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1. 发明公开

US20240344196A1 ULTRALIGHT ROBUST PLATE MATERIALS 审中-公开
公开(公告)号：US20240344196A1
公开(公告)日：2024-10-17
申请号：US18613241
申请日：2024-03-22
申请人： THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA
发明人： Igor Bargatin , Keivan Davami
IPC分类号： C23C16/455 , C23C16/01 , C23C16/12 , C23C16/50 , H01J37/32 , H01L21/3065
CPC分类号： C23C16/45525 , C23C16/01 , C23C16/12 , C23C16/45555 , C23C16/50 , H01J37/321 , H01J2237/334 , H01L21/3065
摘要： A nanoscale plate structure includes base plates and rib plates with nanoscale thickness and macroscopic lateral dimensions. The base plate resides in the first plane, the ribs can reside out-of-plane and form at least one strengthening rib, and additional base plates can reside in planes parallel to the first plane. The strengthening rib can be patterned such that there is no straight line path extending through a lateral dimension of the plate structure that does not intersect the at least one base plate and the at least one strengthening rib. The plates and ribs used in the structure have a thickness between about 1 nm and about 100 nm. The plate structures can be fabricated using a conformal deposition method including atomic layer deposition.

2. 发明授权

US11939672B2 Ultralight robust plate materials 有权
公开(公告)号：US11939672B2
公开(公告)日：2024-03-26
申请号：US17541681
申请日：2021-12-03
申请人： THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA
发明人： Igor Bargatin , Keivan Davami
IPC分类号： H01L21/3065 , C23C16/01 , C23C16/12 , C23C16/455 , C23C16/50 , H01J37/32
CPC分类号： C23C16/45525 , C23C16/01 , C23C16/12 , C23C16/45555 , C23C16/50 , H01J37/321 , H01J2237/334 , H01L21/3065
摘要： A nanoscale plate structure includes base plates and rib plates with nanoscale thickness and macroscopic lateral dimensions. The base plate resides in the first plane, the ribs can reside out-of-plane and form at least one strengthening rib, and additional base plates can reside in planes parallel to the first plane. The strengthening rib can be patterned such that there is no straight line path extending through a lateral dimension of the plate structure that does not intersect the at least one base plate and the at least one strengthening rib. The plates and ribs used in the structure have a thickness between about 1 nm and about 100 nm. The plate structures can be fabricated using a conformal deposition method including atomic layer deposition.

3. 发明申请

US20170362699A1 IMPLANTATION USING SOLID ALUMINUM IODIDE (ALI3) FOR PRODUCING ATOMIC ALUMINUM IONS AND IN SITU CLEANING OF ALUMINUM IODIDE AND ASSOCIATED BY-PRODUCTS 审中-公开
公开(公告)号：US20170362699A1
公开(公告)日：2017-12-21
申请号：US15627952
申请日：2017-06-20
申请人： Axcelis Technologies, Inc.
发明人： Dennis Elliott Kamenitsa , Richard J. Rzeszut , Fernando M. Silva , Neil K. Colvin
IPC分类号： C23C16/12 , C01F7/48 , C01B7/13 , C23C16/448 , H01L21/306 , H01L21/02
CPC分类号： C23C16/12 , C01B7/135 , C01B31/36 , C01F7/48 , C23C14/48 , C23C16/448 , H01J37/3171 , H01J2237/022 , H01J2237/08 , H01J2237/31705 , H01L21/02019 , H01L21/02167 , H01L21/26506 , H01L21/306
摘要： An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station configured to accept the ion beam for implantation of aluminum ions into a workpiece. The ion source has a solid-state material source having aluminum iodide in a solid form. A solid source vaporizer vaporizes the aluminum iodide, defining gaseous aluminum iodide. An arc chamber forms a plasma from the gaseous aluminum iodide, where arc current from a power supply is configured to dissociate aluminum ions from the aluminum iodide. One or more extraction electrodes extract the ion beam from the arc chamber. A water vapor source further introduces water to react residual aluminum iodide to form hydroiodic acid, where the residual aluminum iodide and hydroiodic acid is evacuated from the system.

