(公告)号：US5658614A
公开(公告)日：1997-08-19
申请号：US330694
申请日：1994-10-28
申请人： William C. Basta , David C. Punola , Bruce M. Warnes
发明人： William C. Basta , David C. Punola , Bruce M. Warnes
IPC分类号： C23C10/02 , C23C10/14 , C23C16/12 , F01D5/28 , C23C16/00
CPC分类号： F01D5/288 , C23C10/02 , C23C10/14 , C23C16/12
摘要： A method of improving the oxidation resistance of a platinum modified aluminide coating formed on a nickel base superalloy substrate, comprises providing a platinum layer on the substrate, heating the substrate in a coating retort to a temperature of at least about 1000.degree. C., forming external of the coating retort a high purity coating gas comprising hydrogen and aluminum trichloride, and introducing the coating gas into the coating retort to contact the heated substrate to form an outwardly grown, single phase [(Ni,Pt)]Al] platinum modified aluminide coating having reduced concentration of at least one of a substrate substitutional alloying element and a surface active tramp element selected from at least one of B, P, and S in said coating as compared to a platinum modified aluminide coating formed at a lower temperature.
摘要翻译：一种提高形成在镍基超合金基底上的铂改性铝化物涂层的抗氧化性的方法包括在基底上提供铂层，将基底在涂层蒸煮中加热到至少约1000℃的温度，形成涂层的外部将包含氢和三氯化铝的高纯度涂层气体蒸煮，并将涂覆气体引入涂层蒸馏器中以接触加热的底物以形成向外生长的单相[（Ni，Pt）] Al]铂改性铝化物与在较低温度下形成的铂改性铝化物涂层相比，所述涂层中的至少一种基质替代合金元素和选自B，P和S中的至少一种的表面活性杂质元素的浓度降低。

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