4. 发明授权

US08943830B2 Coated porous metallic mat 有权
标题翻译：涂层多孔金属垫
公开(公告)号：US08943830B2
公开(公告)日：2015-02-03
申请号：US13397961
申请日：2012-02-16
申请人： Arun K. Bhattacharya , Jose M. Aurrecoechea
发明人： Arun K. Bhattacharya , Jose M. Aurrecoechea
IPC分类号： B32B3/26
CPC分类号： B32B3/26 , C23C10/48 , C23C16/12 , C23C16/56 , F23D14/16 , F23D2203/1012 , F23D2212/201 , Y10T428/249953
摘要： A porous metallic mat is provided. The porous metallic mat includes a plurality of fibers and a protective coating. The plurality of fibers is sintered into a mat configuration. The protective coating is provided on the porous metallic mat. The protective coating includes a diffusion aluminide configured to provide oxidation resistance to the porous metallic mat.
摘要翻译：提供多孔金属垫。多孔金属垫包括多根纤维和保护涂层。多个纤维被烧结成垫子构型。保护涂层设置在多孔金属垫上。保护涂层包括被配置为对多孔金属垫提供抗氧化性的扩散铝化物。

5. 发明申请

US20130213045A1 Coated Porous Metallic Mat 有权
标题翻译：涂层多孔金属垫
公开(公告)号：US20130213045A1
公开(公告)日：2013-08-22
申请号：US13397961
申请日：2012-02-16
申请人： Arun K. Bhattacharya , Jose M. Aurrecoechea
发明人： Arun K. Bhattacharya , Jose M. Aurrecoechea
IPC分类号： F02C7/22 , C23C8/60 , B32B3/26
CPC分类号： B32B3/26 , C23C10/48 , C23C16/12 , C23C16/56 , F23D14/16 , F23D2203/1012 , F23D2212/201 , Y10T428/249953
摘要： A porous metallic mat is provided. The porous metallic mat includes a plurality of fibers and a protective coating. The plurality of fibers is sintered into a mat configuration. The protective coating is provided on the porous metallic mat. The protective coating includes a diffusion aluminide configured to provide oxidation resistance to the porous metallic mat.
摘要翻译：提供多孔金属垫。多孔金属垫包括多根纤维和保护涂层。多个纤维被烧结成垫子构型。保护涂层设置在多孔金属垫上。保护涂层包括被配置为对多孔金属垫提供抗氧化性的扩散铝化物。

6. 发明申请

US20050271563A1 Protected alloy surfaces in microchannel apparatus and catalysts, alumina supported catalysts, catalyst intermediates, and methods of forming catalysts and microchannel apparatus 有权
标题翻译：微通道设备和催化剂中受保护的合金表面，氧化铝负载催化剂，催化剂中间体以及形成催化剂和微通道设备的方法
公开(公告)号：US20050271563A1
公开(公告)日：2005-12-08
申请号：US11088685
申请日：2005-03-23
申请人： Barry Yang , Francis Daly , Junko Watson , Terry Manzanec , Sean Fitzgerald , Bradley Johnson , Xiaohong Li , Chunshe Cao , Ya-Huei Chin , Anna Tonkovich , Ravi Arora , David Hesse , Dongming Qiu , Rachid Taha , Jeffrey Ramler , Yong Wang
发明人： Barry Yang , Francis Daly , Junko Watson , Terry Manzanec , Sean Fitzgerald , Bradley Johnson , Xiaohong Li , Chunshe Cao , Ya-Huei Chin , Anna Tonkovich , Ravi Arora , David Hesse , Dongming Qiu , Rachid Taha , Jeffrey Ramler , Yong Wang
IPC分类号： B01J10/00 , B01J19/00 , C01B3/38 , C23C8/10 , C23C16/00 , C23C16/12 , C23C16/56 , H01M8/12
CPC分类号： C01B3/384 , B01J19/0093 , B01J2219/00822 , B01J2219/00824 , B01J2219/00835 , B01J2219/00844 , B01J2219/0086 , B01J2219/00869 , B01J2219/00873 , B01J2219/0236 , C01B2203/0233 , C01B2203/0811 , C23C8/10 , C23C16/12 , C23C16/56 , H01M2008/1293 , Y02P20/52 , Y10S585/92 , Y10S585/924
摘要： The invention describes microchannel apparatus and catalysts that contain a layer of a metal aluminide or are made in a process in which a metal aluminide layer is formed as an intermediate. Certain processing conditions have surprisingly been found to result in superior coatings. The invention includes chemical processes conducted through apparatus described in the specification. Other catalysts and catalyst synthesis techniques are also described.
摘要翻译：本发明描述了包含金属铝化物层的微通道装置和催化剂，或者是在其中形成金属铝化物层作为中间体的方法制造的。令人惊奇地发现某些加工条件导致优异的涂层。本发明包括通过本说明书中描述的设备进行的化学过程。还描述了其它催化剂和催化剂合成技术。

7. 发明申请

US20040062865A1 Gas distributor for vapor coating method and container 审中-公开
标题翻译：气体分布器用于蒸镀法和容器
公开(公告)号：US20040062865A1
公开(公告)日：2004-04-01
申请号：US10671193
申请日：2003-09-25
发明人： Gary E. Wheat , Terri K. Brown , Richard L. Schmidt , Edward J. Cove
IPC分类号： C23C016/06
CPC分类号： C23C16/45508 , C23C10/06 , C23C16/12 , C23C16/4488 , C23C16/455 , C23C16/45563 , C23C16/45591
摘要： A gas distributor suitable for introducing a carrier gas at the top of a coating container used to provide a metallic coating on articles. The gas distributor includes a gas inlet and a gas outlet head in communication with the gas inlet for receiving a flow of gas from the gas inlet. A plurality of gas outlets through which the gas flow exits as a gas stream are spaced along the peripheral surface of the gas outlet head. A plurality of gas deflectors, each proximate to one of the gas outlets, at least initially direct the gas stream exiting the gas outlet in at least a generally centripetal path. This gas distributor can be used in vapor coating apparatus having a coating container, at least one holder for each article to be coated positioned within the coating container and below the gas outlet head of the gas distributor and at least one holder for the source of the metallic coating positioned within the coating container and below the gas outlet head of the gas distributor. A method is also provided for introducing the carrier gas as a plurality of carrier gas streams proximate the top of the coating container so that each carrier gas stream flows at least initially in at least a generally centripetal path, as well as a method for coating the articles with a metallic coating in the coating container.
摘要翻译：适用于在用于在物品上提供金属涂层的涂层容器顶部引入载气的气体分配器。气体分配器包括与气体入口连通的气体入口和气体出口头，用于从气体入口接收气体流。气流作为气流离开的多个气体出口沿气体出口头的外周表面间隔开。多个气体导流器，每个靠近一个气体出口，至少最初引导在至少大致向心的路径中离开气体出口的气流。这种气体分配器可用于具有涂层容器的蒸气涂覆装置中，每个用于待涂覆的物品的至少一个保持器定位在涂覆容器内并位于气体分配器的气体出口头部下方，以及至少一个用于金属涂层位于涂层容器内并位于气体分配器的气体出口头下方。还提供了一种方法，用于将载气作为接近涂层容器顶部的多个载气流引入，使得每个载气流至少在至少一个大致向心的路径中流动，以及一种涂覆方法在涂料容器中具有金属涂层的物品。

8. 发明授权

US06334907B1 Method of controlling thickness and aluminum content of a diffusion aluminide coating 失效
标题翻译：控制扩散铝化物涂层的厚度和铝含量的方法
公开(公告)号：US06334907B1
公开(公告)日：2002-01-01
申请号：US09417468
申请日：1999-10-13
申请人： Nripendra N. Das , Thomas E. Mantkowski , Jeffrey A. Conner
发明人： Nripendra N. Das , Thomas E. Mantkowski , Jeffrey A. Conner
IPC分类号： C23C800
CPC分类号： C23C16/12 , C23C10/08
摘要： A process for forming a diffusion aluminide coating on a substrate, such as a component for a gas turbine engine. The process generally entails placing the substrate in a suitable coating chamber, flowing an inert or reducing gas into and through the coating chamber, and then aluminizing the substrate using an aluminizing technique with a substantially constant aluminum activity, such as a vapor phase deposition process. During the aluminizing process, the amount of unreacted aluminum within the coating chamber is controlled by altering the flow rate of the gas through the coating chamber so that a portion of the unreacted aluminum is swept from the coating chamber by the gas. The amount of unreacted aluminum swept from the coating chamber is regulated by metering the gas flow rate in order to control the aluminizing rate and aluminum content of the resulting aluminide coating.
摘要翻译：在基底上形成扩散铝化物涂层的方法，例如用于燃气涡轮发动机的部件。该方法通常需要将基底放置在合适的涂布室中，使惰性或还原性气体流入涂层室并通过涂层室，然后使用具有基本上恒定的铝活性的镀铝技术（例如气相沉积工艺）使基底镀铝。在镀铝过程中，通过改变通过涂覆室的气体的流速来控制涂覆室内的未反应铝的量，使得一部分未反应的铝被气体从涂覆室扫过。通过计量气体流速来调节从涂覆室扫过的未反应铝的量，以便控制所得铝化物涂层的镀铝速率和铝含量。

9. 发明授权

US5658614A Platinum aluminide CVD coating method 失效
标题翻译：镀铂铝镀层法
公开(公告)号：US5658614A
公开(公告)日：1997-08-19
申请号：US330694
申请日：1994-10-28
申请人： William C. Basta , David C. Punola , Bruce M. Warnes
发明人： William C. Basta , David C. Punola , Bruce M. Warnes
IPC分类号： C23C10/02 , C23C10/14 , C23C16/12 , F01D5/28 , C23C16/00
CPC分类号： F01D5/288 , C23C10/02 , C23C10/14 , C23C16/12
摘要： A method of improving the oxidation resistance of a platinum modified aluminide coating formed on a nickel base superalloy substrate, comprises providing a platinum layer on the substrate, heating the substrate in a coating retort to a temperature of at least about 1000.degree. C., forming external of the coating retort a high purity coating gas comprising hydrogen and aluminum trichloride, and introducing the coating gas into the coating retort to contact the heated substrate to form an outwardly grown, single phase [(Ni,Pt)]Al] platinum modified aluminide coating having reduced concentration of at least one of a substrate substitutional alloying element and a surface active tramp element selected from at least one of B, P, and S in said coating as compared to a platinum modified aluminide coating formed at a lower temperature.
摘要翻译：一种提高形成在镍基超合金基底上的铂改性铝化物涂层的抗氧化性的方法包括在基底上提供铂层，将基底在涂层蒸煮中加热到至少约1000℃的温度，形成涂层的外部将包含氢和三氯化铝的高纯度涂层气体蒸煮，并将涂覆气体引入涂层蒸馏器中以接触加热的底物以形成向外生长的单相[（Ni，Pt）] Al]铂改性铝化物与在较低温度下形成的铂改性铝化物涂层相比，所述涂层中的至少一种基质替代合金元素和选自B，P和S中的至少一种的表面活性杂质元素的浓度降低。

10. 发明授权

US3594215A Coating of granular particles 失效
标题翻译：颗粒颗粒的涂层
公开(公告)号：US3594215A
公开(公告)日：1971-07-20
申请号：US3594215D
申请日：1968-09-10
申请人： TEXAS INSTRUMENTS INC
发明人： WAKEFIELD GENE F
IPC分类号： C23C14/22 , C23C16/12 , H01B1/00 , C23C13/04
CPC分类号： C23C14/223 , C23C14/22 , C23C16/12 , H01B1/00
摘要： DISCLOSED IS A METHOD AND APPARATUS FOR COATING PARTICULATE MATERIAL WITH METALS UTILIZING A FLUIDIZED BED. THE INVENTION COMPRISES A JACKETED FLUIDIZING CHAMBER EVACUATED BY A VACUUM PUMP AND CONTAINING PARTICLES TO BE COATED, A CELL CONTAINING THE COATING METAL, AND HEATING COILS FOR HEATING THE METAL. THE PROCESS ENABLES METALLIC COATINGS TO BE PLACED ON HEAT SENSITIVE SUBSTRATE PARTICLES, SINCE THE FLUIDIZING CHAMBER IS EASILY COOLED BY THE COMBINED EFFECTS OF CIRCULATING A COOLING FLUID THROUGH THE JACKET AND MAINTAINING A VACUUM IN THE CHAMBER.

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